JP5357473B2 - 半導体集積回路装置 - Google Patents
半導体集積回路装置 Download PDFInfo
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- JP5357473B2 JP5357473B2 JP2008230628A JP2008230628A JP5357473B2 JP 5357473 B2 JP5357473 B2 JP 5357473B2 JP 2008230628 A JP2008230628 A JP 2008230628A JP 2008230628 A JP2008230628 A JP 2008230628A JP 5357473 B2 JP5357473 B2 JP 5357473B2
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- 239000004065 semiconductor Substances 0.000 title claims abstract description 81
- 239000000758 substrate Substances 0.000 claims description 13
- 229910021420 polycrystalline silicon Inorganic materials 0.000 claims description 6
- 230000006866 deterioration Effects 0.000 claims description 2
- 238000000034 method Methods 0.000 abstract description 7
- 239000010410 layer Substances 0.000 description 38
- 239000000470 constituent Substances 0.000 description 9
- 239000012535 impurity Substances 0.000 description 7
- 229910021332 silicide Inorganic materials 0.000 description 7
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 description 7
- 238000010586 diagram Methods 0.000 description 6
- 239000011229 interlayer Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 229910052751 metal Inorganic materials 0.000 description 4
- 239000002184 metal Substances 0.000 description 4
- 229910052814 silicon oxide Inorganic materials 0.000 description 4
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 3
- 230000007423 decrease Effects 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 229910052710 silicon Inorganic materials 0.000 description 3
- 239000010703 silicon Substances 0.000 description 3
- 239000000654 additive Substances 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- 230000015556 catabolic process Effects 0.000 description 2
- 238000006731 degradation reaction Methods 0.000 description 2
- 238000009792 diffusion process Methods 0.000 description 2
- 230000005669 field effect Effects 0.000 description 2
- 239000012212 insulator Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- ZXEYZECDXFPJRJ-UHFFFAOYSA-N $l^{3}-silane;platinum Chemical compound [SiH3].[Pt] ZXEYZECDXFPJRJ-UHFFFAOYSA-N 0.000 description 1
- 229910003855 HfAlO Inorganic materials 0.000 description 1
- 229910004140 HfO Inorganic materials 0.000 description 1
- 229910004129 HfSiO Inorganic materials 0.000 description 1
- 229910018245 LaO Inorganic materials 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- 229910000577 Silicon-germanium Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 229910007875 ZrAlO Inorganic materials 0.000 description 1
- GEIAQOFPUVMAGM-UHFFFAOYSA-N ZrO Inorganic materials [Zr]=O GEIAQOFPUVMAGM-UHFFFAOYSA-N 0.000 description 1
- 229910006501 ZrSiO Inorganic materials 0.000 description 1
- 230000000996 additive effect Effects 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000000149 argon plasma sintering Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 229910002056 binary alloy Inorganic materials 0.000 description 1
- YXTPWUNVHCYOSP-UHFFFAOYSA-N bis($l^{2}-silanylidene)molybdenum Chemical compound [Si]=[Mo]=[Si] YXTPWUNVHCYOSP-UHFFFAOYSA-N 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910021344 molybdenum silicide Inorganic materials 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 229910021334 nickel silicide Inorganic materials 0.000 description 1
- RUFLMLWJRZAWLJ-UHFFFAOYSA-N nickel silicide Chemical compound [Ni]=[Si]=[Ni] RUFLMLWJRZAWLJ-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Substances [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 1
- 229910021339 platinum silicide Inorganic materials 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 230000003252 repetitive effect Effects 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910002058 ternary alloy Inorganic materials 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/08—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind
- H01L27/085—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only
- H01L27/088—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including only semiconductor components of a single kind including field-effect components only the components being field-effect transistors with insulated gate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0207—Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/70—Manufacture or treatment of devices consisting of a plurality of solid state components formed in or on a common substrate or of parts thereof; Manufacture of integrated circuit devices or of parts thereof
- H01L21/77—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate
- H01L21/78—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices
- H01L21/82—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components
- H01L21/822—Manufacture or treatment of devices consisting of a plurality of solid state components or integrated circuits formed in, or on, a common substrate with subsequent division of the substrate into plural individual devices to produce devices, e.g. integrated circuits, each consisting of a plurality of components the substrate being a semiconductor, using silicon technology
- H01L21/8232—Field-effect technology
- H01L21/8234—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type
- H01L21/823437—MIS technology, i.e. integration processes of field effect transistors of the conductor-insulator-semiconductor type with a particular manufacturing method of the gate conductors, e.g. particular materials, shapes
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Engineering & Computer Science (AREA)
- Metal-Oxide And Bipolar Metal-Oxide Semiconductor Integrated Circuits (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
- Semiconductor Integrated Circuits (AREA)
- Logic Circuits (AREA)
Description
前記複数のMISFETは、互いに隣接して直列に接続され、前記ゲートへの信号入力により連動してオン・オフ動作を行うものである。
2 p型ウエル
3 ゲート絶縁膜
4 ゲート電極
5 n−型半導体領域
6 n+型半導体領域
7 シリサイド層
8 層間絶縁膜
9、9A、9G、9V コンタクトホール
10、10A、10G、10N、10P、10V プラグ
11、11G、11N、11P、11V 配線
CTN 連動トランジスタ群
CTP 連動トランジスタ群
LN、LP 活性領域(第1活性領域)
Qn101、Qn102、Qn1、Qn2、Qn3、Qn4、Qn5 nチャネル型MISFET
Qp101、Qp102、Qp1、Qp2、Qp3、Qp4、Qp5 pチャネル型MISFET
Claims (7)
- 半導体基板の主面上に形成された第1電源、第2電源、前記第1電源と前記第2電源間にNAND回路セルを有する半導体集積回路装置であって、
前記NAND回路セルは、ソースが前記第1電源へ接続され、ゲートが第1入力端子へ接続された第1のp型MISFETと、ソースが前記第1電源へ接続され、ゲートが第2入力端子へ接続された第2のp型MISFETと、ソースが前記第2電源へ接続され、ゲートが前記第1入力端子へ接続された第1のn型MISFETと、ソースが前記第1のn型MISFETへ接続され、ゲートが前記第2入力端子へ接続された第2のn型MISFETと、ソースが前記第2のn型MISFETへ接続され、ゲートが前記第2入力端子へ接続された第3のn型MISFETとを有し、
前記第2のp型MISFETのゲート、前記第2のn型MISFETのゲートおよび前記第3のn型MISFETのゲートは、多結晶シリコン膜からなり一体に形成されていることを特徴とする半導体集積回路装置。 - 請求項1記載の半導体集積回路装置において、
前記第2のn型MISFETのゲートおよび前記第3のn型MISFETのゲートへ入力される信号は、速度劣化の懸念の少ない信号であることを特徴とする半導体集積回路装置。 - 請求項2記載の半導体集積回路装置において、
前記信号は、SCAN信号、RESET信号またはSET信号であることを特徴とする半導体集積回路装置。 - 請求項1記載の半導体集積回路装置において、
前記第2のn型MISFETのゲート長および前記第3のn型MISFETのゲート長は、65nm以下であることを特徴とする半導体集積回路装置。 - 請求項4記載の半導体集積回路装置において、
前記第2のn型MISFETのゲート長および前記第3のn型MISFETのゲート長は、65nm以下であり、
前記第2のn型MISFETのゲートと前記第3のn型MISFETのゲートは、互いに隣接しており、両者の間隔は、前記第2のn型MISFETのゲート長の5倍〜15倍の範囲である半導体集積回路装置。 - 請求項4記載の半導体集積回路装置において、
前記第2のn型MISFETのゲート長および前記第3のn型MISFETのゲート長は、45nm以下であり、
前記第2のn型MISFETのゲートと前記第3のn型MISFETのゲートは、互いに隣接しており、両者の間隔は、前記第2のn型MISFETのゲート長の3倍〜10倍の範囲である半導体集積回路装置。 - 請求項1記載の半導体集積回路装置において、
前記NAND回路セルは、前記半導体基板の前記主面上の最下層の配線のみで回路形成されていることを特徴とする半導体集積回路装置。
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008230628A JP5357473B2 (ja) | 2008-09-09 | 2008-09-09 | 半導体集積回路装置 |
TW098119102A TWI484620B (zh) | 2008-09-09 | 2009-06-08 | Semiconductor integrated circuit device |
CN2009101600280A CN101673742B (zh) | 2008-09-09 | 2009-07-17 | 半导体集成电路装置 |
US12/540,277 US8399929B2 (en) | 2008-09-09 | 2009-08-12 | Semiconductor integrated circuit device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008230628A JP5357473B2 (ja) | 2008-09-09 | 2008-09-09 | 半導体集積回路装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010067667A JP2010067667A (ja) | 2010-03-25 |
JP5357473B2 true JP5357473B2 (ja) | 2013-12-04 |
Family
ID=41798477
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008230628A Expired - Fee Related JP5357473B2 (ja) | 2008-09-09 | 2008-09-09 | 半導体集積回路装置 |
Country Status (4)
Country | Link |
---|---|
US (1) | US8399929B2 (ja) |
JP (1) | JP5357473B2 (ja) |
CN (1) | CN101673742B (ja) |
TW (1) | TWI484620B (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN102884617B (zh) * | 2010-10-21 | 2015-01-07 | 松下电器产业株式会社 | 半导体装置 |
WO2018030107A1 (ja) * | 2016-08-08 | 2018-02-15 | 株式会社ソシオネクスト | 半導体集積回路装置 |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3002096B2 (ja) * | 1994-08-31 | 2000-01-24 | 川崎製鉄株式会社 | 出力バッファ回路 |
JPH09289251A (ja) * | 1996-04-23 | 1997-11-04 | Matsushita Electric Ind Co Ltd | 半導体集積回路のレイアウト構造およびその検証方法 |
US6730953B2 (en) * | 2002-09-13 | 2004-05-04 | Mia-Com, Inc. | Apparatus, methods and articles of manufacture for a low control voltage switch |
US7226843B2 (en) | 2002-09-30 | 2007-06-05 | Intel Corporation | Indium-boron dual halo MOSFET |
JP2004157663A (ja) * | 2002-11-05 | 2004-06-03 | Matsushita Electric Ind Co Ltd | 配線パターン生成方法および配線パターン生成装置 |
JP2005086120A (ja) * | 2003-09-11 | 2005-03-31 | Matsushita Electric Ind Co Ltd | 半導体装置 |
JP4248451B2 (ja) * | 2004-06-11 | 2009-04-02 | パナソニック株式会社 | 半導体装置およびそのレイアウト設計方法 |
JP5030373B2 (ja) * | 2004-08-25 | 2012-09-19 | 三菱重工業株式会社 | 半導体回路 |
JP4827422B2 (ja) | 2005-03-10 | 2011-11-30 | ルネサスエレクトロニクス株式会社 | 半導体集積回路装置の設計方法と装置並びにプログラム |
US7951722B2 (en) * | 2007-08-08 | 2011-05-31 | Xilinx, Inc. | Double exposure semiconductor process for improved process margin |
-
2008
- 2008-09-09 JP JP2008230628A patent/JP5357473B2/ja not_active Expired - Fee Related
-
2009
- 2009-06-08 TW TW098119102A patent/TWI484620B/zh not_active IP Right Cessation
- 2009-07-17 CN CN2009101600280A patent/CN101673742B/zh not_active Expired - Fee Related
- 2009-08-12 US US12/540,277 patent/US8399929B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
CN101673742B (zh) | 2013-11-20 |
JP2010067667A (ja) | 2010-03-25 |
CN101673742A (zh) | 2010-03-17 |
US20100059826A1 (en) | 2010-03-11 |
US8399929B2 (en) | 2013-03-19 |
TW201013898A (en) | 2010-04-01 |
TWI484620B (zh) | 2015-05-11 |
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