JP5081527B2 - 気体清浄化装置及び気体清浄化方法 - Google Patents
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- JP5081527B2 JP5081527B2 JP2007194811A JP2007194811A JP5081527B2 JP 5081527 B2 JP5081527 B2 JP 5081527B2 JP 2007194811 A JP2007194811 A JP 2007194811A JP 2007194811 A JP2007194811 A JP 2007194811A JP 5081527 B2 JP5081527 B2 JP 5081527B2
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- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- 229910052741 iridium Inorganic materials 0.000 claims description 4
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 claims description 4
- 229910052725 zinc Inorganic materials 0.000 claims description 4
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
- B03C3/01—Pretreatment of the gases prior to electrostatic precipitation
- B03C3/014—Addition of water; Heat exchange, e.g. by condensation
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/0027—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions
- B01D46/0032—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions using electrostatic forces to remove particles, e.g. electret filters
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/42—Auxiliary equipment or operation thereof
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/42—Auxiliary equipment or operation thereof
- B01D46/4218—Influencing the heat transfer which act passively, e.g. isolations, heat sinks, cooling ribs
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/42—Auxiliary equipment or operation thereof
- B01D46/44—Auxiliary equipment or operation thereof controlling filtration
- B01D46/46—Auxiliary equipment or operation thereof controlling filtration automatic
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/56—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with multiple filtering elements, characterised by their mutual disposition
- B01D46/62—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with multiple filtering elements, characterised by their mutual disposition connected in series
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/66—Regeneration of the filtering material or filter elements inside the filter
- B01D46/80—Chemical processes for the removal of the retained particles, e.g. by burning
- B01D46/84—Chemical processes for the removal of the retained particles, e.g. by burning by heating only
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
- B03C3/02—Plant or installations having external electricity supply
- B03C3/04—Plant or installations having external electricity supply dry type
- B03C3/08—Plant or installations having external electricity supply dry type characterised by presence of stationary flat electrodes arranged with their flat surfaces parallel to the gas stream
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
- B03C3/02—Plant or installations having external electricity supply
- B03C3/04—Plant or installations having external electricity supply dry type
- B03C3/09—Plant or installations having external electricity supply dry type characterised by presence of stationary flat electrodes arranged with their flat surfaces at right angles to the gas stream
