JP5210574B2 - レーザ照射装置 - Google Patents

レーザ照射装置 Download PDF

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Publication number
JP5210574B2
JP5210574B2 JP2007233645A JP2007233645A JP5210574B2 JP 5210574 B2 JP5210574 B2 JP 5210574B2 JP 2007233645 A JP2007233645 A JP 2007233645A JP 2007233645 A JP2007233645 A JP 2007233645A JP 5210574 B2 JP5210574 B2 JP 5210574B2
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Japan
Prior art keywords
lens
laser
optical system
film
laser oscillator
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Expired - Fee Related
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JP2007233645A
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Japanese (ja)
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JP2008098621A (ja
JP2008098621A5 (enExample
Inventor
幸一郎 田中
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Priority to JP2007233645A priority Critical patent/JP5210574B2/ja
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Publication of JP2008098621A5 publication Critical patent/JP2008098621A5/ja
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JP2007233645A 2006-09-14 2007-09-10 レーザ照射装置 Expired - Fee Related JP5210574B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007233645A JP5210574B2 (ja) 2006-09-14 2007-09-10 レーザ照射装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2006248975 2006-09-14
JP2006248975 2006-09-14
JP2007233645A JP5210574B2 (ja) 2006-09-14 2007-09-10 レーザ照射装置

Publications (3)

Publication Number Publication Date
JP2008098621A JP2008098621A (ja) 2008-04-24
JP2008098621A5 JP2008098621A5 (enExample) 2010-09-30
JP5210574B2 true JP5210574B2 (ja) 2013-06-12

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JP2007233645A Expired - Fee Related JP5210574B2 (ja) 2006-09-14 2007-09-10 レーザ照射装置

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JP (1) JP5210574B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2460648A (en) * 2008-06-03 2009-12-09 M Solv Ltd Method and apparatus for laser focal spot size control
CN108549159B (zh) * 2018-06-04 2023-06-23 凯迈（洛阳）测控有限公司 一种用于机载激光照测器的光学系统
WO2024018785A1 (ja) * 2022-07-19 2024-01-25 住友重機械工業株式会社 ビーム調整装置、レーザアニール装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04237587A (ja) * 1991-01-18 1992-08-26 Hitachi Constr Mach Co Ltd レーザ加工装置
JPH11251220A (ja) * 1998-03-02 1999-09-17 Nikon Corp 露光装置及び露光方法
JP2003053578A (ja) * 2001-08-15 2003-02-26 Sumitomo Heavy Ind Ltd レーザビームのプロファイル調整方法及び装置
DE10144244A1 (de) * 2001-09-05 2003-03-20 Zeiss Carl Zoom-System, insbesondere für eine Beleuchtungseinrichtung
JP4439794B2 (ja) * 2001-09-10 2010-03-24 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP2006049606A (ja) * 2004-08-05 2006-02-16 Sumitomo Heavy Ind Ltd レーザ加工装置
JP5100127B2 (ja) * 2006-01-12 2012-12-19 株式会社半導体エネルギー研究所 レ−ザー光照射装置

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JP2008098621A (ja) 2008-04-24

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