JP5230328B2 - ウエハノッチ部の研磨パッド - Google Patents
ウエハノッチ部の研磨パッド Download PDFInfo
- Publication number
- JP5230328B2 JP5230328B2 JP2008255153A JP2008255153A JP5230328B2 JP 5230328 B2 JP5230328 B2 JP 5230328B2 JP 2008255153 A JP2008255153 A JP 2008255153A JP 2008255153 A JP2008255153 A JP 2008255153A JP 5230328 B2 JP5230328 B2 JP 5230328B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing pad
- notch
- outer peripheral
- peripheral edge
- wafer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 238000005498 polishing Methods 0.000 title claims description 136
- 230000002093 peripheral effect Effects 0.000 claims description 42
- 239000004745 nonwoven fabric Substances 0.000 claims description 5
- 239000004065 semiconductor Substances 0.000 description 32
- 238000010586 diagram Methods 0.000 description 7
- 239000000835 fiber Substances 0.000 description 5
- 238000007517 polishing process Methods 0.000 description 5
- 238000003825 pressing Methods 0.000 description 5
- 230000002411 adverse Effects 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000010953 base metal Substances 0.000 description 2
- 239000013078 crystal Substances 0.000 description 2
- 229910003460 diamond Inorganic materials 0.000 description 2
- 239000010432 diamond Substances 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 230000007261 regionalization Effects 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229920003002 synthetic resin Polymers 0.000 description 1
- 239000000057 synthetic resin Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D5/00—Bonded abrasive wheels, or wheels with inserted abrasive blocks, designed for acting only by their periphery; Bushings or mountings therefor
- B24D5/02—Wheels in one piece
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D13/00—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
- B24D13/02—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by their periphery
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/302—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to change their surface-physical characteristics or shape, e.g. etching, polishing, cutting
- H01L21/304—Mechanical treatment, e.g. grinding, polishing, cutting
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Mechanical Treatment Of Semiconductor (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
- Polishing Bodies And Polishing Tools (AREA)
Description
11 外周縁部
12、13 側面
141、142、143、144、145 切り込み部
151、152、153、154、155 切り込み部
16、17 ヒゲ状体
181、182、183、184、185 切り込み部
191、192、193、194、195 切り込み部
2 半導体ウエハ
21 外周縁部
22 ノッチ部
3 ウエハチャックテーブル
31 ノズル
41、42 切り込み部
Claims (4)
- ウエハの外周縁部に形成したノッチ部を研磨するために、不織布で形成された環状の研磨パッドであって、
上記ノッチ部の輪郭とほぼ一致する断面形状に形成された外周縁部、及び、
上記研磨パッドの外周縁部の近傍で、研磨パッドの両側面に形成され、研磨パッドの外周と実質的に同心の、連続あるいは断続した切り込み部を備えたこと
を特徴とするウエハノッチ部の研磨パッド。 - 請求項1に記載されたウエハノッチ部の研磨パッドにおいて、
上記切り込み部は、研磨パッドにおける同じ半径位置でその厚さの中央部を残すようにして研磨パッドの両側面から向かい合うような対をなして形成されていること
を特徴とするウエハノッチ部の研磨パッド。 - 請求項2に記載されたウエハノッチ部の研磨パッドにおいて、
上記切り込み部は、複数の対があり、各対が研磨パッドにおいてそれぞれ異なる半径位置に形成されていること
を特徴とするウエハノッチ部の研磨パッド。 - 請求項1に記載されたウエハノッチ部の研磨パッドにおいて、
上記切り込み部は、研磨パッドにおける異なる半径位置において研磨パッドの両側面に対して交互に形成されていること
を特徴とするウエハノッチ部の研磨パッド。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008255153A JP5230328B2 (ja) | 2008-09-30 | 2008-09-30 | ウエハノッチ部の研磨パッド |
KR1020090090887A KR101268627B1 (ko) | 2008-09-30 | 2009-09-25 | 웨이퍼 노치부의 연마 패드 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008255153A JP5230328B2 (ja) | 2008-09-30 | 2008-09-30 | ウエハノッチ部の研磨パッド |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2010082754A JP2010082754A (ja) | 2010-04-15 |
JP5230328B2 true JP5230328B2 (ja) | 2013-07-10 |
Family
ID=42214375
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008255153A Active JP5230328B2 (ja) | 2008-09-30 | 2008-09-30 | ウエハノッチ部の研磨パッド |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP5230328B2 (ja) |
KR (1) | KR101268627B1 (ja) |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP7091575B2 (ja) * | 2017-03-03 | 2022-06-28 | スピードファム株式会社 | ノッチ部分ポリッシング用パッド及びその製造方法 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2000317790A (ja) * | 1999-05-12 | 2000-11-21 | Mitsubishi Materials Corp | 半導体ウェーハの面取り面研磨装置及びその方法 |
JP3445237B2 (ja) * | 2000-10-27 | 2003-09-08 | システム精工株式会社 | ワーク外周の研磨方法および研磨装置 |
JP4162567B2 (ja) * | 2003-10-14 | 2008-10-08 | スピードファム株式会社 | ウェハノッチの鏡面加工装置 |
JP3872081B2 (ja) | 2004-12-29 | 2007-01-24 | 東邦エンジニアリング株式会社 | 研磨用パッド |
JP5348966B2 (ja) * | 2008-08-21 | 2013-11-20 | Sumco Techxiv株式会社 | 研磨パッド |
-
2008
- 2008-09-30 JP JP2008255153A patent/JP5230328B2/ja active Active
-
2009
- 2009-09-25 KR KR1020090090887A patent/KR101268627B1/ko active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
KR101268627B1 (ko) | 2013-05-29 |
KR20100036959A (ko) | 2010-04-08 |
JP2010082754A (ja) | 2010-04-15 |
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