JP5362188B2 - 磁性体検出センサ - Google Patents
磁性体検出センサ Download PDFInfo
- Publication number
- JP5362188B2 JP5362188B2 JP2007088032A JP2007088032A JP5362188B2 JP 5362188 B2 JP5362188 B2 JP 5362188B2 JP 2007088032 A JP2007088032 A JP 2007088032A JP 2007088032 A JP2007088032 A JP 2007088032A JP 5362188 B2 JP5362188 B2 JP 5362188B2
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- Japan
- Prior art keywords
- magnetic
- magnetic field
- detection
- magnet
- field detection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 238000001514 detection method Methods 0.000 title claims description 323
- 239000000126 substance Substances 0.000 claims description 56
- 239000010408 film Substances 0.000 claims description 40
- 239000000696 magnetic material Substances 0.000 claims description 28
- 230000008859 change Effects 0.000 claims description 23
- 230000005415 magnetization Effects 0.000 claims description 15
- 239000010409 thin film Substances 0.000 claims description 7
- 230000035945 sensitivity Effects 0.000 description 14
- 239000000758 substrate Substances 0.000 description 13
- 238000009826 distribution Methods 0.000 description 12
- 238000010586 diagram Methods 0.000 description 11
- 239000006249 magnetic particle Substances 0.000 description 8
- 238000000034 method Methods 0.000 description 8
- 230000006870 function Effects 0.000 description 7
- 238000006073 displacement reaction Methods 0.000 description 5
- 230000005389 magnetism Effects 0.000 description 5
- 239000010949 copper Substances 0.000 description 4
- 230000005381 magnetic domain Effects 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 230000008569 process Effects 0.000 description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 230000008878 coupling Effects 0.000 description 2
- 238000010168 coupling process Methods 0.000 description 2
- 238000005859 coupling reaction Methods 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000010355 oscillation Effects 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 229910000679 solder Inorganic materials 0.000 description 2
- 229910000906 Bronze Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- AOWKSNWVBZGMTJ-UHFFFAOYSA-N calcium titanate Chemical compound [Ca+2].[O-][Ti]([O-])=O AOWKSNWVBZGMTJ-UHFFFAOYSA-N 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 238000003745 diagnosis Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000012447 hatching Effects 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 230000007257 malfunction Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 229910001172 neodymium magnet Inorganic materials 0.000 description 1
- 238000003909 pattern recognition Methods 0.000 description 1
- 229910000889 permalloy Inorganic materials 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000001105 regulatory effect Effects 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005549 size reduction Methods 0.000 description 1
- 238000004528 spin coating Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
Landscapes
- Measuring Magnetic Variables (AREA)
- Hall/Mr Elements (AREA)
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007088032A JP5362188B2 (ja) | 2007-03-29 | 2007-03-29 | 磁性体検出センサ |
US12/056,880 US20080238417A1 (en) | 2007-03-29 | 2008-03-27 | Magnetic substance detection sensor and magnetic substance detecting apparatus |
CN2008100879988A CN101275992B (zh) | 2007-03-29 | 2008-03-28 | 磁性物质检测传感器和磁性物质检测装置 |
EP08153527A EP1975637B1 (en) | 2007-03-29 | 2008-03-28 | Magnetic substance detection sensor and magnetic substance detecting apparatus |
