JP5282481B2 - Ozone cleaning tank and ozone cleaning device - Google Patents

Ozone cleaning tank and ozone cleaning device

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JP5282481B2
JP5282481B2 JP2008211907A JP2008211907A JP5282481B2 JP 5282481 B2 JP5282481 B2 JP 5282481B2 JP 2008211907 A JP2008211907 A JP 2008211907A JP 2008211907 A JP2008211907 A JP 2008211907A JP 5282481 B2 JP5282481 B2 JP 5282481B2
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ozone
gas
water
cleaning
liquid separation
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JP2010046589A (en
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洋 黒部
博志 森田
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Kurita Water Industries Ltd
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Kurita Water Industries Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To provide an ozone cleaning tank constituted so that ozone waterwhich has high ozone concentration, and contains no ozone bubbles at all or scarcely contains ozone bubbles, and to provide an ozone cleaning apparatus. <P>SOLUTION: Ultrapure water and ozone gas are supplied to an ozone water producing device 1 to produce ozone water-ozone gas mixed water. The mixed water is introduced into a gas-liquid separation chamber 4 via a pipe 2 and a receiving port 3 to float and separate bubbles of undissolved ozone gas in the mixed water. The ozone water containing no bubbles by the gas-liquid separation in the gas-liquid separation chamber 4 is introduced into a cleaning chamber 7 from a communication part 6. <P>COPYRIGHT: (C)2010,JPO&amp;INPIT

Description

本発明は、オゾン水によって被洗浄物を洗浄するためのオゾン洗浄槽及びオゾン洗浄装置に係り、特に、半導体や液晶等の電子デバイスの製造工程で用いるのに好適なオゾン洗浄槽及びオゾン洗浄装置に関する。   The present invention relates to an ozone cleaning tank and an ozone cleaning apparatus for cleaning an object to be cleaned with ozone water, and in particular, an ozone cleaning tank and an ozone cleaning apparatus suitable for use in a manufacturing process of electronic devices such as semiconductors and liquid crystals. About.

オゾンを超純水に溶解させたオゾン水によってシリコンウェハなどの電子デバイス部品を洗浄することは公知である(例えば、特開2005−186067)。   It is known to clean electronic device parts such as silicon wafers with ozone water in which ozone is dissolved in ultrapure water (for example, Japanese Patent Application Laid-Open No. 2005-186067).

上記特開2005−186067では、オゾンを超純水に溶解させたオゾン含有超純水を配管によってユースポイントへ供給すると共に、このユースポイントの直前で気液分離を行うようにしている。
特開2005−186067
In JP-A-2005-186067, ozone-containing ultrapure water in which ozone is dissolved in ultrapure water is supplied to a use point by piping, and gas-liquid separation is performed immediately before this use point.
JP2005-186067

上記特開2005−186067のようにオゾン溶解水を配管で輸送すると、この輸送途中で水中から離脱するオゾン量が多くなり、ユースポイントに供給されるオゾン水のオゾン濃度が低下する。   When ozone-dissolved water is transported by piping as in JP-A-2005-186067, the amount of ozone released from the water during the transportation increases, and the ozone concentration of ozone water supplied to the use point decreases.

またユースポイントの直前で気液分離しても、気液分離装置からユースポイントに到る途中でオゾン水濃度の低下が起こる。このようにオゾン水濃度が低下したオゾン水でシリコンウェハ等を洗浄した場合、洗浄性低下が生じる。   Moreover, even if gas-liquid separation is performed immediately before the use point, the ozone water concentration is lowered on the way from the gas-liquid separator to the use point. When a silicon wafer or the like is cleaned with ozone water having a reduced ozone water concentration in this way, the cleaning performance is lowered.

