JP2001314740A - Gas dissolved washing water supply apparatus - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a gas dissolved washing water supply apparatus with enables successively supplying plural kinds of gas dissolved washing water by using a simple apparatus of one series and corresponding to a one-bath type washer or a leaf type washer. SOLUTION: This gas dissolving washing water supply apparatus is provided with a gas dissolving part which is composed of one of plural gas dissolvers 1 of mixing type which directly mixes gas and pure water and dissolves the gas, a pure water supply piping 2 which supplies pure water to the gas dissolving part, a gas supply means which supplies plural kinds of gas to the gas dissolving part, a supplying pipe 6 which sends out the gas dissolved washing water into the gas dissolving part and a gas-liquid separator 7 which is disposed on the supplying pipe.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas-dissolved cleaning water supply apparatus. More specifically, the present invention provides a simple
The present invention relates to a gas-dissolved cleaning water supply device that can sequentially supply a plurality of types of gas-dissolved cleaning water by using a series device, and can correspond to a one-bath type washing machine or a single-wafer type washing machine.

[0002]

2. Description of the Related Art Removal of fine particles, organic substances, metals, and the like from the surface of electronic materials such as silicon substrates for semiconductors, glass substrates for liquid crystals, and quartz substrates for photomasks is necessary to ensure product quality and yield. Very important. For this purpose, a cleaning technique using a high-concentration chemical solution represented by RCA cleaning has conventionally been applied. For such cleaning, a mixed solution of ammonia and hydrogen peroxide solution (AP
M), a mixture of sulfuric acid and aqueous hydrogen peroxide (SPM), a mixture of hydrochloric acid and aqueous hydrogen peroxide (HPM), and the like. In recent years, the prior art, which requires a high-concentration chemical solution and a large amount of rinsing water for rinsing it, has been problematic in terms of both environmental load and treatment cost, and drastic improvement measures have been required. Have been. On the other hand, it has been found that by dissolving a specific gas in ultrapure water, pure water, or the like, so-called functional water, which is extremely effective in removing foreign substances on the object to be cleaned, can be obtained. In particular, it has been clarified that cleaning water in which hydrogen gas, oxygen gas, rare gas, and the like are dissolved is effective in removing fine particles, and cleaning water in which ozone gas is dissolved is useful in removing organic substances and metals. In addition, these gas-dissolved waters prevent natural oxidation of the object to be cleaned,
It has also been found to have a function of accelerating the rinsing of the chemical solution and of actively oxidizing the surface. In order to utilize these series of development results in actual cleaning and surface treatment processes, various gas-dissolving functional water producing apparatuses have been invented and put into practical use. Combining highly oxidizing ozone-dissolved water with hydrogen gas-dissolved water, oxygen gas-dissolved water, and rare gas-dissolved water that are effective in removing fine particles to remove multiple types of foreign matter from the surface of electronic materials Can be. To this end, a supply line for ozone-dissolved water and a supply line for hydrogen-gas-dissolved water, oxygen-gas-dissolved water or rare-gas-dissolved water are connected to one cleaning system. In a conventional mainstream technique of cleaning using a multi-layer wet station, ozone-dissolved water, hydrogen gas-dissolved water, oxygen gas-dissolved water, or rare gas-dissolved water may be required at the same time. However, in a one-bath type washing machine and a single-wafer type washing machine that have rapidly spread in recent years, the supply of a plurality of washing waters is performed step by step, and they are not used simultaneously. For this reason, for example, during the time when the ozone-dissolved water is used, the hydrogen-gas-dissolved water, the oxygen-gas-dissolved water, or the rare-gas-dissolved water are in a standby state. Conventionally, the production of gas-dissolved water is mainly performed by a gas dissolver having a gas-permeable membrane. However, in the permeable membrane gas dissolver, when the gas supply is started and stopped, the response of the rise and fall of the dissolved gas concentration is poor, and it is necessary to sequentially produce different gas dissolved water and supply it as cleaning water. However, there is a problem in that the switching takes time. For this,
There is a need for a gas-dissolved cleaning water supply apparatus that can smoothly switch a plurality of types of gas-dissolved cleaning water and that can wash electronic materials and the like with a plurality of types of gas-dissolved cleaning water using a simple one-line apparatus. I was

[0003]

SUMMARY OF THE INVENTION The present invention is capable of sequentially supplying a plurality of types of gas-dissolved cleaning water by using a simple one-line apparatus, and is applicable to a one-bath cleaning machine and a single-wafer cleaning machine. It is intended to provide a gas-dissolved cleaning water supply device that can perform the cleaning.

