JP5357542B2 - 中赤外共振空洞発光ダイオード - Google Patents
中赤外共振空洞発光ダイオード Download PDFInfo
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- JP5357542B2 JP5357542B2 JP2008526956A JP2008526956A JP5357542B2 JP 5357542 B2 JP5357542 B2 JP 5357542B2 JP 2008526956 A JP2008526956 A JP 2008526956A JP 2008526956 A JP2008526956 A JP 2008526956A JP 5357542 B2 JP5357542 B2 JP 5357542B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/04—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction
- H01L33/06—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a quantum effect structure or superlattice, e.g. tunnel junction within the light emitting region, e.g. quantum confinement structure or tunnel barrier
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/10—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a light reflecting structure, e.g. semiconductor Bragg reflector
- H01L33/105—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a light reflecting structure, e.g. semiconductor Bragg reflector with a resonant cavity structure
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/26—Materials of the light emitting region
- H01L33/30—Materials of the light emitting region containing only elements of group III and group V of the periodic system
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/36—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes
- H01L33/38—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the electrodes with a particular shape
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- Optics & Photonics (AREA)
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- Semiconductor Lasers (AREA)
Description
Claims (8)
- 中心波長(λ)でピーク状プロファイルを有する放射を放出することができる共振空洞発光ダイオード(RCLED)デバイスであって、
上面および底面をもつ平面形状を有し、1つまたは複数の量子井戸が内部に配置されており、前記1つまたは複数の量子井戸が、エネルギーを供給して前記RCLEDの放射出力を誘導するように構成され、また前記RCLEDの共振波に対して波腹の位置付近に配置される、第1の活性領域と、
前記第1の活性領域の上面に隣接し、前記第1の活性領域の中央から第1の距離延びるような厚さを有する第1のチャンバと、
前記第1の活性領域の底面に隣接し、クラッド層と、電子閉じ込めバリア層とトンネルダイオードとを備える、第2のチャンバと
を備え、
前記第1の活性領域、前記第1のチャンバ、および前記第2のチャンバが、赤外領域内に中心波長を有する電磁放射を生成する一次共振経路を形成するように構成され、
前記第1の活性領域、前記第1のチャンバ、および前記第2のチャンバの厚さの合計が約2λ以下であり、
前記RCLEDの中心波長および品質係数が、ある雰囲気中の二酸化炭素を検出するための使用に実質的に最適化され、
前記RCLEDは、さらに前記第2のチャンバの底部に隣接する第2の反射器をさらに備え、前記第2の反射器が4分の1波長の分布ブラッグ反射器(DBR)スタックを含み、
前記第2の反射器が8.5〜17のDBR対を含む、
RCLEDデバイス。 - 前記第1の活性領域が1つ〜5つの量子井戸を含む、請求項1記載のデバイス。
- 前記量子井戸がInAsとInAsSbの交互層からなる、請求項1記載のデバイス。
- 前記第1の活性領域が3つの量子井戸を含む、請求項1記載のデバイス。
- 前記RCLEDが、空気中で約4.26ミクロンの中心波長を有する赤外放射を放出するように構成される、請求項1記載のデバイス。
- 中心波長(λ)でピーク状プロファイルを有する放射を放出することができる共振空洞発光ダイオード(RCLED)デバイスであって、
1つまたは複数の量子井戸が内部に配置され、第1のチャンバに使用される主要材料がInAsである第1の活性領域と、
前記第1の活性領域に結合された第1のチャンバおよび第2のチャンバと、
前記第1および第2のチャンバにそれぞれ結合された第1および第2の反射器と
を備え、
前記第2のチャンバが、電子閉じ込めバリア層とトンネルダイオードとを備え、
前記第1の活性領域、前記第1のチャンバ、および前記第2のチャンバが、赤外領域内に中心波長を有する電磁放射を生成する一次共振経路を形成するように構成され、
前記第1の活性領域、前記第1のチャンバ、および前記第2のチャンバの厚さの合計が約2λ以下であり、
前記RCLEDの中心波長および品質係数が、ある雰囲気中の二酸化炭素を検出するための使用に実質的に最適化され、
前記第2の反射器が8.5〜17のDBR対を含む、
RCLEDデバイス。 - 前記RCLED内の放射の一次共振経路が約1.5λ以下である、請求項6記載のデバイス。