本発明は、上記の問題点を解決し、オゾン濃度が高くしかもオゾン気泡を全く又は殆ど含まないオゾン水が洗浄部に供給されるよう構成されたオゾン洗浄槽及びオゾン洗浄装置を提供することを目的とする。   The present invention solves the above problems and provides an ozone cleaning tank and an ozone cleaning apparatus configured to supply ozone water having a high ozone concentration and containing no or almost no ozone bubbles to a cleaning unit. Objective.

本発明(請求項1)のオゾン洗浄槽は、オゾン水によって被洗浄物を洗浄するオゾン洗浄槽において、槽体と、該槽体内を、オゾン水−オゾンガス混合水を受け入れて気液分離する気液分離室と洗浄室とに区画する仕切板と、該仕切板の下部に設けられた、該気液分離室と洗浄室とを連通する連通部と、を備え、該気液分離室の側壁に前記オゾン水−オゾンガス混合水の受入口が設けられ、該受入口が前記連通部よりも上部に設けられており、該連通部に、前記気液分離室側から洗浄室に向って下り勾配となるバッフルが設けられていることを特徴とするものである。
請求項2のオゾン洗浄槽は、請求項1において、前記気液分離室に、前記槽体の上端と前記仕切板の上端に跨がる天板が設けられ、該天板にオゾンガスの流出口が設けられていることを特徴とするものである。
The ozone cleaning tank of the present invention (Claim 1) is an ozone cleaning tank that cleans an object to be cleaned with ozone water. The ozone cleaning tank is a gas that separates the tank body and the tank body by receiving ozone water-ozone gas mixed water. a partition plate for partitioning into a liquid separation chamber and the cleaning chamber, provided under the partition plate includes a communicating portion for communicating the the cleaning chamber gas-liquid separating chamber, the side walls of the gas-liquid separation chamber The ozone water-ozone gas mixed water inlet is provided at the upper part of the communication part, and the communication part has a downward slope from the gas-liquid separation chamber side toward the cleaning room. The baffle which becomes is characterized by being provided .
According to a second aspect of the present invention, there is provided an ozone cleaning tank according to the first aspect, wherein the gas-liquid separation chamber is provided with a top plate straddling the upper end of the tank body and the upper end of the partition plate. Is provided.

請求項のオゾン洗浄装置は、請求項1又は2のオゾン洗浄槽と、該槽体に当接又は近接して設けられた、該気液分離室にオゾン水−オゾンガス混合水を供給するための、オゾンガスを水に溶解させてオゾン水−オゾンガス混合水を生成させるオゾン水生成器とを備えてなるものである。 Ozone cleaning apparatus according to claim 3, the ozone cleaning tank according to claim 1 or 2, provided in contact with or proximity to the cistern body, ozone water to the gas-liquid separation chamber - for supplying ozone gas mixed water And an ozone water generator that dissolves ozone gas in water to generate ozone water-ozone gas mixed water.

請求項のオゾン洗浄装置は、請求項において、前記オゾン水生成器はエジェクタであることを特徴とするものである。
請求項5のオゾン洗浄装置は、請求項3又は4において、前記受入口に対し、1000mm以下の短い配管を介して前記オゾン水生成器が接続されていることを特徴とするものである。
請求項6のオゾン洗浄装置は、請求項3又は4において、前記オゾン水生成器のオゾン水−オゾンガス混合水流出口を前記受入口に直結したことを特徴とするものである。
According to a fourth aspect of the present invention, there is provided the ozone cleaning apparatus according to the third aspect , wherein the ozone water generator is an ejector.
The ozone cleaning device according to claim 5 is characterized in that, in claim 3 or 4, the ozone water generator is connected to the receiving port through a short pipe of 1000 mm or less.
The ozone cleaning device of claim 6 is characterized in that, in claim 3 or 4, the ozone water / ozone gas mixed water outlet of the ozone water generator is directly connected to the receiving port.

