JP5356233B2 - 流動床反応器中で塩素を製造する方法 - Google Patents
流動床反応器中で塩素を製造する方法 Download PDFInfo
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- JP5356233B2 JP5356233B2 JP2009528711A JP2009528711A JP5356233B2 JP 5356233 B2 JP5356233 B2 JP 5356233B2 JP 2009528711 A JP2009528711 A JP 2009528711A JP 2009528711 A JP2009528711 A JP 2009528711A JP 5356233 B2 JP5356233 B2 JP 5356233B2
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- fluidized bed
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- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 title claims abstract description 7
- 239000000460 chlorine Substances 0.000 title claims abstract description 7
- 229910052801 chlorine Inorganic materials 0.000 title claims abstract description 7
- 238000000034 method Methods 0.000 title claims description 29
- 239000003054 catalyst Substances 0.000 claims abstract description 29
- 239000007789 gas Substances 0.000 claims abstract description 15
- 239000011541 reaction mixture Substances 0.000 claims abstract description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims abstract description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 5
- 229910000041 hydrogen chloride Inorganic materials 0.000 claims abstract description 5
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 claims abstract description 5
- 238000004519 manufacturing process Methods 0.000 claims abstract description 5
- 239000001301 oxygen Substances 0.000 claims abstract description 3
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 3
- 238000006243 chemical reaction Methods 0.000 claims description 79
- 229910052751 metal Inorganic materials 0.000 claims description 19
- 239000002184 metal Substances 0.000 claims description 19
- 239000000463 material Substances 0.000 claims description 11
- 238000012856 packing Methods 0.000 claims description 5
- 239000000700 radioactive tracer Substances 0.000 claims description 5
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 claims description 4
- 229910052707 ruthenium Inorganic materials 0.000 claims description 4
- 229910052802 copper Inorganic materials 0.000 claims description 3
- 239000010949 copper Substances 0.000 claims description 3
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims description 2
- 239000000919 ceramic Substances 0.000 claims description 2
- 150000001845 chromium compounds Chemical class 0.000 claims description 2
- 239000011521 glass Substances 0.000 claims description 2
- 229920000642 polymer Polymers 0.000 claims description 2
- 210000004027 cell Anatomy 0.000 abstract description 4
- 210000002421 cell wall Anatomy 0.000 abstract description 2
- 239000007787 solid Substances 0.000 description 8
- 239000007858 starting material Substances 0.000 description 7
- 239000000945 filler Substances 0.000 description 5
- 239000011796 hollow space material Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 229910001925 ruthenium oxide Inorganic materials 0.000 description 3
- WOCIAKWEIIZHES-UHFFFAOYSA-N ruthenium(iv) oxide Chemical compound O=[Ru]=O WOCIAKWEIIZHES-UHFFFAOYSA-N 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 2
- 238000007138 Deacon process reaction Methods 0.000 description 2