CN201210281433.XA CN102819001B (zh) | 2007-03-29 | 2008-03-28 | 磁性物质检测传感器和磁性物质检测装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007088032A JP5362188B2 (ja) | 2007-03-29 | 2007-03-29 | 磁性体検出センサ |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2008249369A JP2008249369A (ja) | 2008-10-16 |
JP2008249369A5 JP2008249369A5 (zh) | 2010-05-06 |
JP5362188B2 true JP5362188B2 (ja) | 2013-12-11 |
Family
ID=39974517
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007088032A Active JP5362188B2 (ja) | 2007-03-29 | 2007-03-29 | 磁性体検出センサ |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP5362188B2 (zh) |
CN (1) | CN101275992B (zh) |
Families Citing this family (16)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5165963B2 (ja) * | 2007-08-14 | 2013-03-21 | 新科實業有限公司 | 磁気センサ及びその製造方法 |
JP5608548B2 (ja) * | 2010-12-28 | 2014-10-15 | 日本電産サンキョー株式会社 | 磁気センサユニット |
US20120229128A1 (en) * | 2011-03-10 | 2012-09-13 | Armin Satz | Magnetic Field Sensor |
DE102011087342A1 (de) * | 2011-11-29 | 2013-05-29 | Leibniz-Institut Für Festkörper- Und Werkstoffforschung Dresden E.V. | Verwendung von flexiblen magnetischen dünnschichtsensorelementen |
CN102692609B (zh) * | 2012-05-30 | 2014-09-10 | 电子科技大学 | 基于纳米粒子磁流变弹性体薄膜的微型磁场传感器 |
CN103226865B (zh) * | 2013-04-16 | 2016-05-25 | 无锡乐尔科技有限公司 | 一种基于磁电阻技术检测磁性图形表面磁场的磁头 |
KR101476258B1 (ko) * | 2013-10-23 | 2014-12-24 | 기산전자 주식회사 | 위폐 감별용 자기센서 |
JP6359858B2 (ja) * | 2014-04-04 | 2018-07-18 | キヤノン電子株式会社 | 磁界検出装置および磁気識別装置 |
JP6464907B2 (ja) * | 2015-04-20 | 2019-02-06 | Tdk株式会社 | 位置検出装置及び位置検出装置の使用構造 |
CN105548921B (zh) * | 2015-12-03 | 2018-06-19 | 深圳怡化电脑股份有限公司 | 一种确定轴承含磁的方法及装置 |
JP6682657B2 (ja) | 2016-04-29 | 2020-04-15 | ティディケイ−ミクロナス ゲー・エム・ベー・ハー | 距離測定装置 |
JP2018072429A (ja) * | 2016-10-25 | 2018-05-10 | キヤノン株式会社 | 電子機器および撮像装置 |
JP6661215B2 (ja) * | 2017-10-31 | 2020-03-11 | Tdk株式会社 | 位置検出装置およびカメラモジュール |
JP6508381B1 (ja) * | 2018-03-22 | 2019-05-08 | Tdk株式会社 | 磁気センサ装置 |
JP7059080B2 (ja) * | 2018-04-09 | 2022-04-25 | キヤノン電子株式会社 | 磁気識別装置 |
JP7293818B2 (ja) | 2019-04-03 | 2023-06-20 | 株式会社プロテリアル | センサ装置、センサ付きケーブル及び複合ケーブル |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2630204B1 (fr) * | 1988-04-18 | 1991-05-10 | Alsthom | Capteur de position |
WO1992012438A1 (fr) * | 1990-12-28 | 1992-07-23 | Kabushiki Kaisha Komatsu Seisakusho | Detecteur magnetique et structure de son montage |
JPH07210833A (ja) * | 1994-01-11 | 1995-08-11 | Murata Mfg Co Ltd | 磁気センサ装置 |
CN1195294C (zh) * | 1994-03-10 | 2005-03-30 | 国际商业机器公司 | 边缘偏置的磁阻传感器、其制作方法及包括它的磁存储系统 |
JP3605880B2 (ja) * | 1995-05-12 | 2004-12-22 | 株式会社デンソー | 非接触型回転センサ |
US5744896A (en) * | 1996-05-21 | 1998-04-28 | Visual Computing Systems Corp. | Interlocking segmented coil array |
JP3064293B2 (ja) * | 1997-02-18 | 2000-07-12 | トヨタ自動車株式会社 | 回転センサ |
JP4024964B2 (ja) * | 1998-07-28 | 2007-12-19 | キヤノン電子株式会社 | 磁気インク検知用磁気センサー、その信号処理方法、及び磁気インク検知装置 |
JP3764834B2 (ja) * | 1999-10-22 | 2006-04-12 | キヤノン電子株式会社 | 電流センサー及び電流検出装置 |
JP2002090432A (ja) * | 2000-09-12 | 2002-03-27 | Aichi Steel Works Ltd | 磁場検出装置 |
JP2002243766A (ja) * | 2001-02-16 | 2002-08-28 | Fuji Electric Co Ltd | 電流センサ |
JP3781422B2 (ja) * | 2003-08-19 | 2006-05-31 | 株式会社ミネルバ | 磁気センサ |
JP4541136B2 (ja) * | 2004-12-28 | 2010-09-08 | キヤノン電子株式会社 | 磁性体検出センサ及び磁性体検出ラインセンサ |
JP3987941B2 (ja) * | 2005-03-14 | 2007-10-10 | 国立大学法人 岡山大学 | 磁気的インピーダンス計測装置 |
US7116101B1 (en) * | 2005-12-20 | 2006-10-03 | Honeywell International Inc. | Specific location of hall chips for sensing redundant angular positions |
-
2007
- 2007-03-29 JP JP2007088032A patent/JP5362188B2/ja active Active
-
2008
- 2008-03-28 CN CN2008100879988A patent/CN101275992B/zh active Active
Also Published As
Publication number | Publication date |
---|---|
CN101275992A (zh) | 2008-10-01 |
CN101275992B (zh) | 2012-09-12 |
JP2008249369A (ja) | 2008-10-16 |
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