JP5309016B2 - 光表面実装用導波路基板の製造方法 - Google Patents
光表面実装用導波路基板の製造方法 Download PDFInfo
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- JP5309016B2 JP5309016B2 JP2009509058A JP2009509058A JP5309016B2 JP 5309016 B2 JP5309016 B2 JP 5309016B2 JP 2009509058 A JP2009509058 A JP 2009509058A JP 2009509058 A JP2009509058 A JP 2009509058A JP 5309016 B2 JP5309016 B2 JP 5309016B2
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- 230000003287 optical effect Effects 0.000 title claims description 57
- 239000000758 substrate Substances 0.000 title claims description 57
- 238000000034 method Methods 0.000 title claims description 18
- 238000004519 manufacturing process Methods 0.000 title claims description 7
- 239000000463 material Substances 0.000 claims description 35
- 239000011358 absorbing material Substances 0.000 claims description 15
- 238000005253 cladding Methods 0.000 claims description 13
- 238000005304 joining Methods 0.000 claims description 3
- 230000000149 penetrating effect Effects 0.000 claims description 2
- 239000013078 crystal Substances 0.000 description 8
- 238000009792 diffusion process Methods 0.000 description 7
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- 238000006243 chemical reaction Methods 0.000 description 4
- 239000011777 magnesium Substances 0.000 description 4
- 229920005989 resin Polymers 0.000 description 4
- 239000011347 resin Substances 0.000 description 4
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 3
- 229910004298 SiO 2 Inorganic materials 0.000 description 3
- 238000009429 electrical wiring Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- GQYHUHYESMUTHG-UHFFFAOYSA-N lithium niobate Chemical compound [Li+].[O-][Nb](=O)=O GQYHUHYESMUTHG-UHFFFAOYSA-N 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 229910052761 rare earth metal Inorganic materials 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- WSMQKESQZFQMFW-UHFFFAOYSA-N 5-methyl-pyrazole-3-carboxylic acid Chemical compound CC1=CC(C(O)=O)=NN1 WSMQKESQZFQMFW-UHFFFAOYSA-N 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 2
- 239000004642 Polyimide Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052744 lithium Inorganic materials 0.000 description 2
- 229920001721 polyimide Polymers 0.000 description 2
- 230000001902 propagating effect Effects 0.000 description 2
- 229910052710 silicon Inorganic materials 0.000 description 2
- 239000006104 solid solution Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052692 Dysprosium Inorganic materials 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- 229910052689 Holmium Inorganic materials 0.000 description 1
- 229910013641 LiNbO 3 Inorganic materials 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 229910052777 Praseodymium Inorganic materials 0.000 description 1
- 229910004541 SiN Inorganic materials 0.000 description 1
- -1 Ta 2 O 5 Inorganic materials 0.000 description 1
- 229910052775 Thulium Inorganic materials 0.000 description 1
- 229910010413 TiO 2 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
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- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 238000004891 communication Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
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- 239000000835 fiber Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 238000000608 laser ablation Methods 0.000 description 1
- 238000003754 machining Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000001579 optical reflectometry Methods 0.000 description 1
- 230000010355 oscillation Effects 0.000 description 1
- 230000008832 photodamage Effects 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 230000010287 polarization Effects 0.000 description 1
