JP5378420B2 - 加工可能な無機及び有機ポリマー配合物、それらの製造方法及び使用 - Google Patents

加工可能な無機及び有機ポリマー配合物、それらの製造方法及び使用 Download PDF

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JP5378420B2
JP5378420B2 JP2010547789A JP2010547789A JP5378420B2 JP 5378420 B2 JP5378420 B2 JP 5378420B2 JP 2010547789 A JP2010547789 A JP 2010547789A JP 2010547789 A JP2010547789 A JP 2010547789A JP 5378420 B2 JP5378420 B2 JP 5378420B2
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polymer
film
formulations
formulation
acid
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JP2011513514A (ja
JP2011513514A5 (enExample
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ラター，エドワード，ジュニア
クリシュナムーアシ，アヒラ
ケネディ，ジョセフ
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Honeywell International Inc
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Honeywell International Inc
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3442—Heterocyclic compounds having nitrogen in the ring having two nitrogen atoms in the ring
    • C08K5/3445—Five-membered rings
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/045—Polysiloxanes containing less than 25 silicon atoms
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J5/00—Manufacture of articles or shaped materials containing macromolecular substances
    • C08J5/18—Manufacture of films or sheets
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C08L61/04—Condensation polymers of aldehydes or ketones with phenols only
    • C08L61/06—Condensation polymers of aldehydes or ketones with phenols only of aldehydes with phenols
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2361/00—Characterised by the use of condensation polymers of aldehydes or ketones; Derivatives of such polymers
    • C08J2361/04—Condensation polymers of aldehydes or ketones with phenols only
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08J—WORKING-UP; GENERAL PROCESSES OF COMPOUNDING; AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F, C08G or C08H
    • C08J2383/00—Characterised by the use of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen, or carbon only; Derivatives of such polymers
    • C08J2383/04—Polysiloxanes

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Materials For Photolithography (AREA)
  • Formation Of Insulating Films (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
JP2010547789A 2008-02-25 2009-02-20 加工可能な無機及び有機ポリマー配合物、それらの製造方法及び使用 Active JP5378420B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US3132808P 2008-02-25 2008-02-25
US61/031,328 2008-02-25
PCT/US2009/034655 WO2009108574A2 (en) 2008-02-25 2009-02-20 Processable inorganic and organic polymer formulations, methods of production and uses thereof

Related Child Applications (1)

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JP2013157160A Division JP5702837B2 (ja) 2008-02-25 2013-07-29 加工可能な無機及び有機ポリマー配合物、それらの製造方法及び使用

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JP2011513514A JP2011513514A (ja) 2011-04-28
JP2011513514A5 JP2011513514A5 (enExample) 2013-04-18
JP5378420B2 true JP5378420B2 (ja) 2013-12-25

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JP2013157160A Active JP5702837B2 (ja) 2008-02-25 2013-07-29 加工可能な無機及び有機ポリマー配合物、それらの製造方法及び使用

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US (1) US8859673B2 (enExample)
EP (1) EP2247665A2 (enExample)
JP (2) JP5378420B2 (enExample)
KR (1) KR101546222B1 (enExample)
TW (2) TWI454508B (enExample)
WO (1) WO2009108574A2 (enExample)

Cited By (1)

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JP2013241617A (ja) * 2008-02-25 2013-12-05 Honeywell Internatl Inc 加工可能な無機及び有機ポリマー配合物、それらの製造方法及び使用

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GB201105364D0 (en) 2011-03-30 2011-05-11 Cambridge Display Tech Ltd Surface planarisation
KR101550092B1 (ko) * 2012-05-21 2015-09-03 (주)엘지하우시스 하이브리드 언더코팅층을 갖는 투명 도전성 필름 및 이의 제조방법, 이를 이용한 터치패널
JP6279878B2 (ja) * 2013-10-31 2018-02-14 東京応化工業株式会社 太陽電池の製造方法
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
US10381481B1 (en) 2018-04-27 2019-08-13 Taiwan Semiconductor Manufacturing Co., Ltd. Multi-layer photoresist

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013241617A (ja) * 2008-02-25 2013-12-05 Honeywell Internatl Inc 加工可能な無機及び有機ポリマー配合物、それらの製造方法及び使用

Also Published As

Publication number Publication date
JP2011513514A (ja) 2011-04-28
WO2009108574A3 (en) 2009-12-10
JP5702837B2 (ja) 2015-04-15
TW201506088A (zh) 2015-02-16
KR101546222B1 (ko) 2015-08-20
TW200940610A (en) 2009-10-01
JP2013241617A (ja) 2013-12-05
US8859673B2 (en) 2014-10-14
US20110054119A1 (en) 2011-03-03
WO2009108574A2 (en) 2009-09-03
TWI454508B (zh) 2014-10-01
KR20100126764A (ko) 2010-12-02
TWI513769B (zh) 2015-12-21
EP2247665A2 (en) 2010-11-10

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