JP2011513514A5 - - Google Patents

Download PDF

Info

Publication number
JP2011513514A5
JP2011513514A5 JP2010547789A JP2010547789A JP2011513514A5 JP 2011513514 A5 JP2011513514 A5 JP 2011513514A5 JP 2010547789 A JP2010547789 A JP 2010547789A JP 2010547789 A JP2010547789 A JP 2010547789A JP 2011513514 A5 JP2011513514 A5 JP 2011513514A5
Authority
JP
Japan
Prior art keywords
present
acid
crosslinkers
crosslinking
glycolurils
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2010547789A
Other languages
English (en)
Japanese (ja)
Other versions
JP2011513514A (ja
JP5378420B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from PCT/US2009/034655 external-priority patent/WO2009108574A2/en
Publication of JP2011513514A publication Critical patent/JP2011513514A/ja
Publication of JP2011513514A5 publication Critical patent/JP2011513514A5/ja
Application granted granted Critical
Publication of JP5378420B2 publication Critical patent/JP5378420B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2010547789A 2008-02-25 2009-02-20 加工可能な無機及び有機ポリマー配合物、それらの製造方法及び使用 Active JP5378420B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US3132808P 2008-02-25 2008-02-25
US61/031,328 2008-02-25
PCT/US2009/034655 WO2009108574A2 (en) 2008-02-25 2009-02-20 Processable inorganic and organic polymer formulations, methods of production and uses thereof

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013157160A Division JP5702837B2 (ja) 2008-02-25 2013-07-29 加工可能な無機及び有機ポリマー配合物、それらの製造方法及び使用

Publications (3)

Publication Number Publication Date
JP2011513514A JP2011513514A (ja) 2011-04-28
JP2011513514A5 true JP2011513514A5 (enExample) 2013-04-18
JP5378420B2 JP5378420B2 (ja) 2013-12-25

Family

ID=41016679

Family Applications (2)

Application Number Title Priority Date Filing Date
JP2010547789A Active JP5378420B2 (ja) 2008-02-25 2009-02-20 加工可能な無機及び有機ポリマー配合物、それらの製造方法及び使用
JP2013157160A Active JP5702837B2 (ja) 2008-02-25 2013-07-29 加工可能な無機及び有機ポリマー配合物、それらの製造方法及び使用

Family Applications After (1)

Application Number Title Priority Date Filing Date
JP2013157160A Active JP5702837B2 (ja) 2008-02-25 2013-07-29 加工可能な無機及び有機ポリマー配合物、それらの製造方法及び使用

Country Status (6)

Country Link
US (1) US8859673B2 (enExample)
EP (1) EP2247665A2 (enExample)
JP (2) JP5378420B2 (enExample)
KR (1) KR101546222B1 (enExample)
TW (2) TWI454508B (enExample)
WO (1) WO2009108574A2 (enExample)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8859673B2 (en) * 2008-02-25 2014-10-14 Honeywell International, Inc. Processable inorganic and organic polymer formulations, methods of production and uses thereof
DE102010039298B4 (de) 2010-08-13 2022-11-10 Robert Bosch Gmbh Verfahren zum Füllen von Hohlräumen in Wafern
PH12013500707A1 (en) 2010-10-27 2013-05-27 Intercontinental Great Brands Llc Magnetically closable product accomodating package
US8623447B2 (en) * 2010-12-01 2014-01-07 Xerox Corporation Method for coating dielectric composition for fabricating thin-film transistors
GB201105364D0 (en) 2011-03-30 2011-05-11 Cambridge Display Tech Ltd Surface planarisation
KR101550092B1 (ko) * 2012-05-21 2015-09-03 (주)엘지하우시스 하이브리드 언더코팅층을 갖는 투명 도전성 필름 및 이의 제조방법, 이를 이용한 터치패널
JP6279878B2 (ja) * 2013-10-31 2018-02-14 東京応化工業株式会社 太陽電池の製造方法
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications
US10381481B1 (en) 2018-04-27 2019-08-13 Taiwan Semiconductor Manufacturing Co., Ltd. Multi-layer photoresist