- 229910052703 rhodium Inorganic materials 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- JBQYATWDVHIOAR-UHFFFAOYSA-N tellanylidenegermanium Chemical compound [Te]=[Ge] JBQYATWDVHIOAR-UHFFFAOYSA-N 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/43—Arrangements comprising a plurality of opto-electronic elements and associated optical interconnections
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12002—Three-dimensional structures
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/42—Coupling light guides with opto-electronic elements
- G02B6/4201—Packages, e.g. shape, construction, internal or external details
- G02B6/4204—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms
- G02B6/4214—Packages, e.g. shape, construction, internal or external details the coupling comprising intermediate optical elements, e.g. lenses, holograms the intermediate optical element having redirecting reflective means, e.g. mirrors, prisms for deflecting the radiation from horizontal to down- or upward direction toward a device
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T156/00—Adhesive bonding and miscellaneous chemical manufacture
- Y10T156/10—Methods of surface bonding and/or assembly therefor
- Y10T156/1052—Methods of surface bonding and/or assembly therefor with cutting, punching, tearing or severing
- Y10T156/1062—Prior to assembly
- Y10T156/1064—Partial cutting [e.g., grooving or incising]
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Optical Integrated Circuits (AREA)
Description
光導波路の材料からなる基体上にクラッド層を設けるクラッド層形成工程、
前記クラッド層形成工程の後に、前記基体および前記クラッド層に前記クラッド層を貫通する溝を形成する溝形成工程、
前記溝形成工程の後に、前記基体の前記溝側の端面を光吸収性材料または光反射性材料に接触させることで反射鏡を形成する反射鏡形成工程、
前記反射鏡形成工程の後に、前記基体および前記クラッド層を支持基板に接合し、この際前記クラッド層を前記支持基板側に位置させる接合工程、および
前記接合工程の後に、前記基体を加工して薄くして薄板とすることによって光導波路を形成すると共に、前記溝を薄板に貫通させ、前記光導波路の前記溝側の端面を前記光吸収性材料または前記光反射性材料に接触させる薄板化工程
を備えている。
Au、Ag、Cu、Al、Cr、Rh、Pt、Ti、Siなどの金属膜
SiO2、SiN、Al2O3、TiO2、Ta2O5などの誘電体膜
金属膜と誘電体膜との組み合わせ
誘電体多層膜
の拡散型光導波路10を形成した。次に、光導波路10を作成した表面に厚さ1um のSiO2クラッド層7をスパッタ法により形成した。次いで、図3に示すように、基板表面に幅50um、深さ20um、傾斜角θ1、θ2=45度の溝8をダイサーによって形成した。溝加工後に、図4に示すように、Al膜9をスパッタ法により成膜した。
Claims (6)
- 光導波路の材料からなる基体上にクラッド層を設けるクラッド層形成工程、
前記クラッド層形成工程の後に、前記基体および前記クラッド層に前記クラッド層を貫通する溝を形成する溝形成工程、
前記溝形成工程の後に、前記基体の前記溝側の端面を光吸収性材料または光反射性材料に接触させることで反射鏡を形成する反射鏡形成工程、
前記反射鏡形成工程の後に、前記基体および前記クラッド層を支持基板に接合し、この際前記クラッド層を前記支持基板側に位置させる接合工程、および
前記接合工程の後に、前記基体を加工して薄くして薄板とすることによって光導波路を形成すると共に、前記溝を薄板に貫通させ、前記光導波路の前記溝側の端面を前記光吸収性材料または前記光反射性材料に接触させる薄板化工程
を備えていることを特徴とする、光表面実装用導波路基板の製造方法。 - 前記溝が、垂直面から一方の方向へと傾斜した第一の傾斜面と、前記垂直面から反対方向へと傾斜した第二の傾斜面とを有することを特徴とする、請求項1記載の方法。
- 前記光反射性材料または前記光吸収性材料が、前記端面を被覆する膜であることを特徴とする、請求項1または2記載の方法。
- 前記溝に低誘電率材料が充填されていることを特徴とする、請求項3記載の方法。
- 前記溝が空隙をなしていることを特徴とする、請求項3記載の方法。
- 前記溝に前記光反射性材料または前記光吸収性材料が充填されていることを特徴とする、請求項1または2記載の方法。
Priority Applications (1)
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---|---|---|---|
JP2009509058A JP5309016B2 (ja) | 2007-03-22 | 2008-03-13 | 光表面実装用導波路基板の製造方法 |
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JP2007074578 | 2007-03-22 | ||
JP2007074578 | 2007-03-22 | ||
JP2009509058A JP5309016B2 (ja) | 2007-03-22 | 2008-03-13 | 光表面実装用導波路基板の製造方法 |
PCT/JP2008/055160 WO2008126653A1 (ja) | 2007-03-22 | 2008-03-13 | 光表面実装用導波路基板の製造方法 |
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JPWO2008126653A1 JPWO2008126653A1 (ja) | 2010-07-22 |
JP5309016B2 true JP5309016B2 (ja) | 2013-10-09 |
Family
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Country Status (4)
Country | Link |
---|---|
US (1) | US8062449B2 (ja) |
JP (1) | JP5309016B2 (ja) |
DE (1) | DE112008000727B4 (ja) |
WO (1) | WO2008126653A1 (ja) |
Families Citing this family (3)