[0004]

The inventor of the present invention has conducted intensive studies to solve the above-mentioned problems. As a result, when the water to be dissolved is directly mixed with the gas, the concentration change of the gas-dissolved water is smaller than that in the dissolved film system. The gas-liquid separator removes undissolved gas and provides gas-free washing water that does not contain air bubbles even if a gas that is higher than the saturated dissolution amount is supplied. By supplying and dissolving sequentially different gases to the gas dissolving unit equipped with a gas dissolving unit, it is possible to wash electronic materials and the like by sequentially using a plurality of types of gas dissolving washing water. The present invention has been completed. That is, the present invention provides (1) a gas dissolving unit composed of one or a plurality of mixed gas dissolving units for directly mixing a gas and pure water to dissolve the gas, and a pure gas for supplying pure water to the gas dissolving unit. A water supply pipe, a gas supply means for supplying a plurality of types of gases to the gas dissolving unit, a feed pipe for sending out gas-dissolved washing water in which the gas is dissolved in the gas dissolving section, and a gas-liquid separator provided in the feed pipe. A gas dissolving cleaning water supply device, characterized by having
(2) The gas dissolving cleaning water supply device according to (1), wherein the gas dissolving unit is constituted by one mixed gas dissolving unit, and a plurality of types of gases are supplied to the gas dissolving unit. Wherein the gas dissolving water supply device according to claim 1, wherein a plurality of mixed gas dissolving devices are provided, and a different gas is supplied to each gas dissolving device. 4. The gas-dissolved cleaning water supply device according to claim 3, wherein the pure water flow is provided in series, and (5) a plurality of mixed gas dissolvers are provided so that the pure water flows in parallel. The third provided in
And (6) a gas-dissolved cleaning water supply apparatus according to any one of (1), (2), (3) and (3), wherein one of a plurality of gases can be selectively supplied to a gas dissolving unit. Item 4. An apparatus for supplying gas-dissolved cleaning water according to Item 4 or 5.

[0005]

BEST MODE FOR CARRYING OUT THE INVENTION A gas dissolving cleaning water supply apparatus according to the present invention comprises a gas dissolving unit comprising one or more mixed gas dissolving units for directly mixing a gas and pure water to dissolve the gas. A pure water supply pipe for supplying pure water to the dissolving section, gas supply means for supplying a plurality of gases to the gas dissolving section, a supply pipe for supplying gas-dissolved washing water in which the gas is dissolved in the gas dissolving section, and a supply pipe It is a device having a gas-liquid separator provided in. FIG.
It is a process system diagram of one mode of the gas dissolving cleaning water supply device of the present invention. In the apparatus of this embodiment, the gas dissolving section is constituted by one mixed gas dissolving device, and two kinds of gases are supplied to the gas dissolving device. The apparatus of this aspect is used in a cleaning step of cleaning an object to be cleaned using ozone-dissolved water and hydrogen gas-dissolved water.
In the apparatus of the present embodiment, pure water is supplied through a pure water supply pipe 2 to a gas dissolving section including a mixed gas dissolver 1 that directly mixes gas and pure water to dissolve the gas. Also,
An ozone generator 3 and a hydrogen gas source are provided as gas supply means for supplying ozone gas and hydrogen gas to the gas dissolver, and ozone gas and hydrogen gas are supplied to the gas dissolver through valves 4 and 5, respectively. The gas-dissolved washing water obtained by dissolving ozone gas or hydrogen gas in the gas dissolver is supplied to the feed pipe 6.
The undissolved gas mixed in the gas-dissolved cleaning water is separated in the gas-liquid separator 7 provided in the feed pipe. The gas-dissolved washing water from which the undissolved gas has been separated and removed is sent to the washing machine 8 and used for washing. When cleaning an electronic material using the apparatus of the present embodiment, first, ozone gas is supplied to a gas dissolving section to prepare ozone-dissolved water, and in a cleaning machine, oxidative decomposition of organic substances and metals attached to the electronic material is performed. And remove. Next, the gas supplied to the gas dissolving unit is changed from ozone gas to hydrogen gas to prepare hydrogen gas dissolving water, and fine particles attached to the electronic material are removed in the washing machine. Furthermore, when the supply of hydrogen gas to the gas dissolving unit is stopped when the cleaning with the hydrogen gas dissolving water is completed, the water sent from the gas dissolving unit becomes pure water. , The rinsing of the electronic material can be completed. The gas-dissolved cleaning water supply apparatus of the present embodiment can supply a larger number of gases to one mixed gas dissolver. For example, a plurality of gas conduits connected to a plurality of gas supply sources can be gas-dissolved. By connecting to a gas supply pipe connected to the vessel and opening or closing a valve provided in each gas conduit, or starting or stopping a gas generation source, one of the gases to be dissolved can be selected and supplied to the dissolver. it can.

There is no particular limitation on the mixed gas dissolver for directly dissolving the gas by directly mixing the gas and pure water used in the apparatus of the present invention. A gas dissolving pump having a function can be used. Ejector and gas dissolution pump
Since it is not necessary to pressurize the gas to be supplied, it can be suitably used. When one kind of gas to be dissolved is ozone gas, the ejector can be particularly preferably used because the ejector can be easily formed using a member having a simple device and excellent in ozone resistance. The gas dissolving pump to be used is not particularly limited, but a vortex pump having a large effect of forming ultrafine bubbles of a liquid emulsion to promote the dissolution of gas can be preferably used. Since the ejector and the gas dissolving pump do not have a space serving as a buffer when the gas is dissolved in pure water, the concentration of the dissolved gas quickly responds to the supply state of the gas. When an ejector is used as a gas dissolver, it is preferable to provide a booster pump or the like on the upstream side to pressurize pure water. When pressurizing pure water using a booster pump or the like, it is preferable to attach a filtration device equipped with an ultrafiltration membrane, a microfiltration membrane, etc., between the pump and the ejector to remove dust from the pump. . When a gas dissolving pump is used, it is preferable to provide a filtration device provided with an ultrafiltration membrane, a microfiltration membrane, or the like on the downstream side to remove dust from the pump.

[0007] The apparatus of the present invention uses a mixed gas dissolver for dissolving a gas by directly mixing a gas and pure water in a gas dissolving section. And a plurality of types of gas-dissolved washing water can be sequentially supplied to the washing machine by using a series of gas-dissolved washing water supply pipes. FIG. 2 is a graph showing the response of dissolved ozone concentration in the production of ozone-dissolved water using an ejector and the production of ozone-dissolved water using a dissolution membrane module. In this figure, the solid line shows the case where an ejector is used, and the dotted line shows the case where a dissolved membrane module is used. The same amount of ultrapure water was supplied to the ejector and the dissolved film module, and the same amount of the ozone-containing gas was supplied for 20 minutes. When the ejector is used, the dissolved ozone concentration of the ozone-dissolved water reaches a steady state value within one minute after the supply of the ozone-containing gas is started, and becomes almost zero within one minute after the supply of the ozone-containing gas is stopped. The response of the dissolved ozone concentration to the gas supply state is rapid. On the other hand, when the dissolved membrane module is used, it takes about 15 minutes from the start of the supply of the ozone-containing gas for the dissolved ozone concentration to reach the steady state value, and the dissolved ozone concentration becomes almost zero. It takes about 15 minutes after the supply of the ozone-containing gas is stopped. In addition, when the same amount of ultrapure water and ozone-containing gas are supplied, the use of an ejector has a higher concentration of dissolved ozone in a steady state by 10% or more than the case of using a dissolved film module, and the supplied ozone gas Used effectively.