本発明のオゾン洗浄槽及びオゾン洗浄装置では、オゾン水−オゾンガス混合水が槽体内の気液分離室に導入される。このオゾン水にオゾン気泡が含まれていた場合、このオゾン気泡は該気液分離室内において浮上し、気液分離される。そして、オゾン気泡を含まないようになったオゾン水が連通部から洗浄室へ導入される。従って、洗浄室ではオゾン気泡を全く又は殆ど含まないオゾン水によって被洗浄物が洗浄される。   In the ozone cleaning tank and the ozone cleaning apparatus of the present invention, ozone water-ozone gas mixed water is introduced into the gas-liquid separation chamber in the tank body. When the ozone water contains ozone bubbles, the ozone bubbles rise in the gas-liquid separation chamber and are gas-liquid separated. Then, ozone water that does not contain ozone bubbles is introduced into the cleaning chamber from the communicating portion. Accordingly, the object to be cleaned is cleaned in the cleaning chamber with ozone water that contains no or almost no ozone bubbles.

また、本発明のオゾン洗浄装置では、オゾン水生成器がこの槽体に当接又は近接して設けられている場合、オゾン水生成器で生成したオゾン水が直ちに気液分離室に導入されるようになる。これにより、気液分離されたオゾン水を供給する場合にくらべ、オゾン濃度の高いオゾン水を洗浄室に導入することが可能となる。   Further, in the ozone cleaning device of the present invention, when the ozone water generator is provided in contact with or close to the tank body, the ozone water generated by the ozone water generator is immediately introduced into the gas-liquid separation chamber. It becomes like this. This makes it possible to introduce ozone water having a higher ozone concentration into the cleaning chamber than when supplying ozone water that has been gas-liquid separated.

以下、図面を参照して実施の形態について説明する。   Hereinafter, embodiments will be described with reference to the drawings.

第1図は実施の形態に係るオゾン洗浄槽及びオゾン洗浄装置の縦断面図である。槽体10内が仕切板5によって気液分離室4と洗浄室7とに区画されている。この槽体10及び仕切板5は、耐オゾン性に優れたPFA,PTFEなどの合成樹脂製とされるか合成樹脂被覆されることが望ましい。   FIG. 1 is a longitudinal sectional view of an ozone cleaning tank and an ozone cleaning apparatus according to an embodiment. The inside of the tank body 10 is partitioned into a gas-liquid separation chamber 4 and a cleaning chamber 7 by a partition plate 5. It is desirable that the tank body 10 and the partition plate 5 are made of synthetic resin such as PFA or PTFE excellent in ozone resistance or coated with synthetic resin.

気液分離室4と洗浄室7とは、仕切板5の下部の開口よりなる連通部6によって連通している。この連通部6には、気液分離室4側から洗浄室7側に向って下り勾配となるようにバッフル6aが設けられている。気液分離室4の側壁に設けられたオゾン水の受入口3に対し、好ましくは10000mm以下特に好ましくは1000mm以下の短い配管2を介してオゾン水生成器1が接続されている。この受入口3は連通部6よりも好ましくは100mm以上上位に設けられている。オゾン水生成器1としては不純物混入のおそれが少ないエジェクタが好適であるが、これに限定されない。   The gas-liquid separation chamber 4 and the cleaning chamber 7 are communicated with each other by a communication portion 6 formed by an opening at the bottom of the partition plate 5. The communication part 6 is provided with a baffle 6a so as to have a downward gradient from the gas-liquid separation chamber 4 side toward the cleaning chamber 7 side. The ozone water generator 1 is connected to the ozone water inlet 3 provided on the side wall of the gas-liquid separation chamber 4 through a short pipe 2 that is preferably 10000 mm or less, particularly preferably 1000 mm or less. The receiving port 3 is preferably provided at a position higher than the communicating portion 6 by 100 mm or more. The ozone water generator 1 is preferably an ejector that is less likely to be contaminated with impurities, but is not limited thereto.

気液分離室4には天蓋11が槽体10の上端と仕切板5の上端とに跨がって設けられている。この天蓋11にオゾンガスの流出口12が設けられている。   A canopy 11 is provided in the gas-liquid separation chamber 4 across the upper end of the tank body 10 and the upper end of the partition plate 5. The canopy 11 is provided with an ozone gas outlet 12.