- PHFQLYPOURZARY-UHFFFAOYSA-N chromium trinitrate Chemical compound [Cr+3].[O-][N+]([O-])=O.[O-][N+]([O-])=O.[O-][N+]([O-])=O PHFQLYPOURZARY-UHFFFAOYSA-N 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- 229910021555 Chromium Chloride Inorganic materials 0.000 description 1
- 239000005749 Copper compound Substances 0.000 description 1
- 229910021529 ammonia Inorganic materials 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000011651 chromium Substances 0.000 description 1
- QSWDMMVNRMROPK-UHFFFAOYSA-K chromium(3+) trichloride Chemical compound [Cl-].[Cl-].[Cl-].[Cr+3] QSWDMMVNRMROPK-UHFFFAOYSA-K 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- 150000001880 copper compounds Chemical class 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000018109 developmental process Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000010304 firing Methods 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 239000002638 heterogeneous catalyst Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 210000003739 neck Anatomy 0.000 description 1
- -1 organic acid chromium salt Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 150000003304 ruthenium compounds Chemical class 0.000 description 1
- YBCAZPLXEGKKFM-UHFFFAOYSA-K ruthenium(iii) chloride Chemical compound [Cl-].[Cl-].[Cl-].[Ru+3] YBCAZPLXEGKKFM-UHFFFAOYSA-K 0.000 description 1
- 150000003377 silicon compounds Chemical class 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
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Description
図中、
図1は、本発明により用いる流動床反応器の好ましい一実施様態を模式的に示すものであり、
図2は、本発明により用いる内部構造物の好ましい一実施様態を模式的に示すものである。
2 固体−自由ガス分配器ゾーン
3 熱交換器
4 内部構造物
5 反応室
6 固体分離器
7 ガス状出発原料
8 ガス状生成物流
Claims (12)
- 塩化水素と酸素とを含むガス状反応混合物(7)が下方から流動床を形成している不均一粒子状触媒を通して上向きに流れる流動床反応器(1)中で、塩素を製造する方法であって、
流動床は、内部構造物(4)を有し、これにより流動床が、流動床反応器中に水平にならびに垂直に配置された複数の反応室(5)に分割され、該反応室が、ガスを透過性で且つ開口部を有する反応室壁面を有し、これにより、不均一粒子状触媒の垂直方向の交換値が、確実に反応器容量1リットル当たり1〜100リットル/時となり、及び
内部構造物(4)は、流路交差型の充填材として構成され、該充填材は、流動床反応器(1)中で垂直方向に相互に平行に配置された折り目のあるガス透過性金属シート(10)、エキスパンドメタルシートまたは織布状メッシュを有し、また垂直方向に対してゼロではない傾斜角度を有する折り目間平坦部(12)を形成する折り目(11)を有し、
その折り目間の平坦部(12)が、相次ぐ金属シート(10)、エキスパンドメタルシートまたは織布状メッシュで、同一の傾斜角度を反対の符合で有し、及び反応室(5)は、折り目(11)間のくびれ(13)により垂直方向に区切られていることを特徴とする方法。 - 一種以上のルテニウム、銅またはクロム化合物を含む坦持または非坦持触媒が不均一粒子状触媒として用いられる請求項1に記載の方法。
- 折り目間の平坦部(11)の垂直方向への傾斜角度が、10〜80°の範囲である請求項1に記載の方法。
- 内部構造物(4)の反応室(5)の、放射線トレーサー法で測定した水力直径が、100〜5mmである請求項1〜3のいずれか一項に記載の方法。
- 内部構造物の反応室の、放射線トレーサー法で測定した流動床反応器中の垂直方向の高さが、100〜3mmである請求項1〜4のいずれか一項に記載の方法。
- 金属シート(10)、エキスパンドメタルシートまたは織布状メッシュ中の折り目(11)間の平坦部(12)の折り目高さが100〜3mmの範囲であり、折り目(11)間のくびれの間隔が50〜2mmの範囲である請求項1〜5のいずれか一項に記載の方法。
- 熱交換器(3)が、内部構造物に設置されている請求項1〜6のいずれか一項に記載の方法。
- 上記熱交換器(3)が、プレート状またはチューブ状に構成されている請求項7に記載の方法。
- 上記内部構造物(4)が、金属、セラミック、ポリマーまたはガラス材料からなる請求項1〜8のいずれか一項に記載の方法。
- 上記内部構造物(4)が、流動床容量の10〜90%を分割して反応室(5)とする請求項1〜9のいずれか一項に記載の方法。
- 上記流動床内のガス状反応混合物(7)の流れ方向の下部領域には内部構造物(4)が存在しない請求項10に記載の方法。
- 上記の流動床を反応室(5)に分割する内部構造物(4)が熱交換器(3)の上に位置している請求項7または8に記載の方法。
Applications Claiming Priority (3)
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EP06120886 | 2006-09-19 | ||
EP06120886.4 | 2006-09-19 | ||
PCT/EP2007/059870 WO2008034836A2 (de) | 2006-09-19 | 2007-09-19 | Verfahren zur herstellung von chlor in einem wirbelschichtreaktor |
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JP2010503607A JP2010503607A (ja) | 2010-02-04 |
JP2010503607A5 JP2010503607A5 (ja) | 2010-11-04 |
JP5356233B2 true JP5356233B2 (ja) | 2013-12-04 |
