JP5209880B2 - 光学的放射の偏光の状態に対する光学系の影響を近似する方法 - Google Patents

光学的放射の偏光の状態に対する光学系の影響を近似する方法 Download PDF

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JP5209880B2
JP5209880B2 JP2007020652A JP2007020652A JP5209880B2 JP 5209880 B2 JP5209880 B2 JP 5209880B2 JP 2007020652 A JP2007020652 A JP 2007020652A JP 2007020652 A JP2007020652 A JP 2007020652A JP 5209880 B2 JP5209880 B2 JP 5209880B2
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polarization
state
optical system
incident
optical radiation
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JP2007212455A5 (enExample
JP2007212455A (ja
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メンゲル マルクス
トツェック ミハエル
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J4/00—Measuring polarisation of light
    • G01J4/04—Polarimeters using electric detection means
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01M—TESTING STATIC OR DYNAMIC BALANCE OF MACHINES OR STRUCTURES; TESTING OF STRUCTURES OR APPARATUS, NOT OTHERWISE PROVIDED FOR
    • G01M11/00—Testing of optical apparatus; Testing structures by optical methods not otherwise provided for
    • G01M11/02—Testing optical properties
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/19—Dichroism
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G01J2009/0223—Common path interferometry; Point diffraction interferometry
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G01J9/0215—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods by shearing interferometric methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/21—Polarisation-affecting properties
    • G01N2021/216—Polarisation-affecting properties using circular polarised light

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analytical Chemistry (AREA)
  • Chemical & Material Sciences (AREA)
  • Biochemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Health & Medical Sciences (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2007020652A 2006-02-08 2007-01-31 光学的放射の偏光の状態に対する光学系の影響を近似する方法 Expired - Fee Related JP5209880B2 (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
US77139506P 2006-02-08 2006-02-08
US60/771,395 2006-02-08
EP06002586.3 2006-02-08
EP06002586A EP1818658A1 (en) 2006-02-08 2006-02-08 Method for approximating the influence of an optical system on the state of polarisation of optical radiation

Publications (3)

Publication Number Publication Date
JP2007212455A JP2007212455A (ja) 2007-08-23
JP2007212455A5 JP2007212455A5 (enExample) 2010-03-11
JP5209880B2 true JP5209880B2 (ja) 2013-06-12

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US (1) US7924436B2 (enExample)
EP (1) EP1818658A1 (enExample)
JP (1) JP5209880B2 (enExample)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
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DE102005041203A1 (de) * 2005-08-31 2007-03-01 Carl Zeiss Sms Gmbh Vorrichtung und Verfahren zur interferometrischen Messung von Phasenmasken
JP2007198896A (ja) 2006-01-26 2007-08-09 Canon Inc 計測方法
JP5055141B2 (ja) 2008-01-10 2012-10-24 キヤノン株式会社 評価方法、調整方法、露光装置、およびプログラム
US8773662B2 (en) * 2010-07-22 2014-07-08 Vuv Analytics, Inc. Methods and apparatus for vacuum ultraviolet (VUV) or shorter wavelength circular dichroism spectroscopy
DE102012203944A1 (de) 2012-03-14 2013-10-02 Carl Zeiss Smt Gmbh Verfahren zur Justage eines optischen Systems einer mikrolithographischen Projektionsbelichtungsanlage
DE102013200394A1 (de) 2013-01-14 2014-07-17 Carl Zeiss Smt Gmbh Polarisationsmessvorrichtung, Lithographieanlage, Messanordnung, und Verfahren zur Polarisationsmessung
DE102013204466A1 (de) 2013-03-14 2014-09-18 Carl Zeiss Smt Gmbh Messung einer optischen Symmetrieeigenschaft an einer Projektionsbelichtungsanlage
DE102014205406A1 (de) * 2014-03-24 2015-09-24 Carl Zeiss Smt Gmbh Messvorrichtung zum Bestimmen eines Polarisationsparameters
JP6995376B2 (ja) * 2017-02-10 2022-02-04 国立大学法人京都工芸繊維大学 ３次元物体情報計測装置
CN112926192B (zh) * 2021-01-29 2022-05-06 长春理工大学 一种离轴自由曲面光学系统偏振像差分析方法
CN114322748B (zh) * 2021-11-19 2024-04-12 中国科学院上海光学精密机械研究所 偏振同步相移点衍射干涉仪及其检测方法
CN115014533B (zh) * 2022-08-10 2022-12-09 歌尔光学科技有限公司 光偏振态测试装置

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5298972A (en) * 1990-01-22 1994-03-29 Hewlett-Packard Company Method and apparatus for measuring polarization sensitivity of optical devices
JPH0552657A (ja) * 1991-08-22 1993-03-02 Shimadzu Corp 偏光測定器
TW550377B (en) 2000-02-23 2003-09-01 Zeiss Stiftung Apparatus for wave-front detection
JP2002071515A (ja) 2000-08-31 2002-03-08 Canon Inc 測定装置及び測定方法
JP2003287717A (ja) * 2002-03-28 2003-10-10 Acterna R & D Kk 偏光制御装置と偏光制御方法
US7009691B2 (en) * 2002-05-29 2006-03-07 Agilent Technologies, Inc. System and method for removing the relative phase uncertainty in device characterizations performed with a polarimeter
JP3844222B2 (ja) * 2002-06-14 2006-11-08 ユニオプト株式会社 複屈折測定装置
DE10304822A1 (de) 2002-07-29 2004-02-12 Carl Zeiss Smt Ag Verfahren und Vorrichtung zur Bestimmung der Polarisationszustandsbeeinflussung durch ein optisches System und Analysator
JP2004061515A (ja) * 2002-07-29 2004-02-26 Cark Zeiss Smt Ag 光学系による偏光状態への影響を決定する方法及び装置と、分析装置
US7289223B2 (en) 2003-01-31 2007-10-30 Carl Zeiss Smt Ag Method and apparatus for spatially resolved polarimetry
JP2004279380A (ja) * 2003-03-19 2004-10-07 Citizen Watch Co Ltd 旋光度測定装置
WO2005003862A1 (de) * 2003-07-05 2005-01-13 Carl Zeiss Smt Ag Vorrichtung zur polarisationsspezifischen untersuchung eines optischen systems
US6947137B2 (en) * 2003-12-11 2005-09-20 Corning Incorporated System and method for measuring birefringence in an optical material

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US20070182969A1 (en) 2007-08-09
JP2007212455A (ja) 2007-08-23
US7924436B2 (en) 2011-04-12
EP1818658A1 (en) 2007-08-15

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