JP5281989B2 - パターン転写装置及びパターン形成方法 - Google Patents

パターン転写装置及びパターン形成方法 Download PDF

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JP5281989B2
JP5281989B2 JP2009195656A JP2009195656A JP5281989B2 JP 5281989 B2 JP5281989 B2 JP 5281989B2 JP 2009195656 A JP2009195656 A JP 2009195656A JP 2009195656 A JP2009195656 A JP 2009195656A JP 5281989 B2 JP5281989 B2 JP 5281989B2
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liquid
substrate
pattern
stamp
contact
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JP2011049302A5 (enrdf_load_stackoverflow
JP2011049302A (ja
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裕司 又木
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Fujifilm Corp
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Fujifilm Corp
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JP2009195656A 2009-08-26 2009-08-26 パターン転写装置及びパターン形成方法 Expired - Fee Related JP5281989B2 (ja)

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JP2009195656A JP5281989B2 (ja) 2009-08-26 2009-08-26 パターン転写装置及びパターン形成方法

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JP2009195656A JP5281989B2 (ja) 2009-08-26 2009-08-26 パターン転写装置及びパターン形成方法

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JP2011049302A JP2011049302A (ja) 2011-03-10
JP2011049302A5 JP2011049302A5 (enrdf_load_stackoverflow) 2012-03-08
JP5281989B2 true JP5281989B2 (ja) 2013-09-04

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5283647B2 (ja) * 2010-03-03 2013-09-04 富士フイルム株式会社 パターン転写方法及びパターン転写装置
JP5460541B2 (ja) * 2010-03-30 2014-04-02 富士フイルム株式会社 ナノインプリント方法、液滴配置パターン作成方法および基板の加工方法
JP6300459B2 (ja) * 2013-07-12 2018-03-28 キヤノン株式会社 インプリント装置およびインプリント方法、それを用いた物品の製造方法
KR102731996B1 (ko) * 2021-11-11 2024-11-20 한국기계연구원 각도 조정 및 정렬 기능을 갖는 임프린트 장치 및 임프린트 방법

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6929762B2 (en) * 2002-11-13 2005-08-16 Molecular Imprints, Inc. Method of reducing pattern distortions during imprint lithography processes
JP2007516862A (ja) * 2003-11-12 2007-06-28 モレキュラー・インプリンツ・インコーポレーテッド 高速充填とスループットを実現するための分配の幾何学的配置および導電性テンプレート
JP4819577B2 (ja) * 2006-05-31 2011-11-24 キヤノン株式会社 パターン転写方法およびパターン転写装置
CN101583436B (zh) * 2007-01-16 2014-05-07 皇家飞利浦电子股份有限公司 用于挠性板件和基板接触的方法和系统

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