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JP2009528711A Expired - Fee Related JP5356233B2 (ja) | 2006-09-19 | 2007-09-19 | 流動床反応器中で塩素を製造する方法 |
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US (1) | US20090269270A1 (ja) |
EP (1) | EP2066583B1 (ja) |
JP (1) | JP5356233B2 (ja) |
KR (1) | KR20090057301A (ja) |
CN (1) | CN101516769B (ja) |
AT (1) | ATE489329T1 (ja) |
DE (1) | DE502007005784D1 (ja) |
ES (1) | ES2356488T3 (ja) |
PT (1) | PT2066583E (ja) |
WO (1) | WO2008034836A2 (ja) |
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WO2010149560A1 (de) * | 2009-06-24 | 2010-12-29 | Basf Se | Verfahren zur herstellung von chlor aus hci |
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CN1003504B (zh) * | 1984-12-03 | 1989-03-08 | 三井东圧化学有限公司 | 氯气制备方法 |
IL81532A (en) * | 1986-02-19 | 1990-06-10 | Mitsui Toatsu Chemicals | Process for production of chlorine |
EP0272332B1 (en) * | 1986-06-26 | 1992-03-18 | MITSUI TOATSU CHEMICALS, Inc. | Process for producing chlorine |
JP2595018B2 (ja) * | 1988-03-01 | 1997-03-26 | 三井東圧化学株式会社 | 塩素の製造方法 |
US5073236A (en) * | 1989-11-13 | 1991-12-17 | Gelbein Abraham P | Process and structure for effecting catalytic reactions in distillation structure |
US5925291A (en) * | 1997-03-25 | 1999-07-20 | Midwest Research Institute | Method and apparatus for high-efficiency direct contact condensation |
DE10159821A1 (de) * | 2001-12-06 | 2003-06-18 | Basf Ag | Vorrichtung und Verfahren zur Durchführung von heterogen katalysierter Reaktivdestillationen, insbesondere zur Herstellung von Pseudoionen |
DE10159816A1 (de) * | 2001-12-06 | 2003-06-18 | Basf Ag | Vorrichtung und Verfahren zur Durchführung von heterogen katalysierten Reaktionen |
CN1188342C (zh) * | 2002-11-08 | 2005-02-09 | 巨化集团公司 | 氯化氢催化氧化生产氯气的工艺方法及装置 |
DE10336522A1 (de) * | 2003-08-08 | 2005-02-24 | Basf Ag | Verfahren zur Herstellung von Chlor |
DE10361519A1 (de) * | 2003-12-23 | 2005-07-28 | Basf Ag | Verfahren zur Herstellung von Chlor durch Gasphasenoxidation von Chlorwasserstoff |
JP2005238225A (ja) * | 2004-01-29 | 2005-09-08 | Sumitomo Chemical Co Ltd | 気相反応器用充填材 |
DE102004006610A1 (de) * | 2004-02-11 | 2005-09-01 | Basf Ag | Reaktor und Verfahren zur Herstellung von Chlor aus HCI |
DE102004014677A1 (de) * | 2004-03-25 | 2005-10-13 | Basf Ag | Wirbelschichtverfahren und Reaktor zur Durchführung exothermer chemischer Gleichgewichtsreaktionen |
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2007
- 2007-09-19 EP EP07803556A patent/EP2066583B1/de not_active Not-in-force
- 2007-09-19 DE DE502007005784T patent/DE502007005784D1/de active Active
- 2007-09-19 KR KR1020097006911A patent/KR20090057301A/ko not_active Application Discontinuation
- 2007-09-19 WO PCT/EP2007/059870 patent/WO2008034836A2/de active Application Filing
- 2007-09-19 ES ES07803556T patent/ES2356488T3/es active Active
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CN101516769A (zh) | 2009-08-26 |
ES2356488T3 (es) | 2011-04-08 |
DE502007005784D1 (de) | 2011-01-05 |
EP2066583A2 (de) | 2009-06-10 |
EP2066583B1 (de) | 2010-11-24 |
US20090269270A1 (en) | 2009-10-29 |
CN101516769B (zh) | 2011-12-14 |
ATE489329T1 (de) | 2010-12-15 |
KR20090057301A (ko) | 2009-06-04 |
WO2008034836A2 (de) | 2008-03-27 |
JP2010503607A (ja) | 2010-02-04 |
PT2066583E (pt) | 2010-12-07 |
WO2008034836A3 (de) | 2008-09-25 |
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