JP5320815B2 - 磁気記録媒体用薄膜の成膜方法およびそれが用いられる成膜装置 - Google Patents
磁気記録媒体用薄膜の成膜方法およびそれが用いられる成膜装置 Download PDFInfo
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- JP5320815B2 JP5320815B2 JP2008132245A JP2008132245A JP5320815B2 JP 5320815 B2 JP5320815 B2 JP 5320815B2 JP 2008132245 A JP2008132245 A JP 2008132245A JP 2008132245 A JP2008132245 A JP 2008132245A JP 5320815 B2 JP5320815 B2 JP 5320815B2
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- Prior art keywords
- magnetic recording
- recording medium
- substrate holder
- substrate
- film
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
- G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
- G11B5/85—Coating a support with a magnetic layer by vapour deposition
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
- C23C14/0605—Carbon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
- C23C14/325—Electric arc evaporation
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
- Y02T50/00—Aeronautics or air transport
- Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
- Physical Vapour Deposition (AREA)
Description
マビーム形成部からのプラズマビームが供給される成膜室に回動可能に配される基板ホル
ダーに、磁気記録層が形成された記録媒体用基板を配置し、記録媒体用基板の磁気記録層
の表面の法線とプラズマビームの入射方向に対し直交する平面とのなす傾斜角を、磁気記
録層の表面に形成されたta−Cの薄膜の膜厚の増大に応じて最小傾斜角度から最大傾斜
角度まで連続的に変化させ、前記基板ホルダーにおける成膜時間あたりの回転数が、成膜中、少なくとも3回以上に設定され、
前記最小傾斜角度は0°から10°未満であることを含むことを特徴とする。
れる成膜室と、成膜室に回動可能に配され、磁気記録層が形成された磁気記録媒体用基板
を着脱可能に把持する基板ホルダーと、基板ホルダーにより把持された磁気記録媒体用基
板の磁気記録層の表面の法線とプラズマビームの入射方向に対し直交する平面とのなす傾
斜角を、連続的に変更するチルト機構部と、基板ホルダーにより把持された磁気記録媒体
用基板を基板ホルダーの回転軸線回りに回動させる回動機構部と、チルト機構部に、傾斜
角を磁気記録媒体用基板の磁気記録層の表面に形成されたta−Cの薄膜の膜厚の増大に
応じて最小傾斜角度から最大傾斜角度まで連続的に変更するように動作させるとともに、
回動機構部に前記基板ホルダーを回動させる動作を行わせる制御部と、を備え前記最小傾斜角度は0°から10°未満に設定され、前記基板ホルダーにおける成膜完了時間あたりの回転数が、成膜中、少なくとも3回以上に設定されて構成される。
12 プラズマビーム形成部
14C 成膜室
18 カバー部材
20 基板ホルダー
28 磁気記録媒体
28Ld 保護層
28Lc 磁性層
40 制御ユニット
Io プラズマビーム
Claims (4)
- プラズマビーム形成部からのプラズマビームが供給される成膜室に回動可能に配される基板ホルダーに、磁気記録層が形成された記録媒体用基板を配置し、
前記記録媒体用基板の磁気記録層の表面の法線と前記プラズマビームの入射方向に対し直交する平面とのなす傾斜角を、
該磁気記録層の表面に形成されたta−Cの薄膜の膜厚の増大に応じて最小傾斜角度から最大傾斜角度まで連続的に変化させ、
前記基板ホルダーにおける成膜時間あたりの回転数が、成膜中、少なくとも3回以上に設定され、
前記最小傾斜角度は0°から10°未満であることを特徴とする磁気記録媒体用薄膜の成膜方法。 - プラズマビーム形成部からのプラズマビームが供給される成膜室と、
前記成膜室に回動可能に配され、磁気記録層が形成された磁気記録媒体用基板を着脱可能に把持する基板ホルダーと、
前記基板ホルダーにより把持された前記磁気記録媒体用基板の磁気記録層の表面の法線とプラズマビームの入射方向に対し直交する平面とのなす傾斜角を、連続的に変更するチルト機構部と、
前記基板ホルダーにより把持された前記磁気記録媒体用基板を該基板ホルダーの回転軸線回りに回動させる回動機構部と、
前記チルト機構部に、前記傾斜角を前記磁気記録媒体用基板の磁気記録層の表面に形成されたta−Cの薄膜の膜厚の増大に応じて最小傾斜角度から最大傾斜角度まで連続的に変更するように動作させるとともに、前記回動機構部に前記基板ホルダーを回動させる動作を行わせる制御部と、を備え、
前記最小傾斜角度は0°から10°未満に設定され、
前記基板ホルダーにおける成膜完了時間あたりの回転数が、成膜中、少なくとも3回以上に設定されることを特徴とする磁気記録媒体用薄膜の成膜装置。 - 前記基板ホルダー、チルト機構部、および、回動機構部の周囲を包囲するカバー部材が、前記成膜室に備えられることを特徴とする請求項2に記載の磁気記録媒体用薄膜の成膜装置。
- 前記成膜室は、該成膜室の圧力が負圧となるように吸引手段により、前記プラズマビーム形成部に対し離隔する方向の端部の位置で該成膜室に設けられた前記排気口を介して吸引されることを特徴とする請求項2に記載の磁気記録媒体用薄膜の成膜装置。
Priority Applications (3)
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JP2008132245A JP5320815B2 (ja) | 2008-05-20 | 2008-05-20 | 磁気記録媒体用薄膜の成膜方法およびそれが用いられる成膜装置 |
US12/453,633 US8440269B2 (en) | 2008-05-20 | 2009-05-18 | Method for depositing thin film for magnetic recording medium |
US13/858,386 US8573149B2 (en) | 2008-05-20 | 2013-04-08 | Film deposition apparatus for magnetic recording medium |
Applications Claiming Priority (1)
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JP2008132245A JP5320815B2 (ja) | 2008-05-20 | 2008-05-20 | 磁気記録媒体用薄膜の成膜方法およびそれが用いられる成膜装置 |
Publications (2)
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JP2009283044A JP2009283044A (ja) | 2009-12-03 |
