JP5350276B2 - 集積回路用高シリコン含量シロキサンポリマー - Google Patents

集積回路用高シリコン含量シロキサンポリマー Download PDF

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JP5350276B2
JP5350276B2 JP2009550737A JP2009550737A JP5350276B2 JP 5350276 B2 JP5350276 B2 JP 5350276B2 JP 2009550737 A JP2009550737 A JP 2009550737A JP 2009550737 A JP2009550737 A JP 2009550737A JP 5350276 B2 JP5350276 B2 JP 5350276B2
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thin film
ether
integer
groups
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JP2010519375A (ja
JP2010519375A5 (enExample
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テー ランタラ ユハ
ガッダ トーマス
パウラサリ ユリ
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シレクス オサケユキチュア
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    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/06—Preparatory processes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
    • C09D183/04—Polysiloxanes
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/18—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances
    • H01B3/30—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes
    • H01B3/46—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties mainly consisting of organic substances plastics; resins; waxes silicones
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/14—Polysiloxanes containing silicon bound to oxygen-containing groups
    • C08G77/16—Polysiloxanes containing silicon bound to oxygen-containing groups to hydroxyl groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/04—Polysiloxanes
    • C08G77/20—Polysiloxanes containing silicon bound to unsaturated aliphatic groups
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
    • C08G77/70—Siloxanes defined by use of the MDTQ nomenclature
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/63—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the formation processes
    • H10P14/6326—Deposition processes
    • H10P14/6342—Liquid deposition, e.g. spin-coating, sol-gel techniques or spray coating
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/66—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials
    • H10P14/668—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials
    • H10P14/6681—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si
    • H10P14/6684—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si the compound comprising silicon and oxygen
    • H10P14/6686—Formation of materials, e.g. in the shape of layers or pillars of insulating materials characterised by the type of materials the materials being characterised by the deposition precursor materials the precursor containing a compound comprising Si the compound comprising silicon and oxygen the compound being a molecule comprising at least one silicon-oxygen bond and the compound having hydrogen or an organic group attached to the silicon or oxygen, e.g. a siloxane
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
    • H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
    • H10P14/69—Inorganic materials
    • H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
    • H10P14/6921—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon
    • H10P14/6922—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Materials Engineering (AREA)
  • Medicinal Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Polymers & Plastics (AREA)
  • Wood Science & Technology (AREA)
  • Silicon Polymers (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
  • Formation Of Insulating Films (AREA)
  • Paints Or Removers (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
JP2009550737A 2007-02-22 2008-02-21 集積回路用高シリコン含量シロキサンポリマー Active JP5350276B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US90249407P 2007-02-22 2007-02-22
US60/902,494 2007-02-22
PCT/FI2008/050080 WO2008102060A2 (en) 2007-02-22 2008-02-21 High silicon content siloxane polymers for integrated circuits

Publications (3)

Publication Number Publication Date
JP2010519375A JP2010519375A (ja) 2010-06-03
JP2010519375A5 JP2010519375A5 (enExample) 2010-12-09
JP5350276B2 true JP5350276B2 (ja) 2013-11-27

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JP2009550737A Active JP5350276B2 (ja) 2007-02-22 2008-02-21 集積回路用高シリコン含量シロキサンポリマー

Country Status (6)

