JP5136566B2 - 露光装置及び露光方法並びにデバイス製造方法 - Google Patents

露光装置及び露光方法並びにデバイス製造方法 Download PDF

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Publication number
JP5136566B2
JP5136566B2 JP2010000173A JP2010000173A JP5136566B2 JP 5136566 B2 JP5136566 B2 JP 5136566B2 JP 2010000173 A JP2010000173 A JP 2010000173A JP 2010000173 A JP2010000173 A JP 2010000173A JP 5136566 B2 JP5136566 B2 JP 5136566B2
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light
exposure
exposure apparatus
optical system
projection optical
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JP2010000173A
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Japanese (ja)
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JP2010098328A (ja
JP2010098328A5 (enExample
Inventor
壽 西永
郁雄 引間
光紀 豊田
恭志 水野
尚憲 北
修 谷津
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Nikon Corp
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Nikon Corp
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  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Photometry And Measurement Of Optical Pulse Characteristics (AREA)
JP2010000173A 2003-09-29 2010-01-04 露光装置及び露光方法並びにデバイス製造方法 Expired - Fee Related JP5136566B2 (ja)

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JP2010000173A JP5136566B2 (ja) 2003-09-29 2010-01-04 露光装置及び露光方法並びにデバイス製造方法

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JP2003338420 2003-09-29
JP2003338420 2003-09-29
JP2004042931 2004-02-19
JP2004042931 2004-02-19
JP2010000173A JP5136566B2 (ja) 2003-09-29 2010-01-04 露光装置及び露光方法並びにデバイス製造方法

Related Parent Applications (1)

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JP2004284218A Division JP4466300B2 (ja) 2003-09-29 2004-09-29 露光装置及び露光方法並びにデバイス製造方法、計測装置

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JP2011007813A Division JP5360078B2 (ja) 2003-09-29 2011-01-18 露光装置、計測方法、露光方法、及びデバイス製造方法

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JP2010098328A JP2010098328A (ja) 2010-04-30
JP2010098328A5 JP2010098328A5 (enExample) 2011-05-26
JP5136566B2 true JP5136566B2 (ja) 2013-02-06

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JP2010000173A Expired - Fee Related JP5136566B2 (ja) 2003-09-29 2010-01-04 露光装置及び露光方法並びにデバイス製造方法
JP2011007813A Expired - Fee Related JP5360078B2 (ja) 2003-09-29 2011-01-18 露光装置、計測方法、露光方法、及びデバイス製造方法
JP2012083222A Expired - Fee Related JP5790572B2 (ja) 2003-09-29 2012-03-30 露光装置、計測方法、露光方法、及びデバイス製造方法
JP2013247837A Expired - Lifetime JP5725137B2 (ja) 2003-09-29 2013-11-29 露光装置、計測方法、露光方法、及びデバイス製造方法
JP2014199486A Expired - Fee Related JP6256281B2 (ja) 2003-09-29 2014-09-29 露光装置及びデバイス製造方法
JP2015139526A Expired - Fee Related JP6341892B2 (ja) 2003-09-29 2015-07-13 露光装置、計測方法、露光方法、及びデバイス製造方法
JP2016145825A Expired - Fee Related JP6361702B2 (ja) 2003-09-29 2016-07-25 露光装置及びデバイス製造方法
JP2017176600A Expired - Fee Related JP6477814B2 (ja) 2003-09-29 2017-09-14 露光装置、及びデバイス製造方法
JP2018238833A Withdrawn JP2019070825A (ja) 2003-09-29 2018-12-20 露光装置

Family Applications After (8)

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JP2011007813A Expired - Fee Related JP5360078B2 (ja) 2003-09-29 2011-01-18 露光装置、計測方法、露光方法、及びデバイス製造方法
JP2012083222A Expired - Fee Related JP5790572B2 (ja) 2003-09-29 2012-03-30 露光装置、計測方法、露光方法、及びデバイス製造方法
JP2013247837A Expired - Lifetime JP5725137B2 (ja) 2003-09-29 2013-11-29 露光装置、計測方法、露光方法、及びデバイス製造方法
JP2014199486A Expired - Fee Related JP6256281B2 (ja) 2003-09-29 2014-09-29 露光装置及びデバイス製造方法
JP2015139526A Expired - Fee Related JP6341892B2 (ja) 2003-09-29 2015-07-13 露光装置、計測方法、露光方法、及びデバイス製造方法
JP2016145825A Expired - Fee Related JP6361702B2 (ja) 2003-09-29 2016-07-25 露光装置及びデバイス製造方法
JP2017176600A Expired - Fee Related JP6477814B2 (ja) 2003-09-29 2017-09-14 露光装置、及びデバイス製造方法
JP2018238833A Withdrawn JP2019070825A (ja) 2003-09-29 2018-12-20 露光装置

