JP5097131B2 - リボン状イオンビームのイオン注入システムのアーキテクチャ - Google Patents

リボン状イオンビームのイオン注入システムのアーキテクチャ Download PDF

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Publication number
JP5097131B2
JP5097131B2 JP2008552347A JP2008552347A JP5097131B2 JP 5097131 B2 JP5097131 B2 JP 5097131B2 JP 2008552347 A JP2008552347 A JP 2008552347A JP 2008552347 A JP2008552347 A JP 2008552347A JP 5097131 B2 JP5097131 B2 JP 5097131B2
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Prior art keywords
ion beam
ribbon
parallel
lens system
workpiece
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JP2008552347A
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Japanese (ja)
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JP2009524908A (ja
JP2009524908A5 (enExample
Inventor
サアダトマンド、クーロシュ
エル． ケラーマン、ピーター
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バリアン・セミコンダクター・エクイップメント・アソシエイツ・インコーポレイテッド
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Publication of JP2009524908A5 publication Critical patent/JP2009524908A5/ja
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/26—Bombardment with radiation
    • H01L21/263—Bombardment with radiation with high-energy radiation
    • H01L21/265—Bombardment with radiation with high-energy radiation producing ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/3002—Details
    • H01J37/3007—Electron or ion-optical systems
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/04—Means for controlling the discharge
    • H01J2237/049—Focusing means
    • H01J2237/0492—Lens systems

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  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physical Vapour Deposition (AREA)
JP2008552347A 2006-01-27 2007-01-22 リボン状イオンビームのイオン注入システムのアーキテクチャ Active JP5097131B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11/275,772 US7394079B2 (en) 2006-01-27 2006-01-27 Architecture for ribbon ion beam ion implanter system
US11/275,772 2006-01-27
PCT/US2007/001665 WO2007089468A2 (en) 2006-01-27 2007-01-22 Architecture for ribbon ion beam ion implanter system

Publications (3)

Publication Number Publication Date
JP2009524908A JP2009524908A (ja) 2009-07-02
JP2009524908A5 JP2009524908A5 (enExample) 2010-03-11
JP5097131B2 true JP5097131B2 (ja) 2012-12-12

Family

ID=38198249

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2008552347A Active JP5097131B2 (ja) 2006-01-27 2007-01-22 リボン状イオンビームのイオン注入システムのアーキテクチャ

Country Status (6)

Country Link
US (1) US7394079B2 (enExample)
JP (1) JP5097131B2 (enExample)
KR (1) KR101309853B1 (enExample)
CN (1) CN101416269B (enExample)
TW (1) TWI395251B (enExample)
WO (1) WO2007089468A2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20170169987A1 (en) * 2015-12-11 2017-06-15 Varian Semiconductor Equipment Associates, Inc. Parallelizing electrostatic acceleration/deceleration optical element

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7858955B2 (en) * 2008-06-25 2010-12-28 Axcelis Technologies, Inc. System and method of controlling broad beam uniformity
US8263941B2 (en) * 2008-11-13 2012-09-11 Varian Semiconductor Equipment Associates, Inc. Mass analysis magnet for a ribbon beam
MY171019A (en) 2009-04-13 2019-09-23 Applied Materials Inc Modification of magnetic properties of films using ion and neutral beam implantation
JP5041260B2 (ja) * 2010-06-04 2012-10-03 日新イオン機器株式会社 イオン注入装置
US20120056107A1 (en) * 2010-09-08 2012-03-08 Varian Semiconductor Equipment Associates, Inc. Uniformity control using ion beam blockers
JP6184254B2 (ja) * 2013-08-29 2017-08-23 住友重機械イオンテクノロジー株式会社 イオン注入装置、ビーム平行化装置、及びイオン注入方法
US20150144810A1 (en) * 2013-11-27 2015-05-28 Varian Semiconductor Equipment Associates, Inc. Triple mode electrostatic collimator
JP6324231B2 (ja) * 2014-06-23 2018-05-16 住友重機械イオンテクノロジー株式会社 イオン注入装置

Family Cites Families (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5091655A (en) 1991-02-25 1992-02-25 Eaton Corporation Reduced path ion beam implanter
US5177366A (en) * 1992-03-06 1993-01-05 Eaton Corporation Ion beam implanter for providing cross plane focusing
US5350926A (en) 1993-03-11 1994-09-27 Diamond Semiconductor Group, Inc. Compact high current broad beam ion implanter
US5481116A (en) * 1994-06-10 1996-01-02 Ibis Technology Corporation Magnetic system and method for uniformly scanning heavy ion beams
US5693939A (en) * 1996-07-03 1997-12-02 Purser; Kenneth H. MeV neutral beam ion implanter
US5834786A (en) * 1996-07-15 1998-11-10 Diamond Semiconductor Group, Inc. High current ribbon beam ion implanter
US6060715A (en) * 1997-10-31 2000-05-09 Applied Materials, Inc. Method and apparatus for ion beam scanning in an ion implanter
GB2347786B (en) * 1999-02-22 2002-02-13 Toshiba Kk Ion implantation method
GB2356736B (en) * 1999-02-22 2002-06-05 Toshiba Kk Ion implantation method and ion implantation equipment
US6423976B1 (en) * 1999-05-28 2002-07-23 Applied Materials, Inc. Ion implanter and a method of implanting ions
US6635880B1 (en) * 1999-10-05 2003-10-21 Varian Semiconductor Equipment Associates, Inc. High transmission, low energy beamline architecture for ion implanter
JP3680274B2 (ja) * 2002-03-27 2005-08-10 住友イートンノバ株式会社 イオンビームの電荷中和装置とその方法
US6774377B1 (en) * 2003-06-26 2004-08-10 Axcelis Technologies, Inc. Electrostatic parallelizing lens for ion beams
US7102146B2 (en) * 2004-06-03 2006-09-05 Axcelis Technologies, Inc. Dose cup located near bend in final energy filter of serial implanter for closed loop dose control
US20060017010A1 (en) * 2004-07-22 2006-01-26 Axcelis Technologies, Inc. Magnet for scanning ion beams
JP5100963B2 (ja) * 2004-11-30 2012-12-19 株式会社Ｓｅｎ ビーム照射装置
US7173260B2 (en) * 2004-12-22 2007-02-06 Axcelis Technologies, Inc. Removing byproducts of physical and chemical reactions in an ion implanter

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20170169987A1 (en) * 2015-12-11 2017-06-15 Varian Semiconductor Equipment Associates, Inc. Parallelizing electrostatic acceleration/deceleration optical element
US9978556B2 (en) * 2015-12-11 2018-05-22 Varian Semiconductor Equipment Associates, Inc. Parallelizing electrostatic acceleration/deceleration optical element

Also Published As

Publication number Publication date
WO2007089468A2 (en) 2007-08-09
CN101416269B (zh) 2010-06-09
TWI395251B (zh) 2013-05-01
KR101309853B1 (ko) 2013-09-23
CN101416269A (zh) 2009-04-22
US20070176122A1 (en) 2007-08-02
JP2009524908A (ja) 2009-07-02
US7394079B2 (en) 2008-07-01
WO2007089468A3 (en) 2007-10-04
TW200805421A (en) 2008-01-16
KR20080092965A (ko) 2008-10-16

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