Family Cites Families (64)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA586038A (en) * 1956-03-26 1959-10-27 General Electric Company Organopolysiloxane resins
US3547766A (en) * 1966-11-25 1970-12-15 Du Pont Laminated article
JPS5125070B2 (enExample) * 1972-07-11 1976-07-28
US4107133A (en) * 1974-01-14 1978-08-15 Dainippon Ink & Chemicals, Inc. Colored polyethylene molding compositions
GB1604414A (en) * 1977-07-27 1981-12-09 Raychem Ltd Silicone resin
US4302503A (en) * 1978-05-17 1981-11-24 Libbey-Owens-Ford Company Architectural spandrel
ATE9811T1 (de) * 1980-07-14 1984-10-15 Akzo N.V. Einen blockierten katalysator enthaltende waermehaertbare ueberzugszusammensetzung.
US4590117A (en) * 1983-03-10 1986-05-20 Toray Industries, Inc. Transparent material having antireflective coating
US4839427A (en) * 1987-09-03 1989-06-13 Monsanto Company Resin systems cured with blocked acid catalysts
JP2603291B2 (ja) * 1988-04-19 1997-04-23 東芝シリコーン株式会社 第4級アンモニウム基含有シリコーン樹脂微粉末
JP2517785B2 (ja) * 1990-08-02 1996-07-24 信越化学工業株式会社 含浸性防水剤組成物
US5082758A (en) * 1990-08-31 1992-01-21 Xerox Corporation Toner and developer compositions with charge enhancing additives
JP2712817B2 (ja) * 1990-11-15 1998-02-16 信越化学工業株式会社 ポリオルガノシロキサン樹脂の製造方法
JPH0597478A (ja) * 1991-10-04 1993-04-20 Nippon Sheet Glass Co Ltd 撥水性ガラス物品およびその製造方法
JP2704175B2 (ja) 1992-11-25 1998-01-26 株式会社アメックス協販 瓦パネル
US5460911A (en) * 1994-03-14 1995-10-24 Xerox Corporation Electrophotographic imaging member free of reflection interference
WO1996000758A1 (en) 1994-06-30 1996-01-11 Hitachi Chemical Company, Ltd. Material for forming silica-base coated insulation film, process for producing the material, silica-base insulation film, semiconductor device, and process for producing the device
US5858547A (en) * 1994-07-06 1999-01-12 Alliedsignal, Inc. Novolac polymer planarization films for microelectronic structures
JP3637723B2 (ja) * 1997-03-12 2005-04-13 Jsr株式会社 ネガ型感放射線性樹脂組成物
US7361444B1 (en) * 1998-02-23 2008-04-22 International Business Machines Corporation Multilayered resist systems using tuned polymer films as underlayers and methods of fabrication thereof
US20010006759A1 (en) * 1998-09-08 2001-07-05 Charles R. Shipley Jr. Radiation sensitive compositions
US20020102483A1 (en) * 1998-09-15 2002-08-01 Timothy Adams Antireflective coating compositions
US6210856B1 (en) * 1999-01-27 2001-04-03 International Business Machines Corporation Resist composition and process of forming a patterned resist layer on a substrate
US6316165B1 (en) * 1999-03-08 2001-11-13 Shipley Company, L.L.C. Planarizing antireflective coating compositions
US6268457B1 (en) * 1999-06-10 2001-07-31 Allied Signal, Inc. Spin-on glass anti-reflective coatings for photolithography
US6890448B2 (en) * 1999-06-11 2005-05-10 Shipley Company, L.L.C. Antireflective hard mask compositions
JP4248098B2 (ja) 1999-09-20 2009-04-02 東京応化工業株式会社 反射防止膜形成用組成物及びレジストパターンの形成方法
JP4257480B2 (ja) * 1999-09-29 2009-04-22 信越化学工業株式会社 高分子化合物、化学増幅レジスト材料及びパターン形成方法
US6461717B1 (en) * 2000-04-24 2002-10-08 Shipley Company, L.L.C. Aperture fill
US6891237B1 (en) * 2000-06-27 2005-05-10 Lucent Technologies Inc. Organic semiconductor device having an active dielectric layer comprising silsesquioxanes
JP3772077B2 (ja) * 2000-09-27 2006-05-10 株式会社東芝 パターン形成方法
JP4029556B2 (ja) * 2000-11-01 2008-01-09 Jsr株式会社 感光性絶縁樹脂組成物およびその硬化物
US6602552B1 (en) * 2000-11-14 2003-08-05 Basf Corporation Low temperature cure coating composition and method therefore
US6573328B2 (en) * 2001-01-03 2003-06-03 Loctite Corporation Low temperature, fast curing silicone compositions