- 前記RCLEDが、主にInAsからなり、かつ複数のエピタキシャル成長させた内部層を含む、請求項6記載のデバイス。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US11/203,398 | 2005-08-15 | ||
US11/203,398 US7560736B2 (en) | 2005-08-15 | 2005-08-15 | Mid-infrared resonant cavity light emitting diodes |
PCT/US2006/029562 WO2007021509A2 (en) | 2005-08-15 | 2006-07-28 | Mid-infrared resonant cavity light emitting diodes |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009505420A JP2009505420A (ja) | 2009-02-05 |
JP2009505420A5 JP2009505420A5 (ja) | 2011-09-22 |
JP5357542B2 true JP5357542B2 (ja) | 2013-12-04 |
Family
ID=37533258
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008526956A Active JP5357542B2 (ja) | 2005-08-15 | 2006-07-28 | 中赤外共振空洞発光ダイオード |
Country Status (7)
Country | Link |
---|---|
US (1) | US7560736B2 (ja) |
EP (1) | EP1935039B1 (ja) |
JP (1) | JP5357542B2 (ja) |
KR (1) | KR20080035696A (ja) |
CN (1) | CN101288184B (ja) |
CA (1) | CA2618695C (ja) |
WO (1) | WO2007021509A2 (ja) |
Families Citing this family (18)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100631133B1 (ko) * | 2005-05-31 | 2006-10-02 | 삼성전기주식회사 | 수직구조 질화물계 반도체 발광 다이오드 |
US7598158B1 (en) * | 2006-06-05 | 2009-10-06 | Hrl Laboratories, Llc | Method and device for growing pseudomorphic AlInAsSb on InAs |
US7642562B2 (en) | 2006-09-29 | 2010-01-05 | Innolume Gmbh | Long-wavelength resonant-cavity light-emitting diode |
DE102011116367A1 (de) * | 2011-10-19 | 2013-04-25 | Bluepoint Medical Gmbh & Co. Kg | Vorrichtung zur hoch aufgelösten Bestimmung der Konzentration von Substanzen in fluiden Medien |
JP2014154559A (ja) * | 2013-02-04 | 2014-08-25 | Fuji Xerox Co Ltd | 半導体発光素子、光源ヘッド、及び画像形成装置 |
CN103236479A (zh) * | 2013-04-22 | 2013-08-07 | 中国科学院半导体研究所 | 紫外共振腔发光二极管 |
US10374128B2 (en) * | 2013-12-12 | 2019-08-06 | Terahertz Device Corporation | Electrical contacts to light-emitting diodes for improved current spreading and injection |
KR102131599B1 (ko) | 2013-12-16 | 2020-07-09 | 삼성디스플레이 주식회사 | 발광 다이오드 및 그 제조 방법 |
US9947827B2 (en) | 2014-02-21 | 2018-04-17 | Terahertz Device Corporation | Front-side emitting mid-infrared light emitting diode |
US9711679B2 (en) * | 2014-03-11 | 2017-07-18 | Terahertz Device Corporation | Front-side emitting mid-infrared light emitting diode fabrication methods |
CN104465913B (zh) * | 2014-11-26 | 2017-06-16 | 西安电子科技大学 | 具有双InGaN子量子阱的共振隧穿二极管及其制作方法 |
WO2017145026A1 (en) * | 2016-02-23 | 2017-08-31 | Silanna UV Technologies Pte Ltd | Resonant optical cavity light emitting device |
US10418517B2 (en) | 2016-02-23 | 2019-09-17 | Silanna UV Technologies Pte Ltd | Resonant optical cavity light emitting device |
CN106768352B (zh) * | 2016-11-25 | 2019-11-26 | 中国科学院上海技术物理研究所 | 一种红外窄带辐射源及其制备方法 |
FR3083002B1 (fr) * | 2018-06-20 | 2020-07-31 | Aledia | Dispositif optoelectronique comprenant une matrice de diodes |
US10622514B1 (en) | 2018-10-15 | 2020-04-14 | Silanna UV Technologies Pte Ltd | Resonant optical cavity light emitting device |