JP5320815B2 true JP5320815B2 (ja) | 2013-10-23 |
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JP2008132245A Expired - Fee Related JP5320815B2 (ja) | 2008-05-20 | 2008-05-20 | 磁気記録媒体用薄膜の成膜方法およびそれが用いられる成膜装置 |
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US (2) | US8440269B2 (ja) |
JP (1) | JP5320815B2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20230111296A1 (en) * | 2021-10-07 | 2023-04-13 | Western Digital Technologies, Inc. | Longitudinal Sensor Bias Structures and Method of Formation Thereof |
Families Citing this family (6)
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US20130163119A1 (en) * | 2010-09-07 | 2013-06-27 | National University Of Singapore | Head-Media Interface in a Hard Disk Drive |
JP2015015062A (ja) * | 2013-07-03 | 2015-01-22 | 富士電機株式会社 | 磁気記録媒体の製造方法 |
US9840765B2 (en) * | 2013-10-16 | 2017-12-12 | General Electric Company | Systems and method of coating an interior surface of an object |
CN107058966B (zh) * | 2016-12-12 | 2019-10-15 | 苏州求是真空电子有限公司 | 一种真空镀膜衬底底座 |
JP2018163878A (ja) * | 2017-03-27 | 2018-10-18 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置 |
JP6548856B1 (ja) * | 2018-03-08 | 2019-07-24 | 堺ディスプレイプロダクト株式会社 | 成膜装置、蒸着膜の成膜方法および有機el表示装置の製造方法 |
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US5342660A (en) * | 1991-05-10 | 1994-08-30 | Celestech, Inc. | Method for plasma jet deposition |
US6173672B1 (en) * | 1997-06-06 | 2001-01-16 | Celestech, Inc. | Diamond film deposition on substrate arrays |
JPH10204616A (ja) * | 1997-01-24 | 1998-08-04 | Fujitsu Ltd | カーボンスパッタ装置 |
JP2001338896A (ja) * | 2000-05-30 | 2001-12-07 | Ebara Corp | 基板の成膜・埋込方法及び装置 |
JP2002212713A (ja) * | 2001-01-18 | 2002-07-31 | Shimadzu Corp | 陰極アーク放電を用いた成膜装置 |
RU2240376C1 (ru) * | 2003-05-22 | 2004-11-20 | Ооо "Альбатэк" | Способ формирования сверхтвердого аморфного углеродного покрытия в вакууме |
JP2006147130A (ja) * | 2004-10-21 | 2006-06-08 | Showa Denko Kk | 垂直磁気記録媒体の製造方法及び垂直磁気記録媒体 |
US20060159844A1 (en) * | 2005-01-18 | 2006-07-20 | Fuji Photo Film Co., Ltd. | Process and apparatus for producing magnetic recording medium |
JP2007026506A (ja) | 2005-07-14 | 2007-02-01 | Hitachi Global Storage Technologies Netherlands Bv | 磁気ヘッドスライダの製造方法及び磁気ヘッドスライダ |
JP2007100162A (ja) * | 2005-10-04 | 2007-04-19 | Tdk Corp | 薄膜形成方法、磁気記録媒体製造方法および薄膜形成装置 |
JP2008050653A (ja) * | 2006-08-24 | 2008-03-06 | Shimadzu Corp | 成膜装置、および成膜方法 |
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2008
- 2008-05-20 JP JP2008132245A patent/JP5320815B2/ja not_active Expired - Fee Related
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2009
- 2009-05-18 US US12/453,633 patent/US8440269B2/en active Active
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2013
- 2013-04-08 US US13/858,386 patent/US8573149B2/en active Active
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20230111296A1 (en) * | 2021-10-07 | 2023-04-13 | Western Digital Technologies, Inc. | Longitudinal Sensor Bias Structures and Method of Formation Thereof |
US11631535B1 (en) * | 2021-10-07 | 2023-04-18 | Western Digital Technologies, Inc. | Longitudinal sensor bias structures and method of formation thereof |
Also Published As
Publication number | Publication date |
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US8440269B2 (en) | 2013-05-14 |
US20130213302A1 (en) | 2013-08-22 |
US20090291234A1 (en) | 2009-11-26 |
JP2009283044A (ja) | 2009-12-03 |
US8573149B2 (en) | 2013-11-05 |
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