JP4401033B2 (ja) * 2001-03-19 2010-01-20 Azエレクトロニックマテリアルズ株式会社 ネガ型感光性樹脂組成物及びこれを用いた表示デバイス
JP2003025510A (ja) * 2001-07-16 2003-01-29 Shin Etsu Chem Co Ltd 反射防止性及び耐擦傷性を有する多層積層体
TW591341B (en) * 2001-09-26 2004-06-11 Shipley Co Llc Coating compositions for use with an overcoated photoresist
WO2003034152A1 (en) * 2001-10-10 2003-04-24 Nissan Chemical Industries, Ltd. Composition for forming antireflection film for lithography
DE10151264A1 (de) * 2001-10-17 2003-04-30 Degussa Aminoalkylalkoxysiloxanhaltige Gemische, deren Herstellung und deren Verwendung
AU2002359387A1 (en) 2001-11-15 2003-06-10 Honeywell International Inc. Anti-reflective coatings for photolithography and methods of preparation thereof
EP1478681A4 (en) 2001-11-16 2006-10-11 Honeywell Int Inc SPIN ON GLASS ANTIREFLECTION COATINGS FOR PHOTOLITHOGRAPHY
KR100913879B1 (ko) * 2002-01-28 2009-08-26 제이에스알 가부시끼가이샤 감광성 유전체 형성용 조성물, 및 그것을 이용한 전사필름, 유전체 및 전자 부품
JP2003316296A (ja) * 2002-02-01 2003-11-07 Seiko Epson Corp 回路基板、電気光学装置、電子機器
TWI314247B (en) * 2002-03-04 2009-09-01 Shipley Co Llc Megative photordsists for short wavelength imaging
US7390608B2 (en) * 2002-10-21 2008-06-24 Rohm And Haas Electronic Materials Llc Photoresists containing Si-polymers
EP1422565A3 (en) * 2002-11-20 2005-01-05 Shipley Company LLC Multilayer photoresist systems
KR20040044368A (ko) 2002-11-20 2004-05-28 쉬플리 캄파니, 엘.엘.씨. 다층 포토레지스트 시스템
US7202013B2 (en) * 2003-06-03 2007-04-10 Shin-Etsu Chemical Co., Ltd. Antireflective film material, and antireflective film and pattern formation method using the same
KR101100068B1 (ko) * 2003-08-04 2011-12-29 시바 홀딩 인크 강한 접착성 피막의 제조방법
US7303855B2 (en) * 2003-10-03 2007-12-04 Shin-Etsu Chemical Co., Ltd. Photoresist undercoat-forming material and patterning process
US7270931B2 (en) * 2003-10-06 2007-09-18 International Business Machines Corporation Silicon-containing compositions for spin-on ARC/hardmask materials
TWI360726B (en) * 2003-10-30 2012-03-21 Nissan Chemical Ind Ltd Sublayer coating-forming composition containing de
US8053159B2 (en) * 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
TWI367686B (en) * 2004-04-07 2012-07-01 Semiconductor Energy Lab Light emitting device, electronic device, and television device
US20060057491A1 (en) 2004-05-18 2006-03-16 Rohm And Haas Electronic Materials, L.L.C. Coating compositions for use with an overcoated photoresist
US7015061B2 (en) 2004-08-03 2006-03-21 Honeywell International Inc. Low temperature curable materials for optical applications
EP1813987B1 (en) * 2004-11-01 2011-08-24 Nissan Chemical Industries, Ltd. Sulfonic-ester-containing composition for formation of antireflection film for lithography
TWI338816B (en) * 2005-03-11 2011-03-11 Shinetsu Chemical Co Photoresist undercoat-forming material and patterning process
US7326442B2 (en) * 2005-07-14 2008-02-05 International Business Machines Corporation Antireflective composition and process of making a lithographic structure
JP2007056108A (ja) * 2005-08-23 2007-03-08 Jsr Corp 感光性絶縁樹脂組成物およびその硬化物
JP2007137944A (ja) * 2005-11-15 2007-06-07 Fujifilm Corp 硬化性樹脂組成物、硬化膜、反射防止フィルム、偏光板、及び表示装置
US20070197727A1 (en) * 2006-02-16 2007-08-23 Laura Ann Lewin Multi component coating composition
MX325549B (es) * 2006-06-14 2014-11-24 Du Pont Sustrato recubierto que tiene resistencia mejorada contra ralladuras y desgaste.
US8859673B2 (en) * 2008-02-25 2014-10-14 Honeywell International, Inc. Processable inorganic and organic polymer formulations, methods of production and uses thereof

