JP5351069B2 - インプリント方法及びインプリント装置 - Google Patents

インプリント方法及びインプリント装置 Download PDF

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Publication number
JP5351069B2
JP5351069B2 JP2010025239A JP2010025239A JP5351069B2 JP 5351069 B2 JP5351069 B2 JP 5351069B2 JP 2010025239 A JP2010025239 A JP 2010025239A JP 2010025239 A JP2010025239 A JP 2010025239A JP 5351069 B2 JP5351069 B2 JP 5351069B2
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JP
Japan
Prior art keywords
droplet
volume
transfer material
template
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2010025239A
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English (en)
Japanese (ja)
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JP2011161711A5 (https=
JP2011161711A (ja
Inventor
正之 幡野
哲郎 中杉
郁男 米田
健司 大木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Toshiba Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp filed Critical Toshiba Corp
Priority to JP2010025239A priority Critical patent/JP5351069B2/ja
Priority to US13/023,225 priority patent/US8973494B2/en
Publication of JP2011161711A publication Critical patent/JP2011161711A/ja
Publication of JP2011161711A5 publication Critical patent/JP2011161711A5/ja
Application granted granted Critical
Publication of JP5351069B2 publication Critical patent/JP5351069B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0002—Lithographic processes using patterning methods other than those involving the exposure to radiation, e.g. by stamping
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y40/00—Manufacture or treatment of nanostructures

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Nanotechnology (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Mathematical Physics (AREA)
  • Theoretical Computer Science (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2010025239A 2010-02-08 2010-02-08 インプリント方法及びインプリント装置 Expired - Fee Related JP5351069B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2010025239A JP5351069B2 (ja) 2010-02-08 2010-02-08 インプリント方法及びインプリント装置
US13/023,225 US8973494B2 (en) 2010-02-08 2011-02-08 Imprint method and imprint apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2010025239A JP5351069B2 (ja) 2010-02-08 2010-02-08 インプリント方法及びインプリント装置

Publications (3)

Publication Number Publication Date
JP2011161711A JP2011161711A (ja) 2011-08-25
JP2011161711A5 JP2011161711A5 (https=) 2012-04-26
JP5351069B2 true JP5351069B2 (ja) 2013-11-27

Family

ID=44352659

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2010025239A Expired - Fee Related JP5351069B2 (ja) 2010-02-08 2010-02-08 インプリント方法及びインプリント装置

Country Status (2)

Country Link
US (1) US8973494B2 (https=)
JP (1) JP5351069B2 (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5584241B2 (ja) * 2012-02-27 2014-09-03 株式会社東芝 半導体製造装置及び半導体デバイスの製造方法
JP6083178B2 (ja) * 2012-09-28 2017-02-22 大日本印刷株式会社 レジスト基板の製造方法、レプリカテンプレートの製造方法、及びナノインプリントリソグラフィ方法
JP2016004794A (ja) * 2014-06-13 2016-01-12 キヤノン株式会社 インプリント方法、インプリント装置、および物品の製造方法
JP6299910B2 (ja) * 2017-03-28 2018-03-28 大日本印刷株式会社 異物検査方法、インプリント方法及び異物検査装置
JP6447657B2 (ja) * 2017-04-25 2019-01-09 大日本印刷株式会社 インプリント樹脂滴下順序決定方法及びインプリント方法
JP7100436B2 (ja) * 2017-09-19 2022-07-13 キヤノン株式会社 インプリント装置および物品製造方法
US11131923B2 (en) 2018-10-10 2021-09-28 Canon Kabushiki Kaisha System and method of assessing surface quality by optically analyzing dispensed drops
JP7555735B2 (ja) * 2020-06-19 2024-09-25 キヤノン株式会社 成形装置、成形方法、および物品の製造方法

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006516065A (ja) 2002-08-01 2006-06-15 モレキュラー・インプリンツ・インコーポレーテッド インプリント・リソグラフィの散乱計測アラインメント
US20050118338A1 (en) * 2003-05-02 2005-06-02 Johns Hopkins University Control of the spatial distribution and sorting of micro-or nano-meter or molecular scale objects on patterned surfaces
JP4574240B2 (ja) 2004-06-11 2010-11-04 キヤノン株式会社 加工装置、加工方法、デバイス製造方法
US7927089B2 (en) 2005-06-08 2011-04-19 Canon Kabushiki Kaisha Mold, apparatus including mold, pattern transfer apparatus, and pattern forming method
JP4819577B2 (ja) * 2006-05-31 2011-11-24 キヤノン株式会社 パターン転写方法およびパターン転写装置
WO2009020658A1 (en) * 2007-08-08 2009-02-12 Northwestern University Independently-addressable, self-correcting inking for cantilever arrays
JP4467611B2 (ja) * 2007-09-28 2010-05-26 株式会社日立製作所 光インプリント方法
JP4908369B2 (ja) * 2007-10-02 2012-04-04 株式会社東芝 インプリント方法及びインプリントシステム
JP5289006B2 (ja) 2008-11-19 2013-09-11 株式会社東芝 パターン形成方法およびプログラム

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Publication number Publication date
JP2011161711A (ja) 2011-08-25
US8973494B2 (en) 2015-03-10
US20110192300A1 (en) 2011-08-11

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