Country Link
US (1) US8133965B2 (enExample)
EP (1) EP2113005A2 (enExample)
JP (1) JP5350276B2 (enExample)
KR (1) KR101647360B1 (enExample)
TW (1) TWI434891B (enExample)
WO (1) WO2008102060A2 (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI439494B (zh) * 2007-02-27 2014-06-01 Braggone Oy 產生有機矽氧烷聚合物的方法
US8657966B2 (en) * 2008-08-13 2014-02-25 Intermolecular, Inc. Combinatorial approach to the development of cleaning formulations for glue removal in semiconductor applications
US8048810B2 (en) * 2010-01-29 2011-11-01 Taiwan Semiconductor Manufacturing Company, Ltd. Method for metal gate N/P patterning
WO2011121166A1 (en) 2010-03-29 2011-10-06 Silecs Oy Etch resistant alumina based coatings
US8864898B2 (en) * 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US9011591B2 (en) * 2011-09-21 2015-04-21 Dow Global Technologies Llc Compositions and antireflective coatings for photolithography
KR101825546B1 (ko) * 2014-05-26 2018-02-05 제일모직 주식회사 실리카계 막 형성용 조성물, 및 실리카계 막의 제조방법
KR102409869B1 (ko) 2018-08-10 2022-06-16 버슘머트리얼즈 유에스, 엘엘씨 규소 화합물 및 이를 사용하여 막을 증착시키는 방법
CN110952074B (zh) * 2018-08-10 2023-06-13 弗萨姆材料美国有限责任公司 硅化合物和使用硅化合物沉积膜的方法
FI129480B (en) * 2018-08-10 2022-03-15 Pibond Oy Silanol-containing organic-inorganic hybrid coatings for high resolution patterning
CN110283315B (zh) * 2019-06-25 2021-06-08 湖北兴瑞硅材料有限公司 一种利用甲基氯硅烷副产物生产羟基硅油的方法

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6962727B2 (en) * 1998-03-20 2005-11-08 Honeywell International Inc. Organosiloxanes
US6872456B2 (en) * 2001-07-26 2005-03-29 Dow Corning Corporation Siloxane resins
US6852367B2 (en) * 2001-11-20 2005-02-08 Shipley Company, L.L.C. Stable composition
WO2003063205A2 (en) * 2002-01-17 2003-07-31 Silecs Oy Poly(organosiloxane) materials and methods for hybrid organic-inorganic dielectrics for integrated circuit applications
US20050032357A1 (en) * 2002-01-17 2005-02-10 Rantala Juha T. Dielectric materials and methods for integrated circuit applications
JP2004059738A (ja) * 2002-07-29 2004-02-26 Jsr Corp 膜形成用組成物、膜の形成方法およびシリカ系膜
WO2004090019A1 (en) * 2003-04-11 2004-10-21 Silecs Oy Organo-silsesquioxane polymers for forming low-k dielectrics
JP2004006890A (ja) * 2003-05-27 2004-01-08 Tokyo Ohka Kogyo Co Ltd 多層配線構造の形成方法
JP4110401B2 (ja) * 2003-06-13 2008-07-02 信越化学工業株式会社 感光性シリコーン樹脂組成物及びその硬化物並びにネガ型微細パターンの形成方法
JP4491283B2 (ja) * 2004-06-10 2010-06-30 信越化学工業株式会社 反射防止膜形成用組成物を用いたパターン形成方法
JP4379596B2 (ja) * 2004-06-10 2009-12-09 信越化学工業株式会社 犠牲膜形成用組成物、パターン形成方法、犠牲膜及びその除去方法
KR101275635B1 (ko) * 2004-07-16 2013-06-14 다우 코닝 코포레이션 방사선 민감성 실리콘 수지 조성물
SG119379A1 (en) * 2004-08-06 2006-02-28 Nippon Catalytic Chem Ind Resin composition method of its composition and cured formulation
EP1787319A4 (en) * 2004-08-31 2011-06-29 Silecs Oy NEW DIELECTRIC POLYORGANOSILOXANE MATERIALS
JP4513966B2 (ja) * 2005-03-07 2010-07-28 信越化学工業株式会社 プライマー組成物及びそれを用いた電気電子部品
EP1891146B1 (en) * 2005-06-13 2015-01-14 Silecs OY Organo functionalized silane monomers and siloxane polymers of the same

Also Published As

Publication number Publication date
WO2008102060A3 (en) 2009-03-05
US8133965B2 (en) 2012-03-13
WO2008102060A2 (en) 2008-08-28
EP2113005A2 (en) 2009-11-04
KR20090127140A (ko) 2009-12-09
TW200844180A (en) 2008-11-16
JP2010519375A (ja) 2010-06-03
TWI434891B (zh) 2014-04-21
KR101647360B1 (ko) 2016-08-10
US20080206578A1 (en) 2008-08-28

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