JP5125314B2 - 電子装置 - Google Patents
電子装置 Download PDFInfo
- Publication number
- JP5125314B2 JP5125314B2 JP2007215819A JP2007215819A JP5125314B2 JP 5125314 B2 JP5125314 B2 JP 5125314B2 JP 2007215819 A JP2007215819 A JP 2007215819A JP 2007215819 A JP2007215819 A JP 2007215819A JP 5125314 B2 JP5125314 B2 JP 5125314B2
- Authority
- JP
- Japan
- Prior art keywords
- resin
- terminal
- bump electrode
- electronic component
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000011347 resin Substances 0.000 claims description 191
- 229920005989 resin Polymers 0.000 claims description 191
- 239000000758 substrate Substances 0.000 claims description 79
- 238000007789 sealing Methods 0.000 claims description 51
- 238000000034 method Methods 0.000 description 30
- 239000004973 liquid crystal related substance Substances 0.000 description 28
- 239000010410 layer Substances 0.000 description 18
- 230000001154 acute effect Effects 0.000 description 17
- 238000004519 manufacturing process Methods 0.000 description 14
- 238000002788 crimping Methods 0.000 description 11
- 230000015572 biosynthetic process Effects 0.000 description 9
- 230000000694 effects Effects 0.000 description 9
- 230000005489 elastic deformation Effects 0.000 description 9
- 239000011521 glass Substances 0.000 description 7
- 239000000463 material Substances 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 230000035882 stress Effects 0.000 description 6
- 239000010931 gold Substances 0.000 description 5
- 230000001681 protective effect Effects 0.000 description 5
- 239000000956 alloy Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- 238000003825 pressing Methods 0.000 description 4
- 238000004544 sputter deposition Methods 0.000 description 4
- 230000006835 compression Effects 0.000 description 3
- 238000007906 compression Methods 0.000 description 3
- 229920001721 polyimide Polymers 0.000 description 3
- 239000009719 polyimide resin Substances 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 238000007772 electroless plating Methods 0.000 description 2
- 239000003822 epoxy resin Substances 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 238000005304 joining Methods 0.000 description 2
- 238000001459 lithography Methods 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 229920003217 poly(methylsilsesquioxane) Polymers 0.000 description 2
- 229920000647 polyepoxide Polymers 0.000 description 2
- 229920003002 synthetic resin Polymers 0.000 description 2
- 239000000057 synthetic resin Substances 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- 229910006164 NiV Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 229910008599 TiW Inorganic materials 0.000 description 1
- 229920006223 adhesive resin Polymers 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000003990 capacitor Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000001312 dry etching Methods 0.000 description 1
- 238000005401 electroluminescence Methods 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000001020 plasma etching Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229920002050 silicone resin Polymers 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 229910000679 solder Inorganic materials 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 238000001039 wet etching Methods 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/73—Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
- H01L2224/732—Location after the connecting process
- H01L2224/73201—Location after the connecting process on the same surface
- H01L2224/73203—Bump and layer connectors
- H01L2224/73204—Bump and layer connectors the bump connector being embedded into the layer connector
Landscapes
- Wire Bonding (AREA)
- Structures For Mounting Electric Components On Printed Circuit Boards (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007215819A JP5125314B2 (ja) | 2007-08-22 | 2007-08-22 | 電子装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007215819A JP5125314B2 (ja) | 2007-08-22 | 2007-08-22 | 電子装置 |
Related Child Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2012198288A Division JP2013030789A (ja) | 2012-09-10 | 2012-09-10 | 実装構造体及び実装構造体の製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009049285A JP2009049285A (ja) | 2009-03-05 |
JP2009049285A5 JP2009049285A5 (enrdf_load_stackoverflow) | 2010-10-07 |
JP5125314B2 true JP5125314B2 (ja) | 2013-01-23 |
Family
ID=40501219
