JP5355090B2 - 結晶体を含まないガラスフリット組成物およびマイクロリアクタ装置のためのそれから製造されたフリット - Google Patents
結晶体を含まないガラスフリット組成物およびマイクロリアクタ装置のためのそれから製造されたフリット Download PDFInfo
- Publication number
- JP5355090B2 JP5355090B2 JP2008542760A JP2008542760A JP5355090B2 JP 5355090 B2 JP5355090 B2 JP 5355090B2 JP 2008542760 A JP2008542760 A JP 2008542760A JP 2008542760 A JP2008542760 A JP 2008542760A JP 5355090 B2 JP5355090 B2 JP 5355090B2
- Authority
- JP
- Japan
- Prior art keywords
- mol
- frit
- glass
- composition
- microreactor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000203 mixture Substances 0.000 title claims description 98
- 239000006219 crystal-free glass Substances 0.000 title 1
- 239000011521 glass Substances 0.000 claims description 116
- 239000000758 substrate Substances 0.000 claims description 65
- 238000005245 sintering Methods 0.000 claims description 35
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 26
- 229910052708 sodium Inorganic materials 0.000 claims description 20
- 239000005388 borosilicate glass Substances 0.000 claims description 18
- 239000013078 crystal Substances 0.000 claims description 18
- 229910018068 Li 2 O Inorganic materials 0.000 claims description 13
- 229910018072 Al 2 O 3 Inorganic materials 0.000 claims description 12
- 238000000034 method Methods 0.000 description 27
- 239000011734 sodium Substances 0.000 description 26
- 229910052796 boron Inorganic materials 0.000 description 25
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 23
- 238000002425 crystallisation Methods 0.000 description 23
- 230000008025 crystallization Effects 0.000 description 23
- 238000004519 manufacturing process Methods 0.000 description 17
- 239000000463 material Substances 0.000 description 15
- 230000008569 process Effects 0.000 description 14
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 13
- 238000006243 chemical reaction Methods 0.000 description 12
- 238000013461 design Methods 0.000 description 12
- 238000001816 cooling Methods 0.000 description 11
- 239000012530 fluid Substances 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- 239000003513 alkali Substances 0.000 description 9
- 238000010304 firing Methods 0.000 description 8
- 238000010438 heat treatment Methods 0.000 description 8
- 239000002419 bulk glass Substances 0.000 description 7
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 6
- 239000002253 acid Substances 0.000 description 6
- 239000000945 filler Substances 0.000 description 6
- 229910052731 fluorine Inorganic materials 0.000 description 6
- 239000000376 reactant Substances 0.000 description 6
- 238000012360 testing method Methods 0.000 description 6
- ODINCKMPIJJUCX-UHFFFAOYSA-N Calcium oxide Chemical compound [Ca]=O ODINCKMPIJJUCX-UHFFFAOYSA-N 0.000 description 5
- 230000006835 compression Effects 0.000 description 5
- 238000007906 compression Methods 0.000 description 5
- 238000005498 polishing Methods 0.000 description 5
- 239000000377 silicon dioxide Substances 0.000 description 5
- 230000001052 transient effect Effects 0.000 description 5
- 229910000500 β-quartz Inorganic materials 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 238000000137 annealing Methods 0.000 description 4
- 229910052906 cristobalite Inorganic materials 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 239000000843 powder Substances 0.000 description 4
- 238000012545 processing Methods 0.000 description 4
- RZVAJINKPMORJF-UHFFFAOYSA-N Acetaminophen Chemical compound CC(=O)NC1=CC=C(O)C=C1 RZVAJINKPMORJF-UHFFFAOYSA-N 0.000 description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 description 3
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 3
- 229910000323 aluminium silicate Inorganic materials 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- BRPQOXSCLDDYGP-UHFFFAOYSA-N calcium oxide Chemical compound [O-2].[Ca+2] BRPQOXSCLDDYGP-UHFFFAOYSA-N 0.000 description 3
- 239000000292 calcium oxide Substances 0.000 description 3
- 238000000280 densification Methods 0.000 description 3
- 239000011737 fluorine Substances 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 229910052744 lithium Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000005297 pyrex Substances 0.000 description 3
- KKCBUQHMOMHUOY-UHFFFAOYSA-N sodium oxide Chemical compound [O-2].[Na+].[Na+] KKCBUQHMOMHUOY-UHFFFAOYSA-N 0.000 description 3
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 2
- 238000000576 coating method Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 230000018109 developmental process Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 229910000174 eucryptite Inorganic materials 0.000 description 2
- 230000004907 flux Effects 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 238000001000 micrograph Methods 0.000 description 2
- 238000001053 micromoulding Methods 0.000 description 2
- 238000000465 moulding Methods 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 230000000750 progressive effect Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 238000011160 research Methods 0.000 description 2
- 238000007789 sealing Methods 0.000 description 2
- 230000035939 shock Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000010703 silicon Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 238000006467 substitution reaction Methods 0.000 description 2
- 238000005382 thermal cycling Methods 0.000 description 2
- 229910052725 zinc Inorganic materials 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 1
- 239000000020 Nitrocellulose Substances 0.000 description 1
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229940072049 amyl acetate Drugs 0.000 description 1
- PGMYKACGEOXYJE-UHFFFAOYSA-N anhydrous amyl acetate Natural products CCCCCOC(C)=O PGMYKACGEOXYJE-UHFFFAOYSA-N 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 230000033228 biological regulation Effects 0.000 description 1
- KGBXLFKZBHKPEV-UHFFFAOYSA-N boric acid Chemical compound OB(O)O KGBXLFKZBHKPEV-UHFFFAOYSA-N 0.000 description 1
- 239000004327 boric acid Substances 0.000 description 1
- 229910052810 boron oxide Inorganic materials 0.000 description 1
- -1 boron oxide anhydride Chemical class 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 150000001768 cations Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910010293 ceramic material Inorganic materials 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000001311 chemical methods and process Methods 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 238000004031 devitrification Methods 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000007613 environmental effect Effects 0.000 description 1
- 238000007572 expansion measurement Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- MNWFXJYAOYHMED-UHFFFAOYSA-M heptanoate Chemical compound CCCCCCC([O-])=O MNWFXJYAOYHMED-UHFFFAOYSA-M 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 239000003112 inhibitor Substances 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- FUJCRWPEOMXPAD-UHFFFAOYSA-N lithium oxide Chemical compound [Li+].[Li+].[O-2] FUJCRWPEOMXPAD-UHFFFAOYSA-N 0.000 description 1
- 229910001947 lithium oxide Inorganic materials 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 230000003278 mimic effect Effects 0.000 description 1
- 239000006060 molten glass Substances 0.000 description 1
- 229920001220 nitrocellulos Polymers 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- PXXKQOPKNFECSZ-UHFFFAOYSA-N platinum rhodium Chemical compound [Rh].[Pt] PXXKQOPKNFECSZ-UHFFFAOYSA-N 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- CHWRSCGUEQEHOH-UHFFFAOYSA-N potassium oxide Chemical compound [O-2].[K+].[K+] CHWRSCGUEQEHOH-UHFFFAOYSA-N 0.000 description 1
- 229910001950 potassium oxide Inorganic materials 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 238000012827 research and development Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 239000005368 silicate glass Substances 0.000 description 1
- 229910001948 sodium oxide Inorganic materials 0.000 description 1
- 230000000930 thermomechanical effect Effects 0.000 description 1
- 230000009466 transformation Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 229910021489 α-quartz Inorganic materials 0.000 description 1
- 229910021491 α-tridymite Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C8/00—Enamels; Glazes; Fusion seal compositions being frit compositions having non-frit additions
- C03C8/02—Frit compositions, i.e. in a powdered or comminuted form
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/076—Glass compositions containing silica with 40% to 90% silica, by weight
- C03C3/089—Glass compositions containing silica with 40% to 90% silica, by weight containing boron
- C03C3/091—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium
- C03C3/093—Glass compositions containing silica with 40% to 90% silica, by weight containing boron containing aluminium containing zinc or zirconium
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00819—Materials of construction
- B01J2219/00831—Glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00781—Aspects relating to microreactors
- B01J2219/00889—Mixing
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01L—CHEMICAL OR PHYSICAL LABORATORY APPARATUS FOR GENERAL USE
- B01L3/00—Containers or dishes for laboratory use, e.g. laboratory glassware; Droppers
- B01L3/50—Containers for the purpose of retaining a material to be analysed, e.g. test tubes
- B01L3/502—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures
- B01L3/5027—Containers for the purpose of retaining a material to be analysed, e.g. test tubes with fluid transport, e.g. in multi-compartment structures by integrated microfluidic structures, i.e. dimensions of channels and chambers are such that surface tension forces are important, e.g. lab-on-a-chip
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- General Chemical & Material Sciences (AREA)
- Geochemistry & Mineralogy (AREA)
- Materials Engineering (AREA)
- Health & Medical Sciences (AREA)
- Clinical Laboratory Science (AREA)
- Glass Compositions (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP05292534.4 | 2005-11-30 | ||
| EP05292534 | 2005-11-30 | ||
| PCT/EP2006/069107 WO2007063092A1 (en) | 2005-11-30 | 2006-11-30 | Crystallization-resistant glass compositions suitable for manufacturing glass frits for microreactors |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009517319A JP2009517319A (ja) | 2009-04-30 |
| JP2009517319A5 JP2009517319A5 (https=) | 2010-06-17 |
| JP5355090B2 true JP5355090B2 (ja) | 2013-11-27 |
Family
ID=35788300
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008542760A Expired - Fee Related JP5355090B2 (ja) | 2005-11-30 | 2006-11-30 | 結晶体を含まないガラスフリット組成物およびマイクロリアクタ装置のためのそれから製造されたフリット |
Country Status (8)
| Country | Link |
|---|---|
| US (3) | US20070123410A1 (https=) |
| EP (2) | EP2269959A1 (https=) |
| JP (1) | JP5355090B2 (https=) |
| KR (1) | KR20080072082A (https=) |
| CN (1) | CN101316799B (https=) |
| AT (1) | ATE506330T1 (https=) |
| DE (1) | DE602006021471D1 (https=) |
| WO (1) | WO2007063092A1 (https=) |
Families Citing this family (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20070123410A1 (en) * | 2005-11-30 | 2007-05-31 | Morena Robert M | Crystallization-free glass frit compositions and frits made therefrom for microreactor devices |
| EP2065347A1 (en) * | 2007-11-30 | 2009-06-03 | Corning Incorporated | Durable frit composition and composites and devices comprised thereof |
| WO2008143918A1 (en) * | 2007-05-18 | 2008-11-27 | Corning Incorporated | Glass microfluidic devices and methods of manufacture thereof |
| US7767135B2 (en) * | 2007-10-19 | 2010-08-03 | Corning Incorporated | Method of forming a sintered microfluidic device |
| EP2216093A1 (en) | 2009-01-30 | 2010-08-11 | Corning Incorporated | In situ formation and deposition of palladium Pd(0) in reactors |
| TW201103626A (en) * | 2009-04-28 | 2011-02-01 | Corning Inc | Microreactors with connectors sealed thereon; their manufacture |
| KR101228694B1 (ko) * | 2010-12-03 | 2013-02-01 | 삼성전기주식회사 | 소결 조제용 나노 사이즈 글라스 분말 및 그 제조 방법 |
| KR102120349B1 (ko) | 2011-10-25 | 2020-06-09 | 코닝 인코포레이티드 | 개선된 화학적 및 기계적 내구성을 갖는 알칼리 토 알루미노-실리케이트 유리 조성물 |
| US11707409B2 (en) | 2011-10-25 | 2023-07-25 | Corning Incorporated | Delamination resistant pharmaceutical glass containers containing active pharmaceutical ingredients |
| US9517966B2 (en) | 2011-10-25 | 2016-12-13 | Corning Incorporated | Glass compositions with improved chemical and mechanical durability |
| RU2719857C2 (ru) | 2011-10-25 | 2020-04-23 | Корнинг Инкорпорейтед | Композиции стекла с повышенной химической и механической стойкостью |
| US10350139B2 (en) | 2011-10-25 | 2019-07-16 | Corning Incorporated | Pharmaceutical glass packaging assuring pharmaceutical sterility |
| EP2785446B1 (en) | 2011-11-30 | 2023-04-19 | Corning Incorporated | Methods of forming complex structures in refractory bodies |
| US9359251B2 (en) | 2012-02-29 | 2016-06-07 | Corning Incorporated | Ion exchanged glasses via non-error function compressive stress profiles |
| WO2013147856A1 (en) * | 2012-03-30 | 2013-10-03 | Intel Corporation | Process and material for preventing deleterious expansion of high aspect ratio copper filled through silicon vias (tsvs) |
| US10273048B2 (en) | 2012-06-07 | 2019-04-30 | Corning Incorporated | Delamination resistant glass containers with heat-tolerant coatings |
| US10202303B2 (en) | 2012-10-04 | 2019-02-12 | Corning Incorporated | Compressively stressed laminated glass article via photosensitive glass and method of making the article |
| WO2014055834A1 (en) * | 2012-10-04 | 2014-04-10 | Corning Incorporated | Article with glass layer and glass-ceramic layer and method of making the article |
| US9700485B2 (en) | 2013-04-24 | 2017-07-11 | Corning Incorporated | Delamination resistant pharmaceutical glass containers containing active pharmaceutical ingredients |
| US9707154B2 (en) | 2013-04-24 | 2017-07-18 | Corning Incorporated | Delamination resistant pharmaceutical glass containers containing active pharmaceutical ingredients |
| US9849066B2 (en) | 2013-04-24 | 2017-12-26 | Corning Incorporated | Delamination resistant pharmaceutical glass containers containing active pharmaceutical ingredients |
| US9713572B2 (en) | 2013-04-24 | 2017-07-25 | Corning Incorporated | Delamination resistant pharmaceutical glass containers containing active pharmaceutical ingredients |
| US9707153B2 (en) | 2013-04-24 | 2017-07-18 | Corning Incorporated | Delamination resistant pharmaceutical glass containers containing active pharmaceutical ingredients |
| US9603775B2 (en) | 2013-04-24 | 2017-03-28 | Corning Incorporated | Delamination resistant pharmaceutical glass containers containing active pharmaceutical ingredients |
| US9717648B2 (en) | 2013-04-24 | 2017-08-01 | Corning Incorporated | Delamination resistant pharmaceutical glass containers containing active pharmaceutical ingredients |
| US9717649B2 (en) | 2013-04-24 | 2017-08-01 | Corning Incorporated | Delamination resistant pharmaceutical glass containers containing active pharmaceutical ingredients |
| US9839579B2 (en) | 2013-04-24 | 2017-12-12 | Corning Incorporated | Delamination resistant pharmaceutical glass containers containing active pharmaceutical ingredients |
| US9707155B2 (en) | 2013-04-24 | 2017-07-18 | Corning Incorporated | Delamination resistant pharmaceutical glass containers containing active pharmaceutical ingredients |
| US9700486B2 (en) | 2013-04-24 | 2017-07-11 | Corning Incorporated | Delamination resistant pharmaceutical glass containers containing active pharmaceutical ingredients |
| US11079309B2 (en) | 2013-07-26 | 2021-08-03 | Corning Incorporated | Strengthened glass articles having improved survivability |
| US10118858B2 (en) | 2014-02-24 | 2018-11-06 | Corning Incorporated | Strengthened glass with deep depth of compression |
| TWI773291B (zh) | 2014-06-19 | 2022-08-01 | 美商康寧公司 | 無易碎應力分布曲線的玻璃 |
| TWI660928B (zh) | 2014-10-08 | 2019-06-01 | 美商康寧公司 | 含有金屬氧化物濃度梯度之玻璃以及玻璃陶瓷 |
| US10150698B2 (en) | 2014-10-31 | 2018-12-11 | Corning Incorporated | Strengthened glass with ultra deep depth of compression |
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| JP7023861B2 (ja) | 2016-04-08 | 2022-02-22 | コーニング インコーポレイテッド | 金属酸化物濃度グラジエントを含むガラス系物品 |
| KR20200091500A (ko) | 2016-04-08 | 2020-07-30 | 코닝 인코포레이티드 | 두 영역을 포함하는 응력 프로파일을 포함하는 유리-계 물품, 및 제조 방법 |
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2006
- 2006-11-08 US US11/594,657 patent/US20070123410A1/en not_active Abandoned
- 2006-11-30 WO PCT/EP2006/069107 patent/WO2007063092A1/en not_active Ceased
- 2006-11-30 DE DE602006021471T patent/DE602006021471D1/de active Active
- 2006-11-30 JP JP2008542760A patent/JP5355090B2/ja not_active Expired - Fee Related
- 2006-11-30 KR KR1020087015704A patent/KR20080072082A/ko not_active Withdrawn
- 2006-11-30 CN CN2006800446410A patent/CN101316799B/zh not_active Expired - Fee Related
- 2006-11-30 EP EP10178616A patent/EP2269959A1/en not_active Withdrawn
- 2006-11-30 EP EP06830211A patent/EP1963235B1/en not_active Not-in-force
- 2006-11-30 AT AT06830211T patent/ATE506330T1/de not_active IP Right Cessation
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2010
- 2010-01-25 US US12/692,662 patent/US20100120603A1/en not_active Abandoned
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2012
- 2012-03-08 US US13/415,286 patent/US8252708B2/en not_active Expired - Fee Related
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|---|---|
| EP1963235B1 (en) | 2011-04-20 |
| US20120172191A1 (en) | 2012-07-05 |
| WO2007063092A1 (en) | 2007-06-07 |
| KR20080072082A (ko) | 2008-08-05 |
| US20100120603A1 (en) | 2010-05-13 |
| JP2009517319A (ja) | 2009-04-30 |
| US8252708B2 (en) | 2012-08-28 |
| ATE506330T1 (de) | 2011-05-15 |
| CN101316799A (zh) | 2008-12-03 |
| EP2269959A1 (en) | 2011-01-05 |
| DE602006021471D1 (de) | 2011-06-01 |
| CN101316799B (zh) | 2013-03-27 |
| US20070123410A1 (en) | 2007-05-31 |
| EP1963235A1 (en) | 2008-09-03 |
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