JP5133871B2 - コロイドナノ粒子を利用したコロイドフォトニック結晶の製造方法 - Google Patents
コロイドナノ粒子を利用したコロイドフォトニック結晶の製造方法 Download PDFInfo
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J13/00—Colloid chemistry, e.g. the production of colloidal materials or their solutions, not otherwise provided for; Making microcapsules or microballoons
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Optical Integrated Circuits (AREA)
- Liquid Crystal (AREA)
- Processes Of Treating Macromolecular Substances (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Colloid Chemistry (AREA)
Description
コロイドナノ粒子溶液として分散媒は水、ナノ粒子は直径が460nmであるポリスチレン球形粒子を使った。
前記実施例1において粘弾性物質としてポリビニルピロリドン0.63重量%を使ったことを除いては前記実施例1と同様の方法で実施してフォトニック結晶を得た。これは図3の電子走査顕微鏡観察結果を通じて確認することができた。
前記実施例1において粘弾性物質としてポリアクリル酸0.63重量%を使ったことを除いては前記実施例1と同様の方法で実施してフォトニック結晶を得た。
前記実施例1において粘弾性物質としてポリビニルアルコール0.63重量%を使ったことを除いては前記実施例1と同様の方法で実施してフォトニック結晶を得た。
実施例2においてナノ粒子として直径180nmであるポリスチレンを使ったことを除いては実施例2と同様の方法で実施してフォトニック結晶を得た。
実施例2においてナノ粒子として直径が240nmであるポリスチレンを使ったことを除いては実施例2と同様の方法で実施してフォトニック結晶を得た。
実施例2においてナノ粒子として直径が460nmであるポリスチレン粒子の代わりに直径が1μmであるポリスチレンを使ったことを除いては実施例2と同様の方法で実施してフォトニック結晶を得た。
実施例2において製造したコロイドフォトニック結晶にポリジメチルシロキサンゴムと硬化剤を10:1の重量比で入れた後、60℃で硬化させた。次いで、前記ポリジメチルシロキサンゴムをコロイドフォトニック結晶から引き離してコロイドフォトニック結晶の逆相構造を有する鋳型を製造した(図5)。
前記実施例1において粘弾性物質を使わないことを除いては前記実施例1と同様の方法で実施してフォトニック結晶を得た。
11:粘弾性物質を含んでいない分散媒
12:基材
13:欠陥
14:粘弾性物質を含んでいる分散媒
15:粘弾性物質
Claims (9)
- コロイドナノ粒子を利用したコロイドフォトニック結晶の製造方法であって、
a)直径が0.1乃至10μmである前記ナノ粒子を分散媒に均一に分散させる工程;
b)前記ナノ粒子を0.5重量%で分散媒に分散させた後、前記コロイドナノ粒子溶液に粘弾性物質を0.21乃至0.63重量%を溶解させる工程;
c)前記溶液の分散媒を蒸発させ前記粒子を分散媒‐空気‐基板の界面に自己構成させる工程;及び
d)前記自己構成された粒子を基板上に移す工程を含むことを特徴とするコロイドナノ粒子を利用したコロイドフォトニック結晶の製造方法。 - 前記粘弾性物質がポリビニルピロリドン、ポリビニルアルコール、ポリアクリル酸、ポリ(パラフェニレンビニレン)、ポリエチレングリコール、ポリエチレンアミン、デキストリン、ポリスチレン、ポリメタクリル酸メチル、ポリアクリル酸塩、及びポリ塩化ビニルからなる群から1種以上選択されることを特徴とする請求項1に記載のコロイドフォトニック結晶の製造方法。
- 前記粘弾性物質の重量平均分子量(Mw)が10乃至1,000,000であることを特徴とする請求項1に記載のコロイドフォトニック結晶の製造方法。
- 前記ナノ粒子がポリスチレン、ポリアルファメチルスチレン、ポリアクリル酸塩、ポリメタクリル酸メチル、ポリベンジルメタクリレート、ポリフェニルメタクリレート、ポリ-1-メチルシクロヘキシルメタクリレート、ポリシクロヘキシルメタクリレート、ポリクロロベンジルメタクリレート、ポリ-1-フェニルエチルメタクリレート、ポリ-1,2-ジフェニルエチルメタクリレート、ポリジフェニルメチルメタクリレート、ポリフルフリルメタクリレート、ポリ-1-フェニルシクロヘキシルメタクリレート、ポリペンタクロロフェニルメタクリレート、ポリペンタブロモフェニルメタクリレート、ポリジメチルシロキサン、及びポリ-N-イソプロピルアクリルアミドからなる群から1種以上選択されることを特徴とする請求項1に記載のコロイドフォトニック結晶の製造方法。
- 前記ナノ粒子が酸化チタン(titanium oxide)、酸化亜鉛(zinc oxide)、酸化セリウム(cerium oxide)、酸化スズ(tin oxide)、酸化タリウム(thallium oxide)、チタン酸バリウム(barium titanate)、酸化アルミニウム(aluminium oxide)、酸化イットリウム(yttrium oxide)、酸化ジルコニウム(zirconium oxide)、及び酸化銅(copper oxide)からなる群から1種以上選択されることを特徴とする請求項1に記載のコロイドフォトニック結晶の製造方法。
- 前記ナノ粒子がビスマス(Bi)、鉛(Pb)、セレン(Se)、及びアンチモン(Sb)からなる群から1種以上選択されることを特徴とする請求項1に記載のコロイドフォトニック結晶の製造方法。
- 前記分散媒が水、メタノール、エタノール、プロパノール、ブタノール、エチレングリコール、グリセロール、ペルフルオロデカリン、ペルフルオロメチルデカリン、ペルフルオロノナン、ペルフルオロイソ酸、ペルフルオロシクロヘキサン、ペルフルオロ1,2‐ジメチルシクロヘキサン、ペルフルオロ2‐メチル2‐ペンテン、及びペルフルオロケロセンからなる群から1種以上選択されることを特徴とする請求項1に記載のコロイドフォトニック結晶の製造方法。
- 前記コロイドフォトニック結晶内の空隙を半導体、金属、金属酸化物、または有機物で充填する工程を更に実施することを特徴とする請求項1に記載のコロイドフォトニック結晶の製造方法。
- 前記半導体がSi、CdS、CdSe、及びGaAsからなる群から1種以上選択され、前記金属がAg、Au、Al、Pt、及びPdからなる群から1種以上選択され、前記金属酸化物がAlO2、TiO2、SiO2、ZrO2、Fe2O3、及びZnOからなる群から1種以上選択され、前記有機物がポリジメチルシロキサン、ポリチオフェン、ポリキノリン、ポリピロール、ポリアセチレン、ポリプロレン、ポリ(パラフェニレンビニレン)、及びこれらの誘導体からなる群から1種以上選択されることを特徴とする請求項8に記載のコロイドフォトニック結晶の製造方法。
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