このように構成されたオゾン洗浄装置において、オゾン水生成器1に対し超純水などの水とオゾンガスとが供給され、オゾン水−オゾンガス混合水が生成する。この混合水は、配管2、受入口3を介して気液分離室4に導入され、混合水中の未溶解オゾンガスよりなる気泡が浮上分離される。気液分離室4の水面から離脱したオゾンガスは流出口12から流出し、オゾン水生成器1に再循環されるか、又はオゾン分解触媒等を備えたオゾン分解処理装置へ送られる。   In the ozone cleaning device configured as described above, water such as ultrapure water and ozone gas are supplied to the ozone water generator 1 to generate ozone water-ozone gas mixed water. This mixed water is introduced into the gas-liquid separation chamber 4 through the pipe 2 and the receiving port 3, and bubbles formed of undissolved ozone gas in the mixed water are floated and separated. The ozone gas separated from the water surface of the gas-liquid separation chamber 4 flows out from the outlet 12 and is recirculated to the ozone water generator 1 or sent to an ozone decomposition treatment apparatus equipped with an ozone decomposition catalyst or the like.

気液分離室4内で気液分離されて気泡を含まないようになったオゾン水は、連通部6から洗浄室7に導入される。この洗浄室7内において、シリコンウェハなどの被洗浄物とオゾン水とが接触し、被洗浄物が洗浄される。洗浄排水は、槽体10の側壁上部に設けられたオーバーフロー口8からオーバーフローして排出される。洗浄排水は、処理後、廃棄されてもよく、再利用されてもよい。   The ozone water that has been gas-liquid separated in the gas-liquid separation chamber 4 so as not to contain bubbles is introduced into the cleaning chamber 7 from the communication portion 6. In the cleaning chamber 7, the object to be cleaned such as a silicon wafer comes into contact with ozone water, and the object to be cleaned is cleaned. The washing waste water overflows and is discharged from the overflow port 8 provided in the upper part of the side wall of the tank body 10. The washing waste water may be discarded after the treatment or may be reused.

このオゾン洗浄装置では、オゾン洗浄装置内でオゾン水−オゾンガス混合水の気液分離を行っているので、気液分離されたオゾン水を洗浄装置に供給した場合にくらべ、洗浄室7内のオゾン水のオゾン濃度が高い。また、気液分離室4と洗浄処理用の洗浄室7とが仕切板5を介して隣接配置されている。従って、オゾン気泡を全く又は殆ど含まないオゾン濃度の高いオゾン水が気液分離室4から洗浄室7へ導入され、洗浄室7において効率よくオゾン洗浄が行われる。   In this ozone cleaning apparatus, since the gas-liquid separation of the ozone water-ozone gas mixed water is performed in the ozone cleaning apparatus, the ozone in the cleaning chamber 7 is compared with the case where the ozone water that has been gas-liquid separated is supplied to the cleaning apparatus. The ozone concentration in water is high. Further, a gas-liquid separation chamber 4 and a cleaning chamber 7 for cleaning processing are disposed adjacent to each other with a partition plate 5 interposed therebetween. Accordingly, ozone water having a high ozone concentration that contains no or almost no ozone bubbles is introduced from the gas-liquid separation chamber 4 to the cleaning chamber 7, and ozone cleaning is performed efficiently in the cleaning chamber 7.

この実施の形態では、受入口3が連通部6よりも上部に設けられており、また連通部6に洗浄室7へ向って下り勾配となるバッフル6aが設けられているので、気液分離室4内のオゾン気泡が浮遊して洗浄室7へ流入することも防止される。   In this embodiment, the receiving port 3 is provided above the communication portion 6, and the baffle 6 a that is inclined downward toward the cleaning chamber 7 is provided in the communication portion 6, so that the gas-liquid separation chamber It is also possible to prevent the ozone bubbles in 4 from floating and flowing into the cleaning chamber 7.

なお、気液分離室4内における気液分離を促進させるために、受入口3を上向きに設けるようにしてもよい。   In order to promote gas-liquid separation in the gas-liquid separation chamber 4, the receiving port 3 may be provided upward.

上記実施の形態では、オゾン水生成器1を槽体10と若干離隔させているが、第2図のようにオゾン水生成器1を槽体10に当接させ、オゾン水生成器1の混合水流出口を受入口3に直結してもよい。第2図のその他の構成は第1図と同一である。第2図のオゾン洗浄装置は、第1図と同様の作用効果を奏する。   In the above embodiment, the ozone water generator 1 is slightly separated from the tank body 10, but the ozone water generator 1 is brought into contact with the tank body 10 as shown in FIG. The water outlet may be directly connected to the receiving port 3. The other structure of FIG. 2 is the same as FIG. The ozone cleaning apparatus of FIG. 2 has the same effect as that of FIG.

以下、実施例及び比較例について説明する。   Hereinafter, examples and comparative examples will be described.

[実施例1,2]
第1図及び第2図に示すオゾン洗浄装置において、諸元を次の通りとした。
槽体10の水深:30cm
気液分離室4の容積:10L
洗浄室7の容積:20L
第1図の配管2の長さ:1000mm
[Examples 1 and 2]
In the ozone cleaning apparatus shown in FIGS. 1 and 2, the specifications are as follows.
Water depth of the tank 10: 30 cm
Volume of gas-liquid separation chamber 4: 10L
Volume of cleaning chamber 7: 20L
Length of pipe 2 in FIG. 1: 1000 mm

この気液分離室4に対し、オゾン水生成器1からオゾン水−オゾンガス混合水を供給し、洗浄室7内のオゾン濃度を測定したところ、いずれも約25mg/Lであった。   When ozone water-ozone gas mixed water was supplied from the ozone water generator 1 to the gas-liquid separation chamber 4 and the ozone concentration in the cleaning chamber 7 was measured, both were about 25 mg / L.

[比較例1,2]
エジェクターを用いて、オゾン水−オゾンガス混合水を生成したのち、気液分離器によって気液分離し、この気液分離後のオゾン水(オゾン濃度25mg/L)を管長1000mm(比較例1)又は3000mm(比較例2)の配管によって洗浄室7に導入した。その結果、洗浄室7内のオゾン濃度は次の通りとなった。
[Comparative Examples 1 and 2]
After generating ozone water-ozone gas mixed water using an ejector, gas-liquid separation is performed by a gas-liquid separator, and ozone water (ozone concentration 25 mg / L) after the gas-liquid separation is 1000 mm in tube length (Comparative Example 1) or It was introduced into the cleaning chamber 7 through a 3000 mm pipe (Comparative Example 2). As a result, the ozone concentration in the cleaning chamber 7 was as follows.

比較例1:22mg/L
比較例2:15mg/L
Comparative Example 1: 22 mg / L
Comparative Example 2: 15 mg / L

以上の実施例及び比較例からも明らかな通り、本発明によると洗浄室内のオゾン濃度を高くすることができる。   As is clear from the above examples and comparative examples, according to the present invention, the ozone concentration in the cleaning chamber can be increased.

実施の形態に係るオゾン洗浄装置の断面図である。It is sectional drawing of the ozone cleaning apparatus which concerns on embodiment. 別の実施の形態に係るオゾン洗浄装置の断面図である。It is sectional drawing of the ozone cleaning apparatus which concerns on another embodiment.

符号の説明Explanation of symbols

1 オゾン水生成器
2 配管
3 受入口
4 気液分離室
5 仕切板
6 連通部
7 洗浄室
10 槽体
11 天蓋
12 オゾンガス流出口
DESCRIPTION OF SYMBOLS 1 Ozone water generator 2 Piping 3 Inlet 4 Gas-liquid separation room 5 Partition plate 6 Communication part 7 Washing room 10 Tank 11 Canopy 12 Ozone gas outlet

Claims (6)

オゾン水によって被洗浄物を洗浄するオゾン洗浄槽において、
槽体と、
該槽体内を、オゾン水−オゾンガス混合水を受け入れて気液分離する気液分離室と洗浄室とに区画する仕切板と、
該仕切板の下部に設けられた、該気液分離室と洗浄室とを連通する連通部と、
を備え
該気液分離室の側壁に前記オゾン水−オゾンガス混合水の受入口が設けられ、
該受入口が前記連通部よりも上部に設けられており、
該連通部に、前記気液分離室側から洗浄室に向って下り勾配となるバッフルが設けられていることを特徴とするオゾン洗浄槽。
In an ozone cleaning tank that cleans an object to be cleaned with ozone water,
Tank body,
A partition plate that divides the tank body into a gas-liquid separation chamber and a cleaning chamber for receiving a mixture of ozone water and ozone gas and separating the gas and liquid;
A communication portion provided at a lower portion of the partition plate, which communicates the gas-liquid separation chamber and the cleaning chamber;
Equipped with a,
A receiving port for the ozone water-ozone gas mixed water is provided on a side wall of the gas-liquid separation chamber,
The receiving port is provided above the communicating portion;
An ozone cleaning tank , wherein the communication part is provided with a baffle having a downward slope from the gas-liquid separation chamber side toward the cleaning chamber.
請求項1において、前記気液分離室に、前記槽体の上端と前記仕切板の上端に跨がる天板が設けられ、該天板にオゾンガスの流出口が設けられていることを特徴とするオゾン洗浄槽。2. The gas-liquid separation chamber according to claim 1, wherein a top plate is provided across the upper end of the tank body and the upper end of the partition plate, and an ozone gas outlet is provided on the top plate. Ozone cleaning tank. 請求項1又は2のオゾン洗浄槽と、
該槽体に当接又は近接して設けられた、該気液分離室にオゾン水−オゾンガス混合水を供給するための、オゾンガスを水に溶解させてオゾン水−オゾンガス混合水を生成させるオゾン水生成器と
を備えてなるオゾン洗浄装置。
The ozone cleaning tank according to claim 1 or 2 ,
Ozone water for generating ozone water-ozone gas mixed water by dissolving ozone gas in water for supplying ozone water-ozone gas mixed water to the gas-liquid separation chamber provided in contact with or close to the tank body An ozone cleaning device comprising a generator.
請求項において、前記オゾン水生成器はエジェクタであることを特徴とするオゾン洗浄装置。 4. The ozone cleaning apparatus according to claim 3 , wherein the ozone water generator is an ejector. 請求項3又は4において、前記受入口に対し、1000mm以下の短い配管を介して前記オゾン水生成器が接続されていることを特徴とするオゾン洗浄装置。5. The ozone cleaning apparatus according to claim 3, wherein the ozone water generator is connected to the receiving port through a short pipe of 1000 mm or less. 請求項3又は4において、前記オゾン水生成器のオゾン水−オゾンガス混合水流出口を前記受入口に直結したことを特徴とするオゾン洗浄装置。The ozone cleaning apparatus according to claim 3 or 4, wherein an ozone water-ozone gas mixed water outlet of the ozone water generator is directly connected to the inlet.
JP2008211907A 2008-08-20 2008-08-20 Ozone cleaning tank and ozone cleaning device Expired - Fee Related JP5282481B2 (en)

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JP2001314740A (en) * 2000-05-12 2001-11-13 Kurita Water Ind Ltd Gas dissolved washing water supply apparatus
JP2002052301A (en) * 2000-08-10 2002-02-19 Max Co Ltd Ozone water producer
JP2004031852A (en) * 2002-06-28 2004-01-29 Sony Corp Device for processing substrate and method therefor
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