JP5123514B2 - 通電試験用プローブおよび通電試験用プローブ組立体 - Google Patents
通電試験用プローブおよび通電試験用プローブ組立体 Download PDFInfo
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- JP5123514B2 JP5123514B2 JP2006270543A JP2006270543A JP5123514B2 JP 5123514 B2 JP5123514 B2 JP 5123514B2 JP 2006270543 A JP2006270543 A JP 2006270543A JP 2006270543 A JP2006270543 A JP 2006270543A JP 5123514 B2 JP5123514 B2 JP 5123514B2
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- metal material
- probe
- needle tip
- needle
- material layer
- Prior art date
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- 239000000523 sample Substances 0.000 title claims description 132
- 239000007769 metal material Substances 0.000 claims description 125
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims description 21
- 230000001747 exhibiting effect Effects 0.000 claims description 3
- 239000010410 layer Substances 0.000 description 105
- 239000000758 substrate Substances 0.000 description 14
- 239000004065 semiconductor Substances 0.000 description 13
- 238000000206 photolithography Methods 0.000 description 11
- 238000009713 electroplating Methods 0.000 description 8
- 238000004519 manufacturing process Methods 0.000 description 7
- 229910052703 rhodium Inorganic materials 0.000 description 7
- 239000010948 rhodium Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 238000000034 method Methods 0.000 description 6
- MHOVAHRLVXNVSD-UHFFFAOYSA-N rhodium atom Chemical compound [Rh] MHOVAHRLVXNVSD-UHFFFAOYSA-N 0.000 description 6
- 239000000919 ceramic Substances 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 230000005489 elastic deformation Effects 0.000 description 4
- 230000008878 coupling Effects 0.000 description 3
- 238000010168 coupling process Methods 0.000 description 3
- 238000005859 coupling reaction Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 230000003014 reinforcing effect Effects 0.000 description 3
- 229910000531 Co alloy Inorganic materials 0.000 description 2
- KDLHZDBZIXYQEI-UHFFFAOYSA-N Palladium Chemical compound [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 229910000623 nickel–chromium alloy Inorganic materials 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 229910000906 Bronze Inorganic materials 0.000 description 1
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910000990 Ni alloy Inorganic materials 0.000 description 1
- 229910001096 P alloy Inorganic materials 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 229910001080 W alloy Inorganic materials 0.000 description 1
- QXZUUHYBWMWJHK-UHFFFAOYSA-N [Co].[Ni] Chemical compound [Co].[Ni] QXZUUHYBWMWJHK-UHFFFAOYSA-N 0.000 description 1
- 238000005299 abrasion Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000010974 bronze Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000000470 constituent Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical compound [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 1
- 239000011162 core material Substances 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 208000014674 injury Diseases 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- MOWMLACGTDMJRV-UHFFFAOYSA-N nickel tungsten Chemical compound [Ni].[W] MOWMLACGTDMJRV-UHFFFAOYSA-N 0.000 description 1
- 229910052763 palladium Inorganic materials 0.000 description 1
- OFNHPGDEEMZPFG-UHFFFAOYSA-N phosphanylidynenickel Chemical compound [P].[Ni] OFNHPGDEEMZPFG-UHFFFAOYSA-N 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 150000003283 rhodium Chemical class 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 230000008733 trauma Effects 0.000 description 1
Images
Landscapes
- Testing Of Individual Semiconductor Devices (AREA)
- Measuring Leads Or Probes (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Description
20 プローブ基板
22 プローブ
22a プローブ本体部
22b 針先部
28 取付け部分
32 アーム部分
34 台座部分
38a 針先の平坦面
40a 第1の金属材料層
40b 第2の金属材料層
Claims (8)
- 靱性を示す金属材料で形成され、平坦面を有する針本体部と、該針本体部の前記平坦面から突出して設けられる針先部とを備え、前記針先部の少なくとも前記平坦面から突出する部分は、その全域で、前記針本体部を形成する靱性金属材料よりも高い硬度を示す第1の金属材料層と、該第1の金属材料層よりも優れた靭性を示す第2の金属材料層との積層構造を有する通電試験用プローブ。
- 前記針本体部は板状部材で形成され、前記針先部は前記針本体部の板厚方向に積層された積層構造を有する、請求項1に記載の通電試験用プローブ。
- 前記第2の金属材料層は前記針本体部を形成する前記靱性金属材料と同一金属材料からなる、請求項1に記載の通電試験用プローブ。
- 前記第1の金属材料層の厚さ寸法は前記第2の金属材料層のそれよりも大きい、請求項1に記載の通電試験用プローブ。
- 前記針本体部は、前記針先部が設けられる台座部分を有し、前記第2の金属材料層が前記台座部分と同一金属材料で一体的に形成されている、請求項1に記載の通電試験用プローブ。
- 前記針先部は、前記第1の金属材料層と、該金属材料層の両面を覆う一対の前記第2の金属材料層とを有する積層構造を有する、請求項1に記載の通電試験用プローブ。
- 前記針本体部は、取付け部分と、該取付け部分からその高さ方向へ相互に間隔をおいて横方向へ伸長する一対のアーム部分を備え、該アーム部分の伸長端を連結すべく該アーム部分から見て前記取付け部分が位置する側と反対側へ前記台座部分が伸長して形成されており、該台座部分の伸長端に前記針先部が形成されている、請求項1に記載の通電試験用プローブ。
- 複数の導電路が形成されたプローブ基板と、該プローブ基板に設けられ、対応する前記導電路に電気的に接続される請求項1に記載の通電用プローブとを備える通電試験用プローブ組立体。
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006270543A JP5123514B2 (ja) | 2006-10-02 | 2006-10-02 | 通電試験用プローブおよび通電試験用プローブ組立体 |
TW096128165A TW200815763A (en) | 2006-09-26 | 2007-08-01 | Electrical test probe and electrical test probe assembly |
KR1020070084612A KR100902019B1 (ko) | 2006-09-26 | 2007-08-22 | 통전 테스트용 프로브 및 통전 테스트용 프로브 조립체 |
US11/847,082 US7586321B2 (en) | 2006-09-26 | 2007-08-29 | Electrical test probe and electrical test probe assembly |
DE102007046042.4A DE102007046042B4 (de) | 2006-09-26 | 2007-09-26 | Elektrische Prüfsonde und elektrische Prüfsondenanordnung |
KR1020090000946A KR100903810B1 (ko) | 2006-09-26 | 2009-01-06 | 통전 테스트용 프로브 및 통전 테스트용 프로브 조립체 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006270543A JP5123514B2 (ja) | 2006-10-02 | 2006-10-02 | 通電試験用プローブおよび通電試験用プローブ組立体 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008089399A JP2008089399A (ja) | 2008-04-17 |
JP5123514B2 true JP5123514B2 (ja) | 2013-01-23 |
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JP2006270543A Active JP5123514B2 (ja) | 2006-09-26 | 2006-10-02 | 通電試験用プローブおよび通電試験用プローブ組立体 |
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JP (1) | JP5123514B2 (ja) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5297113B2 (ja) * | 2008-08-06 | 2013-09-25 | 日本電子材料株式会社 | コンタクトプローブの製造方法 |
JP6103821B2 (ja) * | 2012-05-29 | 2017-03-29 | 株式会社日本マイクロニクス | 通電試験用プローブ |
TWI713939B (zh) * | 2017-12-18 | 2020-12-21 | 義大利商探針科技公司 | 用於測試電子裝置的測試頭的接觸探針 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH10319039A (ja) * | 1997-05-19 | 1998-12-04 | Toshiba Corp | プローブ用垂直ニードル、垂直ニードル型プローブおよびそれに用いられる複合細線 |
US5936243A (en) * | 1997-06-09 | 1999-08-10 | Ian Hardcastle | Conductive micro-probe and memory device |
JP3745184B2 (ja) * | 1999-03-25 | 2006-02-15 | 株式会社東京カソード研究所 | プローブカード用探針及びその製造方法 |
JP4014040B2 (ja) * | 2002-10-29 | 2007-11-28 | 日本電子材料株式会社 | プローブ |
JP2005351846A (ja) * | 2004-06-14 | 2005-12-22 | Micronics Japan Co Ltd | プローブ針 |
WO2006075408A1 (ja) * | 2005-01-14 | 2006-07-20 | Kabushiki Kaisha Nihon Micronics | 通電試験用プローブ |
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- 2006-10-02 JP JP2006270543A patent/JP5123514B2/ja active Active
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