JP5326643B2 - 窒化物半導体素子の製造方法 - Google Patents
窒化物半導体素子の製造方法 Download PDFInfo
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- JP5326643B2 JP5326643B2 JP2009038038A JP2009038038A JP5326643B2 JP 5326643 B2 JP5326643 B2 JP 5326643B2 JP 2009038038 A JP2009038038 A JP 2009038038A JP 2009038038 A JP2009038038 A JP 2009038038A JP 5326643 B2 JP5326643 B2 JP 5326643B2
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JP2009038038A JP5326643B2 (ja) | 2009-02-20 | 2009-02-20 | 窒化物半導体素子の製造方法 |
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JP2009038038A JP5326643B2 (ja) | 2009-02-20 | 2009-02-20 | 窒化物半導体素子の製造方法 |
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JP2010192824A JP2010192824A (ja) | 2010-09-02 |
JP2010192824A5 JP2010192824A5 (enrdf_load_stackoverflow) | 2012-02-23 |
JP5326643B2 true JP5326643B2 (ja) | 2013-10-30 |
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JP2009038038A Active JP5326643B2 (ja) | 2009-02-20 | 2009-02-20 | 窒化物半導体素子の製造方法 |
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Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2013183032A (ja) * | 2012-03-02 | 2013-09-12 | Toshiba Corp | 半導体発光素子 |
JP6479308B2 (ja) * | 2013-08-09 | 2019-03-06 | ソニー株式会社 | 面発光レーザ素子及びその製造方法 |
JPWO2018096850A1 (ja) | 2016-11-24 | 2019-10-17 | ソニー株式会社 | 面発光レーザおよび電子機器 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2003270467A (ja) * | 2002-01-09 | 2003-09-25 | Matsushita Electric Ind Co Ltd | 光導波路デバイスの製造方法、光導波路デバイス並びに当該光導波路デバイスを用いたコヒーレント光源及び光学装置 |
WO2005099057A1 (ja) * | 2004-03-31 | 2005-10-20 | Nec Corporation | 窒化物半導体発光素子用ウエハとその製造方法およびそのウエハから得られた窒化物半導体発光素子 |
US6956246B1 (en) * | 2004-06-03 | 2005-10-18 | Lumileds Lighting U.S., Llc | Resonant cavity III-nitride light emitting devices fabricated by growth substrate removal |
JP2006216788A (ja) * | 2005-02-03 | 2006-08-17 | Hitachi Cable Ltd | 半導体レーザー用単結晶ウェハ |
KR101090900B1 (ko) * | 2006-10-18 | 2011-12-08 | 니텍 인코포레이티드 | 수직구조의 심자외선 발광다이오드 |
WO2008091837A2 (en) * | 2007-01-22 | 2008-07-31 | Cree Led Lighting Solutions, Inc. | Fault tolerant light emitters, systems incorporating fault tolerant light emitters and methods of fabricating fault tolerant light emitters |
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