Similar Documents

Publication Publication Date Title
JP2011513514A5 (enExample)
ATE540043T1 (de) Härtbare polymerabmischungen
EP2112180A4 (en) PROPYLENE POLYMER, PROPYLENE POLYMERIC COMPOSITION, PILL WITH THUS AND LIABILITY
WO2008151150A3 (en) Peg-pei copolymers for nucleic acid delivery
JP2013537406A5 (enExample)
JP2014533756A5 (enExample)
JP2010045351A5 (enExample)
WO2009106717A3 (fr) Composes a structure guanidine et leurs utilisations comme catalyseurs de polycondensation d'organopolysiloxanes
EP3115428A3 (en) A coating composition and articles made therefrom
JP2012031414A5 (enExample)
ES2570607T3 (es) Película revestida con un fluoropolímero, procedimiento para formar la misma, y composición líquida de fluoropolímero
IT1403380B1 (it) Composizione di polimeri con caratteristiche di assorbimento di calore ad alta stabilità agli agenti atmosferici.
IT1396193B1 (it) Composizioni polimeriche nanocomposite termoplastiche espansibili con migliorata capacita' di isolamento termico.
JP2011528383A5 (enExample)
WO2009103894A8 (fr) Composition organopolysiloxanique vulcanisable a temperature ambiante en elastomere et nouveaux catalyseurs de polycondensation d'organopolysiloxanes
ITRM20100667A1 (it) Composizione di polimeri con caratteristiche di assorbimento di calore ad alta stabilità agli agenti atmosferici.
BR112012003468A2 (pt) processo para a produção de polímeros de polibifenilsulfona, polímero de polibifenilsulfona, composição termoplástica para moldagem, corpo moldado, fibra, filme, membrana ou espuma, e, uso das composições termoplásticas para moldagem ou dos polímeros de polibifenilsulfona.
BRPI0907537A2 (pt) Pá para roda de pás de turbomáquina, setor de distribuidor de turbomáquina, roda de pás e turbomáquina
WO2011096777A3 (ko) 양이온성 고분자 화합물로 표면개질된 흡수성 수지
BRPI0808051A2 (pt) Sistema de cultivo de alta superfície com substrato para aumento de superfície.
JP2010506991A5 (enExample)
BRPI0823363A2 (pt) Modificação de ácido nucleico com polímeros compreendendo grupos amino quaternário carregados .
RU2015137608A (ru) Сополимерный каучук, содержащий нитрильные группы, сшиваемая каучуковая композиция и сшитый каучук
EP2277951A4 (en) POLYPHENYLENETHERIC COMPOSITION WITH ENGER MOLECULAR WEIGHT DISTRIBUTION
WO2010074440A3 (ko) 고분자 중합체, 이를 포함하는 유기 광전 소자, 및 이를 포함하는 표시장치