JP5294877B2 - ヒドロキシベンゾフェノン誘導体 - Google Patents
ヒドロキシベンゾフェノン誘導体 Download PDFInfo
- Publication number
- JP5294877B2 JP5294877B2 JP2008553748A JP2008553748A JP5294877B2 JP 5294877 B2 JP5294877 B2 JP 5294877B2 JP 2008553748 A JP2008553748 A JP 2008553748A JP 2008553748 A JP2008553748 A JP 2008553748A JP 5294877 B2 JP5294877 B2 JP 5294877B2
- Authority
- JP
- Japan
- Prior art keywords
- group
- carbon atoms
- formula
- products
- hair
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 0 CC(C=CC=C1C(c2ccccc2C(O*C(*)(*)[Si](*)(*)OC(*)(*)[S+](*)(*)*)=O)=O)(C=C1O)N(*)I Chemical compound CC(C=CC=C1C(c2ccccc2C(O*C(*)(*)[Si](*)(*)OC(*)(*)[S+](*)(*)*)=O)=O)(C=C1O)N(*)I 0.000 description 1
- BJYAYTSWUPRYIW-UHFFFAOYSA-N CCN(CC)c1ccc(C(c2ccccc2C(OCCC[Si+](C)(C)C)=O)=O)c(O)c1 Chemical compound CCN(CC)c1ccc(C(c2ccccc2C(OCCC[Si+](C)(C)C)=O)=O)c(O)c1 BJYAYTSWUPRYIW-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0803—Compounds with Si-C or Si-Si linkages
- C07F7/081—Compounds with Si-C or Si-Si linkages comprising at least one atom selected from the elements N, O, halogen, S, Se or Te
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61K—PREPARATIONS FOR MEDICAL, DENTAL OR TOILETRY PURPOSES
- A61K8/00—Cosmetics or similar toiletry preparations
- A61K8/18—Cosmetics or similar toiletry preparations characterised by the composition
- A61K8/30—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds
- A61K8/58—Cosmetics or similar toiletry preparations characterised by the composition containing organic compounds containing atoms other than carbon, hydrogen, halogen, oxygen, nitrogen, sulfur or phosphorus
- A61K8/585—Organosilicon compounds
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61Q—SPECIFIC USE OF COSMETICS OR SIMILAR TOILETRY PREPARATIONS
- A61Q17/00—Barrier preparations; Preparations brought into direct contact with the skin for affording protection against external influences, e.g. sunlight, X-rays or other harmful rays, corrosive materials, bacteria or insect stings
- A61Q17/04—Topical preparations for affording protection against sunlight or other radiation; Topical sun tanning preparations
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/0834—Compounds having one or more O-Si linkage
- C07F7/0838—Compounds with one or more Si-O-Si sequences
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
- C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
- C07F7/02—Silicon compounds
- C07F7/08—Compounds having one or more C—Si linkages
- C07F7/10—Compounds having one or more C—Si linkages containing nitrogen having a Si-N linkage
Landscapes
- Health & Medical Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Veterinary Medicine (AREA)
- Animal Behavior & Ethology (AREA)
- General Health & Medical Sciences (AREA)
- Public Health (AREA)
- Dermatology (AREA)
- Birds (AREA)
- Epidemiology (AREA)
- Cosmetics (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP06101454.4 | 2006-02-09 | ||
| EP06101454 | 2006-02-09 | ||
| PCT/EP2007/051117 WO2007090832A1 (en) | 2006-02-09 | 2007-02-06 | Hydroxybenzophenone derivatives |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009526015A JP2009526015A (ja) | 2009-07-16 |
| JP2009526015A5 JP2009526015A5 (https=) | 2010-03-11 |
| JP5294877B2 true JP5294877B2 (ja) | 2013-09-18 |
Family
ID=36010871
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008553748A Expired - Fee Related JP5294877B2 (ja) | 2006-02-09 | 2007-02-06 | ヒドロキシベンゾフェノン誘導体 |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7999128B2 (https=) |
| EP (1) | EP1981895B1 (https=) |
| JP (1) | JP5294877B2 (https=) |
| ES (1) | ES2584204T3 (https=) |
| GB (1) | GB2435041A (https=) |
| WO (1) | WO2007090832A1 (https=) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102007024343A1 (de) * | 2007-05-22 | 2008-11-27 | Beiersdorf Ag | Kosmetische Zubereitung mit polymerem UV-Filter und Metalloxiden |
| AR100211A1 (es) * | 2014-05-19 | 2016-09-21 | Interquim Sa | Procedimiento para la preparación de un polímero fotoprotector progresivo de organosilicio; polímero fotoprotector progresivo de organosilicio, su uso, composición que lo comprende, monómero precursor, procedimientos para la preparación de dicho monómero precursor |
| WO2025072721A1 (en) * | 2023-09-28 | 2025-04-03 | Uvageless Llc | Compositions |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2938047A (en) | 1958-11-13 | 1960-05-24 | Union Carbide Corp | Carbobenzophenoneoxyalkyl siloxanes and their preparation |
| US4042613A (en) | 1974-04-23 | 1977-08-16 | Dai Nippon Printing Co., Ltd. | Benzophenone derivatives and their preparation and application |
| US4495360A (en) * | 1982-04-30 | 1985-01-22 | General Electric Company | Ultraviolet light absorbing agents, method for making, compositions and articles containing same |
| US5270426A (en) * | 1990-01-22 | 1993-12-14 | Shin-Etsu Chemical Co., Ltd. | Organosilicon compound |
| JPH03287588A (ja) * | 1990-04-02 | 1991-12-18 | Shiseido Co Ltd | ベンゾフェノン誘導体、紫外線吸収剤及び皮膚外用剤 |
| FR2684551B1 (fr) * | 1991-12-05 | 1995-04-21 | Oreal | Huile cosmetique filtrante contenant une silicone filtre et un melange d'une silicone volatile et d'une huile de silicone ou d'une gomme de silicone et emulsion cosmetique filtrante contenant une telle huile. |
| DE59510278D1 (de) | 1994-02-10 | 2002-08-22 | Ciba Sc Holding Ag | Holzschutzanstrich |
| US6071052A (en) | 1997-06-30 | 2000-06-06 | Lok-Mor, Inc. | Extended height lock nut |
| FR2782516B1 (fr) * | 1998-08-21 | 2001-09-07 | Oreal | Procede de photostabilisation de filtres solaires derives du dibenzoylmethane, compositions cosmetiques filtrantes photostabilisees ainsi obtenues et leurs utilisation |
| DE19917906A1 (de) * | 1999-04-20 | 2000-10-26 | Basf Ag | Verwendung von aminosubstituierten Hydroxybenzophenonen als photostabile UV-Filter in kosmetischen und pharmazeutischen Zubereitungen |
| DE10011317A1 (de) | 2000-03-10 | 2001-09-13 | Basf Ag | Verwendung von aminosubstituierten Hydroxybenzophenonen als Lichtschutzmittel und Stabilisatoren für nicht lenbendes organisches Material |
| DE10012408A1 (de) | 2000-03-15 | 2001-09-20 | Basf Ag | Verwendung von Lichtschutzmittelkombinationen, die als wesentlichen Bestandteil aminosubstituierte Hydroxybenzophenone enthalten als photostabile UV-Filter in kosmetischen und pharmazeutischen Zubereitungen |
| DE10143963A1 (de) | 2001-09-07 | 2003-03-27 | Basf Ag | Kosmetische und dermatologische Zubereitungen in Form von W/O-Emulsionen, enthaltend ein aminosubstituiertes Hydroxybenzophenon |
| DE10155963A1 (de) | 2001-11-09 | 2003-05-22 | Beiersdorf Ag | Kosmetische und dermatologische Lichtschutzformulierungen mit einem Gehalt an Hydroxybenzophenonen, Triazin- und/oder Benzotriazol-Derivaten |
| JP4349915B2 (ja) * | 2002-04-12 | 2009-10-21 | ディーエスエム アイピー アセッツ ビー.ブイ. | アミノヒドロキシベンゾフェノンのオルガノシリコーン誘導体及び化粧用製剤におけるuvaフィルターとしてのそれらの使用 |
| EP1569893B1 (en) * | 2002-12-12 | 2012-04-11 | Basf Se | Amino substituted hydroxyphenyl benzophenone derivatives |
| JP2008545843A (ja) | 2005-05-31 | 2008-12-18 | ディーエスエム アイピー アセッツ ビー.ブイ. | 新規なポリシロキサン日焼け止め剤 |
-
2007
- 2007-02-06 US US12/223,686 patent/US7999128B2/en not_active Expired - Fee Related
- 2007-02-06 EP EP07726317.6A patent/EP1981895B1/en active Active
- 2007-02-06 JP JP2008553748A patent/JP5294877B2/ja not_active Expired - Fee Related
- 2007-02-06 ES ES07726317.6T patent/ES2584204T3/es active Active
- 2007-02-06 WO PCT/EP2007/051117 patent/WO2007090832A1/en not_active Ceased
- 2007-02-07 GB GB0702326A patent/GB2435041A/en not_active Withdrawn
Also Published As
| Publication number | Publication date |
|---|---|
| JP2009526015A (ja) | 2009-07-16 |
| EP1981895A1 (en) | 2008-10-22 |
| GB2435041A (en) | 2007-08-15 |
| WO2007090832A1 (en) | 2007-08-16 |
| ES2584204T3 (es) | 2016-09-26 |
| US7999128B2 (en) | 2011-08-16 |
| US20090220439A1 (en) | 2009-09-03 |
| GB2435041A9 (en) | 2007-08-15 |
| GB0702326D0 (en) | 2007-03-21 |
| EP1981895B1 (en) | 2016-04-27 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5099559B2 (ja) | メロシアニン誘導体 | |
| JP4566907B2 (ja) | アミノ置換ヒドロキシフェニルベンゾフェノン誘導体 | |
| KR101433142B1 (ko) | 트리아진 유도체 | |
| JP5078611B2 (ja) | メロシアニン誘導体 | |
| KR101538527B1 (ko) | 나노스케일 uv 흡수제의 제조 | |
| DK1868984T3 (en) | BENZOIC ACID ESTER COMPOUNDS, COMPOSITIONS, APPLICATIONS AND PROCEDURES | |
| EP0368717A1 (fr) | Dérivés de la 5-benzylidène 3-oxa cyclopentanone, leur procédé de préparation et leur utilisation dans des compositions cosmétiques pour la protection de la peau et des cheveux contre le rayonnement solaire | |
| JP5384826B2 (ja) | 光安定性の化粧用又は皮膚科学用組成物 | |
| JP5362574B2 (ja) | メロシアニン誘導体 | |
| JP2011517321A (ja) | 二量体ベンジリデンマロネート類 | |
| EP2435017A2 (en) | Benzylidene malonates | |
| EP2249780A2 (fr) | Composés cationiques tensioactifs, leur utilisation comme conditionneur, procédé de traitement cosmétique, et compositions cosmétiques ou pharmaceutiques les comprenant | |
| JP5294877B2 (ja) | ヒドロキシベンゾフェノン誘導体 | |
| EP0370868B1 (fr) | Utilisation de diorganopolysiloxanes modifiés comme anti-oxydants en cosmétique ou en dermatologie | |
| JP5588676B2 (ja) | 紫外線の悪影響からヒト又は動物の皮膚又は毛髪を保護するためのアミノフェニルベンゾトリアゾール誘導体の使用及びその化粧品組成物。 | |
| EP1642893B1 (fr) | Composés s-triazine possédant deux substituants choisis parmi des groupes para-aminobenzalmalonate et para-aminobenzalmalonamide encombrés et un substituant aminobenzoate, compositions, utilisations | |
| JPH07330779A (ja) | 有機ケイ素基を有するベンザルマロネート誘導体及びその製造法並びにこれを含有する紫外線吸収剤及び化粧料 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100122 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100122 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20120828 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120829 |
|
| AA91 | Notification that invitation to amend document was cancelled |
Free format text: JAPANESE INTERMEDIATE CODE: A971091 Effective date: 20120911 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120926 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20121226 |
|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20121226 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20130529 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20130611 |
|
| R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 Ref document number: 5294877 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |