JP5094756B2 - Semiconductor device manufacturing method and semiconductor package deformation correcting device used therefor - Google Patents

Semiconductor device manufacturing method and semiconductor package deformation correcting device used therefor Download PDF

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JP5094756B2
JP5094756B2 JP2009020666A JP2009020666A JP5094756B2 JP 5094756 B2 JP5094756 B2 JP 5094756B2 JP 2009020666 A JP2009020666 A JP 2009020666A JP 2009020666 A JP2009020666 A JP 2009020666A JP 5094756 B2 JP5094756 B2 JP 5094756B2
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semiconductor package
insertion plate
semiconductor
counterbore
resin
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孝司 清水
宏顕 成松
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Mitsui High Tech Inc
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Description

本発明は、半導体装置の製造方法及び装置に関し、特に半導体素子及びボンディングワイヤ部分を樹脂封止後に半導体パッケージ裏面の外部端子やダイパッド等の導体部を再エッチングによりリードフレームから切り離すタイプの半導体パッケージの変形矯正技術に関する。   The present invention relates to a method and apparatus for manufacturing a semiconductor device, and more particularly, to a semiconductor package of a type in which a semiconductor element and a bonding wire portion are sealed with a resin and a conductor portion such as an external terminal or die pad on the back surface of the semiconductor package is separated from a lead frame by re-etching. It relates to deformation correction technology.

通常の樹脂封止型半導体装置では、半導体素子をリードフレームの中央部に搭載し、半導体素子のボンディングパッドとリードフレームの内部リードとを金線等のボンディングワイヤによって結線した後、樹脂封止する。この樹脂封止工程の後に樹脂の硬化を促進し完了させる加熱エージング(モールドキュア)を行い、次いで外部リードをめっき処理し、外部リードを所定の形状に切断して曲げ加工し、製品とする。   In an ordinary resin-encapsulated semiconductor device, a semiconductor element is mounted at the center of a lead frame, and a bonding pad of the semiconductor element and an internal lead of the lead frame are connected by a bonding wire such as a gold wire and then resin-sealed. . After this resin sealing step, heat aging (mold cure) is performed to accelerate and complete the curing of the resin, then the external leads are plated, and the external leads are cut into a predetermined shape and bent into a product.

この工程における樹脂硬化の際に、半導体パッケージの構成材料の違いや樹脂の硬化収縮、パッケージの上下厚さの違いなどの原因により、半導体パッケージの変形が生じる。
この変形は次工程の外部リードの切断・成型工程におけるジャミングなどを引き起こして歩留低下を招くほか、半導体装置をプリント基板に実装する際の半田付け不良を発生させる原因となる。
When the resin is cured in this process, the semiconductor package is deformed due to a difference in the constituent material of the semiconductor package, a curing shrinkage of the resin, a difference in thickness of the package, and the like.
This deformation causes jamming in the cutting / molding process of the external lead in the next process, leading to a decrease in yield, and also causes a soldering failure when the semiconductor device is mounted on the printed board.

この問題を解消するために、特許文献1には、半導体素子を樹脂封止した半導体パッケージと金属平板(挿間プレート)とを交互に積重ねて筒形の金属容器内に収納し、半導体パッケージ及び挿間プレートを積重ねた最上段に耐熱性の重しを載置した状態で半導体パッケージをガラス転移温度を超える温度まで加熱した後徐冷して半導体パッケージに生じた変形を矯正する方法が開示されている。   In order to solve this problem, Patent Document 1 discloses that semiconductor packages in which semiconductor elements are sealed with resin and metal flat plates (insertion plates) are alternately stacked and housed in a cylindrical metal container. A method is disclosed in which a semiconductor package is heated to a temperature exceeding the glass transition temperature with a heat-resistant weight placed on the uppermost stack of interposing plates, and then slowly cooled to correct deformation in the semiconductor package. ing.

一方、半導体装置のパッケージの構造としては、外部入出力用のピンを四辺に配置したQFP(Quad Flat Package)、外部入出力用のピンが外部に出ていないQFN(Quad Flat Non-leaded Package)、パッケージの下面に外部入出力用のパッドが並んでいるBGA(Ball Grid Array)、LGA(Land Grid Array)等のタイプがあるが、前二者は安価であるが半導体の高集積化、多ピン配列には限界があり、後二者は高集積化、他ピン配列に向いているが、製造コストが嵩むという、相反する問題を有している。   On the other hand, the structure of the semiconductor device package is QFP (Quad Flat Package) in which external input / output pins are arranged on four sides, and QFN (Quad Flat Non-leaded Package) in which external input / output pins are not exposed to the outside. There are types such as BGA (Ball Grid Array) and LGA (Land Grid Array) in which pads for external input / output are arranged on the bottom surface of the package. The pin arrangement is limited, and the latter two are suitable for higher integration and other pin arrangements, but have the conflicting problem of increased manufacturing costs.

近年の半導体の高集積化、多ピン配列のニーズに対応するとともに製造コストを低減できる半導体装置の構造として、特許文献2に記載されたものがある。これは、図5(E)に示すように、中央に半導体素子51が配置され、その半導体素子51の周辺にエリアアレイ状に、表面側がワイヤボンディング部52であり裏面側が外部接続端子部53である導体端子54が配置され、ワイヤボンディング部52と半導体素子51の各電極パッドがボンディングワイヤ56で電気的に接続され、半導体素子51、ボンディングワイヤ52及び導体端子54の表面側半分が封止樹脂58で樹脂封止されている半導体装置50である。   As a structure of a semiconductor device capable of meeting the needs for high integration of semiconductors and a multi-pin arrangement in recent years and reducing the manufacturing cost, there is one described in Patent Document 2. As shown in FIG. 5 (E), a semiconductor element 51 is arranged at the center, an area array is formed around the semiconductor element 51, the surface side is a wire bonding part 52, and the back side is an external connection terminal part 53. A certain conductor terminal 54 is arranged, the wire bonding portion 52 and each electrode pad of the semiconductor element 51 are electrically connected by a bonding wire 56, and the semiconductor element 51, the bonding wire 52, and the surface half of the conductor terminal 54 are encapsulating resin. The semiconductor device 50 is sealed with a resin 58.

この半導体装置の製造方法は、次の工程からなる。
図5(A)に示すように、板状のリードフレーム材61の表面側に、中央に搭載予定の半導体素子51を囲んで形成されるワイヤボンディング部52と、該ワイヤボンディング部52に対応して裏面側に形成される外部接続端子部53と、半導体素子搭載部50の形成予定領域となるリードフレームの表裏面に金めっき層62、63を形成する(第1工程)。
This semiconductor device manufacturing method includes the following steps.
As shown in FIG. 5A, a wire bonding portion 52 formed on the surface side of the plate-like lead frame material 61 so as to surround the semiconductor element 51 to be mounted in the center, and corresponds to the wire bonding portion 52. Then, the gold plating layers 62 and 63 are formed on the front and back surfaces of the external connection terminal portion 53 formed on the back surface side and the lead frame to be formed in the semiconductor element mounting portion 50 (first step).

次に、図5(B)に示すように、リードフレーム材61の裏面側に耐エッチングレジスト膜64を形成した後、表面側に形成された金めっき層62をレジストマスクとして表面側からリードフレーム材61に所定深さのエッチング加工(ハーフエッチング)を行う。これによって、半導体素子搭載部50とワイヤボンディング部52とを突出させる(第2工程)。   Next, as shown in FIG. 5B, after forming an etching resistant resist film 64 on the back surface side of the lead frame material 61, the lead frame is formed from the front surface side using the gold plating layer 62 formed on the front surface side as a resist mask. Etching (half etching) is performed on the material 61 at a predetermined depth. Thereby, the semiconductor element mounting part 50 and the wire bonding part 52 are protruded (second step).

そして、図5(C)に示すように、ハーフエッチングされたリードフレーム材61の表面側中央に半導体素子51を銀・エポキシ系樹脂からなる接着剤を介して搭載した後、半導体素子51の電極パッド部55とそれぞれ対応するワイヤボンディング部52との間をボンディングワイヤ56によって接続し、電気的導通回路を形成する(第3工程)。   Then, as shown in FIG. 5C, after the semiconductor element 51 is mounted on the surface side center of the half-etched lead frame material 61 via an adhesive made of silver / epoxy resin, the electrode of the semiconductor element 51 The pad portions 55 and the corresponding wire bonding portions 52 are connected by bonding wires 56 to form an electrical conduction circuit (third step).

この後、図5(D)に示すように、半導体素子51、ボンディングワイヤ56を含むリードフレーム材61の表面側を封止樹脂58で樹脂封止する(第4工程)。   Thereafter, as shown in FIG. 5D, the surface side of the lead frame material 61 including the semiconductor element 51 and the bonding wire 56 is resin-sealed with a sealing resin 58 (fourth step).

以上の処理が終わった後、リードフレーム材61の裏面側に貼着していた耐エッチングレジスト膜64を除去する。更に、図5(E)に示すように、リードフレーム材61の裏面側に、裏面側に形成された金めっき層63をレジストマスクとして再エッチング加工を行って、外部接続端子部53と半導体素子搭載部50の裏面側を突出させると共に、隣り合う外部接続端子部53を電気的に独立させる(第5工程)。この後、個片化のための分断作業を行って、独立した半導体装置50が得られる。   After the above processing is completed, the etching resistant resist film 64 adhered to the back side of the lead frame material 61 is removed. Furthermore, as shown in FIG. 5E, the external connection terminal portion 53 and the semiconductor element are re-etched on the back side of the lead frame material 61 using the gold plating layer 63 formed on the back side as a resist mask. The rear surface side of the mounting portion 50 is projected, and the adjacent external connection terminal portions 53 are electrically independent (fifth step). Thereafter, a dividing operation for dividing into pieces is performed, and an independent semiconductor device 50 is obtained.

以上のように、この半導体装置では、樹脂封止後に再エッチングを行うことでスタンドオフ(封止樹脂に保持されリードフレームから独立した端子)を形成できる。この実装端子のスタンドオフを設けていることで、半導体装置における高い実装性と実装信頼性を確保している。   As described above, in this semiconductor device, stand-off (terminals held by the sealing resin and independent of the lead frame) can be formed by performing re-etching after resin sealing. By providing standoffs for the mounting terminals, high mountability and mounting reliability in the semiconductor device are ensured.

特開平9−17816号公報JP-A-9-17816 特許第3947750号公報Japanese Patent No. 3947750

前掲の特許文献2に記載されたタイプの半導体装置(以下、「ハイブリッド型半導体装置」という。)においても、通常のQFP型、QFN型、BGA型、LGA型の半導体装置と同様に、樹脂封止工程(第4工程:図5(D)参照)の後、耐エッチングレジスト膜64を除去した後に、樹脂の硬化を促進し完了させるモールドキュアを行うが、この際においても、半導体パッケージの構成材料の違いや樹脂の硬化収縮、パッケージの上下厚さの違いなどの原因により、半導体パッケージの変形が生じる。
そこで、前掲の特許文献1に記載された半導体装置の製造方法のように、パッケージ間に挿間プレートを挿入、もしくは直接パッケージを重ねた上で、重しで加圧した状態でモールドキュアを行い、変形を矯正している。
Also in the semiconductor device of the type described in the above-mentioned Patent Document 2 (hereinafter referred to as “hybrid type semiconductor device”), as in the case of a normal QFP type, QFN type, BGA type, and LGA type semiconductor device, resin sealing is performed. After the stop step (fourth step: see FIG. 5D), after the etching resistant resist film 64 is removed, mold curing is performed to accelerate and complete the curing of the resin. Deformation of the semiconductor package occurs due to causes such as differences in materials, resin curing shrinkage, and differences in the upper and lower thicknesses of the package.
Then, like the manufacturing method of the semiconductor device described in the above-mentioned Patent Document 1, insert curing plates are inserted between packages, or the packages are directly stacked, and mold curing is performed in a state of being pressurized with a weight. , Have corrected the deformation.

しかしながら、前掲のハイブリッド型半導体装置のように、樹脂封止後にエッチングにて外部端子を独立させるパッケージにおいては、挿間プレートに付着した樹脂カス等の異物が外部端子やダイパッド等の導体部表面のめっき面に接触し、再エッチングの際のレジスト機能を果たすめっき面にキズをつけてしまい、このキズの部分がエッチング液により浸食されて、ピット不良を発生させ、歩留まり低下の原因となっている。
そこで本発明は、樹脂封止型半導体装置のパッケージの封止樹脂のモールドキュア工程における製品不良の発生を防止することを目的とする。
However, in a package in which external terminals are made independent by etching after resin sealing, as in the hybrid semiconductor device described above, foreign matter such as resin debris attached to the insertion plate is exposed on the surface of the conductor part such as external terminals and die pads. The plating surface that contacts the plating surface and scratches the plating surface that performs the resist function at the time of re-etching, and this scratched portion is eroded by the etching solution, causing pit defects and causing a decrease in yield. .
Accordingly, an object of the present invention is to prevent the occurrence of product defects in a mold curing process of a sealing resin for a package of a resin-encapsulated semiconductor device.

前記課題を解決するため、本発明の第1の構成は、半導体素子を樹脂封止した半導体パッケージと耐熱性平板からなる挿間プレートとを交互に積重ねて基台上に載置し、最上段の挿間プレート上に設けた加圧手段により加圧した状態で前記半導体パッケージを所定温度まで加熱した後徐冷して半導体パッケージに生じた変形を矯正する工程を含む半導体装置の製造方法において、前記挿間プレートは、その表面に、当該挿間プレートに当接する半導体パッケージの外部端子の輪郭に対応する座ぐり部または貫通孔部を設けたものを使用することを特徴とする。   In order to solve the above-described problem, the first configuration of the present invention includes a semiconductor package in which a semiconductor element is sealed with resin and an insertion plate made of a heat-resistant flat plate, which are alternately stacked and placed on a base. In a method for manufacturing a semiconductor device, the method includes a step of heating the semiconductor package to a predetermined temperature in a state where the semiconductor package is pressed by a pressing means provided on the insertion plate, and then slowly cooling to correct deformation generated in the semiconductor package. The insertion plate is provided with a counterbore or a through-hole corresponding to the outline of the external terminal of the semiconductor package that contacts the insertion plate on the surface.

この第1の構成においては、モールドキュア工程時に挿間プレートを介して各半導体パッケージを加圧するとき、挿間プレートにおける半導体パッケージの外部端子と接触する部位に座ぐり部または貫通孔部を設けているため、半導体パッケージの外部端子が挿間プレートに直接接触せず、外部端子のメッキ面にキズや異物の付着が生じない。これにより、後の再エッチング時にレジスト機能不良により外部端子が浸食されてキズが生じる等の製品不良が解消され、歩留まりを向上させることができる。   In the first configuration, when pressurizing each semiconductor package via the insertion plate during the mold curing process, a counterbore or a through hole is provided at a portion of the insertion plate that contacts the external terminal of the semiconductor package. Therefore, the external terminals of the semiconductor package do not directly contact the insertion plate, and scratches and foreign substances do not adhere to the plated surface of the external terminals. This eliminates product defects such as scratches caused by erosion of external terminals due to defective resist functions during subsequent re-etching, and can improve yield.

本発明の第2の構成は、第1の構成において、前記挿間プレートには更に、前記半導体パッケージのダイパッドの輪郭に対応する座ぐり部または貫通孔部を設けたものを使用することを特徴とする。この第2の構成においては、挿間プレートに、更にダイパッドの輪郭に対応する座ぐり部または貫通孔部を設けることにより、ダイパッド面にキズや異物の付着が生じず、製品不良を防ぐことができる。また、加圧時にダイパッド面にかかる荷重を無くし、封止樹脂部の変形を効率的に矯正することができる。   According to a second configuration of the present invention, in the first configuration, the insertion plate is further provided with a counterbore or a through hole corresponding to the contour of the die pad of the semiconductor package. And In this second configuration, by providing a counterbore or a through-hole corresponding to the contour of the die pad on the insertion plate, scratches and foreign matter do not occur on the die pad surface, thereby preventing product defects. it can. Moreover, the load applied to the die pad surface during pressurization can be eliminated, and the deformation of the sealing resin portion can be efficiently corrected.

本発明の第3の構成は、基台と、その基台上に積み重ねられる複数の半導体パッケージ間に挿入される挿間プレートと、最上段の挿間プレート上に設けられる加圧手段とを有する半導体パッケージの変形矯正装置において、前記挿間プレートには、その表面に、当該挿間プレートに当接する半導体パッケージの外部端子の輪郭に対応する座ぐり部または貫通孔部が設けられていることを特徴とする。   The third configuration of the present invention includes a base, an insertion plate inserted between a plurality of semiconductor packages stacked on the base, and a pressing means provided on the uppermost insertion plate. In the semiconductor package deformation correction device, the insertion plate is provided with a counterbore or a through-hole corresponding to the contour of the external terminal of the semiconductor package in contact with the insertion plate. Features.

この第3の構成においては、挿間プレートにおける半導体パッケージの外部端子と接触する部位に座ぐり部または貫通孔部を設けているため、半導体パッケージの外部端子が挿間プレートに直接接触せず、外部端子のメッキ面にキズや異物の付着が生じない。これにより、後の再エッチング時にレジスト機能不良により外部端子が侵食されてキズが生じる等の製品不良が解消され、歩留まりを向上させることができる。   In the third configuration, since the counterbore or the through hole is provided in the portion of the insertion plate that contacts the external terminal of the semiconductor package, the external terminal of the semiconductor package does not directly contact the insertion plate, No scratches or foreign matter adhere to the plated surface of the external terminals. This eliminates product defects such as scratches caused by erosion of external terminals due to defective resist functions during subsequent re-etching, and can improve yield.

本発明の第4の構成は、第3の構成において、前記挿間プレートには更に、前記半導体パッケージのダイパッドの輪郭に対応する座ぐり部または貫通孔部が設けられていることを特徴とする。この第4の構成においては、挿間プレートに、更にダイパッドの輪郭に対応する座ぐり部または貫通孔部を設けることにより、ダイパッド面にキズや異物の付着が生じず、製品不良を防ぐことができる。また、加圧時にダイパッド面にかかる荷重を無くし、封止樹脂部の変形を効率的に矯正することができる。   According to a fourth configuration of the present invention, in the third configuration, the insertion plate is further provided with a counterbore or a through-hole corresponding to the outline of the die pad of the semiconductor package. . In the fourth configuration, by providing a counterbore or a through-hole corresponding to the contour of the die pad in the insertion plate, scratches and foreign matter do not occur on the die pad surface, thereby preventing product defects. it can. Moreover, the load applied to the die pad surface during pressurization can be eliminated, and the deformation of the sealing resin portion can be efficiently corrected.

本発明によれば、モールドキュア時に製品の外部端子またはダイパッド等の導体部が挿間プレートと接触していた場合、挿間プレート表面に付着した樹脂カス、異物等により製品キズが発生し、外観不良で歩留まり低下の原因となるが、挿間プレートを導体部と接しない構造にしたことにより、モールドキュア時に発生するキズ、異物が削減され、歩留まりが向上する。   According to the present invention, when a conductor part such as an external terminal or die pad of the product is in contact with the insertion plate during mold curing, a product scratch is generated due to resin residue, foreign matter, etc. adhering to the surface of the insertion plate. Although it causes a decrease in yield due to a defect, the structure in which the insertion plate is not in contact with the conductor portion reduces scratches and foreign matters generated during mold curing, thereby improving the yield.

本発明の構成の挿間プレートは、ハイブリッド型半導体装置のみならず、BGAやQFN等の片面モールドを行う製品かつ重し等の加圧手段を用いたモールドキュアを行う製品であれば同様の効果を期待できる。   The effect of the insertion plate of the configuration of the present invention is not limited to a hybrid type semiconductor device, but also a product that performs single-side molding such as BGA and QFN and a product that performs mold curing using pressure means such as weight. Can be expected.

本発明の実施の形態に係る半導体パッケージの変形矯正装置の一部分解斜視図である。1 is a partially exploded perspective view of a semiconductor package deformation correction device according to an embodiment of the present invention. 本発明の実施の形態に係る半導体パッケージの変形矯正装置の正面図である。It is a front view of the deformation correction apparatus of the semiconductor package which concerns on embodiment of this invention. (a)は本発明の実施の形態に係る半導体パッケージの表面図、(b)は本発明の実施の形態に係る挿間プレートの上面の表面図、(c)はその挿間プレートの下面の表面図である。(A) is a surface view of the semiconductor package according to the embodiment of the present invention, (b) is a surface view of the upper surface of the insertion plate according to the embodiment of the present invention, and (c) is a lower surface of the insertion plate. FIG. (a),(b),(c)は、それぞれ本発明の実施の形態に係る挿間プレートの他の例を示す表面図である。(A), (b), (c) is a surface view which shows the other example of the insertion plate which concerns on embodiment of this invention, respectively. ハイブリッド型半導体装置の製造工程を示す説明図である。It is explanatory drawing which shows the manufacturing process of a hybrid type semiconductor device.

以下、本発明の実施の形態を図面を参照して説明する。
図1及び図2に示すように、本発明の実施の形態に係る半導体パッケージの変形矯正装置は、基台1と、基台1から立設したガイド棒2と、重し3とを有している。基台1の上面及び重し3の下面はフラットであり、その間に、挿間プレート5と半導体パッケージ6が交互に積み重ねられる。基台1とガイド棒2と重し3は、モールドキュア時の温度(約180℃〜200℃)に耐える耐熱性の部材で作られており、本例ではアルミニウム合金製としている。
Hereinafter, embodiments of the present invention will be described with reference to the drawings.
As shown in FIGS. 1 and 2, the semiconductor package deformation correction device according to the embodiment of the present invention includes a base 1, a guide bar 2 erected from the base 1, and a weight 3. ing. The upper surface of the base 1 and the lower surface of the weight 3 are flat, and the interposing plates 5 and the semiconductor packages 6 are alternately stacked therebetween. The base 1, the guide rod 2, and the weight 3 are made of a heat-resistant member that can withstand the temperature during mold curing (about 180 ° C. to 200 ° C.), and in this example, is made of an aluminum alloy.

ガイド棒2は、基台1上に挿間プレート5と半導体パッケージ6を積み重ねる際に位置を規制する機能を有しており、6本のガイド棒2の内側に、隙間なく外周が接するように、挿間プレート5、半導体パッケージ6、および重し3が設置される。   The guide bar 2 has a function of restricting the position when the insertion plate 5 and the semiconductor package 6 are stacked on the base 1 so that the outer periphery is in contact with the inner side of the six guide bars 2 without a gap. The insertion plate 5, the semiconductor package 6, and the weight 3 are installed.

挿間プレート5の上下面には、その間に挟む半導体パッケージ6における外部端子、ダイパッドの配置、形状に応じた座ぐり部または貫通孔部が形成される。例えば、半導体パッケージ6の裏面の導電部が図3(a)に示す外部端子6aおよびダイパッド6bの形態の場合は、挿間プレート5の上面は、図3(b)に示す座ぐり部(または貫通孔部)5a,5bの形態となる。半導体パッケージ6の上面がフラットであれば、挿間プレート5の下面は図3(c)に示すようにフラットとする。座ぐり部5a,5bの深さは、半導体パッケージの外部端子6a、ダイパッド6bの高さよりも深くして、外部端子6a、ダイパッド6bが座ぐり部5a,5bと接触しないようにする。   On the upper and lower surfaces of the insertion plate 5, counterbore portions or through-hole portions according to the arrangement and shape of external terminals and die pads in the semiconductor package 6 sandwiched therebetween are formed. For example, when the conductive portion on the back surface of the semiconductor package 6 is in the form of the external terminal 6a and the die pad 6b shown in FIG. 3A, the upper surface of the insertion plate 5 is the counterbore portion shown in FIG. Through-hole portions) 5a and 5b. If the upper surface of the semiconductor package 6 is flat, the lower surface of the insertion plate 5 is flat as shown in FIG. The depth of the spot facing portions 5a and 5b is set to be deeper than the height of the external terminal 6a and die pad 6b of the semiconductor package so that the external terminal 6a and die pad 6b do not contact the spot facing portions 5a and 5b.

なお、挿間プレート5の上面または下面に形成される座ぐり部5a、5bまたは貫通孔部は、外部端子のそれぞれに対応する形状のほかに、外部端子アレイ全体を含むような形態とすることもできる。その例を図4(a),(b),(c)に示す。図4(a)は座ぐり部5cが図3(a)に示す半導体パッケージの4個分全体を含む場合、図4(b)は座ぐり部5dが半導体パッケージの1個分全体を含む場合、図4(c)は座ぐり部5eが外部端子のみと接触しない場合を示している。   The counterbore 5a, 5b or the through hole formed on the upper surface or the lower surface of the insertion plate 5 is configured to include the entire external terminal array in addition to the shape corresponding to each external terminal. You can also. Examples are shown in FIGS. 4 (a), 4 (b) and 4 (c). 4A shows a case where the spot facing portion 5c includes the entire four semiconductor packages shown in FIG. 3A, and FIG. 4B shows a case where the spot facing portion 5d includes the entire semiconductor package. FIG. 4 (c) shows a case where the spot facing 5e does not contact only the external terminal.

以上のようにして基台1上に挿間プレート5と半導体パッケージ6を交互に積み立てて重し3を上に載せた状態で、モールドキュアを行う。これにより半導体パッケージ6の変形が矯正される。ハイブリッド型半導体装置の場合は、変形矯正後、再エッチングを行って外部端子のスタンドオフを形成する。   As described above, mold curing is performed in a state where the interposing plates 5 and the semiconductor packages 6 are alternately stacked on the base 1 and the weights 3 are placed on the base plate 1. Thereby, the deformation of the semiconductor package 6 is corrected. In the case of a hybrid semiconductor device, after the deformation is corrected, re-etching is performed to form a standoff of the external terminal.

この半導体パッケージの変形矯正装置は、従来のモールドキュアで使用していたフラットの挿間プレートを、半導体パッケージのダイパッド、外部端子が接触しない構造の挿間プレートに全て変えることにより、従来のモールドキュアと同じ工程で、キズや異物混入による製品不良を解消することができる。すなわち、挿間プレートのみを変更することで、同じ手順を適用して本発明の効果を得ることができる。   This semiconductor package deformation correction device changes the flat insertion plate used in the conventional mold cure to an insertion plate having a structure in which the die pad of the semiconductor package and the external terminal do not contact, thereby making the conventional mold cure. In the same process, product defects due to scratches and foreign matter can be eliminated. That is, by changing only the insertion plate, the same procedure can be applied to obtain the effects of the present invention.