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
- B03C3/34—Constructional details or accessories or operation thereof
- B03C3/36—Controlling flow of gases or vapour
- B03C3/368—Controlling flow of gases or vapour by other than static mechanical means, e.g. internal ventilator or recycler
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B03—SEPARATION OF SOLID MATERIALS USING LIQUIDS OR USING PNEUMATIC TABLES OR JIGS; MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C—MAGNETIC OR ELECTROSTATIC SEPARATION OF SOLID MATERIALS FROM SOLID MATERIALS OR FLUIDS; SEPARATION BY HIGH-VOLTAGE ELECTRIC FIELDS
- B03C3/00—Separating dispersed particles from gases or vapour, e.g. air, by electrostatic effect
- B03C3/34—Constructional details or accessories or operation thereof
- B03C3/40—Electrode constructions
- B03C3/45—Collecting-electrodes
- B03C3/455—Collecting-electrodes specially adapted for heat exchange with the gas stream
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2275/00—Filter media structures for filters specially adapted for separating dispersed particles from gases or vapours
- B01D2275/30—Porosity of filtering material
- B01D2275/305—Porosity decreasing in flow direction
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67063—Apparatus for fluid treatment for etching
- H01L21/67069—Apparatus for fluid treatment for etching for drying etching
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67155—Apparatus for manufacturing or treating in a plurality of work-stations
- H01L21/67161—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers
- H01L21/67167—Apparatus for manufacturing or treating in a plurality of work-stations characterized by the layout of the process chambers surrounding a central transfer chamber
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S55/00—Gas separation
- Y10S55/10—Residue burned
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- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Electrostatic Separation (AREA)
- Filtering Of Dispersed Particles In Gases (AREA)
Description
10 基板処理システム
14 ローダーモジュール
15 搬送室
20,26,30,34,38,52 ファンフィルタユニット
21 ファン
22,31 フィルタ
23,27 照射ヒータ
24,28 高温部
25,32,36 クーリングチャネル
29,33,37,53 温度センサ
35 ケミカルフィルタ
39 正電源
40 イオナイザ
41 負電源
42 パーティクル電位測定装置
Claims (18)
- 気体流を生じさせるファンと、前記気体流に混在する微細粒子を捕捉して除去する少なくとも1つのフィルタとを備える気体清浄化装置において、
前記気体流上に位置し且つ前記フィルタよりも温度が高い少なくとも1つの高温部と、
前記高温部及び前記フィルタの温度差を維持する温度差維持装置と、を備え、
前記温度差維持装置は、前記高温部と前記フィルタとの温度差を3℃以上に維持し、
前記気体流における前記フィルタに関する上流及び下流のそれぞれにおいて少なくとも1つの前記高温部が位置することを特徴とする気体清浄化装置。 - 前記少なくとも1つのフィルタとして、第1のフィルタと、該第1のフィルタよりも網目の大きさが小さい第2のフィルタとを備え、
前記第1のフィルタ及び/又は前記第2のフィルタは前記高温部よりも温度が低いことを特徴とする請求項1記載の気体清浄化装置。 - 前記第2のフィルタは多孔質体からなることを特徴とする請求項2記載の気体清浄化装置。
- 前記少なくとも1つのフィルタとして、網目状のフィルタと、ケミカルフィルタとを備え、
前記網目状のフィルタ及び/又は前記ケミカルフィルタは前記高温部よりも温度が低いことを特徴とする請求項1記載の気体清浄化装置。 - 前記フィルタは、亜鉛、アルミニウム又はイリジウムによって構成されることを特徴とする請求項1乃至4のいずれか1項に記載の気体清浄化装置。
- 前記フィルタに前記微細粒子の極性と反対の極性の電位を発生させるフィルタ電位発生装置を備えることを特徴とする請求項1乃至5のいずれか1項に記載の気体清浄化装置。
- 前記微細粒子の電位の極性を測定する電位測定装置を備えることを特徴とする請求項6記載の気体清浄化装置。
- 前記電位測定装置は対向する第1の電極及び第2の電極と、前記微細粒子を前記第1の電極及び前記第2の電極の間に導引する微細粒子導引装置とを有し、前記第1の電極には正の電圧を印加する第1の電源が接続され、前記第1の電極及び前記第1の電源の間には第1の電流測定装置が配置されるとともに、前記第2の電極には負の電圧を印加する第2の電源が接続され、前記第2の電極及び前記第2の電源の間には第2の電流測定装置が配置されることを特徴とする請求項7記載の気体清浄化装置。
- 前記微細粒子を帯電させて前記フィルタの極性とは反対の極性の電位を強制的に発生させる微細粒子帯電装置を備えることを特徴とする請求項6乃至8のいずれか1項に記載の気体清浄化装置。
- 前記微細粒子帯電装置は、イオナイザ、エキシマレーザ発振器、紫外線ランプ及び軟エックス線照射装置からなる群から選択された1つであることを特徴とする請求項9記載の気体清浄化装置。
- 前記フィルタに正電位及び負電位を生じさせるフィルタ電位発生装置を備えることを特徴とする請求項1乃至5のいずれか1項に記載の気体清浄化装置。
- 前記フィルタ電位発生装置は、前記フィルタにおいて正電位及び負電位を交互に生じさせることを特徴とする請求項11記載の気体清浄化装置。
- 前記フィルタを加熱する加熱装置を備えることを特徴とする請求項1乃至12のいずれか1項に記載の気体清浄化装置。
- 気体流を生じさせるファンと、前記気体流に混在する微細粒子を捕捉して除去する少なくとも1つのフィルタとを備える気体清浄化装置における気体清浄化方法であって、
前記気体流における前記フィルタに関する上流及び下流のそれぞれにおいて前記フィルタよりも温度が高い少なくとも1つの高温部を発生させる高温部発生ステップと、
前記高温部と前記フィルタとの温度差を3℃以上に維持する温度維持ステップとを有することを特徴とする気体清浄化方法。 - 前記高温部発生ステップでは前記フィルタを冷却することを特徴とする請求項14の気体清浄化方法。
- 前記フィルタに前記微細粒子の極性と反対の極性の電位を発生させるフィルタ電位発生ステップを有することを特徴とする請求項14又は15記載の気体清浄化方法。
- 前記微細粒子の電位の極性を測定する粒子電位測定ステップを有することを特徴とする請求項16記載の気体清浄化方法。
- 前記微細粒子を帯電させて前記フィルタの極性とは反対の極性の電位を発生させる粒子電位発生ステップを有することを特徴とする請求項16又は17記載の気体清浄化方法。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2007194811A JP5081527B2 (ja) | 2007-07-26 | 2007-07-26 | 気体清浄化装置及び気体清浄化方法 |
US12/174,040 US8152907B2 (en) | 2007-07-26 | 2008-07-16 | Gas purification apparatus and method |
US13/422,668 US8475562B2 (en) | 2007-07-26 | 2012-03-16 | Gas purification apparatus and method |
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JP2007194811A JP5081527B2 (ja) | 2007-07-26 | 2007-07-26 | 気体清浄化装置及び気体清浄化方法 |
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JP2012193187A Division JP5442818B2 (ja) | 2012-09-03 | 2012-09-03 | 気体清浄化装置 |
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JP2009028632A JP2009028632A (ja) | 2009-02-12 |
JP5081527B2 true JP5081527B2 (ja) | 2012-11-28 |
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Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
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JP5081527B2 (ja) * | 2007-07-26 | 2012-11-28 | 東京エレクトロン株式会社 | 気体清浄化装置及び気体清浄化方法 |
JP5388643B2 (ja) * | 2009-03-19 | 2014-01-15 | 東京エレクトロン株式会社 | 基板搬送装置及び基板搬送方法 |
JP2010225640A (ja) * | 2009-03-19 | 2010-10-07 | Tokyo Electron Ltd | 基板処理装置及び排気方法 |
WO2013102169A2 (en) * | 2011-12-30 | 2013-07-04 | Rolls-Royce North American Technologies Inc. | Blower for use with air particle separator |
CN105169875B (zh) * | 2015-10-14 | 2017-03-08 | 南京信息工程大学 | 一种电厂排放的粉尘回收装置 |
KR102413271B1 (ko) * | 2015-11-02 | 2022-06-28 | 삼성전자주식회사 | 기판 이송 장치 |
KR101988457B1 (ko) * | 2017-08-31 | 2019-06-12 | (주)신우에이엔티 | 팬 필터용 히터 유닛 및 상기 팬 필터용 히터 유닛을 포함한 팬 필터 어셈블리 |
Family Cites Families (33)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1887737A (en) * | 1925-04-16 | 1932-11-15 | Herman Nelson Corp | Air filter for heating and ventilating units |
US1853333A (en) * | 1929-03-05 | 1932-04-12 | Burd High Compression Ring Com | Heater for motor vehicles |
US1825808A (en) * | 1930-09-02 | 1931-10-06 | Lee W Melcher | Air conditioning apparatus |
US3429057A (en) * | 1966-12-05 | 1969-02-25 | Proctor & Schwartz Inc | Dryers |
US3672342A (en) * | 1970-09-02 | 1972-06-27 | Ford Motor Co | System for controlling air and fuel temperature |
US4202676A (en) * | 1978-07-31 | 1980-05-13 | Raymond Fink | Safety enclosure |
JPH0143455Y2 (ja) * | 1984-11-13 | 1989-12-18 | ||
JPS632100Y2 (ja) * | 1985-01-18 | 1988-01-20 | ||
JPS61186744A (ja) * | 1985-02-14 | 1986-08-20 | Ebara Corp | 空気清浄方法及びその装置 |
JPS6261614A (ja) * | 1985-09-10 | 1987-03-18 | Aoki Kensetsu:Kk | 滅菌フイルタ− |
US4749385A (en) * | 1987-03-27 | 1988-06-07 | Rca Licensing Corporation | Method and apparatus for providing clean air |
JPH0710323B2 (ja) * | 1987-05-12 | 1995-02-08 | 日本真空技術株式会社 | 真空排気系用微粒子トラツプ |
JPS6443455A (en) | 1987-08-07 | 1989-02-15 | Canon Kk | Sheet material output device |
JPH0687994B2 (ja) * | 1987-08-31 | 1994-11-09 | 日本バイリーン株式会社 | 荷電式フィルター |
FI83481C (fi) * | 1989-08-25 | 1993-10-25 | Airtunnel Ltd Oy | Foerfarande och anordning foer rengoering av luft, roekgaser eller motsvarande |
JP2627575B2 (ja) * | 1990-08-15 | 1997-07-09 | 高砂熱学工業株式会社 | 半導体製造用クリーンルームの海塩粒子汚染防止方法 |
JPH05319808A (ja) * | 1992-05-20 | 1993-12-03 | Kao Corp | 金属酸化物微粒子及びその製造方法 |
JPH09276738A (ja) * | 1996-04-17 | 1997-10-28 | Mitsubishi Heavy Ind Ltd | 粒子捕集装置 |
US6129781A (en) * | 1997-06-18 | 2000-10-10 | Funai Electric Co., Ltd. | Air conditioning apparatus with an air cleaning function and electric dust collector for use in the same |
DE19741498B4 (de) * | 1997-09-20 | 2008-07-03 | Evonik Degussa Gmbh | Herstellung eines Keramik-Edelstahlgewebe-Verbundes |
JP3246427B2 (ja) * | 1997-12-22 | 2002-01-15 | 船井電機株式会社 | 電子式集塵器と電子式集塵器付き空気調和機 |
JP2000107536A (ja) * | 1998-09-30 | 2000-04-18 | Sanyo Electric Co Ltd | 空気清浄装置 |
GB2350804A (en) * | 1999-06-12 | 2000-12-13 | Johnson Matthey Plc | Removing particulate matter from gas by thermophoresis and combustion |
JP3509741B2 (ja) * | 1999-12-27 | 2004-03-22 | 株式会社セキュリティーシステム | 非放電型空気清浄器、非放電型空気清浄方法、及び、非放電型空気除菌器 |
KR20000018255A (ko) * | 2000-01-26 | 2000-04-06 | 임인권 | 금속 또는 세라믹 구슬을 적용한 매연 포집 방법 및 그방법을 이용한 매연저감 장치 |
JP2001232131A (ja) * | 2000-02-25 | 2001-08-28 | Oki Electric Ind Co Ltd | 大気中ガス不純物の除去装置 |
JP4158322B2 (ja) | 2000-07-28 | 2008-10-01 | 沖電気工業株式会社 | 空気中不純物成分の除去装置 |
JP2002129933A (ja) * | 2000-10-19 | 2002-05-09 | Japan Science & Technology Corp | 排気ガス処理装置とそれを使用した排気ガス処理方法 |
US6833122B2 (en) * | 2002-03-20 | 2004-12-21 | Carrier Corporation | Combined particle filter and purifier |
KR20050006350A (ko) * | 2003-07-08 | 2005-01-17 | 엘지전자 주식회사 | 공기 청정기 |
US6951582B1 (en) * | 2004-11-04 | 2005-10-04 | Sung-Lin Tsai | Air purifier device |
US7452403B2 (en) * | 2005-12-29 | 2008-11-18 | General Electric Company | System and method for applying partial discharge analysis for electrostatic precipitator |
JP5081527B2 (ja) * | 2007-07-26 | 2012-11-28 | 東京エレクトロン株式会社 | 気体清浄化装置及び気体清浄化方法 |
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US8152907B2 (en) | 2012-04-10 |
JP2009028632A (ja) | 2009-02-12 |
US20120174773A1 (en) | 2012-07-12 |
US8475562B2 (en) | 2013-07-02 |
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