CN110620169B (zh) * | 2019-09-10 | 2020-08-28 | 北京工业大学 | 一种基于共振腔的横向电流限制高效率发光二极管 |
CN111785819B (zh) * | 2020-06-29 | 2021-09-07 | 厦门大学 | 一种GaN基窄带发射共振腔发光二极管及其制作方法 |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61277818A (ja) | 1985-05-31 | 1986-12-08 | Nissan Motor Co Ltd | 多段式タ−ボ過給エンジン |
EP0608674A1 (en) | 1993-01-26 | 1994-08-03 | Interuniversitair Microelektronica Centrum Vzw | InAsSb light emitting diodes |
GB9415528D0 (en) * | 1994-08-01 | 1994-09-21 | Secr Defence | Mid infrared emitting diode |
US5625635A (en) * | 1994-11-28 | 1997-04-29 | Sandia Corporation | Infrared emitting device and method |
US5995529A (en) * | 1997-04-10 | 1999-11-30 | Sandia Corporation | Infrared light sources with semimetal electron injection |
JP3689621B2 (ja) * | 2000-09-04 | 2005-08-31 | シャープ株式会社 | 半導体発光素子 |
JP2002204026A (ja) * | 2000-12-28 | 2002-07-19 | Daido Steel Co Ltd | 面発光デバイス |
WO2004015784A2 (en) * | 2002-07-31 | 2004-02-19 | Firecomms Limited | A light emitting diode |
US6822991B2 (en) * | 2002-09-30 | 2004-11-23 | Lumileds Lighting U.S., Llc | Light emitting devices including tunnel junctions |
JP4331936B2 (ja) * | 2002-12-19 | 2009-09-16 | 農工大ティー・エル・オー株式会社 | 化合物半導体の製造方法及び化合物半導体の製造装置 |
JP2004281559A (ja) * | 2003-03-13 | 2004-10-07 | Toshiba Corp | 半導体発光素子 |
US6969874B1 (en) * | 2003-06-12 | 2005-11-29 | Sandia Corporation | Flip-chip light emitting diode with resonant optical microcavity |
US7061022B1 (en) * | 2003-08-26 | 2006-06-13 | United States Of America As Represented By The Secretary Of The Army | Lateral heat spreading layers for epi-side up ridge waveguide semiconductor lasers |
US7184454B2 (en) * | 2004-06-25 | 2007-02-27 | Finisar Corporation | Light emitting device with an integrated monitor photodiode |
US7564887B2 (en) * | 2004-06-30 | 2009-07-21 | Finisar Corporation | Long wavelength vertical cavity surface emitting lasers |
-
2005
- 2005-08-15 US US11/203,398 patent/US7560736B2/en active Active
-
2006
- 2006-07-28 WO PCT/US2006/029562 patent/WO2007021509A2/en active Application Filing
- 2006-07-28 JP JP2008526956A patent/JP5357542B2/ja active Active
- 2006-07-28 KR KR1020087006179A patent/KR20080035696A/ko not_active Application Discontinuation
- 2006-07-28 EP EP06800501.6A patent/EP1935039B1/en active Active
- 2006-07-28 CA CA2618695A patent/CA2618695C/en active Active
- 2006-07-28 CN CN2006800383820A patent/CN101288184B/zh not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
WO2007021509A3 (en) | 2007-05-03 |
US20070034852A1 (en) | 2007-02-15 |
KR20080035696A (ko) | 2008-04-23 |
CN101288184A (zh) | 2008-10-15 |
EP1935039B1 (en) | 2018-06-13 |
WO2007021509A2 (en) | 2007-02-22 |
JP2009505420A (ja) | 2009-02-05 |
US7560736B2 (en) | 2009-07-14 |
CA2618695C (en) | 2014-12-02 |
CA2618695A1 (en) | 2007-02-22 |
CN101288184B (zh) | 2010-10-13 |
EP1935039A2 (en) | 2008-06-25 |
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