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Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0687027B2 (ja) 1991-01-31 1994-11-02 近藤 敏夫 粉粒体の供給装置
JP5136566B2 (ja) * 2003-09-29 2013-02-06 株式会社ニコン 露光装置及び露光方法並びにデバイス製造方法
US8013977B2 (en) * 2006-07-17 2011-09-06 Asml Netherlands B.V. Lithographic apparatus, radiation sensor and method of manufacturing a radiation sensor
KR101567702B1 (ko) * 2014-06-27 2015-11-10 재단법인 다차원 스마트 아이티 융합시스템 연구단 듀얼 애퍼처 필터 및 그 제작 방법

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DD221563A1 (de) * 1983-09-14 1985-04-24 Mikroelektronik Zt Forsch Tech Immersionsobjektiv fuer die schrittweise projektionsabbildung einer maskenstruktur
JP2928277B2 (ja) * 1989-08-03 1999-08-03 株式会社日立製作所 投影露光方法及びその装置
JPH06124873A (ja) * 1992-10-09 1994-05-06 Canon Inc 液浸式投影露光装置
JP2753930B2 (ja) * 1992-11-27 1998-05-20 キヤノン株式会社 液浸式投影露光装置
JP3521544B2 (ja) * 1995-05-24 2004-04-19 株式会社ニコン 露光装置
JPH09205053A (ja) * 1996-01-25 1997-08-05 Canon Inc センサ制御装置及びそれを用いた走査型露光装置
JPH11176727A (ja) * 1997-12-11 1999-07-02 Nikon Corp 投影露光装置
AU2747999A (en) * 1998-03-26 1999-10-18 Nikon Corporation Projection exposure method and system
JP2000058436A (ja) * 1998-08-11 2000-02-25 Nikon Corp 投影露光装置及び露光方法
WO2001008205A1 (en) * 1999-07-23 2001-02-01 Nikon Corporation Exposure method, exposure system, light source, and method of device manufacture
WO2003065427A1 (en) * 2002-01-29 2003-08-07 Nikon Corporation Exposure device and exposure method
SG121822A1 (en) * 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP2004301825A (ja) * 2002-12-10 2004-10-28 Nikon Corp 面位置検出装置、露光方法、及びデバイス製造方法
DE10261775A1 (de) * 2002-12-20 2004-07-01 Carl Zeiss Smt Ag Vorrichtung zur optischen Vermessung eines Abbildungssystems
US6867846B2 (en) * 2003-01-15 2005-03-15 Asml Holding Nv Tailored reflecting diffractor for EUV lithographic system aberration measurement
JP3813593B2 (ja) * 2003-03-24 2006-08-23 株式会社日本製鋼所 トグル式型締装置
JP4697138B2 (ja) * 2003-07-08 2011-06-08 株式会社ニコン 液浸リソグラフィ装置、液浸リソグラフィ方法、デバイス製造方法
EP1500982A1 (en) * 2003-07-24 2005-01-26 ASML Netherlands B.V. Lithographic apparatus and device manufacturing method
TWI263859B (en) * 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP2005093948A (ja) * 2003-09-19 2005-04-07 Nikon Corp 露光装置及びその調整方法、露光方法、並びにデバイス製造方法
JP5136566B2 (ja) * 2003-09-29 2013-02-06 株式会社ニコン 露光装置及び露光方法並びにデバイス製造方法
JP4466300B2 (ja) * 2003-09-29 2010-05-26 株式会社ニコン 露光装置及び露光方法並びにデバイス製造方法、計測装置
JP2005175034A (ja) * 2003-12-09 2005-06-30 Canon Inc 露光装置

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Publication number Publication date
JP2012134560A (ja) 2012-07-12
JP6477814B2 (ja) 2019-03-06
JP5725137B2 (ja) 2015-05-27
JP2015008333A (ja) 2015-01-15
JP2010098328A (ja) 2010-04-30
JP6256281B2 (ja) 2018-01-10
JP6361702B2 (ja) 2018-07-25
JP2016001314A (ja) 2016-01-07
JP2014060444A (ja) 2014-04-03
JP2011086957A (ja) 2011-04-28
JP2019070825A (ja) 2019-05-09
JP2017215621A (ja) 2017-12-07
JP5360078B2 (ja) 2013-12-04
JP5790572B2 (ja) 2015-10-07
JP2016189029A (ja) 2016-11-04
JP6341892B2 (ja) 2018-06-13

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