JP5188259B2 - 3次元フォトニック結晶を用いた発光素子 - Google Patents
3次元フォトニック結晶を用いた発光素子 Download PDFInfo
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- JP5188259B2 JP5188259B2 JP2008120176A JP2008120176A JP5188259B2 JP 5188259 B2 JP5188259 B2 JP 5188259B2 JP 2008120176 A JP2008120176 A JP 2008120176A JP 2008120176 A JP2008120176 A JP 2008120176A JP 5188259 B2 JP5188259 B2 JP 5188259B2
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- Prior art keywords
- light emitting
- light
- type semiconductor
- photonic crystal
- resonator
- Prior art date
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Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1225—Basic optical elements, e.g. light-guiding paths comprising photonic band-gap structures or photonic lattices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y20/00—Nanooptics, e.g. quantum optics or photonic crystals
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12004—Combinations of two or more optical elements
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L33/00—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof
- H01L33/02—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies
- H01L33/16—Semiconductor devices with at least one potential-jump barrier or surface barrier specially adapted for light emission; Processes or apparatus specially adapted for the manufacture or treatment thereof or of parts thereof; Details thereof characterised by the semiconductor bodies with a particular crystal structure or orientation, e.g. polycrystalline, amorphous or porous
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04254—Electrodes, e.g. characterised by the structure characterised by the shape
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2933/00—Details relating to devices covered by the group H01L33/00 but not provided for in its subgroups
- H01L2933/0083—Periodic patterns for optical field-shaping in or on the semiconductor body or semiconductor body package, e.g. photonic bandgap structures
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/02—Structural details or components not essential to laser action
- H01S5/024—Arrangements for thermal management
- H01S5/02461—Structure or details of the laser chip to manipulate the heat flow, e.g. passive layers in the chip with a low heat conductivity
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/04—Processes or apparatus for excitation, e.g. pumping, e.g. by electron beams
- H01S5/042—Electrical excitation ; Circuits therefor
- H01S5/0425—Electrodes, e.g. characterised by the structure
- H01S5/04252—Electrodes, e.g. characterised by the structure characterised by the material
- H01S5/04253—Electrodes, e.g. characterised by the structure characterised by the material having specific optical properties, e.g. transparent electrodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/1028—Coupling to elements in the cavity, e.g. coupling to waveguides adjacent the active region, e.g. forward coupled [DFC] structures
- H01S5/1032—Coupling to elements comprising an optical axis that is not aligned with the optical axis of the active region
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01S—DEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
- H01S5/00—Semiconductor lasers
- H01S5/10—Construction or shape of the optical resonator, e.g. extended or external cavity, coupled cavities, bent-guide, varying width, thickness or composition of the active region
- H01S5/11—Comprising a photonic bandgap structure
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- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Electromagnetism (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Power Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biophysics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Semiconductor Lasers (AREA)
- Optical Integrated Circuits (AREA)
Description
20 3次元フォトニック結晶
30 P型電極
40,41 Pクラッド部
50 Nクラッド部
60 N型電極
70 活性部
80,82,822 導波路
821 伝熱構造体
90 絶縁層
91 電流狭窄領域
100 共振器
101 半導体周期構造
102 犠牲層
103 導波路
104 点欠陥部
105 絶縁部
200 電気回路
Claims (6)
- 3次元フォトニック結晶を用いた発光素子であって、
該3次元フォトニック結晶は、
活性媒質を含む共振器を形成する第1の欠陥部と、
該共振器で発生した光を外部に取り出すための導波路を形成する第2の欠陥部と、
P型半導体により形成されたPクラッド部と、
第1のN型半導体により形成されたNクラッド部とを有し、
前記第2の欠陥部は、前記Pクラッド部及び前記Nクラッド部のうち該Nクラッド部にのみ設けられており、
前記第2の欠陥部の少なくとも一部は、第2のN型半導体により形成され、外部に熱を放射する放熱手段を構成していることを特徴とする発光素子。 - 前記第2のN型半導体の熱伝導度が、前記第1のN型半導体の熱伝導度よりも高いことを特徴とする請求項1に記載の発光素子。
- 前記Pクラッド部に、前記P型半導体よりも電気伝導度が小さい材料により形成された、前記共振器に対する電流狭窄領域が設けられていることを特徴とする請求項1又は2に記載の発光素子。
- 前記第2の欠陥部の出口側端部に、伝熱構造体が配置されており、
該伝熱構造体が該発光素子の電極に接続されていることを特徴とする請求項1から3のいずれか1つに記載の発光素子。 - 前記伝熱構造体は、前記出口側端部での光学的な反射を抑制する膜として形成されていることを特徴とする請求項4に記載の発光素子。
- 前記第2の欠陥部が、前記出口側端部に向かって断面積が増加するテーパ構造を含むことを特徴とする請求項4又は5に記載の発光素子。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008120176A JP5188259B2 (ja) | 2008-05-02 | 2008-05-02 | 3次元フォトニック結晶を用いた発光素子 |
US12/434,527 US7760973B2 (en) | 2008-05-02 | 2009-05-01 | Light emitting device using three-dimensional photonic crystal |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008120176A JP5188259B2 (ja) | 2008-05-02 | 2008-05-02 | 3次元フォトニック結晶を用いた発光素子 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009272394A JP2009272394A (ja) | 2009-11-19 |
JP2009272394A5 JP2009272394A5 (ja) | 2011-06-23 |
JP5188259B2 true JP5188259B2 (ja) | 2013-04-24 |
Family
ID=41257142
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008120176A Expired - Fee Related JP5188259B2 (ja) | 2008-05-02 | 2008-05-02 | 3次元フォトニック結晶を用いた発光素子 |
Country Status (2)
Country | Link |
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US (1) | US7760973B2 (ja) |
JP (1) | JP5188259B2 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5870833B2 (ja) * | 2012-04-24 | 2016-03-01 | 富士通セミコンダクター株式会社 | 半導体装置の製造方法 |
JP6786961B2 (ja) | 2016-08-29 | 2020-11-18 | セイコーエプソン株式会社 | 面発光レーザーおよび原子発振器 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2001257425A (ja) | 2000-03-13 | 2001-09-21 | Matsushita Electric Ind Co Ltd | 半導体レーザ素子及びその製造方法 |
WO2005078512A1 (ja) * | 2004-02-17 | 2005-08-25 | The Furukawa Electric Co., Ltd. | フォトニック結晶半導体デバイスおよびその製造方法 |
JP4560348B2 (ja) * | 2004-08-04 | 2010-10-13 | キヤノン株式会社 | 3次元フォトニック結晶およびそれを用いた光学素子 |
EP1817524A4 (en) * | 2004-11-16 | 2011-02-02 | Canon Kk | PHOTONIC ELECTROLUMINESCENT DEVICE |
JP4684861B2 (ja) * | 2005-11-14 | 2011-05-18 | キヤノン株式会社 | 導波路及びそれを有するデバイス |
JP4769658B2 (ja) * | 2006-07-31 | 2011-09-07 | キヤノン株式会社 | 共振器 |
JP4956119B2 (ja) * | 2006-09-27 | 2012-06-20 | キヤノン株式会社 | 発光素子およびそれを用いた表示素子 |
JP5322453B2 (ja) * | 2008-02-07 | 2013-10-23 | キヤノン株式会社 | 3次元フォトニック結晶発光素子 |
JP4872096B2 (ja) * | 2008-03-12 | 2012-02-08 | キヤノン株式会社 | フォトニック結晶発光素子及び発光装置 |
-
2008
- 2008-05-02 JP JP2008120176A patent/JP5188259B2/ja not_active Expired - Fee Related
-
2009
- 2009-05-01 US US12/434,527 patent/US7760973B2/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US20090274414A1 (en) | 2009-11-05 |
US7760973B2 (en) | 2010-07-20 |
JP2009272394A (ja) | 2009-11-19 |
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