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007215819A Active JP5125314B2 (ja) | 2007-08-22 | 2007-08-22 | 電子装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5125314B2 (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9279060B2 (en) | 2012-11-29 | 2016-03-08 | Seiko Epson Corporation | Ink composition, ink jet recording apparatus, and ink jet recording system |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102011083423A1 (de) * | 2011-09-26 | 2013-03-28 | Siemens Aktiengesellschaft | Kontaktfederanordnung und Verfahren zur Herstellung derselben |
GB2500380A (en) * | 2012-03-18 | 2013-09-25 | Effect Photonics B V | Arrangement and method of making electrical connections |
JP6394904B2 (ja) * | 2015-03-10 | 2018-09-26 | セイコーエプソン株式会社 | ヘッドの製造方法 |
JP6394903B2 (ja) * | 2015-03-10 | 2018-09-26 | セイコーエプソン株式会社 | ヘッド及び液体噴射装置 |
KR102624624B1 (ko) | 2016-06-15 | 2024-01-12 | 삼성디스플레이 주식회사 | 집적 회로 및 그 제조 방법 |
KR102540850B1 (ko) * | 2016-07-29 | 2023-06-07 | 삼성디스플레이 주식회사 | 집적회로 칩 및 이를 포함하는 표시 장치 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH09293753A (ja) * | 1996-04-24 | 1997-11-11 | Canon Inc | 電気回路部品及び電気回路部品の製造方法及び導電ボール及び導電接続部材及び導電接続部材の製造方法 |
JPH10173006A (ja) * | 1996-12-09 | 1998-06-26 | Hitachi Ltd | 半導体装置および半導体装置の製造方法 |
JP4151634B2 (ja) * | 2004-09-24 | 2008-09-17 | セイコーエプソン株式会社 | 半導体装置とその製造方法、回路基板、電気光学装置および電子機器 |
JP2007115676A (ja) * | 2005-09-21 | 2007-05-10 | Sekisui Chem Co Ltd | 導電性粒子及び導電接続構造体 |
JP4784304B2 (ja) * | 2005-12-27 | 2011-10-05 | セイコーエプソン株式会社 | 電子部品、電子部品の製造方法、回路基板及び電子機器 |
JP2007187777A (ja) * | 2006-01-12 | 2007-07-26 | Epson Imaging Devices Corp | 電気光学装置、半導体装置、電気光学装置の製造方法及び電子機器 |
-
2007
- 2007-08-22 JP JP2007215819A patent/JP5125314B2/ja active Active
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9279060B2 (en) | 2012-11-29 | 2016-03-08 | Seiko Epson Corporation | Ink composition, ink jet recording apparatus, and ink jet recording system |
Also Published As
Publication number | Publication date |
---|---|
JP2009049285A (ja) | 2009-03-05 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4888462B2 (ja) | 電子部品の実装構造 | |
JP4968665B2 (ja) | フラットディスプレイパネル及び接続構造 | |
JP6726070B2 (ja) | 電子部品の実装方法、電子部品の接合構造、基板装置、ディスプレイ装置、ディスプレイシステム | |
JP5125314B2 (ja) | 電子装置 | |
JP2013030789A (ja) | 実装構造体及び実装構造体の製造方法 | |
US8552310B2 (en) | Mounting structure of electronic component | |
JP4165495B2 (ja) | 半導体装置、半導体装置の製造方法、回路基板、電気光学装置、電子機器 | |
CN101426343B (zh) | 电子部件的安装构造 | |
CN101483160B (zh) | 电子部件 | |
CN101373751B (zh) | 电子器件及电子设备 | |
JP5169071B2 (ja) | 電子部品、電子装置、電子部品の実装構造体及び電子部品の実装構造体の製造方法 | |
JP2004140384A (ja) | プリント配線基板の接続方法 | |
JP3835460B2 (ja) | 電子部品実装体の製造方法、及び電気光学装置 | |
JP2009105320A (ja) | 電子部品の実装構造体及び電子部品の実装構造体の製造方法 | |
JP2008112911A (ja) | 基板間接続構造、基板間接続方法、表示装置 | |
JP2005121757A (ja) | 基板接続構造、電子部品、液晶表示装置および電子部品の製造方法 | |
JP2002244146A (ja) | 不透明基板を具えたフラットパネルディスプレイの内部連接方法とそれにより形成される装置 | |
JP5333367B2 (ja) | 電気光学装置及び電子モジュール | |
JP4656191B2 (ja) | 半導体装置の製造方法 | |
JP2013135116A (ja) | 回路基板、及び接続構造体 | |
JP2009074907A (ja) | 検査用治具と被検査体との接続構造およびその形成方法 | |
JP2008060403A (ja) | 駆動icの圧着方法および圧着装置 | |
JP2009111017A (ja) | 電子部品 | |
JP2008219049A (ja) | 半導体装置、半導体装置の製造方法、回路基板、電気光学装置、電子機器 | |
JP2010219273A (ja) | 電子部品の実装構造体、及び電子部品の実装方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20100820 |
|
A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20100820 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A821 Effective date: 20100823 |
|
A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20110117 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20120124 |
|
RD03 | Notification of appointment of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7423 Effective date: 20120402 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120724 |
|
RD04 | Notification of resignation of power of attorney |
Free format text: JAPANESE INTERMEDIATE CODE: A7424 Effective date: 20120801 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120910 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20121002 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20121015 |
|
R150 | Certificate of patent or registration of utility model |
Free format text: JAPANESE INTERMEDIATE CODE: R150 Ref document number: 5125314 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20151109 Year of fee payment: 3 |
|
S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
S111 | Request for change of ownership or part of ownership |
Free format text: JAPANESE INTERMEDIATE CODE: R313113 |
|
R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |