JP5131285B2 - シリコン単結晶成長装置および石英ルツボ - Google Patents
シリコン単結晶成長装置および石英ルツボ Download PDFInfo
- Publication number
- JP5131285B2 JP5131285B2 JP2009554292A JP2009554292A JP5131285B2 JP 5131285 B2 JP5131285 B2 JP 5131285B2 JP 2009554292 A JP2009554292 A JP 2009554292A JP 2009554292 A JP2009554292 A JP 2009554292A JP 5131285 B2 JP5131285 B2 JP 5131285B2
- Authority
- JP
- Japan
- Prior art keywords
- single crystal
- silicon single
- quartz crucible
- diameter
- peripheral wall
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 title claims description 207
- 229910052710 silicon Inorganic materials 0.000 title claims description 207
- 239000010703 silicon Substances 0.000 title claims description 207
- 239000013078 crystal Substances 0.000 title claims description 181
- 239000010453 quartz Substances 0.000 title claims description 92
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 title claims description 92
- 230000002093 peripheral effect Effects 0.000 claims description 49
- 239000000155 melt Substances 0.000 claims description 24
- 238000000034 method Methods 0.000 claims description 24
- 238000003384 imaging method Methods 0.000 claims description 14
- 230000003287 optical effect Effects 0.000 claims description 12
- 239000007788 liquid Substances 0.000 claims description 9
- 239000002994 raw material Substances 0.000 claims description 7
- 238000002425 crystallisation Methods 0.000 claims 1
- 230000008025 crystallization Effects 0.000 claims 1
- 235000012431 wafers Nutrition 0.000 description 41
- 230000007547 defect Effects 0.000 description 24
- 238000001816 cooling Methods 0.000 description 21
- 238000005516 engineering process Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- 229910052796 boron Inorganic materials 0.000 description 2
- 238000002109 crystal growth method Methods 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000005259 measurement Methods 0.000 description 2
- 238000004088 simulation Methods 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004364 calculation method Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000002019 doping agent Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 230000005499 meniscus Effects 0.000 description 1
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 239000002210 silicon-based material Substances 0.000 description 1
- 238000007711 solidification Methods 0.000 description 1
- 230000008023 solidification Effects 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/02—Elements
- C30B29/06—Silicon
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/10—Crucibles or containers for supporting the melt
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/20—Controlling or regulating
- C30B15/22—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal
- C30B15/26—Stabilisation or shape controlling of the molten zone near the pulled crystal; Controlling the section of the crystal using television detectors; using photo or X-ray detectors
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Glass Melting And Manufacturing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2009554292A JP5131285B2 (ja) | 2008-02-18 | 2009-02-16 | シリコン単結晶成長装置および石英ルツボ |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008036678 | 2008-02-18 | ||
JP2008036678 | 2008-02-18 | ||
PCT/JP2009/052485 WO2009104533A1 (ja) | 2008-02-18 | 2009-02-16 | シリコン単結晶成長装置および石英ルツボ |
JP2009554292A JP5131285B2 (ja) | 2008-02-18 | 2009-02-16 | シリコン単結晶成長装置および石英ルツボ |
Publications (2)
Publication Number | Publication Date |
---|---|
JPWO2009104533A1 JPWO2009104533A1 (ja) | 2011-06-23 |
JP5131285B2 true JP5131285B2 (ja) | 2013-01-30 |
Family
ID=40985414
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2009554292A Active JP5131285B2 (ja) | 2008-02-18 | 2009-02-16 | シリコン単結晶成長装置および石英ルツボ |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP5131285B2 (de) |
DE (1) | DE112009000239B4 (de) |
WO (1) | WO2009104533A1 (de) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103911659A (zh) * | 2014-04-15 | 2014-07-09 | 宁夏大学 | 提高400mm以上大直径单晶硅拉晶稳定性的方法 |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
ES2380555T3 (es) | 2007-11-05 | 2012-05-16 | St. Jude Medical, Inc. | Válvulas protésicas del corazón plegables/expansibles con soportes de stent no expansible y características de recuperación |
CN107945180A (zh) * | 2017-12-26 | 2018-04-20 | 浙江大学台州研究院 | 源于抛光的石英晶片表面浅划痕的视觉检测方法 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006169016A (ja) * | 2004-12-14 | 2006-06-29 | Sumco Corp | シリコン単結晶の製造方法 |
JP2007001819A (ja) * | 2005-06-24 | 2007-01-11 | Sumco Corp | シリコン単結晶及びシリコン単結晶製造方法 |
JP2007223879A (ja) * | 2006-02-27 | 2007-09-06 | Sumco Techxiv株式会社 | 位置測定方法 |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4013324B2 (ja) | 1998-03-31 | 2007-11-28 | 株式会社Sumco | 単結晶成長方法 |
JP4277681B2 (ja) * | 2003-12-26 | 2009-06-10 | 株式会社Sumco | 単結晶引上げ装置の融液表面位置検出装置及びその単結晶引上げ装置 |
JP4701738B2 (ja) * | 2005-02-17 | 2011-06-15 | 株式会社Sumco | 単結晶の引上げ方法 |
-
2009
- 2009-02-16 WO PCT/JP2009/052485 patent/WO2009104533A1/ja active Application Filing
- 2009-02-16 JP JP2009554292A patent/JP5131285B2/ja active Active
- 2009-02-16 DE DE112009000239.0T patent/DE112009000239B4/de active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006169016A (ja) * | 2004-12-14 | 2006-06-29 | Sumco Corp | シリコン単結晶の製造方法 |
JP2007001819A (ja) * | 2005-06-24 | 2007-01-11 | Sumco Corp | シリコン単結晶及びシリコン単結晶製造方法 |
JP2007223879A (ja) * | 2006-02-27 | 2007-09-06 | Sumco Techxiv株式会社 | 位置測定方法 |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN103911659A (zh) * | 2014-04-15 | 2014-07-09 | 宁夏大学 | 提高400mm以上大直径单晶硅拉晶稳定性的方法 |
Also Published As
Publication number | Publication date |
---|---|
WO2009104533A1 (ja) | 2009-08-27 |
JPWO2009104533A1 (ja) | 2011-06-23 |
DE112009000239T5 (de) | 2011-06-22 |
DE112009000239B4 (de) | 2021-01-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4814207B2 (ja) | シリコン半導体ウェハを製造する方法及び装置 | |
US7524371B2 (en) | Method for manufacturing defect-free silicon single crystal | |
KR101105950B1 (ko) | 단결정 잉곳 제조장치 | |
JP2010100474A (ja) | シリコン単結晶引上げ水平磁場の最適化方法およびシリコン単結晶の製造方法 | |
WO2009104532A1 (ja) | シリコン単結晶成長方法 | |
TWI632257B (zh) | 單晶矽的製造方法 | |
KR101048831B1 (ko) | 단결정 제조용 흑연 히터 및 단결정 제조장치와 단결정 제조방법 | |
CN107407003A (zh) | 用于生长单晶硅锭的装置和方法 | |
KR102253607B1 (ko) | 열 차폐 부재, 단결정 인상 장치 및 단결정 실리콘 잉곳 제조 방법 | |
JP5131285B2 (ja) | シリコン単結晶成長装置および石英ルツボ | |
JP5145721B2 (ja) | シリコン単結晶の製造方法および製造装置 | |
JP5417965B2 (ja) | 単結晶成長方法 | |
JP5415052B2 (ja) | 極低欠陥半導体単結晶製造方法及びその製造装置 | |
JP6107308B2 (ja) | シリコン単結晶製造方法 | |
TWI427197B (zh) | 單晶冷卻器及包括該冷卻器的單晶成長器 | |
JP6597857B1 (ja) | 熱遮蔽部材、単結晶引き上げ装置及び単結晶の製造方法 | |
JP2007284324A (ja) | 半導体単結晶の製造装置及び製造方法 | |
JP4899608B2 (ja) | 半導体単結晶の製造装置及び製造方法 | |
JP7066857B2 (ja) | シリコン単結晶成長方法及び装置 | |
WO1999037833A1 (fr) | Appareil de tirage de cristal unique | |
JP2008189523A (ja) | 単結晶の製造方法 | |
JP2005145742A (ja) | 単結晶の製造方法及び黒鉛ヒーターならびに単結晶製造装置 | |
JP2009280428A (ja) | エピタキシャルシリコンウェーハ | |
WO2009133720A1 (ja) | エピタキシャルシリコンウェーハ | |
JP4148060B2 (ja) | 単結晶製造用黒鉛ヒーター及び単結晶製造装置ならびに単結晶製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20121009 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20121022 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20151116 Year of fee payment: 3 |
|
R150 | Certificate of patent or registration of utility model |
Ref document number: 5131285 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |