JP5049249B2 - 研磨液組成物 - Google Patents
研磨液組成物 Download PDFInfo
- Publication number
- JP5049249B2 JP5049249B2 JP2008281509A JP2008281509A JP5049249B2 JP 5049249 B2 JP5049249 B2 JP 5049249B2 JP 2008281509 A JP2008281509 A JP 2008281509A JP 2008281509 A JP2008281509 A JP 2008281509A JP 5049249 B2 JP5049249 B2 JP 5049249B2
- Authority
- JP
- Japan
- Prior art keywords
- polishing
- acid
- weight
- alumina
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Manufacturing Of Magnetic Record Carriers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008281509A JP5049249B2 (ja) | 2008-10-31 | 2008-10-31 | 研磨液組成物 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2008281509A JP5049249B2 (ja) | 2008-10-31 | 2008-10-31 | 研磨液組成物 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003270150A Division JP4339034B2 (ja) | 2003-07-01 | 2003-07-01 | 研磨液組成物 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2009079228A JP2009079228A (ja) | 2009-04-16 |
JP2009079228A5 JP2009079228A5 (enrdf_load_stackoverflow) | 2011-01-06 |
JP5049249B2 true JP5049249B2 (ja) | 2012-10-17 |
Family
ID=40654215
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2008281509A Expired - Lifetime JP5049249B2 (ja) | 2008-10-31 | 2008-10-31 | 研磨液組成物 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP5049249B2 (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5484782B2 (ja) * | 2009-04-30 | 2014-05-07 | 花王株式会社 | 研磨材スラリーの製造方法 |
JP5710158B2 (ja) * | 2010-06-18 | 2015-04-30 | 山口精研工業株式会社 | 研磨剤組成物および磁気ディスク基板の研磨方法 |
JP6734018B2 (ja) * | 2014-09-17 | 2020-08-05 | 株式会社フジミインコーポレーテッド | 研磨材、研磨用組成物、及び研磨方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4021133B2 (ja) * | 1999-07-22 | 2007-12-12 | 花王株式会社 | 研磨液組成物 |
TW528645B (en) * | 2000-04-17 | 2003-04-21 | Showa Denko Kk | Composition for polishing magnetic disk substrate |
JP4231632B2 (ja) * | 2001-04-27 | 2009-03-04 | 花王株式会社 | 研磨液組成物 |
JP4339034B2 (ja) * | 2003-07-01 | 2009-10-07 | 花王株式会社 | 研磨液組成物 |
-
2008
- 2008-10-31 JP JP2008281509A patent/JP5049249B2/ja not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
JP2009079228A (ja) | 2009-04-16 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP4339034B2 (ja) | 研磨液組成物 | |
JP4273475B2 (ja) | 研磨用組成物 | |
US6027669A (en) | Polishing composition | |
JP4231632B2 (ja) | 研磨液組成物 | |
TWI506621B (zh) | 硬碟基板用研磨液組合物 | |
JPH1046140A (ja) | 化学的機械研磨用研磨組成物 | |
JP4836441B2 (ja) | 研磨液組成物 | |
WO2002006418A1 (fr) | Composition de fluide de polissage | |
JP5049249B2 (ja) | 研磨液組成物 | |
JP4286168B2 (ja) | ナノスクラッチを低減する方法 | |
JP2007168034A (ja) | ハードディスク基板用研磨液組成物 | |
JP2004263074A (ja) | 研磨用組成物 | |
JP4336550B2 (ja) | 磁気ディスク用研磨液キット | |
JP4021133B2 (ja) | 研磨液組成物 | |
JP2007301721A (ja) | 研磨液組成物 | |
JP4206313B2 (ja) | 磁気ディスク用研磨液組成物 | |
JP4651532B2 (ja) | 磁気ディスク基板の製造方法 | |
JP4707864B2 (ja) | 研磨用組成物およびそれを用いた研磨方法 | |
JP5536433B2 (ja) | ハードディスク基板用研磨液組成物 | |
JP3875156B2 (ja) | ロールオフ低減剤 | |
JP3594184B2 (ja) | 研磨液組成物 | |
JP2021163507A (ja) | 研磨用組成物、基板の製造方法および研磨方法 | |
JP3940111B2 (ja) | 研磨液組成物 | |
JP7441101B2 (ja) | 研磨用組成物 | |
JP7368998B2 (ja) | 研磨用組成物および磁気ディスク基板製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20101115 |
|
A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20120308 |
|
A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20120501 |
|
TRDD | Decision of grant or rejection written | ||
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120717 |
|
A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120720 |
|
FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150727 Year of fee payment: 3 |
|
R151 | Written notification of patent or utility model registration |
Ref document number: 5049249 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R151 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
EXPY | Cancellation because of completion of term |