JP5227499B2 - レーザ照射装置 - Google Patents

レーザ照射装置 Download PDF

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Publication number
JP5227499B2
JP5227499B2 JP2006090305A JP2006090305A JP5227499B2 JP 5227499 B2 JP5227499 B2 JP 5227499B2 JP 2006090305 A JP2006090305 A JP 2006090305A JP 2006090305 A JP2006090305 A JP 2006090305A JP 5227499 B2 JP5227499 B2 JP 5227499B2
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Japan
Prior art keywords
laser
stage
laser oscillator
irradiated
film
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Expired - Fee Related
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JP2006090305A
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English (en)
Japanese (ja)
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JP2006310820A (ja
JP2006310820A5 (https=
Inventor
幸一郎 田中
良明 山本
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2006090305A priority Critical patent/JP5227499B2/ja
Publication of JP2006310820A publication Critical patent/JP2006310820A/ja
Publication of JP2006310820A5 publication Critical patent/JP2006310820A5/ja
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Publication of JP5227499B2 publication Critical patent/JP5227499B2/ja
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Expired - Fee Related legal-status Critical Current

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  • Recrystallisation Techniques (AREA)
JP2006090305A 2005-03-29 2006-03-29 レーザ照射装置 Expired - Fee Related JP5227499B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006090305A JP5227499B2 (ja) 2005-03-29 2006-03-29 レーザ照射装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2005096212 2005-03-29
JP2005096212 2005-03-29
JP2006090305A JP5227499B2 (ja) 2005-03-29 2006-03-29 レーザ照射装置

Publications (3)

Publication Number Publication Date
JP2006310820A JP2006310820A (ja) 2006-11-09
JP2006310820A5 JP2006310820A5 (https=) 2009-07-16
JP5227499B2 true JP5227499B2 (ja) 2013-07-03

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JP2006090305A Expired - Fee Related JP5227499B2 (ja) 2005-03-29 2006-03-29 レーザ照射装置

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JP (1) JP5227499B2 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20080081605A (ko) * 2007-03-06 2008-09-10 삼성전자주식회사 절연 모기판에 얼라인 마크를 형성하는 단계를 포함하는액정 표시 장치의 제조 방법
KR101114835B1 (ko) 2010-04-28 2012-03-06 주식회사 덕인 광 섬유 케이블을 이용한 레이저 조사 장치
KR101092232B1 (ko) 2010-04-28 2011-12-12 주식회사 덕인 2개 이상의 레이저 광학계를 이용한 레이저 조사 장치 및 방법
JP6367584B2 (ja) * 2014-03-24 2018-08-01 クラリオン株式会社 カメラキャリブレーション装置
JP7820804B2 (ja) * 2022-03-09 2026-02-26 株式会社ブイ・テクノロジー レーザアニール装置およびレーザアニール方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2000005891A (ja) * 1998-06-22 2000-01-11 Amada Co Ltd レーザー加工装置
JP4032553B2 (ja) * 1999-03-26 2008-01-16 セイコーエプソン株式会社 半導体製造装置
JP4474108B2 (ja) * 2002-09-02 2010-06-02 株式会社 日立ディスプレイズ 表示装置とその製造方法および製造装置
JP2004111584A (ja) * 2002-09-18 2004-04-08 Sanyo Electric Co Ltd 半導体装置の製造方法
JP4772261B2 (ja) * 2002-10-31 2011-09-14 シャープ株式会社 表示装置の基板の製造方法及び結晶化装置

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Publication number Publication date
JP2006310820A (ja) 2006-11-09

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