JP5237542B2 - 酸化セリウム系研摩材 - Google Patents
酸化セリウム系研摩材 Download PDFInfo
- Publication number
- JP5237542B2 JP5237542B2 JP2006271802A JP2006271802A JP5237542B2 JP 5237542 B2 JP5237542 B2 JP 5237542B2 JP 2006271802 A JP2006271802 A JP 2006271802A JP 2006271802 A JP2006271802 A JP 2006271802A JP 5237542 B2 JP5237542 B2 JP 5237542B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- abrasive
- cerium oxide
- less
- mass
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 229910000420 cerium oxide Inorganic materials 0.000 title claims description 38
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 title claims description 38
- 238000005498 polishing Methods 0.000 claims description 84
- 239000002245 particle Substances 0.000 claims description 42
- 238000000034 method Methods 0.000 claims description 39
- 238000005259 measurement Methods 0.000 claims description 23
- 239000000463 material Substances 0.000 claims description 14
- 238000009826 distribution Methods 0.000 claims description 9
- 239000011737 fluorine Substances 0.000 claims description 6
- 229910052731 fluorine Inorganic materials 0.000 claims description 6
- 238000004438 BET method Methods 0.000 claims description 4
- 238000002441 X-ray diffraction Methods 0.000 claims description 4
- 238000010079 rubber tapping Methods 0.000 claims description 3
- PXGOKWXKJXAPGV-UHFFFAOYSA-N Fluorine Chemical compound FF PXGOKWXKJXAPGV-UHFFFAOYSA-N 0.000 claims 1
- 239000002994 raw material Substances 0.000 description 37
- 239000010419 fine particle Substances 0.000 description 24
- 239000011362 coarse particle Substances 0.000 description 21
- 239000002002 slurry Substances 0.000 description 21
- 239000011521 glass Substances 0.000 description 20
- 238000004519 manufacturing process Methods 0.000 description 14
- 238000010298 pulverizing process Methods 0.000 description 14
- 238000004062 sedimentation Methods 0.000 description 12
- 230000000052 comparative effect Effects 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 239000000725 suspension Substances 0.000 description 10
- GHLITDDQOMIBFS-UHFFFAOYSA-H cerium(3+);tricarbonate Chemical compound [Ce+3].[Ce+3].[O-]C([O-])=O.[O-]C([O-])=O.[O-]C([O-])=O GHLITDDQOMIBFS-UHFFFAOYSA-H 0.000 description 9
- 239000000047 product Substances 0.000 description 8
- 239000000523 sample Substances 0.000 description 8
- 238000000926 separation method Methods 0.000 description 8
- 239000000758 substrate Substances 0.000 description 8
- 229910052684 Cerium Inorganic materials 0.000 description 7
- GWXLDORMOJMVQZ-UHFFFAOYSA-N cerium Chemical compound [Ce] GWXLDORMOJMVQZ-UHFFFAOYSA-N 0.000 description 7
- 229910021193 La 2 O 3 Inorganic materials 0.000 description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- 239000003082 abrasive agent Substances 0.000 description 6
- 238000011156 evaluation Methods 0.000 description 6
- 239000000203 mixture Substances 0.000 description 6
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 5
- 239000002609 medium Substances 0.000 description 5
- 238000002156 mixing Methods 0.000 description 5
- 230000003746 surface roughness Effects 0.000 description 5
- 229910017493 Nd 2 O 3 Inorganic materials 0.000 description 4
- 238000005299 abrasion Methods 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 description 4
- 235000019982 sodium hexametaphosphate Nutrition 0.000 description 4
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 4
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 3
- 235000010724 Wisteria floribunda Nutrition 0.000 description 3
- 239000011324 bead Substances 0.000 description 3
- SBLDRQWVOSCPAD-UHFFFAOYSA-K cerium(3+);carbonate;hydroxide Chemical compound [OH-].[Ce+3].[O-]C([O-])=O SBLDRQWVOSCPAD-UHFFFAOYSA-K 0.000 description 3
- 238000001035 drying Methods 0.000 description 3
- 238000000605 extraction Methods 0.000 description 3
- 238000001914 filtration Methods 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000000227 grinding Methods 0.000 description 3
- 238000007561 laser diffraction method Methods 0.000 description 3
- 238000003801 milling Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000000790 scattering method Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 2
- 239000002253 acid Substances 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000001186 cumulative effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000010304 firing Methods 0.000 description 2
- 238000002354 inductively-coupled plasma atomic emission spectroscopy Methods 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 238000010333 wet classification Methods 0.000 description 2
- ATRRKUHOCOJYRX-UHFFFAOYSA-N Ammonium bicarbonate Chemical compound [NH4+].OC([O-])=O ATRRKUHOCOJYRX-UHFFFAOYSA-N 0.000 description 1
- 229910000013 Ammonium bicarbonate Inorganic materials 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- -1 Pr 6 O 11 Inorganic materials 0.000 description 1
- 229920002125 Sokalan® Polymers 0.000 description 1
- 239000006061 abrasive grain Substances 0.000 description 1
- 239000002156 adsorbate Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 235000012538 ammonium bicarbonate Nutrition 0.000 description 1
- 239000001099 ammonium carbonate Substances 0.000 description 1
- 150000003863 ammonium salts Chemical class 0.000 description 1
- 238000000889 atomisation Methods 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 239000012159 carrier gas Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- CETPSERCERDGAM-UHFFFAOYSA-N ceric oxide Chemical compound O=[Ce]=O CETPSERCERDGAM-UHFFFAOYSA-N 0.000 description 1
- 229910000422 cerium(IV) oxide Inorganic materials 0.000 description 1
- 230000006835 compression Effects 0.000 description 1
- 238000007906 compression Methods 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 238000010332 dry classification Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000001307 helium Substances 0.000 description 1
- 229910052734 helium Inorganic materials 0.000 description 1
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 230000014759 maintenance of location Effects 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920003023 plastic Polymers 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 238000007517 polishing process Methods 0.000 description 1
- 239000004584 polyacrylic acid Substances 0.000 description 1
- 229920002635 polyurethane Polymers 0.000 description 1
- 239000004814 polyurethane Substances 0.000 description 1
- 239000002244 precipitate Substances 0.000 description 1
- 238000001028 reflection method Methods 0.000 description 1
- 238000005070 sampling Methods 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 238000010792 warming Methods 0.000 description 1
- 238000005303 weighing Methods 0.000 description 1
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006271802A JP5237542B2 (ja) | 2006-10-03 | 2006-10-03 | 酸化セリウム系研摩材 |
| TW096122998A TWI368647B (en) | 2006-10-03 | 2007-06-26 | Cerium oxide based abrasive |
| CN 200710154443 CN101157848B (zh) | 2006-10-03 | 2007-09-12 | 氧化铈类研磨材料 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006271802A JP5237542B2 (ja) | 2006-10-03 | 2006-10-03 | 酸化セリウム系研摩材 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008088325A JP2008088325A (ja) | 2008-04-17 |
| JP5237542B2 true JP5237542B2 (ja) | 2013-07-17 |
Family
ID=39306088
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006271802A Active JP5237542B2 (ja) | 2006-10-03 | 2006-10-03 | 酸化セリウム系研摩材 |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP5237542B2 (zh) |
| CN (1) | CN101157848B (zh) |
| TW (1) | TWI368647B (zh) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5695068B2 (ja) * | 2010-09-30 | 2015-04-01 | Hoya株式会社 | 情報記録媒体用ガラス基板の製造方法および情報記録媒体の製造方法 |
| CN102775958B (zh) * | 2012-08-16 | 2014-03-12 | 上海华明高纳稀土新材料有限公司 | 石材磨具用氧化铈抛光材料及其制备方法 |
| MY192996A (en) * | 2017-09-11 | 2022-09-20 | Showa Denko Kk | Manufacturing method for starting material for cerium-based abrasive agent, and manufacturing method for cerium-based abrasive agent |
| CN107674592B (zh) * | 2017-10-16 | 2019-08-23 | 淄博包钢灵芝稀土高科技股份有限公司 | 钐铈稀土抛光粉及其制备方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR2545830B1 (fr) * | 1983-05-13 | 1986-01-03 | Rhone Poulenc Spec Chim | Nouvelle composition de polissage a base de cerium et son procede de fabrication |
| JPH11330017A (ja) * | 1996-03-29 | 1999-11-30 | Hitachi Chem Co Ltd | 酸化セリウム研磨剤及び基板の製造法 |
| JPH09270402A (ja) * | 1996-03-29 | 1997-10-14 | Hitachi Chem Co Ltd | 酸化セリウム研磨剤及び基板の製造法 |
| JP3983949B2 (ja) * | 1998-12-21 | 2007-09-26 | 昭和電工株式会社 | 研磨用酸化セリウムスラリー、その製造法及び研磨方法 |
| JP2001348563A (ja) * | 2000-06-06 | 2001-12-18 | Toray Ind Inc | 研磨剤 |
| US6689178B2 (en) * | 2000-10-02 | 2004-02-10 | Mitsui Mining & Smelting Co., Ltd. | Cerium based abrasive material and method for producing cerium based abrasive material |
| JP4033440B2 (ja) * | 2001-09-17 | 2008-01-16 | 三井金属鉱業株式会社 | セリウム系研摩材スラリー及びセリウム系研摩材スラリーの製造方法 |
| JP3986384B2 (ja) * | 2002-07-12 | 2007-10-03 | 三井金属鉱業株式会社 | セリウム系研摩材およびその製造方法 |
| JP4290465B2 (ja) * | 2003-04-22 | 2009-07-08 | 三井金属鉱業株式会社 | 酸化セリウムを主成分とするセリウム系研摩材の製造方法 |
-
2006
- 2006-10-03 JP JP2006271802A patent/JP5237542B2/ja active Active
-
2007
- 2007-06-26 TW TW096122998A patent/TWI368647B/zh active
- 2007-09-12 CN CN 200710154443 patent/CN101157848B/zh active Active
Also Published As
| Publication number | Publication date |
|---|---|
| CN101157848A (zh) | 2008-04-09 |
| TW200817496A (en) | 2008-04-16 |
| JP2008088325A (ja) | 2008-04-17 |
| TWI368647B (en) | 2012-07-21 |
| CN101157848B (zh) | 2013-01-16 |
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