JP5172328B2 - 浸漬液を用いた広帯域顕微鏡観察用カタジオプトリック結像系 - Google Patents

浸漬液を用いた広帯域顕微鏡観察用カタジオプトリック結像系 Download PDF

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Publication number
JP5172328B2
JP5172328B2 JP2007506429A JP2007506429A JP5172328B2 JP 5172328 B2 JP5172328 B2 JP 5172328B2 JP 2007506429 A JP2007506429 A JP 2007506429A JP 2007506429 A JP2007506429 A JP 2007506429A JP 5172328 B2 JP5172328 B2 JP 5172328B2
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Japan
Prior art keywords
objective system
objective
lens
lens group
light
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Expired - Fee Related
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JP2007506429A
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Japanese (ja)
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JP2007531060A5 (https=
JP2007531060A (ja
Inventor
ジェイ ジョーゼフ アームストロング
ユン ホー チャン
デイビッド アール シェイファー
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KLA Corp
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KLA Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/023—Catoptric systems, e.g. image erecting and reversing system for extending or folding an optical path, e.g. delay lines
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0808—Catadioptric systems using two curved mirrors on-axis systems with at least one of the mirrors having a central aperture
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G02B17/0812—Catadioptric systems using two curved mirrors off-axis or unobscured systems in which all of the mirrors share a common axis of rotational symmetry
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0856—Catadioptric systems comprising a refractive element with a reflective surface, the reflection taking place inside the element, e.g. Mangin mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/02—Objectives
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/02—Objectives
    • G02B21/04—Objectives involving mirrors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B21/00—Microscopes
    • G02B21/33—Immersion oils, or microscope systems or objectives for use with immersion fluids

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Lenses (AREA)
  • Microscoopes, Condenser (AREA)
JP2007506429A 2004-03-29 2005-03-28 浸漬液を用いた広帯域顕微鏡観察用カタジオプトリック結像系 Expired - Fee Related JP5172328B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10/812,111 2004-03-29
US10/812,111 US7307783B2 (en) 2003-02-21 2004-03-29 Catadioptric imaging system employing immersion liquid for use in broad band microscopy
PCT/US2005/010322 WO2005094304A2 (en) 2004-03-29 2005-03-28 Catadioptric imaging system employing immersion liquid for use in broad band microscopy

Publications (3)

Publication Number Publication Date
JP2007531060A JP2007531060A (ja) 2007-11-01
JP2007531060A5 JP2007531060A5 (https=) 2008-03-13
JP5172328B2 true JP5172328B2 (ja) 2013-03-27

Family

ID=35064278

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007506429A Expired - Fee Related JP5172328B2 (ja) 2004-03-29 2005-03-28 浸漬液を用いた広帯域顕微鏡観察用カタジオプトリック結像系

Country Status (4)

Country Link
US (2) US7307783B2 (https=)
EP (1) EP1749230B1 (https=)
JP (1) JP5172328B2 (https=)
WO (1) WO2005094304A2 (https=)

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US20060241496A1 (en) 2002-01-15 2006-10-26 Xillix Technologies Corp. Filter for use with imaging endoscopes
US7884998B2 (en) * 2003-02-21 2011-02-08 Kla - Tencor Corporation Catadioptric microscope objective employing immersion liquid for use in broad band microscopy
US7957066B2 (en) * 2003-02-21 2011-06-07 Kla-Tencor Corporation Split field inspection system using small catadioptric objectives
EP1721201A1 (en) * 2004-02-18 2006-11-15 Corning Incorporated Catadioptric imaging system for high numerical aperture imaging with deep ultraviolet light
WO2007106624A2 (en) * 2006-02-07 2007-09-20 Novadaq Technologies Inc. Near infrared imaging
GB0625775D0 (en) 2006-12-22 2007-02-07 Isis Innovation Focusing apparatus and method
EP2775349B1 (en) * 2007-03-08 2021-08-11 Cellavision AB A method for determining an in-focus position and a vision inspection system
US8665536B2 (en) * 2007-06-19 2014-03-04 Kla-Tencor Corporation External beam delivery system for laser dark-field illumination in a catadioptric optical system
US7633689B2 (en) 2007-07-18 2009-12-15 Asml Holding N.V. Catadioptric optical system for scatterometry
WO2009036192A1 (en) * 2007-09-13 2009-03-19 Applied Precision, Inc. Method of dispersing immersion liquid on a specimen substrate for high resolution imaging and lithographie
JP5909548B2 (ja) * 2011-06-10 2016-04-26 キヤノン株式会社 反射屈折光学系
DE102013112212B4 (de) 2013-11-06 2022-03-10 Carl Zeiss Smt Gmbh Optische Zoomeinrichtung, optische Abbildungseinrichtung, optisches Zoomverfahren und Abbildungsverfahren für die Mikroskopie
US10656098B2 (en) 2016-02-03 2020-05-19 Kla-Tencor Corporation Wafer defect inspection and review systems
KR102450005B1 (ko) * 2016-02-03 2022-09-30 케이엘에이 코포레이션 웨이퍼 결함 검사 및 리뷰 시스템
US10293122B2 (en) 2016-03-17 2019-05-21 Novadaq Technologies ULC Endoluminal introducer with contamination avoidance
CN107505692B (zh) * 2017-09-26 2020-04-10 张家港中贺自动化科技有限公司 一种折反射式物镜
CN108254912B (zh) * 2018-01-23 2020-03-27 电子科技大学 一种用于氮化物mocvd外延生长模式的实时显微监测系统
CN108873289B (zh) * 2018-09-04 2024-02-09 中国科学院长春光学精密机械与物理研究所 显微物镜光学系统及光学设备
CN109298517B (zh) * 2018-11-05 2020-10-30 中国航空工业集团公司洛阳电光设备研究所 一种多光谱同轴折反式无焦光学系统
CA3160205A1 (en) * 2019-11-22 2021-05-27 Howard Hughes Medical Institute Catadioptric microscopy
EP3893038A1 (en) * 2020-04-10 2021-10-13 Universität Zürich Multi-immersion microscope objective with minimally refractive surfaces
JP7772525B2 (ja) * 2020-10-28 2025-11-18 株式会社エビデント 光信号検出装置、ゲル部材、光信号検出方法
US11561476B1 (en) * 2021-07-10 2023-01-24 Kenneth Carlisle Johnson UV lithography system
CN119270451B (zh) * 2024-10-16 2026-01-09 苏州佳智彩光电科技有限公司 基于折返式光学装置的调焦方法、系统、计算机设备和存储介质

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Also Published As

Publication number Publication date
EP1749230A4 (en) 2008-04-02
US20050152027A1 (en) 2005-07-14
US7307783B2 (en) 2007-12-11
EP1749230B1 (en) 2015-06-03
WO2005094304A2 (en) 2005-10-13
JP2007531060A (ja) 2007-11-01
EP1749230A2 (en) 2007-02-07
WO2005094304A3 (en) 2006-12-21
WO2005094304A9 (en) 2007-01-11
US20080247035A1 (en) 2008-10-09
US7633675B2 (en) 2009-12-15

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