JP5186123B2 - Transfer apparatus and transfer method - Google Patents

Transfer apparatus and transfer method Download PDF

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JP5186123B2
JP5186123B2 JP2007065186A JP2007065186A JP5186123B2 JP 5186123 B2 JP5186123 B2 JP 5186123B2 JP 2007065186 A JP2007065186 A JP 2007065186A JP 2007065186 A JP2007065186 A JP 2007065186A JP 5186123 B2 JP5186123 B2 JP 5186123B2
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mold
molded product
transfer
closed space
molded
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JP2008221706A (en
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光典 小久保
裕喜 杉浦
裕 浅野目
貴晴 田代
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Shibaura Machine Co Ltd
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Toshiba Machine Co Ltd
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Description

本発明は、転写装置および転写方法に係り、特に、被成型品への転写がなされる部位を減圧するものに関する。   The present invention relates to a transfer apparatus and a transfer method, and more particularly, to a device that depressurizes a portion to be transferred to a molded product.

近年、電子線描画法などで石英基板等に超微細な転写パターンを形成して型(テンプレート、スタンパ)を作製し、被成型品として被転写基板表面に形成されたレジスト膜に前記型を所定の圧力で押圧して、当該型に形成された転写パターンを転写するナノインプリント技術が研究開発されている(非特許文献1参照)。   In recent years, a mold (template, stamper) is manufactured by forming an ultra-fine transfer pattern on a quartz substrate or the like by an electron beam drawing method, and the mold is predetermined on a resist film formed on the surface of the transfer substrate as a molded product. Research and development has been conducted on nanoimprint technology for transferring a transfer pattern formed on the mold by pressing with a pressure of (see Non-Patent Document 1).

前記ナノインプリント技術による転写を行うための装置として、型を保持する型保持体と、被成型品を保持する被成型品保持体とを備え、型を保持した型保持体を、被成型品を保持した被成型品保持体に相対的に近づけて、型で被成型品を押圧し、型に形成されている微細な転写パターンを被成型品に転写する構成のものが知られている(たとえば特許文献1参照)。
特開2004−34300号公報 Precision Engineering Journal of the International Societies for Precision Engineering and Nanotechnology
As a device for performing transfer by the nanoimprint technology, a mold holding body for holding a mold and a molded article holding body for holding a molded article are provided, and the mold holding body holding the mold is held by the molded article. There is known a structure in which a molded product is pressed relatively close to the molded product holder and the molded product is pressed with a mold to transfer a fine transfer pattern formed on the mold to the molded product (for example, a patent). Reference 1).
JP 2004-34300 A Precision Engineering Journal of the International Societies for Precision Engineering and Nanotechnology

ところで、従来の転写装置では、型で被成型品を押圧するときに、転写装置や型や被成型品のごくわずかな形状誤差等によって、押圧面における押圧力(型による被成型品への押圧力)が一定にならず、転写パターンの深さにばらつきが発生する等、精度のよい転写を行うことができないおそれがある。   By the way, in the conventional transfer device, when pressing the molded product with the mold, the pressing force on the pressing surface (the pressing to the molded product by the mold) is caused by a slight shape error of the transfer device, the mold or the molded product. Pressure) is not constant, and there is a possibility that transfer with high accuracy cannot be performed, for example, the transfer pattern varies in depth.

本発明は、前記問題点に鑑みてなされたものであり、型に形成されている微細な転写パターンを被成型品に転写する転写装置および転写方法において、精度のよい転写を行うことができる転写装置および転写方法を提供することを目的とする。   The present invention has been made in view of the above problems, and in a transfer apparatus and transfer method for transferring a fine transfer pattern formed on a mold to a molded product, transfer capable of performing accurate transfer. An object is to provide an apparatus and a transfer method.

請求項1に記載の発明は、型に形成されている微細な転写パターンを、被成型品に転写する転写装置において、前記転写をするために前記型と前記被成型品とをお互いに接触させた接触部を閉空間内に位置させる閉空間形成手段と、前記閉空間形成手段で形成された閉空間内の気圧を前記閉空間の外の気圧よりも下げることにより、前記型と前記被成型品とのうちの少なくとも一方を、その背面に前記閉空間の外の気圧をかけて変形させ、前記接触部における圧力を均一化する減圧手段とを有する転写装置である。 The invention according to claim 1 is a transfer device that transfers a fine transfer pattern formed on a mold to a molded product, and makes the mold and the molded product contact each other for the transfer. a closed space forming means is positioned in the closed space the contact contact portion has, by lowering the pressure in the closed space formed by the closed space forming unit than air pressure outside the said closed space, the said type to be It is a transfer device having pressure reducing means for making at least one of the molded products deform by applying air pressure outside the closed space to the back surface thereof , and uniformizing the pressure at the contact portion.

請求項2に記載の発明は、型に形成されている微細な転写パターンを、被成型品に転写する転写装置において、前記被成型品を設置するための被成型品設置体と、前記型を保持し、前記被成型品設置体に接近・離反する方向で前記被成型品設置体に対して相対的に移動位置決め自在な型保持体と、前記転写をすべく前記型と前記被成型品とをお互いに接触させたときに、前記被成型品および前記型保持体と協働して、前記型と前記被成型品との接触部を閉空間内に位置させる環状の部材と、前記閉空間内を減圧するとともに、前記型と前記被成型品とのうちの少なくとも一方を、その背面に前記閉空間の外の気圧をかけて変形させ、前記接触部における圧力を均一化する減圧手段とを有する転写装置である。 According to a second aspect of the present invention, there is provided a transfer apparatus for transferring a fine transfer pattern formed on a mold onto a molded product, and a molded product installation body for installing the molded product, and the mold. A mold holding body that can be held and moved relative to the molding object installation body in a direction approaching / separating from the molding object installation body, and the mold and the molding object to be transferred. And an annular member for positioning a contact portion between the mold and the molded product in a closed space in cooperation with the molded product and the mold holding body when they are brought into contact with each other. Pressure reducing means for depressurizing the inside and deforming at least one of the mold and the molded article by applying atmospheric pressure outside the closed space to the back surface thereof, and uniformizing the pressure in the contact portion; A transfer device.

請求項3に記載の発明は、型に形成されている微細な転写パターンを、被成型品に転写する転写装置において、前記被成型品を設置するための被成型品設置体と、前記被成型品設置体に接近・離反する方向で前記被成型品設置体に対して相対的に移動位置決め自在な移動体と、前記転写をすべく、前記被成型品設置体に設置されている被成型品に設置されている型に近づく方向に前記移動体が移動したときに、前記被成型品および前記移動体と協働して、前記型と前記被成型品との接触部を閉空間内に位置させる環状の部材と、前記閉空間内を減圧するとともに、前記被成型品を、その背面に前記閉空間の外の気圧をかけて変形させ、前記接触部における圧力を均一化する減圧手段とを有する転写装置である。 According to a third aspect of the present invention, there is provided a transfer apparatus for transferring a fine transfer pattern formed on a mold to a molded product, a molded product installation body for installing the molded product, and the molded product A movable body that can be moved and positioned relatively to the molded product installation body in a direction approaching or moving away from the molded product installation body, and a molded product installed in the molded product installation body to perform the transfer When the movable body moves in a direction approaching the mold installed on the mold, the contact portion between the mold and the molded article is positioned in a closed space in cooperation with the molded article and the movable body. And an annular member for reducing pressure inside the closed space, and a pressure reducing means for deforming the product to be molded by applying an air pressure outside the closed space to the back surface thereof to equalize the pressure at the contact portion. A transfer device.

請求項に記載の発明は、型に形成されている微細な転写パターンを、被成型品に転写する転写装置において、薄い板状部材を備え、この板状部材を間にして前記被成型品を設置する被成型品設置体と、前記型を保持し、前記被成型品設置体に接近・離反する方向で前記被成型品設置体に対して相対的に移動位置決め自在な型保持体と、前記転写をすべく前記型と前記被成型品とをお互いに接触させたときに、前記板状部材および前記型保持体と協働して、前記型と前記被成型品との接触部を閉空間内に位置させる環状の部材と、前記閉空間内を減圧するとともに、前記板状部材および前記被成型品を、前記板状部材の背面に前記閉空間の外の気圧をかけて変形させ、前記接触部における圧力を均一化する減圧手段とを有する転写装置である。 According to a fourth aspect of the present invention, there is provided a transfer apparatus for transferring a fine transfer pattern formed on a mold to a molded product, comprising a thin plate-like member, and the molded product having the plate-like member in between. A molded product installation body that holds the mold, and a mold holding body that is movable and positionable relative to the molded product installation body in a direction that approaches and separates from the molded product installation body, When the mold and the molded product are brought into contact with each other for the transfer, the contact portion between the mold and the molded product is closed in cooperation with the plate member and the mold holder. An annular member positioned in between, and reducing the pressure in the closed space, and deforming the plate member and the molded article by applying an air pressure outside the closed space to the back surface of the plate member, It is a transcription unit and a decompression means for equalizing the pressure at the contact portion

請求項に記載の発明は、請求項1〜請求項のいずれか1項に記載の転写装置を用いてなされる転写方法において、前記被成型品は、平板状の基材と、この基材の厚さ方向の一方の面に薄く設けられた膜状の転写素材とを備えて構成されており、前記型の微細な転写パターンが前記転写素材に転写される転写方法である。 According to a fifth aspect of the present invention, there is provided a transfer method performed using the transfer device according to any one of the first to fourth aspects, wherein the product to be molded includes a flat base material and a base material. A transfer method in which a fine transfer pattern of the mold is transferred to the transfer material. The transfer method includes a film-like transfer material that is thinly provided on one surface in the thickness direction of the material.