FIG. 3 is a process flow diagram of another embodiment of the gas-dissolved cleaning water supply apparatus of the present invention. In the apparatus of this aspect, the gas dissolving unit is composed of two mixed gas dissolvers, and the two mixed gas dissolvers are provided so that the flows of pure water are in series. Are supplied with different gases. The apparatus of this embodiment is also used in a cleaning step of cleaning an object to be cleaned using ozone-dissolved water and hydrogen gas-dissolved water. In the gas dissolving section of the apparatus of this embodiment, two mixed gas dissolvers 9 and 10 for directly mixing a gas and pure water to dissolve the gas are provided in series. Pure water is supplied to the gas dissolving section through a pure water supply pipe 11. Further, as gas supply means for supplying ozone gas and hydrogen gas to the gas dissolver,
An ozone generator 12 and a hydrogen gas source are provided, and the ozone gas is supplied to the mixed gas dissolver 9 via a valve 13,
Hydrogen gas is supplied to the mixed gas dissolver 10 via the valve 14. The gas-dissolved cleaning water in which the ozone gas or the hydrogen gas is dissolved in the gas dissolving section is sent out to the feed pipe 15, and in the gas-liquid separator 16 provided in the feed pipe, undissolved gas mixed in the gas-dissolved wash water is removed. Separated. The gas-dissolved cleaning water from which the undissolved gas has been separated and removed is sent to the cleaning machine 17,
Used for cleaning. In the case of cleaning the electronic material using the apparatus of this embodiment, similarly to the case of cleaning the electronic material using the apparatus of the embodiment shown in FIG. 1, while sequentially switching between ozone-dissolved water, hydrogen gas-dissolved water and pure water. It can supply and complete from washing of electronic material to rinsing.

FIG. 4 is a process flow diagram of another embodiment of the gas-dissolved cleaning water supply apparatus of the present invention. In the apparatus of this aspect, the gas dissolving unit is composed of two mixed gas dissolvers, and the two mixed gas dissolvers are provided so that the flows of pure water are parallel to each other. Are supplied with different gases. The apparatus of this embodiment is also used in a cleaning step of cleaning an object to be cleaned using ozone-dissolved water and hydrogen gas-dissolved water. In the gas dissolving section of the apparatus of this embodiment, two mixed gas dissolvers 18 and 19 for directly dissolving the gas by directly mixing the gas and the pure water are provided. Pure water is supplied to the gas dissolving section through a pure water supply pipe 20. An ozone generator 21 and a hydrogen gas source are provided as gas supply means for supplying ozone gas and hydrogen gas to the gas dissolver. When the ozone-dissolved water is prepared, pure water is supplied to the mixed gas dissolver 18 via the valve 22, and ozone gas is supplied via the valve 23. When hydrogen gas-dissolved water is prepared, pure water is supplied to the mixed gas dissolver 19 via a valve 24, and hydrogen gas is supplied via a valve 25. The gas-dissolved cleaning water in which the ozone gas or the hydrogen gas is dissolved in the gas dissolving section is sent to the feed pipe 26, and in the gas-liquid separator 27 provided in the feed pipe, undissolved gas mixed in the gas-dissolved wash water is removed. Separated. In addition, when using it on the conditions which melt | dissolve all supplied gas, a gas-liquid separator can be omitted. Further, the position of the gas-liquid separator may be provided on a gas-dissolved water delivery pipe from each gas-dissolving section corresponding to each gas-dissolving section. The gas-dissolved cleaning water from which the undissolved gas has been separated and removed is sent to the cleaning machine 28 and used for cleaning. When the electronic material is cleaned using the apparatus of the present embodiment, similarly to the case of cleaning the electronic material using the apparatus of the embodiment shown in FIG. 1 or FIG. Supply is performed while switching sequentially, so that the steps from cleaning to rinsing of the electronic material can be completed. FIG.
Alternatively, the gas-dissolved cleaning water supply apparatus of the embodiment shown in FIG. 4 is provided with a plurality of mixed gas dissolvers and gas conduits connected to each gas dissolver so that a large number of gases can be supplied. One of the gases to be dissolved can be selected and supplied to the dissolver by opening and closing the provided valve or by starting and stopping the gas generating source.

In FIGS. 1, 3 and 4, the embodiments using ozone gas and hydrogen gas as the gas have been described, but the apparatus of the present invention can be used for supplying various types of gas-dissolved cleaning water. As a gas for producing the gas-dissolved cleaning water, for example, ozone gas, oxygen gas, hydrogen gas,
Noble gases and the like can be given. Examples of the gas used as the pH adjuster include a carbon dioxide gas, an ammonia gas, and a hydrogen chloride gas. The gas serving as the main component of the gas-dissolved cleaning water is dissolved in a predetermined order in accordance with the cleaning process of the object to be cleaned. The gas for the pH adjuster can be dissolved in each of the mixed gas dissolvers simultaneously with the gas that is the main component of the gas-dissolved cleaning water. As in the embodiment shown in FIG. 1, the gas dissolving unit is composed of one mixed gas dissolving unit, and when the ozone gas is dissolved here, the gas dissolving unit and the entire downstream pipe are made of a material having ozone resistance. It is preferable to configure As in the embodiment shown in FIG. 3, when the gas dissolving section is composed of a plurality of mixed-type gas dissolving units and is provided in series, hydrogen gas, oxygen gas, rare gas, etc. are provided upstream of the ozone gas dissolving unit. By providing the dissolver of the above, a member having no ozone resistance can be used up to the dissolver for hydrogen gas, oxygen gas, rare gas or the like. There is no particular limitation on the gas supply source used in the apparatus of the present invention, and it can be appropriately selected according to the characteristics of the dissolved gas. When the gas is ozone gas, for example,
An ozone generator that generates ozone gas by electrolysis using pure water as a raw material and an ozone generator that generates ozone gas by silent discharge, surface discharge, or the like using oxygen gas or air as a raw material can be given. If the gas is oxygen gas, liquid oxygen can be used.If the gas is hydrogen gas or rare gas, use a cylinder filled with these gases, or connect a pipe to the utility gas line of the factory. can do. Hydrogen gas or oxygen gas may be generated by electrolysis using pure water as a raw material.

In the apparatus according to the present invention, an automatic valve is provided in a gas pipe connected to the gas supply means to control a gas flow direction in accordance with a signal from a cleaning machine, or to open / close or open / finely open. / Close control. The gas-dissolved cleaning water supply apparatus of the present invention is provided with a deaeration unit at the preceding stage, and can deaerate pure water supplied to the gas dissolution unit. By degassing the pure water to be supplied to the gas dissolving section and making a space in the gas dissolving capacity of the pure water, the desired gas can be efficiently dissolved in the pure water. In addition, in the device of the present invention, a chemical injection mechanism can be provided upstream or downstream of the gas dissolving section to inject a chemical such as a pH adjuster. In the device of the present invention, a gas processing device can be connected to the gas phase of the gas-liquid separator. By connecting the gas processing device to the gas phase of the gas-liquid separator, even if the gas is a harmful gas, the gas can be detoxified in the gas processing device and then exhausted to the atmosphere. For example, when the gas is ozone gas, as a gas treatment device, a container filled with an ozone decomposition catalyst, activated carbon, an inert carrier kneaded with activated carbon, or the like, or a wavelength of 185 n having a function of decomposing ozone.
For example, a device that irradiates ultraviolet rays of m may be used.
In the apparatus of the present invention, by using ozone gas or oxygen gas and carbon dioxide gas simultaneously to prepare ozone-dissolved water or oxygen-gas-dissolved water whose pH has been adjusted to an acidic side, organic substances adhering to the surface of electronic materials and the like can be reduced. Molecularization, or
Metals can be ionized and removed. In the device of the present invention, hydrogen gas, oxygen gas or rare gas and ammonia gas are simultaneously used to prepare hydrogen gas-dissolved water, oxygen gas-dissolved water or rare gas-dissolved water whose pH has been adjusted to an alkaline side. Fine particles attached to the surface of a material or the like can be effectively removed. In the apparatus of the present invention, when sequentially cleaning with different gas-dissolved cleaning water,
A rinsing step using pure water can be provided next to the cleaning step using each gas-dissolved cleaning water. During the rinsing step with pure water, no gas is supplied to any of the gas dissolvers.

Using the gas-dissolved cleaning water supply apparatus of the present invention, washing with acid-added ozone-dissolved water (first step), washing with alkali-added hydrogen gas-dissolved water (second step), washing with chemical-free hydrogen gas-dissolved water ( When continuously performing the third step) and the ultrapure water rinsing (fourth step), the following operation is performed. That is,
Through the first to fourth steps, ultrapure water is continuously supplied to the gas dissolving section. In the first step, the ozone generator is operated to introduce ozone gas into the gas dissolving section, and the hydrogen gas introduction is closed. Further, carbon dioxide gas is dissolved in ultrapure water before or after dissolving ozone gas or mixed with ozone gas, or adjusted to a predetermined pH by injecting a chemical such as hydrochloric acid. In the second step, hydrogen gas is introduced into the gas dissolving section, the ozone generator is operated or stopped, and when the ozone generator is operated, the ozone gas is exhausted as it is or through a detoxification device. The ammonia gas is dissolved in ultrapure water before or after dissolving the hydrogen gas or mixed with the hydrogen gas, or adjusted to a predetermined pH by injecting a chemical such as ammonia water. In the third step, only the supply of the ammonia gas or the injection of the chemical such as aqueous ammonia is stopped from the second step. In the fourth step, only the hydrogen gas introduction from the third step is closed. Through a series of these operations, the washing water and the rinsing water for the three condyles required in the washing machine can be supplied from one water supply pipe. conventionally,
Ozone-dissolved water is produced and supplied in a line dedicated to ozone-dissolved water, and hydrogen gas-dissolved water, oxygen gas-dissolved water, and rare gas-dissolved water are also produced and supplied in dedicated lines.
The reason for this is that in many cases, a dedicated dissolving membrane module is used. In order to dissolve ozone gas, a gas dissolving part composed of a material with excellent ozone resistance is necessary, and it is clear that the dissolving part of hydrogen gas, oxygen gas, rare gas, etc. that does not require such resistance Was divided into In addition, since the dissolved membrane module has a slow response to switching of the gas type, it has been difficult to sequentially produce a plurality of types of gas-dissolved cleaning water using a single dissolved membrane module. ADVANTAGE OF THE INVENTION According to the gas dissolution washing water supply apparatus of this invention, it is possible to sequentially supply a plurality of types of gas dissolution washing water using a simple one-line apparatus, and it is compatible with a one-bath washing machine and a single wafer washing machine. can do.

[0013]

According to the gas-dissolved cleaning water supply apparatus of the present invention, a plurality of types of gas-dissolved cleaning water supply pipes can be used in common, and a dedicated pipe for each gas type is not required, thereby greatly simplifying the apparatus. it can.

[Brief description of the drawings]

FIG. 1 is a process system diagram of one embodiment of a gas-dissolved cleaning water supply apparatus of the present invention.

FIG. 2 is a graph showing the response of dissolved ozone concentration.

FIG. 3 is a process flow diagram of another embodiment of the gas-dissolved cleaning water supply device of the present invention.

FIG. 4 is a process flow chart of another embodiment of the gas-dissolved cleaning water supply apparatus of the present invention.

[Explanation of symbols]

 REFERENCE SIGNS LIST 1 mixed-type gas dissolver 2 pure water supply pipe 3 ozone generator 4 valve 5 valve 6 feed pipe 7 gas-liquid separator 8 washing machine 9 mixed-type gas dissolver 10 mixed-type gas dissolver 11 pure water supply pipe 12 ozone Generator 13 Valve 14 Valve 15 Feed Pipe 16 Gas-Liquid Separator 17 Washer 18 Mixed Gas Dissolver 19 Mixed Gas Dissolver 20 Pure Water Supply Pipe 21 Ozone Generator 22 Valve 23 Valve 24 Valve 25 Valve 26 Delivery Pipe 27 Gas-liquid separator 28 Washer

Claims (6)

[Claims] A gas dissolving unit comprising one or more mixed gas dissolving units for directly mixing a gas and pure water to dissolve the gas; a pure water supply pipe for supplying pure water to the gas dissolving unit; Gas supply means for supplying a plurality of types of gases to the gas dissolving unit, a feed pipe for sending out gas-dissolved cleaning water in which the gas is dissolved in the gas dissolving section, and a gas-liquid separator provided on the feed pipe are provided. Gas dissolving cleaning water supply device. 2. The gas dissolution cleaning water supply device according to claim 1, wherein the gas dissolution unit is constituted by one mixed gas dissolution device, and a plurality of types of gases are supplied to the gas dissolution device. 3. The gas dissolving water supply apparatus according to claim 1, wherein the gas dissolving section comprises a plurality of mixed gas dissolving devices, and different gases are supplied to each gas dissolving device. 4. The gas-dissolved cleaning water supply apparatus according to claim 3, wherein a plurality of mixed-type gas dissolvers are provided so that the flow of pure water is serial. 5. The gas-dissolved cleaning water supply apparatus according to claim 3, wherein a plurality of mixed-type gas dissolvers are provided so that the flows of pure water are parallel. 6. The gas dissolving device according to claim 1, wherein one of a plurality of types of gas can be selectively supplied to the gas dissolving section. Cleaning water supply device.