JP5112868B2 - 補助媒体として液体を使用するレーザ微細加工方法及びシステム - Google Patents
補助媒体として液体を使用するレーザ微細加工方法及びシステム Download PDFInfo
- Publication number
- JP5112868B2 JP5112868B2 JP2007531168A JP2007531168A JP5112868B2 JP 5112868 B2 JP5112868 B2 JP 5112868B2 JP 2007531168 A JP2007531168 A JP 2007531168A JP 2007531168 A JP2007531168 A JP 2007531168A JP 5112868 B2 JP5112868 B2 JP 5112868B2
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- JP
- Japan
- Prior art keywords
- substrate
- feature
- substrate surface
- liquid
- depth
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000007788 liquid Substances 0.000 title claims description 91
- 238000000034 method Methods 0.000 title claims description 46
- 238000005459 micromachining Methods 0.000 title description 8
- 239000000758 substrate Substances 0.000 claims description 176
- 239000010409 thin film Substances 0.000 claims description 36
- 239000011248 coating agent Substances 0.000 claims description 22
- 238000000576 coating method Methods 0.000 claims description 22
- 239000000463 material Substances 0.000 claims description 21
- 239000012530 fluid Substances 0.000 claims description 14
- 230000015572 biosynthetic process Effects 0.000 claims description 6
- 230000000149 penetrating effect Effects 0.000 claims description 2
- 230000035515 penetration Effects 0.000 claims 1
- 239000010410 layer Substances 0.000 description 31
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- 239000007789 gas Substances 0.000 description 6
- 230000004888 barrier function Effects 0.000 description 5
- 230000003993 interaction Effects 0.000 description 5
- 238000010304 firing Methods 0.000 description 4
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 238000003754 machining Methods 0.000 description 3
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000011241 protective layer Substances 0.000 description 2
- 230000001105 regulatory effect Effects 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 229910001218 Gallium arsenide Inorganic materials 0.000 description 1
- 239000004372 Polyvinyl alcohol Substances 0.000 description 1
- 238000002679 ablation Methods 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 230000001154 acute effect Effects 0.000 description 1
- 239000000443 aerosol Substances 0.000 description 1
- -1 and at block 505 Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000032798 delamination Effects 0.000 description 1
- 238000006073 displacement reaction Methods 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 238000000605 extraction Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000008263 liquid aerosol Substances 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 238000004377 microelectronic Methods 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920002451 polyvinyl alcohol Polymers 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/14—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor
- B23K26/146—Working by laser beam, e.g. welding, cutting or boring using a fluid stream, e.g. a jet of gas, in conjunction with the laser beam; Nozzles therefor the fluid stream containing a liquid
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Laser Beam Processing (AREA)
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US60953004P | 2004-09-13 | 2004-09-13 | |
| US60/609,530 | 2004-09-13 | ||
| US10/976,555 US7923658B2 (en) | 2004-09-13 | 2004-10-29 | Laser micromachining methods and systems |
| US10/976,555 | 2004-10-29 | ||
| PCT/US2005/027113 WO2006031303A1 (en) | 2004-09-13 | 2005-07-29 | Laser micromachining methods and systems using a liquid as an assist medium |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008512250A JP2008512250A (ja) | 2008-04-24 |
| JP2008512250A5 JP2008512250A5 (https=) | 2011-08-11 |
| JP5112868B2 true JP5112868B2 (ja) | 2013-01-09 |
Family
ID=35285436
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007531168A Expired - Fee Related JP5112868B2 (ja) | 2004-09-13 | 2005-07-29 | 補助媒体として液体を使用するレーザ微細加工方法及びシステム |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US7923658B2 (https=) |
| EP (1) | EP1817135A1 (https=) |
| JP (1) | JP5112868B2 (https=) |
| BR (1) | BRPI0515658A (https=) |
| MX (1) | MX2007002935A (https=) |
| WO (1) | WO2006031303A1 (https=) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20080220612A1 (en) * | 2007-03-06 | 2008-09-11 | Ute Drechsler | Protection of polymer surfaces during micro-fabrication |
| US20090020511A1 (en) * | 2007-07-17 | 2009-01-22 | Kommera Swaroop K | Ablation |
| CN109434301B (zh) * | 2018-11-09 | 2020-09-25 | 科立视材料科技有限公司 | 一种可调节平面方向的激光加工载台及其使用方法 |
| CN114571107B (zh) * | 2022-03-28 | 2023-02-21 | 北京理工大学 | 一种超声辅助飞秒激光嵌套加工密封容器阳性微孔的方法 |
Family Cites Families (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3556600A (en) | 1968-08-30 | 1971-01-19 | Westinghouse Electric Corp | Distribution and cutting of rocks,glass and the like |
| US3656988A (en) | 1969-02-27 | 1972-04-18 | Watch Stones Co Ltd | Method for the fabrication of holes in a workpiece by means of laser-beams and apparatus for the performance of the aforesaid method |
| WO1997007928A2 (en) | 1995-08-31 | 1997-03-06 | Biolase Technology, Inc. | User programmable combination of atomized particles for electromagnetically induced cutting |
| US5742028A (en) | 1996-07-24 | 1998-04-21 | General Electric Company | Preloaded laser shock peening |
| US5773791A (en) | 1996-09-03 | 1998-06-30 | Kuykendal; Robert | Water laser machine tool |
| JP2000117480A (ja) | 1998-10-15 | 2000-04-25 | Fanuc Ltd | レーザ加工機 |
| WO2000050198A1 (en) | 1999-02-25 | 2000-08-31 | Seiko Epson Corporation | Method for machining work by laser beam |
| US6333488B1 (en) | 1999-08-30 | 2001-12-25 | General Electric Company | Method for setting up and controlling confinement media flow in laser shock peening |
| US6720522B2 (en) | 2000-10-26 | 2004-04-13 | Kabushiki Kaisha Toshiba | Apparatus and method for laser beam machining, and method for manufacturing semiconductor devices using laser beam machining |
| JP2004515365A (ja) * | 2000-12-15 | 2004-05-27 | エグシル テクノロジー リミテッド | 半導体材料のレーザー加工 |
| US6765174B2 (en) | 2001-02-05 | 2004-07-20 | Denso Corporation | Method for machining grooves by a laser and honeycomb structure forming die and method for producing the same die |
| JP2002240294A (ja) * | 2001-02-21 | 2002-08-28 | Ricoh Co Ltd | 液滴吐出ヘッド及びその製造方法並びにインクジェット記録装置 |
| EP1404481B1 (en) * | 2001-03-22 | 2006-04-19 | Xsil Technology Limited | A laser machining system and method |
| IL159431A0 (en) | 2001-07-02 | 2004-06-01 | Virtek Laser Systems Inc | Method of ablating an opening in a hard, non-metallic substrate |
| JP2003151924A (ja) * | 2001-08-28 | 2003-05-23 | Tokyo Seimitsu Co Ltd | ダイシング方法およびダイシング装置 |
| WO2003028943A1 (en) | 2001-10-03 | 2003-04-10 | Lambda Physik Application Center, L.L.C. | Method and apparatus for fine liquid spray assisted laser material processing |
| US20030062126A1 (en) | 2001-10-03 | 2003-04-03 | Scaggs Michael J. | Method and apparatus for assisting laser material processing |
| TWI236944B (en) * | 2001-12-17 | 2005-08-01 | Tokyo Electron Ltd | Film removal method and apparatus, and substrate processing system |
| US7994450B2 (en) | 2002-01-07 | 2011-08-09 | International Business Machines Corporation | Debris minimization and improved spatial resolution in pulsed laser ablation of materials |
| JP4079309B2 (ja) * | 2002-02-12 | 2008-04-23 | 株式会社リコー | ノズル加工装置及びノズル加工方法 |
| JP2003324263A (ja) | 2002-04-30 | 2003-11-14 | Ngk Spark Plug Co Ltd | プリント配線基板の製造方法 |
| JP4043923B2 (ja) | 2002-11-22 | 2008-02-06 | 東京エレクトロン株式会社 | 加工装置 |
| US7893386B2 (en) | 2003-11-14 | 2011-02-22 | Hewlett-Packard Development Company, L.P. | Laser micromachining and methods of same |
-
2004
- 2004-10-29 US US10/976,555 patent/US7923658B2/en not_active Expired - Fee Related
-
2005
- 2005-07-29 JP JP2007531168A patent/JP5112868B2/ja not_active Expired - Fee Related
- 2005-07-29 WO PCT/US2005/027113 patent/WO2006031303A1/en not_active Ceased
- 2005-07-29 EP EP20050776605 patent/EP1817135A1/en not_active Withdrawn
- 2005-07-29 BR BRPI0515658-0A patent/BRPI0515658A/pt not_active IP Right Cessation
- 2005-07-29 MX MX2007002935A patent/MX2007002935A/es unknown
Also Published As
| Publication number | Publication date |
|---|---|
| US7923658B2 (en) | 2011-04-12 |
| JP2008512250A (ja) | 2008-04-24 |
| US20060054605A1 (en) | 2006-03-16 |
| BRPI0515658A (pt) | 2008-07-29 |
| WO2006031303A1 (en) | 2006-03-23 |
| MX2007002935A (es) | 2007-05-24 |
| EP1817135A1 (en) | 2007-08-15 |
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