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CN104040390A (zh) * | 2012-01-10 | 2014-09-10 | 日立化成株式会社 | 带镜光波导和光纤连接器以及带镜光波导的制造方法 |
US10739518B2 (en) * | 2015-12-21 | 2020-08-11 | International Business Machines Corporation | Optical components for wavelength division multiplexing with high-density optical interconnect modules |
WO2024029011A1 (ja) * | 2022-08-03 | 2024-02-08 | 日本電信電話株式会社 | 光変調器 |
Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4163953A (en) * | 1977-07-07 | 1979-08-07 | Northern Telecom Limited | Double heterostructure laser for direct coupling to an optical fiber |
JPH07183570A (ja) * | 1993-12-24 | 1995-07-21 | Nec Corp | マルチチップモジュール |
US20020196997A1 (en) * | 2001-06-26 | 2002-12-26 | Chakravorty Kishore K. | Packaging and assembly method for optical coupling |
JP2004258066A (ja) * | 2003-02-24 | 2004-09-16 | Ngk Spark Plug Co Ltd | 光導波路基板の製造方法、光電気複合実装配線基板の製造方法 |
JP2004258065A (ja) * | 2003-02-24 | 2004-09-16 | Ngk Spark Plug Co Ltd | 光導波路基板及びその製造方法、光電気複合実装配線基板及びその製造方法 |
JP2005070141A (ja) * | 2003-08-28 | 2005-03-17 | Ngk Spark Plug Co Ltd | 光路変換部品付きの光導波路構造体及びその製造方法、光路変換部品 |
JP2005121818A (ja) * | 2003-10-15 | 2005-05-12 | Central Glass Co Ltd | 多チャンネル光路変換素子 |
JP2006251046A (ja) * | 2005-03-08 | 2006-09-21 | Central Glass Co Ltd | 光導波路基板、光表面実装導波路素子およびそれらの製造方法 |
JP2007010692A (ja) * | 2003-11-05 | 2007-01-18 | Hitachi Chem Co Ltd | 光導波路及びその製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0572429A (ja) | 1991-02-15 | 1993-03-26 | Mitsubishi Rayon Co Ltd | 光表面実装用プリント基板 |
JPH0534526A (ja) | 1991-07-30 | 1993-02-12 | Japan Aviation Electron Ind Ltd | 光表面実装用光学反射鏡形成方法 |
JP2000199827A (ja) | 1998-10-27 | 2000-07-18 | Sony Corp | 光導波装置およびその製造方法 |
US6754407B2 (en) * | 2001-06-26 | 2004-06-22 | Intel Corporation | Flip-chip package integrating optical and electrical devices and coupling to a waveguide on a board |
JP2004094070A (ja) | 2002-09-03 | 2004-03-25 | Toppan Printing Co Ltd | 光路変換部品及びそれを用いた光表面実装導波路 |
-
2008
- 2008-03-13 JP JP2009509058A patent/JP5309016B2/ja active Active
- 2008-03-13 DE DE112008000727.6T patent/DE112008000727B4/de active Active
- 2008-03-13 WO PCT/JP2008/055160 patent/WO2008126653A1/ja active Application Filing
-
2009
- 2009-09-10 US US12/556,889 patent/US8062449B2/en active Active
Patent Citations (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4163953A (en) * | 1977-07-07 | 1979-08-07 | Northern Telecom Limited | Double heterostructure laser for direct coupling to an optical fiber |
JPH07183570A (ja) * | 1993-12-24 | 1995-07-21 | Nec Corp | マルチチップモジュール |
US20020196997A1 (en) * | 2001-06-26 | 2002-12-26 | Chakravorty Kishore K. | Packaging and assembly method for optical coupling |
JP2004258066A (ja) * | 2003-02-24 | 2004-09-16 | Ngk Spark Plug Co Ltd | 光導波路基板の製造方法、光電気複合実装配線基板の製造方法 |
JP2004258065A (ja) * | 2003-02-24 | 2004-09-16 | Ngk Spark Plug Co Ltd | 光導波路基板及びその製造方法、光電気複合実装配線基板及びその製造方法 |
JP2005070141A (ja) * | 2003-08-28 | 2005-03-17 | Ngk Spark Plug Co Ltd | 光路変換部品付きの光導波路構造体及びその製造方法、光路変換部品 |
JP2005121818A (ja) * | 2003-10-15 | 2005-05-12 | Central Glass Co Ltd | 多チャンネル光路変換素子 |
JP2007010692A (ja) * | 2003-11-05 | 2007-01-18 | Hitachi Chem Co Ltd | 光導波路及びその製造方法 |
JP2006251046A (ja) * | 2005-03-08 | 2006-09-21 | Central Glass Co Ltd | 光導波路基板、光表面実装導波路素子およびそれらの製造方法 |
Also Published As
Publication number | Publication date |
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WO2008126653A1 (ja) | 2008-10-23 |
DE112008000727T5 (de) | 2010-01-14 |
US8062449B2 (en) | 2011-11-22 |
DE112008000727B4 (de) | 2021-08-26 |
US20100000664A1 (en) | 2010-01-07 |
JPWO2008126653A1 (ja) | 2010-07-22 |
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