請求項に記載の発明は、型に形成されている微細な転写パターンを、被成型品に転写する転写方法において、前記転写をするために前記型と前記被成型品とをお互いに接触させた接触部を閉空間内に位置させて前記閉空間内の気圧を前記閉空間の外の気圧よりも下げることにより、前記型と前記被成型品とのうちの少なくとも一方を、その背面に前記閉空間の外の気圧をかけて変形させ、前記接触部における圧力を均一化する転写方法である。 According to a sixth aspect of the present invention, there is provided a transfer method for transferring a fine transfer pattern formed on a mold onto a molded product, wherein the mold and the molded product are brought into contact with each other for the transfer. By positioning the contact portion in the closed space and lowering the air pressure in the closed space to be lower than the air pressure outside the closed space, at least one of the mold and the article to be molded is placed on the back surface thereof. This is a transfer method in which the pressure at the contact portion is made uniform by applying a pressure outside the closed space to be deformed.

本発明によれば、型に形成されている微細な転写パターンを被成型品に転写する転写装置および転写方法において、精度のよい転写を行うことができるという効果を奏する。   According to the present invention, in the transfer apparatus and transfer method for transferring a fine transfer pattern formed on a mold to a molding object, there is an effect that accurate transfer can be performed.

[第1の実施形態]
図1は、本発明の実施形態に係る転写装置1の概略構成を示す図である。
[First Embodiment]
FIG. 1 is a diagram showing a schematic configuration of a transfer apparatus 1 according to an embodiment of the present invention.

以下、説明の便宜のために、水平方向の一方向をX軸方向とし、水平方向の他の一方向であってX軸方向に垂直な方向をY軸方向とし、X軸方向およびY軸方向に垂直な方向(上下方向;鉛直方向)をZ軸方向という場合がある。   Hereinafter, for convenience of explanation, one horizontal direction is defined as an X-axis direction, another horizontal direction that is perpendicular to the X-axis direction is defined as a Y-axis direction, and the X-axis direction and the Y-axis direction. A direction (vertical direction; vertical direction) perpendicular to Z may be referred to as a Z-axis direction.

転写装置1は、型(スタンパ)Mの面(たとえば平面状の下面)に形成されている微細な転写パターンを、被成型品Wの面(たとえば平面状の上面)に、型Mの面を被成型品Wの面に面接触させることにより転写する装置である。被成型品Wとして、CD−ROM、DVD−ROM、液晶表示装置の導光板等を掲げることができる。   The transfer device 1 uses a fine transfer pattern formed on a surface (for example, a planar lower surface) of a mold (stamper) M, and a surface of the mold M on a surface (for example, a planar upper surface) of a product W. It is an apparatus for transferring by bringing the surface of the article to be molded W into surface contact. As the molded product W, CD-ROM, DVD-ROM, a light guide plate of a liquid crystal display device, and the like can be listed.

型Mは、たとえば石英ガラスで構成されており、被成型品Wは、たとえばシリコンやガラスで構成されている基材W1と、この基材W1の面に薄く設けられた膜状の転写素材(たとえばUV硬化樹脂)W3とを備えて構成されている(図3参照)。   The mold M is made of, for example, quartz glass, and the product to be molded W is a base material W1 made of, for example, silicon or glass, and a film-like transfer material (thinly provided on the surface of the base material W1). For example, a UV curable resin (W3) is provided (see FIG. 3).

転写装置1は、ベースフレーム3を備えており、このベースフレーム3には、被成型品設置体9が設けられている。被成型品設置体9は、たとえば、上面が平面状になっており、この上面に、被成型品Wを載置し設置することができるようになっている。このようにして載置されている被成型品Wは、この厚さ方向がZ軸方向になっており、また、X軸方向およびY軸方向で所定のところに位置している。   The transfer device 1 includes a base frame 3, and a molded product installation body 9 is provided on the base frame 3. For example, the molded product installation body 9 has a flat upper surface, and the molded product W can be placed and installed on the upper surface. In this way, the to-be-molded product W placed in this way has a thickness direction in the Z-axis direction, and is located at a predetermined position in the X-axis direction and the Y-axis direction.

被成型品設置体9は、XYステージ7を介してベースフレーム3に支持されている。したがって、制御装置(図示せず)の制御の下、XYステージ7を構成するサーボモータ等のアクチュエータ(図示せず)を駆動することによって、被成型品設置体9は、X軸やY軸方向で移動位置決め自在になっている。なお、被成型品設置体9が、Z軸に平行な軸を中心にして回動位置決め自在になるような機能を、XYステージ7に持たせた構成であってもよい。   The molded product installation body 9 is supported by the base frame 3 via the XY stage 7. Therefore, by driving an actuator (not shown) such as a servo motor that constitutes the XY stage 7 under the control of a control device (not shown), the molded product installation body 9 can move in the X-axis or Y-axis direction. It can be moved and positioned freely. Note that the XY stage 7 may have a function that allows the molded product installation body 9 to rotate and position about an axis parallel to the Z axis.

ベースフレーム3には、型保持体5が設けられている。型保持体5は、たとえば、下面が平面状になっており、この下面で型Mを保持することができるようになっている。このようにして保持された型Mでは、微細な転写パターンが形成されている下面が被成型品設置体9(被成型品W)と対向している。   The base frame 3 is provided with a mold holder 5. For example, the lower surface of the mold holding body 5 is flat, and the mold M can be held by the lower surface. In the mold M held in this way, the lower surface on which the fine transfer pattern is formed is opposed to the molded product installation body 9 (molded product W).

型保持体5は、図示しないリニアガイドベアリングを介してベースフレーム3に支持されており、前記制御装置の制御の下、サーボモータ等のアクチュエータ(図示せず)を駆動することによって、Z軸方向で移動位置決め自在になっている。   The mold holding body 5 is supported on the base frame 3 via a linear guide bearing (not shown), and drives an actuator (not shown) such as a servo motor under the control of the control device, thereby moving in the Z-axis direction. It can be moved and positioned freely.

また、転写装置1には、被成型品Wに紫外線を照射するためのUV光発生装置(紫外線発生器;図示せず)が設けられており、転写をすべく型Mを被成型品Wに接触させたときに紫外線を発生し、被成型品Wの転写素材W3を硬化させるようになっている。なお、転写素材W3として熱可塑性樹脂や熱硬化性樹脂を採用してもよい。この場合、UV光発生装置に代えてもしくは加えて、被成型品Wを加熱するための加熱装置を設けることになる。   Further, the transfer device 1 is provided with a UV light generator (ultraviolet generator; not shown) for irradiating the molding target W with ultraviolet rays, and the mold M is transferred to the molding target W for transfer. When contact is made, ultraviolet rays are generated to cure the transfer material W3 of the product W to be molded. A thermoplastic resin or a thermosetting resin may be adopted as the transfer material W3. In this case, instead of or in addition to the UV light generation device, a heating device for heating the product W is provided.

また、転写装置1には、閉空間形成手段10と減圧手段12とが設けられている(図2参照)。閉空間形成手段10は、被成型品Wへの転写をするために型保持体5を下降させて型Mと被成型品Wとをお互いに接触させる場合(たとえば、型Mで被成型品Wを押圧する場合)、型Mと被成型品Wとの接触部を、閉空間(たとえば大気から遮断された空間)内に位置させるためのものである。この場合、被成型品Wの背面は大気に接している。   Further, the transfer device 1 is provided with a closed space forming means 10 and a pressure reducing means 12 (see FIG. 2). The closed space forming means 10 lowers the mold holding body 5 and makes the mold M and the molded product W contact each other in order to transfer to the molded product W (for example, the molded product W with the mold M). ), The contact portion between the mold M and the workpiece W is positioned in a closed space (for example, a space cut off from the atmosphere). In this case, the back surface of the molded product W is in contact with the atmosphere.

減圧手段12は、閉空間形成手段10で形成された閉空間SP1内の気圧を閉空間SP1の外の気圧(たとえば大気圧)よりも下げる(たとえば、ほぼ真空になるまで下げる)ことにより、被成型品Wを大気圧によって弾性変形させ、型Mに被成型品Wが倣うようにして、前記接触部における圧力(型Mと被成型品Wとの接触圧力)を均一化するものである。   The decompression means 12 lowers the atmospheric pressure in the closed space SP1 formed by the closed space forming means 10 to be lower than the atmospheric pressure outside the closed space SP1 (for example, atmospheric pressure) (for example, lowers until it becomes almost vacuum), thereby reducing the pressure. The molded product W is elastically deformed by atmospheric pressure so that the molded product W follows the mold M, and the pressure at the contact portion (contact pressure between the mold M and the molded product W) is made uniform.

転写装置1、型M、被成型品Wについて例を掲げてより詳しく説明する。   The transfer device 1, the mold M, and the molded product W will be described in more detail with examples.

図2は、転写装置1の主要部の概略構成を示す図である。   FIG. 2 is a diagram illustrating a schematic configuration of a main part of the transfer device 1.

型Mは、所定の厚さを備えた矩形な平板状に形成されており、型保持体5に取り付けられた状態では、厚さ方向がZ軸方向になっており、平面状の下面のたとえば中央部に、微細な転写パターンが形成されている。型保持体5の中央部には、Z軸方向に延びた貫通孔(前記紫外線発生器からの紫外線を通過させるための貫通孔)15が設けられており、この貫通孔15の下端部には、透明体で構成された型支持部材11が設けられている。型Mは型支持部材11の下に設けられており、型保持部材13によって、型Mと型支持部材11とが、型保持体5に一体的に取り付けられている。   The mold M is formed in a rectangular flat plate shape having a predetermined thickness, and when attached to the mold holder 5, the thickness direction is the Z-axis direction. A fine transfer pattern is formed at the center. A through hole (through hole for allowing the ultraviolet rays from the ultraviolet ray generator to pass) 15 extending in the Z-axis direction is provided at the center of the mold holder 5. A mold support member 11 made of a transparent body is provided. The mold M is provided below the mold support member 11, and the mold M and the mold support member 11 are integrally attached to the mold holding body 5 by the mold holding member 13.

被成型品Wは、前述したように、矩形な平板状の基材W1と、この基材W1の厚さ方向の一方の面に薄く設けられた膜状の転写素材W3とを備えて構成されており、型Mの微細な転写パターンが、転写素材W3に転写されるようになっている。   As described above, the product to be molded W includes a rectangular flat base material W1 and a film-like transfer material W3 provided thinly on one surface in the thickness direction of the base material W1. The fine transfer pattern of the mold M is transferred to the transfer material W3.

被成型品設置体9は、前述したように、被成型品Wを設置するものであるが、被成型品設置体9に設置されている状態では、型Mの微細な転写パターンが転写される面(被成型品Wの上面)が、型保持体5に保持された型Mの微細な転写パターンが形成されている面(下面)と対向してほぼ平行になっている。また、被成型品設置体9に設置されている被成型品Wは、型保持体5に保持されている型Mに対して、X軸方向とY軸方向とで相対的に移動位置決め自在になっている。   As described above, the molded product installation body 9 is used to install the molded product W. When the molded product installation body 9 is installed on the molded product installation body 9, a fine transfer pattern of the mold M is transferred. The surface (upper surface of the product W) is substantially parallel to the surface (lower surface) on which the fine transfer pattern of the mold M held by the mold holder 5 is formed. Further, the molded product W installed in the molded product installation body 9 can be moved and positioned relatively in the X axis direction and the Y axis direction with respect to the mold M held by the mold holding body 5. It has become.

なお、被成型品設置体9に被成型品Wが設置されている状態では、たとえば、被成型品Wの端部が被成型品設置体9の突き当て(図示せず)に当接して、被成型品設置体9に対する被成型品Wの位置決め(X軸方向やY軸方向における位置決め)が行なわれているが、被成型品Wは、Z軸方向では、被成型品設置体9に単に載置された状態になっている。   In the state where the molded product W is installed on the molded product installation body 9, for example, the end of the molded product W abuts against the butting (not shown) of the molded product installation body 9, Positioning of the molded product W with respect to the molded product installation body 9 (positioning in the X-axis direction and the Y-axis direction) is performed, but the molded product W is simply placed on the molded product installation body 9 in the Z-axis direction. It is placed.

そして、被成型品設置体9と被成型品Wとの接触部(被成型品設置体9の上面と被成型品Wの下面との間のごく僅かな隙間)TC1には、大気中の空気が入り込めるようになっている。なお、被成型品設置体9に被成型品Wが設置されている状態において、被成型品Wの前記位置決めと前記載置とに加えて、被成型品Wの周囲の端部の一部を図示しないクランパーでクランプして被成型品設置体9で被成型品Wを保持していてもよい。   The contact portion between the molded product installation body 9 and the molded product W (a very small gap between the upper surface of the molded product installation body 9 and the lower surface of the molded product W) TC1 includes air in the atmosphere. Can enter. In addition, in the state in which the molded product W is installed in the molded product installation body 9, in addition to the positioning of the molded product W and the above-described placement, a part of the end portion around the molded product W is The molded product W may be held by the molded product installation body 9 by clamping with a clamper (not shown).

型保持体5は、前述したように型Mを保持するものであるが、型保持体5に保持されている状態では、型Mの微細な転写パターンが形成されている面(下面)が、被成型品設置体9に保持されている被成型品Wの微細な転写パターンが転写される面(上面)と対向してほぼ平行になっている。また、前述したように、型保持体5に保持されている型Mは、被成型品設置体9に接近・離反する方向(微細な転写パターンが形成されている型Mの面とほぼ直交する方向;Z軸方向)で、被成型品設置体9(被成型品W)に対して相対的に移動位置決め自在になっている。   As described above, the mold holder 5 holds the mold M, but in a state where the mold holder 5 is held, the surface (lower surface) on which the fine transfer pattern of the mold M is formed is Opposite and parallel to the surface (upper surface) to which the fine transfer pattern of the molded product W held by the molded product installation body 9 is transferred. Further, as described above, the mold M held by the mold holding body 5 approaches and separates from the molded product installation body 9 (almost orthogonal to the surface of the mold M on which a fine transfer pattern is formed). (Direction; Z-axis direction) is relatively movable and positionable relative to the molded product installation body 9 (molded product W).

型保持体5には、環状の部材(環状部材)17が一体的に設けられている。環状の部材17は、たとえば円環状に形成されており、型保持体5に設置されている型Mが内側に位置するように設けられている。すなわち、Z軸方向から見たときに、型保持体5に設置されている型Mを囲うように環状の部材17が設けられている。そして、転写をすべく型Mを保持している型保持体5を、被成型品Wを設置してある被成型品設置体9に相対的に近づけ型Mと被成型品Wとがお互いに接触したときに、環状の部材17と被成型品Wと型保持体5とが協働して、閉空間(大気とは遮断された空間)SP1を形成するようになっている。また、閉空間SP1の内部に、型Mと被成型品Wとの接触部TC2およびこの周辺の部位が位置するようになっている。被成型品Wの背面(下面)は、大気に開放されている。 The mold holder 5 is integrally provided with an annular member (annular member) 17. The annular member 17 is formed in, for example, an annular shape, and is provided so that the mold M installed on the mold holding body 5 is located inside. That is, the annular member 17 is provided so as to surround the mold M installed in the mold holding body 5 when viewed from the Z-axis direction. Then, the mold holder 5 holding the mold M for transfer is brought relatively close to the molded product installation body 9 on which the molded product W is installed, so that the mold M and the molded product W are mutually connected. When contacted, the annular member 17, the product to be molded W, and the mold holder 5 cooperate to form a closed space (a space cut off from the atmosphere) SP1. In addition, the contact portion TC2 between the mold M and the molding target W and the surrounding area are located in the closed space SP1. The back surface (lower surface) of the molded product W is open to the atmosphere.

より詳しく説明すると、転写をすべく型Mと被成型品Wとをお互いに接触させたときに、環状の部材17の先端部(下端部)が被成型品Wの一方の面(上面)の環状の周辺部に接触して、被成型品Wと型保持体5と型支持部材11と環状の部材17とで閉空間SP1が形成されるようになっている。閉空間SP1が形成された状態では、閉空間内SP1内に、接触部TC2の他に型Mと型保持部材13とが存在している。また、閉空間SP1の気密性を高めるために、各Oリング33、35等のシール部材が設けられている。なお、環状の部材17を型保持体5ではなく、被成型品設置体9に一体的に設けた構成であってもよいし、被成型品設置体9に単に載置し設けた構成であってもよい。   More specifically, when the mold M and the molded product W are brought into contact with each other for transfer, the tip (lower end) of the annular member 17 is on one surface (upper surface) of the molded product W. A closed space SP <b> 1 is formed by the workpiece W, the mold holding body 5, the mold support member 11, and the annular member 17 in contact with the annular peripheral portion. In the state where the closed space SP1 is formed, the mold M and the mold holding member 13 exist in the closed space SP1 in addition to the contact portion TC2. Moreover, in order to improve the airtightness of closed space SP1, sealing members, such as each O-ring 33 and 35, are provided. The annular member 17 may be integrated with the molded product installation body 9 instead of the mold holding body 5 or may be simply mounted on the molded product installation body 9. May be.

さらに説明すると、環状の部材17は、ステンレスやアルミニウム合金等の金属(剛性を備えた部材)で構成された基端部側部材30と、基端部側部材30の先端部側で基端部側部材30に一体的に設けられた先端部側部材31とを備えて構成されている。先端部側部材31は、弾性を備えたゴム等の部材(たとえばOリング)で構成されている。   More specifically, the annular member 17 includes a base end portion member 30 made of metal (a member having rigidity) such as stainless steel or an aluminum alloy, and a base end portion on the tip end side of the base end portion side member 30. A tip end side member 31 provided integrally with the side member 30 is provided. The distal end side member 31 is configured by a member such as rubber (for example, an O-ring) having elasticity.

型Mと被成型品Wとが離れている状態では、先端部側部材31の下端部は、型Mの下端部(下面)よりもごく僅かに下方に位置している。一方、先端部側部材31の下端部のほぼ全周に上向きの力が加わると、先端部側部材31が弾性変形し先端部側部材31の下端部が型Mの下端部よりも上方に位置するようになっている。   In a state where the mold M and the product W are separated from each other, the lower end portion of the tip end side member 31 is positioned slightly below the lower end portion (lower surface) of the mold M. On the other hand, when an upward force is applied to substantially the entire circumference of the lower end portion of the tip end side member 31, the tip end side member 31 is elastically deformed and the lower end portion of the tip end side member 31 is positioned above the lower end portion of the mold M. It is supposed to be.

したがって、転写をすべく型Mと被成型品Wとをお互いに接触させる直前(型Mと被成型品Wとが僅かに離れているとき)に、先端部側部材31と被成型品Wとの周辺部とがお互いに接触して閉空間SP1が形成されるようになっている。また、先端部側部材31が弾性変形するので、閉空間SP1を形成したまま、型保持体5(型M)がさらにわずかな距離だけ下降し、型Mで被成型品Wを押圧することができるようになっている。   Therefore, immediately before the mold M and the molded product W are brought into contact with each other for transfer (when the mold M and the molded product W are slightly separated from each other), the tip side member 31 and the molded product W are The closed portion SP1 is formed by contact with each other. Further, since the tip end side member 31 is elastically deformed, the mold holding body 5 (mold M) is further lowered by a slight distance while the closed space SP1 is formed, and the molded product W can be pressed by the mold M. It can be done.

なお、図2では、図を見やすくするために、被成型品Wを動かして描いているが、転写装置1では、被成型品Wではなく、型Mや型保持体5が移動するようになっている。   In FIG. 2, in order to make the drawing easier to see, the product to be molded W is drawn, but in the transfer device 1, not the product to be molded W but the mold M and the mold holding body 5 are moved. ing.

減圧手段12は、たとえば真空ポンプ23を備えて構成されている。閉空間SP1と真空ポンプ23とは流路19でつながっている。流路19は、この一部が型保持体5に設けられた貫通孔によって構成されている。流路19の途中には、流路19を開閉するためのバルブ21が設けられている。   The decompression means 12 includes a vacuum pump 23, for example. The closed space SP1 and the vacuum pump 23 are connected by a flow path 19. A part of the flow path 19 is formed by a through hole provided in the mold holding body 5. A valve 21 for opening and closing the flow path 19 is provided in the middle of the flow path 19.

そして、前記制御装置の制御の下、閉空間SP1が形成されたときに(前記転写をすべく型Mと被成型品Wとがお互いに接触し、型Mと被成型品Wとの接触部TC2が閉じた空間SP1内に位置したときに)、真空ポンプ23を稼動しバルブ21を開くと、閉空間SP1内がたとえば真空に近くなるまで減圧されるようになっている。   Then, when the closed space SP1 is formed under the control of the control device (the mold M and the molded product W are in contact with each other to perform the transfer, the contact portion between the mold M and the molded product W) When the vacuum pump 23 is operated and the valve 21 is opened (when the TC2 is located in the closed space SP1), the inside of the closed space SP1 is depressurized, for example, close to a vacuum.

なお、転写装置1に、閉空間SP1内の気体(空気)の圧力を高めるための加圧手段14を設けてもよい。加圧手段14は、たとえば圧縮空気圧源29を備えて構成されている。閉空間SP1と圧縮空気圧源29とは流路25でつながっている。流路25は、その一部が型保持体5に設けられた貫通孔によって構成されている。流路25の途中には、流路25を開閉するためのバルブ27が設けられている。   Note that the transfer device 1 may be provided with a pressurizing unit 14 for increasing the pressure of the gas (air) in the closed space SP1. The pressurizing means 14 includes, for example, a compressed air pressure source 29. The closed space SP1 and the compressed air pressure source 29 are connected by a flow path 25. A part of the flow path 25 is configured by a through hole provided in the mold holding body 5. A valve 27 for opening and closing the flow path 25 is provided in the middle of the flow path 25.

そして、前記制御装置の制御の下、閉空間SP1が形成され転写が終了した後に、バルブ27を開くと、閉空間SP1内が加圧され、被成型品Wを型Mから容易に取り外すことができるようになっている。なお、圧縮空気圧源29を削除し、流路25の端部を大気に開放した構成であってもよい。   Then, under the control of the control device, when the valve 27 is opened after the closed space SP1 is formed and the transfer is completed, the inside of the closed space SP1 is pressurized and the product W can be easily removed from the mold M. It can be done. The compressed air pressure source 29 may be deleted, and the end of the flow path 25 may be open to the atmosphere.

次に転写装置1の動作について説明する。   Next, the operation of the transfer device 1 will be described.

図3は、転写装置1の動作の概略を示す図である。   FIG. 3 is a diagram showing an outline of the operation of the transfer apparatus 1.

まず、初期状態として、図3(a)に示すよに、型保持体5に型Mが保持されており、被成型品設置体9に被成型品Wが設置されており、型保持体5が上昇し、型Mや環状の部材17は、被成型品Wから離れているものとする。被成型品設置体9(被成型品W)は、X軸方向やY軸方向で適宜の位置に位置決めされているものとする。また、真空ポンプ23は停止しており(稼動していてもよい)、各バルブ21、27は閉じているものとする。 First, as an initial state, Remind as in FIG. 3 (a), and the mold M is held by the mold holder 5, the molded article W is installed in the molding installation body 9, the mold carrier 5 rises, and the mold M and the annular member 17 are separated from the product W. The molded product installation body 9 (molded product W) is positioned at an appropriate position in the X-axis direction and the Y-axis direction. Further, it is assumed that the vacuum pump 23 is stopped (it may be operating) and the valves 21 and 27 are closed.

前記制御装置の制御の下、図3(b)に示すように、転写をするために前記初期状態から型保持体5を下降させて、型Mと被成型品Wとをお互いに接触させると共に、閉空間SP1を形成し、型Mと被成型品Wとの接触部TC2を閉空間SP1内に位置させる。   Under the control of the control device, as shown in FIG. 3 (b), the mold holder 5 is lowered from the initial state in order to perform transfer, and the mold M and the workpiece W are brought into contact with each other. The closed space SP1 is formed, and the contact portion TC2 between the mold M and the workpiece W is positioned in the closed space SP1.

続いて、真空ポンプ23を稼動しバルブ21を開いて、閉空間SP1内の気圧を閉空間SP1の外の気圧(たとえば大気圧)よりも下げ(たとえば、真空近くまで下げ)、型Mをさらにごく僅かに下降して、型Mで被成型品Wを押圧すると共に、紫外線を照射して転写素材W3を硬化させる。なお、前記押圧の押圧力は、たとえば型保持体5にロードセルを設け、このロードセルからの信号に基づいて、前記制御装置の制御の下、適宜の値に制御されるものとする。   Subsequently, the vacuum pump 23 is operated and the valve 21 is opened, so that the pressure inside the closed space SP1 is lowered (for example, close to the vacuum) outside the pressure outside the closed space SP1 (eg, near atmospheric pressure), and the mold M is further moved. The transfer material W3 is slightly lowered, presses the workpiece W with the mold M, and irradiates ultraviolet rays to cure the transfer material W3. Note that the pressing force of the pressing is controlled to an appropriate value under the control of the control device based on, for example, a load cell provided in the mold holder 5 and a signal from the load cell.

閉空間SP1内の圧力(気圧)を下げると、被成型品Wと被成型品設置体9とのごく僅かな隙間TC1に空気(大気)が入り込み、大気圧によって被成型品Wが弾性変形し、被成型品Wが型Mに倣い、型Mと被成型品Wとの接触部TC2における圧力が均一化される。すなわち、型Mと被成型品Wとの接触部TC2のいずれの部位においても、微小な単位面積あたりの接触圧力がお互いにほぼ等しくなる。   When the pressure (atmospheric pressure) in the closed space SP1 is lowered, air (atmosphere) enters a very small gap TC1 between the molded product W and the molded product installation body 9, and the molded product W is elastically deformed by atmospheric pressure. The molded product W follows the mold M, and the pressure at the contact portion TC2 between the mold M and the molded product W is made uniform. That is, in any part of the contact portion TC2 between the mold M and the product W, the contact pressure per minute unit area is substantially equal to each other.

なお、上述した動作においては、転写の際に、大気圧に加えて、型保持体5を用い型Mを被成型品Wに押し付けて押圧をしている(型Mと被成型品設置体9との間に被成型品Wを挟み込んでいる)が、型保持体5による前記押圧を止めて、大気圧のみで被成型品Wを変形させて型Mに倣わせると共に被成型品Wを型Mに押し付けるようにしてもよい。   In the above-described operation, during the transfer, in addition to the atmospheric pressure, the mold M is pressed against the molded product W by using the mold holding body 5 (the mold M and the molded product installation body 9). The molded product W is sandwiched between the mold holder 5 and the pressing by the mold holding body 5 is stopped, and the molded product W is deformed by only atmospheric pressure so as to follow the mold M and the molded product W is You may make it press on the type | mold M. FIG.

前記転写後に、図3(c)に示すように、型保持体5を上昇させて型Mを被成型品Wから離し、バルブ21を閉じ真空ポンプ23を停止すると共に、バルブ27を開いて閉空間SP1内の圧力を上げれば、被成型品Wが型Mから容易にはずれる。なお、図3(b)に示す転写の終了後に、型保持体5の上昇と同時に閉空間SP1内を加圧してもよい。   After the transfer, as shown in FIG. 3C, the mold holder 5 is raised to separate the mold M from the workpiece W, the valve 21 is closed, the vacuum pump 23 is stopped, and the valve 27 is opened and closed. If the pressure in the space SP <b> 1 is increased, the molded product W can be easily removed from the mold M. Note that, after the transfer shown in FIG. 3B, the inside of the closed space SP1 may be pressurized simultaneously with the rise of the mold holder 5.

このようにして、転写素材W3に微細な転写パターンが転写された被成型品Wについて残膜を除去し、この残膜除去後に、転写素材W3をマスク材として基材W1にエッチング(たとえば、ドライエッチング)をすることによって、型Mの微細な転写パターンに対応した微細パターンが基材W1に形成される。基材W1への微細パターンの形成後に、転写素材W3は除去(クリーニング)される。   In this way, the residual film is removed from the molded product W on which the fine transfer pattern is transferred to the transfer material W3. After the residual film is removed, the transfer material W3 is used as a mask material to etch the substrate W1 (for example, dry By etching), a fine pattern corresponding to the fine transfer pattern of the mold M is formed on the substrate W1. After the fine pattern is formed on the substrate W1, the transfer material W3 is removed (cleaned).

ここで、残膜の除去とは、転写後に転写素材W3の微細な凹部の底で基材W1を覆っているごく薄い転写素材の膜を、Oアッシング等で除去することであり、この除去によって、型Mの微細な転写パターンと同様な微細パターンで、基材W1の表面が露出する。 Here, the removal of the remaining film is to remove a very thin transfer material film covering the base material W1 with the bottom of the fine concave portion of the transfer material W3 after the transfer by O 2 ashing or the like. As a result, the surface of the substrate W1 is exposed with a fine pattern similar to the fine transfer pattern of the mold M.

転写装置1によれば、転写をするために型Mと被成型品Wとをお互いに接触させる場合、この接触部TC2を閉空間SP1内に位置させこの閉空間内SP1の気圧を大気圧よりも下げることにより、被成型品Wを変形させて接触部TC2における圧力を均一化するようになっているので、精度のよい転写を行うことができる。   According to the transfer device 1, when the mold M and the workpiece W are brought into contact with each other for transfer, the contact portion TC2 is positioned in the closed space SP1, and the atmospheric pressure of the closed space SP1 is changed from the atmospheric pressure. By lowering the height, the molded product W is deformed and the pressure at the contact portion TC2 is made uniform, so that accurate transfer can be performed.

すなわち、前記減圧をすることによって、被成型品Wが大気圧で変形して型Mに倣い、接触部TC2における圧力(型Mと被成型品Wとの間の押圧力)が均一化され、被成型品Wに形成される微細な転写パターンの深さが均一になる。また、接触部TC2における圧力をほぼ真空になるまで減圧することによって、接触部TC2への気泡の混入を防ぐことができ、気泡の発生による成型不良を軽減することができる。   That is, by reducing the pressure, the molded product W is deformed at atmospheric pressure to follow the mold M, and the pressure at the contact portion TC2 (the pressing force between the mold M and the molded product W) is made uniform. The depth of the fine transfer pattern formed on the workpiece W is uniform. In addition, by reducing the pressure at the contact portion TC2 until it becomes almost vacuum, mixing of bubbles into the contact portion TC2 can be prevented, and molding defects due to the generation of bubbles can be reduced.

さらに、型保持体5と環状部材17と被成型品Wとで接触部TC2のまわりの狭い範囲に局所的な閉空間SP1を形成するので、装置の構成を簡素化することができると共に、減圧をするためのエネルギーを従来の装置よりも少なくすることができ、装置のランニングコストを低減することができる。   Furthermore, since the local closed space SP1 is formed in a narrow range around the contact portion TC2 by the mold holder 5, the annular member 17, and the workpiece W, the configuration of the apparatus can be simplified and the pressure can be reduced. It is possible to reduce the energy for performing the operation as compared with the conventional apparatus, and to reduce the running cost of the apparatus.

ところで、前記説明では、閉空間SP1内を減圧して被成型品Wを変形させているが、被成型品Wの変形に代えて、型Mを変形させてもよい。この場合、図1や図2に示す被成型品Wの設置位置と型Mの設置位置とを入れ換えて、図1や図2に示す転写装置1の上下を逆にすればよい。そして、型が図1や図2示す被成型品のように薄い板状に形成されており、Z軸方向から眺めた場合、型の内側に被成型品が入っており、型と環状部材と被成型品設置体(図1や図2示す型保持体に相当するもの)とで、閉空間が形成されるものとする。 Incidentally, in the above description, the molded product W is deformed by reducing the pressure in the closed space SP1, but the mold M may be deformed instead of the deformation of the molded product W. In this case, the installation position of the molded product W shown in FIGS. 1 and 2 and the installation position of the mold M may be exchanged so that the transfer apparatus 1 shown in FIGS. 1 and 2 is turned upside down. The mold is formed into a thin plate like the molded product shown in FIGS. 1 and 2 , and when viewed from the Z-axis direction, the molded product is contained inside the mold. and out with the molding installation body (corresponding to the type carrier shown in FIGS. 1 and 2), it is assumed that the closed space is formed.

また、転写装置1がジンバル機構を備えて構成されていてもよい。すなわち、図1に示す型保持体5を、上方に位置しベースフレーム3に対して上下動する上側部材と、下方に位置し型Mを保持する下側部材とに分割する。そして、たとえば、球面の一部を用いた構成された凹面を前記上側部材に形成し、前記球面の一部を用いた構成された凸面を前記下側部材に形成し、前記上側部材の凹面と前記下側部材の凸面とをお互いに面接触させて前記上側部材と前記下側部材とをお互いに係合させ、前記上側部材に対する前記下側部材の姿勢(X軸まわりの回動角度とY軸まわりの回動角度)を調整することができるようにしてもよい。   Further, the transfer device 1 may include a gimbal mechanism. That is, the mold holding body 5 shown in FIG. 1 is divided into an upper member that is positioned above and moves up and down relative to the base frame 3 and a lower member that is positioned below and holds the mold M. Then, for example, a concave surface configured using a part of a spherical surface is formed on the upper member, a convex surface configured using a part of the spherical surface is formed on the lower member, and the concave surface of the upper member is The upper member and the lower member are engaged with each other by bringing the convex surface of the lower member into surface contact with each other, and the posture of the lower member relative to the upper member (the rotation angle around the X axis and the Y The rotational angle around the axis may be adjustable.

なお、転写装置1は、転写をするために型と被成型品とをお互いに接合する(接触させ必要に応じた押圧する)場合、前記型の背面(接合面とは反対側に位置している面)、前記被成型品の背面のうちの少なくとも一方の面に大気圧がかかるように、前記接合部を真空引きする真空引き手段を有する転写装置の例である。   The transfer device 1 is located on the back surface of the mold (on the opposite side to the bonding surface) when the mold and the molded product are bonded to each other (contact and pressed as necessary) for transfer. And an evacuation means for evacuating the joint so that atmospheric pressure is applied to at least one of the back surfaces of the molded product.

また、第1の実施形態に係る発明を、型に形成されている微細な転写パターンを、被成型品に転写する転写方法において、前記転写をするために前記型と前記被成型品とをお互いに接合させる場合、少なくとも前記接合部を真空引きして、前記型の背面、前記被成型品の背面のうちの少なくとも一方の面に大気圧がかかるようにする転写方法として把握してもよい。 Further, in the transfer method for transferring the fine transfer pattern formed on the mold to the molded product according to the invention according to the first embodiment, the mold and the molded product are mutually connected to perform the transfer. If Ru is joined to at least said evacuated the junction, the back of the mold, the can be grasped as a method for transferring the atmospheric pressure as according to at least one surface of the back of the molding .

[第2の実施形態]
図4は、本発明の第2の実施形態に係る転写装置1aの概略構成と動作とを示す図である。
[Second Embodiment]
FIG. 4 is a diagram showing a schematic configuration and operation of a transfer apparatus 1a according to the second embodiment of the present invention.

本発明の第2の実施形態に係る転写装置1aは、型Mが型保持体に保持されていない点を除いて、本発明の第1の実施形態に係る転写装置1とほぼ同様に構成されており、本発明の第1の実施形態に係る転写装置1とほぼ同様の効果を奏する。   The transfer apparatus 1a according to the second embodiment of the present invention is configured in substantially the same manner as the transfer apparatus 1 according to the first embodiment of the present invention, except that the mold M is not held by the mold holder. Thus, the transfer apparatus 1 according to the first embodiment of the present invention has substantially the same effect.

すなわち、転写装置1aは、移動体5aと、転写装置1と同様に構成されている被成型品設置体9、環状部材17、減圧手段12とを有する。   That is, the transfer device 1 a includes a moving body 5 a, a molded product installation body 9, an annular member 17, and a decompression unit 12 that are configured in the same manner as the transfer device 1.

移動体5aは、被成型品設置体9に設置されている被成型品Wの微細な転写パターンが転写される面とほぼ平行で対向する平面状の下面を備えており、Z軸方向で被成型品(被成型品設置体9に設置されている被成型品)Wに対して相対的に移動位置決め自在になっている。   The moving body 5a has a flat lower surface that is substantially parallel to and opposite to the surface to which the fine transfer pattern of the molded product W installed in the molded product installation body 9 is transferred. It is movable and positionable relative to a molded product (molded product installed in the molded product installation body 9) W.

環状部材17は、転写をすべく移動体5aを下方に移動させて移動体5aが被成型品設置体9に保持されている被成型品Wに載置されている型Mに接触するときに、被成型品Wおよび移動体5aと協働して、型Mと被成型品Wとの接触部TC2およびこの周辺の部位を閉じた空間SP1内に位置させるようになっている。 The annular member 17 moves the moving body 5a downward to perform transfer , and the moving body 5a comes into contact with the mold M placed on the molding target W held by the molding target installation body 9. The contact part TC2 between the mold M and the molded product W and the surrounding area are positioned in the closed space SP1 in cooperation with the molded product W and the moving body 5a.

より詳しく説明すると、型Mは薄い平板状に形成されている。被成型品Wも薄い板状に形成されている。被成型品設置体9に設置されている被成型品Wは、この厚さ方向が上下方向(Z軸方向)になるようにして被成型品設置体9の平面状の上面に設置(載置)されている。被成型品Wに設置(載置)されている型Mも、この厚さ方向が上下方向になっており下面に微細な転写パターンが存在している。また、Z軸方向から見ると、型Mは被成型品Wの内側に収まっている(図4(a)参照)。   More specifically, the mold M is formed in a thin flat plate shape. The molded product W is also formed in a thin plate shape. The molded product W installed in the molded product installation body 9 is installed (placed) on the planar upper surface of the molded product installation body 9 such that the thickness direction is the vertical direction (Z-axis direction). ) The mold M installed (placed) on the workpiece W also has a vertical direction in the thickness direction, and a fine transfer pattern exists on the lower surface. Further, when viewed from the Z-axis direction, the mold M is housed inside the molded product W (see FIG. 4A).

移動体5aが下降すると、移動体5aの平面状の下面が、型Mの平面状の上面(背面)に接触するようになっている。そして、移動体5aの下面と型Mの上面とが接触する直前のところまで移動体5a下降したときに、環状の部材17の先端部が被成型品Wの一方の面(上面)に接触して、被成型品Wと型保持体5と環状の部材17とで閉空間SP1が形成されるようになっている(図4(b)参照)。 When the movable body 5a is lowered, the planar lower surface of the movable body 5a comes into contact with the planar upper surface (back surface) of the mold M. When the moving body 5a is lowered to a position just before the lower surface of the moving body 5a contacts the upper surface of the mold M, the tip of the annular member 17 contacts one surface (upper surface) of the product W. Thus, the closed space SP1 is formed by the article to be molded W, the mold holder 5 and the annular member 17 (see FIG. 4B).

移動体5aがさらに僅かに下降して、移動体5aの下面が型Mの上面に接触し、移動体5aがさらにごく僅かに下降して、被成型品Wと型Mとを、移動体5aと被成型被設置体9とで挟み込んで押圧する場合にあっても、閉空間SP1が形成されている(図4(b)参照)。   The moving body 5a is further lowered slightly, the lower surface of the moving body 5a is in contact with the upper surface of the mold M, the moving body 5a is further lowered slightly, and the product W and the mold M are moved to the moving body 5a. The closed space SP1 is formed even when sandwiched and pressed between the molded object 9 and the molded object 9 (see FIG. 4B).

そして、閉空間SP1内を減圧手段12によって減圧すると、転写装置1の場合と同様にして、均一な転写がされるようになっている(図4(b)参照)。   Then, when the inside of the closed space SP1 is depressurized by the depressurizing means 12, uniform transfer is performed in the same manner as in the transfer device 1 (see FIG. 4B).

上記転写後、型Mや被成型品Wと共に移動体5aを上昇させて、閉空間SP1内を加圧すれば(減圧状態を解除すれば)、被成型品Wや型Mが移動体5aから容易に離れる。   After the transfer, if the movable body 5a is lifted together with the mold M and the molded article W and the inside of the closed space SP1 is pressurized (if the decompressed state is released), the molded article W and the mold M are removed from the movable body 5a. Leave easily.

なお、転写ための押圧(型Mによる被成型品Wへの押圧)をしなくてもよい。すなわち、移動体5aの下面が型Mの上面に接触した位置もしくは接触する直前の位置で移動体5aを止めておき、減圧手段12による減圧のみで転写を行ってもよい。   In addition, it is not necessary to perform the pressing for the transfer (the pressing to the workpiece W by the mold M). That is, the moving body 5a may be stopped at the position where the lower surface of the moving body 5a is in contact with the upper surface of the mold M or just before the contact, and the transfer may be performed only by the decompression by the decompression means 12.

[第3の実施形態]
図5は、本発明の第3の実施形態に係る転写装置1bの概略構成を示す図である。
[Third Embodiment]
FIG. 5 is a diagram showing a schematic configuration of a transfer apparatus 1b according to the third embodiment of the present invention.

本発明の第3の実施形態に係る転写装置1bは、閉空間SP3内の圧力を大気圧よりも高くして、被成型品Wを変形させる点が、本発明の第1の実施形態に係る転写装置1と異なり、その他の点は、本発明の第1の実施形態に係る転写装置1とほぼ同様に構成されており、本発明の第1の実施形態に係る転写装置1とほぼ同様の効果を奏する。   The transfer device 1b according to the third embodiment of the present invention relates to the first embodiment of the present invention in that the pressure in the closed space SP3 is made higher than the atmospheric pressure to deform the product W. The transfer device 1 is different from the transfer device 1 in other respects and is configured in substantially the same manner as the transfer device 1 according to the first embodiment of the present invention, and is substantially the same as the transfer device 1 according to the first embodiment of the present invention. There is an effect.

すなわち、転写装置1bは、被成型品設置体9bと、加圧手段と、転写装置1と同様に構成されている型保持体5、環状部材17とを有する。   That is, the transfer device 1 b includes a molded product installation body 9 b, a pressurizing unit, and a mold holder 5 and an annular member 17 that are configured in the same manner as the transfer device 1.

被成型品設置体9bは、被成型品Wの周辺部(たとえば、環状の周辺部)を支持して被成型品Wを設置(載置)するように構成されている。また、被成型品設置体9bの内部には、上面の前記周辺部の内側に存在する凹部とこの凹部を蓋する薄い膜状の部材(たとえば弾性体で構成された膜状部材)37とで閉空間SP3が形成されている。 The molded product installation body 9b is configured to install (place) the molded product W while supporting a peripheral portion (for example, an annular peripheral portion) of the molded product W. Inside of the molding installation body 9b, at the 37 recess and the recess (film member composed of e.g. elastic) thin film-like member to cover existing inside of the peripheral portion of the upper surface A closed space SP3 is formed.

そして、閉空間SP3内が前記加圧手段で大気圧よりも高い圧力に加圧されたときに、膜状部材37が変形(たとえば、弾性変形)して、被成型品設置体9bに設置されている被成型品Wを上方に押すようになっている。前記加圧手段は、たとえばバルブ27と圧縮空気圧源29を備えて構成されている。   Then, when the inside of the closed space SP3 is pressurized to a pressure higher than the atmospheric pressure by the pressurizing means, the film-like member 37 is deformed (for example, elastically deformed) and is installed on the molded product installation body 9b. The product to be molded W is pushed upward. The pressurizing means includes, for example, a valve 27 and a compressed air pressure source 29.

なお、前記加圧手段で加圧を行うと、膜状部材37で被成型品設置体9bに保持されている被成型品Wが上方に押される。しかし、転写の際には上方から型M(型保持体5)で押えられているので、被成型品Wが際限なく上昇することはない。前記加圧を行うと、膜状部材37に接している被成型品Wの部位が押されて、被成型品Wが弾性変形をし、均一な押圧力で型Mに押圧されるようになっている。 When pressurization is performed by the pressurizing means, the molded product W held by the molded product installation body 9b by the film member 37 is pushed upward. However, since the sheet M is pressed from above by the mold M (mold holding body 5), the molded product W does not rise without limit. When the pressurization is performed, the part of the molded product W that is in contact with the film-like member 37 is pressed, the molded product W is elastically deformed, and is pressed against the mold M with a uniform pressing force. ing.

[第4の実施形態]
図6は、本発明の第4の実施形態に係る転写装置1cの概略構成を示す図である。
[Fourth Embodiment]
FIG. 6 is a diagram showing a schematic configuration of a transfer apparatus 1c according to the fourth embodiment of the present invention.

本発明の第4の実施形態に係る転写装置1cは、被成型品Wの代わりに板状の部材(板状部材)39を用いて閉空間を形成する点が、本発明の第1の実施形態に係る転写装置1と異なり、その他の点は、本発明の第1の実施形態に係る転写装置1とほぼ同様に構成されており、本発明の第1の実施形態に係る転写装置1とほぼ同様の効果を奏する。 The transfer device 1c according to the fourth embodiment of the present invention is that the closed space is formed by using a plate-like member (plate-like member) 39 instead of the product W to be molded. The transfer device 1 is different from the transfer device 1 according to the embodiment in other respects, and is configured in substantially the same manner as the transfer device 1 according to the first embodiment of the present invention. The transfer device 1 according to the first embodiment of the present invention is different from the transfer device 1 according to the first embodiment of the present invention. The effect is almost the same.

すなわち、転写装置1cは、転写装置1と同様に構成されている型保持体5、被成型品設置体9、環状部材17、減圧手段12を有する。   That is, the transfer device 1 c includes a mold holder 5, a molded product installation body 9, an annular member 17, and a decompression unit 12 that are configured in the same manner as the transfer device 1.

被成型品設置体9は、上面に薄い板状部材39を備えている。薄い板状部材39は、たとえば、金属で構成され弾性を備えている。被成型品設置体9は、板状部材39を間にして被成型品Wを設置(載置)するようになっている。   The molded product installation body 9 includes a thin plate-like member 39 on the upper surface. The thin plate member 39 is made of, for example, metal and has elasticity. The molded product installation body 9 is configured to install (place) the molded product W with the plate-like member 39 interposed therebetween.

より詳しく説明すると、板状部材39は、薄い平板状に形成され厚さ方向が上下方向(Z軸方向)になるようにして、被成型品設置体9の平面状の上面に設けられている。板状部材39は、被成型品設置体9の上面をほぼ覆っているが、被成型品設置体9よりも僅かに小さく形成されて被成型品設置体9の内側に位置している構成であってもよい。また、被成型品Wは板状部材39よりも小さく形成されており、Z軸方向から眺めた場合、板状部材39に載置された被成型品Wが、板状部材39の内側に位置している。   More specifically, the plate-like member 39 is formed on a flat upper surface of the molded product installation body 9 so as to be formed in a thin flat plate shape with the thickness direction being the vertical direction (Z-axis direction). . The plate-like member 39 substantially covers the upper surface of the molded product installation body 9, but is configured to be slightly smaller than the molded product installation body 9 and positioned inside the molded product installation body 9. There may be. Further, the molded product W is formed smaller than the plate-shaped member 39, and the molded product W placed on the plate-shaped member 39 is positioned inside the plate-shaped member 39 when viewed from the Z-axis direction. doing.

また、板状部材39は、お互いが離れた端部近傍の2箇所(たとえば、図6の左方向の端部で、お互いが図6の紙面に直角な方向で離れている2箇所)で、被成型品設置体9に一体的に設けられている。そして、被成型品設置体9と板状部材39との接触部(被成型品設置体9の上面と板状部材39の下面との間のごく僅かな隙間)TC3には、大気中の空気が入り込めるようになっている。 Further, the plate-like member 39, at two locations in the vicinity of the end portion of each other apart (e.g., in the left end portion of FIG. 6, each other that are separated by a perpendicular direction to the plane of FIG. 6 x2), The molded product installation body 9 is integrally provided. The contact portion between the molded product installation body 9 and the plate-shaped member 39 (a very small gap between the upper surface of the molded product installation body 9 and the lower surface of the plate-shaped member 39) TC3 includes air in the atmosphere. Can enter.

また、板状部材39に被成型品Wが設置されている状態では、被成型品Wの端部が板状部材39に設けられている突き当て(図示せず)に当接して、被成型品設置体9(板状部材39)に対する被成型品Wの位置決めがなされている。なお、被成型品設置体9(板状部材39)に被成型品Wが設置されている状態において、被成型品Wの前記位置決めと前記載置とに加えて、被成型品Wの周囲の端部の一部をクランプしていてもよい。   Further, in a state where the molded product W is installed on the plate-shaped member 39, the end of the molded product W comes into contact with an abutment (not shown) provided on the plate-shaped member 39, and the molded product W The molded product W is positioned with respect to the product installation body 9 (plate member 39). In addition, in the state in which the molded product W is installed on the molded product installation body 9 (plate member 39), in addition to the positioning of the molded product W and the above-described placement, the surroundings of the molded product W A part of the end may be clamped.

環状の部材17は、転写をすべく型Mと被成型品Wとをお互いに接触させたときに、板状部材39および型保持体5と協働して、型Mと被成型品Wとの接触部(型M全体と被成型品W全体を含む)を閉じた空間SP5内に位置させるようになっている。   The annular member 17 cooperates with the plate-like member 39 and the mold holding body 5 when the mold M and the molded article W are brought into contact with each other for transfer, and the mold M and the molded article W are The contact portion (including the entire mold M and the entire workpiece W) is positioned in the closed space SP5.

そして、転写のときには、減圧手段12で閉空間SP5内が減圧されるようになっている。   At the time of transfer, the inside of the closed space SP5 is decompressed by the decompression means 12.

ところで、上記各転写装置1、1a、1b、1cでは、型保持体5がZ軸方向に移動するようになっているが、型保持体5がZ軸方向に移動することに代えてまたは加えて、被成型品設置体9がZ軸方向に移動するようになっていてもよい。同様にして、型保持体5が、X軸方向、Y軸方向に移動するようになっていてもよい。   By the way, in each of the transfer devices 1, 1a, 1b, and 1c, the mold holder 5 moves in the Z-axis direction, but instead of or in addition to the mold holder 5 moving in the Z-axis direction. And the to-be-molded product installation body 9 may be configured to move in the Z-axis direction. Similarly, the mold holder 5 may move in the X-axis direction and the Y-axis direction.

また、図7に示すように、転写をする際に、型Mと被成型品Wとをお互いに接触させておき、この接触している型Mと被成型品Wとを、弾性体等の薄い膜で構成されている容器41の閉空間SP6内に収納し、真空ポンプ23を用いて閉空間SP6内を減圧し、型Mと被成型品Wとを弾性変形させ、押圧力を均一化して転写を行ってもよい。   Further, as shown in FIG. 7, when transferring, the mold M and the product W are kept in contact with each other, and the mold M and the product W are in contact with each other such as an elastic body. It is housed in the closed space SP6 of the container 41 made of a thin film, and the inside of the closed space SP6 is depressurized using the vacuum pump 23, and the mold M and the product W are elastically deformed to make the pressing force uniform. Transfer may be performed.

本発明の実施形態に係る転写装置1の概略構成を示す図である。1 is a diagram illustrating a schematic configuration of a transfer apparatus 1 according to an embodiment of the present invention. 転写装置1の主要部の概略構成を示す図である。1 is a diagram illustrating a schematic configuration of a main part of a transfer device 1. FIG. 転写装置1の動作の概略を示す図である。FIG. 5 is a diagram showing an outline of the operation of the transfer device 1. 本発明の第2の実施形態に係る転写装置1aの概略構成と動作とを示す図である。It is a figure which shows schematic structure and operation | movement of the transfer apparatus 1a which concerns on the 2nd Embodiment of this invention. 本発明の第3の実施形態に係る転写装置1bの概略構成を示す図である。It is a figure which shows schematic structure of the transfer apparatus 1b which concerns on the 3rd Embodiment of this invention. 本発明の第4の実施形態に係る転写装置1cの概略構成を示す図である。It is a figure which shows schematic structure of the transfer apparatus 1c which concerns on the 4th Embodiment of this invention. 転写の変形例を示す図である。It is a figure which shows the modification of transcription | transfer.

符号の説明Explanation of symbols

1a、1b、1c 転写装置
5 型保持体
9 被成型品設置体
10 閉空間形成手段
12 減圧手段
17 環状部材
M 型
W 被成型品
1a, 1b, 1c transfer device 5 type holder 9 the molding installation body 10 closed space forming means 12 decompression means 17 annular member M type W to be molded

Claims (6)

型に形成されている微細な転写パターンを、被成型品に転写する転写装置において、
前記転写をするために前記型と前記被成型品とをお互いに接触させた接触部を閉空間内に位置させる閉空間形成手段と;
前記閉空間形成手段で形成された閉空間内の気圧を前記閉空間の外の気圧よりも下げることにより、前記型と前記被成型品とのうちの少なくとも一方を、その背面に前記閉空間の外の気圧をかけて変形させ、前記接触部における圧力を均一化する減圧手段とを有する、
ことを特徴とする転写装置。
In a transfer device for transferring a fine transfer pattern formed on a mold to a molded product,
Closed space forming means for positioning in the closed space a contact portion where the mold and the molded product are brought into contact with each other for the transfer;
By lowering the atmospheric pressure in the closed space formed by the closed space forming means to be lower than the atmospheric pressure outside the closed space, at least one of the mold and the molded product is placed on the back surface of the closed space. Depressurizing means that deforms by applying an external atmospheric pressure and uniformizes the pressure in the contact portion,
A transfer device characterized by that.
型に形成されている微細な転写パターンを、被成型品に転写する転写装置において、
前記被成型品を設置するための被成型品設置体と;
前記型を保持し、前記被成型品設置体に接近・離反する方向で前記被成型品設置体に対して相対的に移動位置決め自在な型保持体と;
前記転写をすべく前記型と前記被成型品とをお互いに接触させたときに、前記被成型品および前記型保持体と協働して、前記型と前記被成型品との接触部を閉空間内に位置させる環状の部材と;
前記閉空間内を減圧するとともに、前記型と前記被成型品とのうちの少なくとも一方を、その背面に前記閉空間の外の気圧をかけて変形させ、前記接触部における圧力を均一化する減圧手段とを有する、
ことを特徴とする転写装置。
In a transfer device for transferring a fine transfer pattern formed on a mold to a molded product,
A molded product installation body for installing the molded product;
A mold holder that holds the mold and is movable and positionable relative to the molded article installation body in a direction approaching and moving away from the molded article installation body;
When the mold and the molded product are brought into contact with each other for the transfer, the contact portion between the mold and the molded product is closed in cooperation with the molded product and the mold holder. An annular member positioned in the space;
Reduced pressure in the closed space, and at least one of the mold and the product to be molded is deformed by applying atmospheric pressure outside the closed space to the back surface thereof, and the pressure in the contact portion is made uniform Having means,
A transfer device characterized by that.
型に形成されている微細な転写パターンを、被成型品に転写する転写装置において、
前記被成型品を設置するための被成型品設置体と;
前記被成型品設置体に接近・離反する方向で前記被成型品設置体に対して相対的に移動位置決め自在な移動体と;
前記転写をすべく、前記被成型品設置体に設置されている被成型品に設置されている型に近づく方向に前記移動体が移動したときに、前記被成型品および前記移動体と協働して、前記型と前記被成型品との接触部を閉空間内に位置させる環状の部材と;
前記閉空間内を減圧するとともに、前記被成型品を、その背面に前記閉空間の外の気圧をかけて変形させ、前記接触部における圧力を均一化する減圧手段とを有する、
ことを特徴とする転写装置。
In a transfer device for transferring a fine transfer pattern formed on a mold to a molded product,
A molded product installation body for installing the molded product;
A movable body which is movable and positionable relative to the molded article installation body in a direction approaching / separating from the molded article installation body;
When the movable body moves in a direction approaching a mold installed on the molded product installed on the molded product installation body for the transfer, it cooperates with the molded product and the movable body And an annular member for positioning a contact portion between the mold and the article to be molded in a closed space;
A pressure reducing unit that decompresses the inside of the closed space and deforms the molding object by applying an air pressure outside the closed space to the back surface thereof, and uniformizes the pressure in the contact portion;
A transfer device characterized by that.
型に形成されている微細な転写パターンを、被成型品に転写する転写装置において、
薄い板状部材を備え;
この板状部材を間にして前記被成型品を設置する被成型品設置体と;
前記型を保持し、前記被成型品設置体に接近・離反する方向で前記被成型品設置体に対して相対的に移動位置決め自在な型保持体と;
前記転写をすべく前記型と前記被成型品とをお互いに接触させたときに、前記板状部材および前記型保持体と協働して、前記型と前記被成型品との接触部を閉空間内に位置させる環状の部材と;
前記閉空間内を減圧するとともに、前記板状部材および前記被成型品を、前記板状部材の背面に前記閉空間の外の気圧をかけて変形させ、前記接触部における圧力を均一化する減圧手段とを有する、
ことを特徴とする転写装置。
In a transfer device for transferring a fine transfer pattern formed on a mold to a molded product,
With a thin plate-like member;
A molded product installation body in which the molded product is installed with the plate-shaped member interposed therebetween;
A mold holder that holds the mold and is movable and positionable relative to the molded article installation body in a direction approaching and moving away from the molded article installation body;
When the mold and the molded product are brought into contact with each other to perform the transfer, the contact portion between the mold and the molded product is closed in cooperation with the plate member and the mold holder. An annular member positioned in the space;
While reducing the pressure in the closed space, the plate-like member and the product to be molded are deformed by applying a pressure outside the closed space to the back surface of the plate-like member, and the pressure in the contact portion is made uniform. Having means,
A transfer device characterized by that.
請求項1〜請求項4のいずれか1項に記載の転写装置を用いてなされる転写方法において、
記被成型品は、平板状の基材と、この基材の厚さ方向の一方の面に薄く設けられた膜状の転写素材とを備えて構成されており、
前記型の微細な転写パターンが前記転写素材に転写される、
ことを特徴とする転写方法。
In it assumed that transfer method using a transfer device according to any one of claims 1 to 4,
Before SL be-molded article, a flat plate shaped base material is configured by a thin provided the film-like transfer material on one surface in the thickness direction of the substrate,
The type of fine transfer pattern Ru is transferred to the transfer material,
A transfer method characterized by the above.
型に形成されている微細な転写パターンを、被成型品に転写する転写方法において、
前記転写をするために前記型と前記被成型品とをお互いに接触させた接触部を閉空間内に位置させて前記閉空間内の気圧を前記閉空間の外の気圧よりも下げることにより、前記型と前記被成型品とのうちの少なくとも一方を、その背面に前記閉空間の外の気圧をかけて変形させ、前記接触部における圧力を均一化する、
ことを特徴とする転写方法。
A fine transfer pattern formed on the mold, the transfer method it transferred to the molded article,
By lowering the pressure in the closed space below the pressure outside the closed space by positioning a contact portion in which the mold and the molded article are in contact with each other to perform the transfer in the closed space, at least one of said mold and the object to be molded, is deformed over the air pressure outside the said closed space on the back, equalize the pressure at the contact portion,
Transfer how, characterized in that.
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