なお、本発明は、ハイブリッド型半導体装置の製造工程のみならず、通常のBGAやQFN等の片面モールドを行う製品の製造工程にも適用できる。また、加圧手段として重しを用いるほかに、スプリングやプレス等の他の加圧手段を用いる変形矯正装置にも適用することができる。   The present invention can be applied not only to a manufacturing process of a hybrid semiconductor device but also to a manufacturing process of a product that performs single-sided molding such as normal BGA and QFN. In addition to using a weight as the pressurizing means, the present invention can also be applied to a deformation correcting apparatus using another pressurizing means such as a spring or a press.

1 基台
2 ガイド棒
3 重し
5 挿間プレート
5a〜5e 座ぐり部
6 半導体パッケージ
6a 外部端子
6b ダイパッド
DESCRIPTION OF SYMBOLS 1 Base 2 Guide rod 3 Weight 5 Insertion plate 5a-5e Counterbore part 6 Semiconductor package 6a External terminal 6b Die pad

Claims (4)

半導体素子を樹脂封止した半導体パッケージと耐熱性平板からなる挿間プレートとを交互に積重ねて基台上に載置し、最上段の挿間プレート上に設けた加圧手段により加圧した状態で前記半導体パッケージを所定温度まで加熱した後徐冷して半導体パッケージに生じた変形を矯正する工程を含む半導体装置の製造方法において、
前記挿間プレートは、その表面に、当該挿間プレートに当接する半導体パッケージの外部端子の輪郭に対応する座ぐり部または貫通孔部を設けたものを使用することを特徴とする半導体の製造方法。
A semiconductor package in which a semiconductor element is sealed with resin and an insertion plate made of a heat-resistant flat plate are alternately stacked and placed on a base and pressed by a pressing means provided on the uppermost insertion plate In the method of manufacturing a semiconductor device, including the step of heating the semiconductor package to a predetermined temperature and then slowly cooling to correct the deformation generated in the semiconductor package.
The method of manufacturing a semiconductor, wherein the insertion plate is provided with a counterbore or a through hole corresponding to the contour of an external terminal of a semiconductor package that contacts the insertion plate on the surface thereof. .
前記挿間プレートには更に、前記半導体パッケージのダイパッドの輪郭に対応する座ぐり部または貫通孔部を設けたものを使用することを特徴とする請求項1記載の半導体の製造方法。   2. The semiconductor manufacturing method according to claim 1, wherein the insertion plate is further provided with a counterbore or a through hole corresponding to the contour of the die pad of the semiconductor package. 基台と、その基台上に積み重ねられる複数の半導体パッケージ間に挿入される挿間プレートと、最上段の挿間プレート上に設けられる加圧手段とを有する半導体パッケージの変形矯正装置において、
前記挿間プレートには、その表面に、当該挿間プレートに当接する半導体パッケージの外部端子の輪郭に対応する座ぐり部または貫通孔部が設けられていることを特徴とする半導体パッケージの変形矯正装置。
In a semiconductor package deformation correction apparatus having a base, an insertion plate inserted between a plurality of semiconductor packages stacked on the base, and a pressing means provided on the uppermost insertion plate,
The insertion plate is provided with a counterbore or a through-hole corresponding to the contour of the external terminal of the semiconductor package that contacts the insertion plate on the surface thereof. apparatus.
前記挿間プレートには更に、前記半導体パッケージのダイパッドの輪郭に対応する座ぐり部または貫通孔部が設けられていることを特徴とする請求項3記載の半導体パッケージの変形矯正装置。   4. The semiconductor package deformation correction device according to claim 3, wherein the insertion plate further includes a counterbore or a through hole corresponding to a contour of a die pad of the semiconductor package.
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