JP2009079228A5 - - Google Patents
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- Publication number
- JP2009079228A5 JP2009079228A5 JP2008281509A JP2008281509A JP2009079228A5 JP 2009079228 A5 JP2009079228 A5 JP 2009079228A5 JP 2008281509 A JP2008281509 A JP 2008281509A JP 2008281509 A JP2008281509 A JP 2008281509A JP 2009079228 A5 JP2009079228 A5 JP 2009079228A5
- Authority
- JP
- Japan
- Prior art keywords
- alumina
- composition according
- polishing composition
- acid
- polishing
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000005498 polishing Methods 0.000 claims 11
- PNEYBMLMFCGWSK-UHFFFAOYSA-N Alumina Chemical compound [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 10
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims 4
- 239000000758 substrate Substances 0.000 claims 4
- 239000002253 acid Substances 0.000 claims 3
- 239000011163 secondary particle Substances 0.000 claims 3
- AFVFQIVMOAPDHO-UHFFFAOYSA-N Methanesulfonic acid Chemical compound CS(O)(=O)=O AFVFQIVMOAPDHO-UHFFFAOYSA-N 0.000 claims 2
- 239000007788 liquid Substances 0.000 claims 2
- 239000002245 particle Substances 0.000 claims 2
- BAERPNBPLZWCES-UHFFFAOYSA-N (2-hydroxy-1-phosphonoethyl)phosphonic acid Chemical compound OCC(P(O)(O)=O)P(O)(O)=O BAERPNBPLZWCES-UHFFFAOYSA-N 0.000 claims 1
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims 1
- 229910052500 inorganic mineral Inorganic materials 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 229940098779 methanesulfonic acid Drugs 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000011707 mineral Substances 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008281509A JP5049249B2 (ja) | 2008-10-31 | 2008-10-31 | 研磨液組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2008281509A JP5049249B2 (ja) | 2008-10-31 | 2008-10-31 | 研磨液組成物 |
Related Parent Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003270150A Division JP4339034B2 (ja) | 2003-07-01 | 2003-07-01 | 研磨液組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2009079228A JP2009079228A (ja) | 2009-04-16 |
| JP2009079228A5 true JP2009079228A5 (enrdf_load_stackoverflow) | 2011-01-06 |
| JP5049249B2 JP5049249B2 (ja) | 2012-10-17 |
Family
ID=40654215
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2008281509A Expired - Lifetime JP5049249B2 (ja) | 2008-10-31 | 2008-10-31 | 研磨液組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP5049249B2 (enrdf_load_stackoverflow) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5484782B2 (ja) * | 2009-04-30 | 2014-05-07 | 花王株式会社 | 研磨材スラリーの製造方法 |
| JP5710158B2 (ja) * | 2010-06-18 | 2015-04-30 | 山口精研工業株式会社 | 研磨剤組成物および磁気ディスク基板の研磨方法 |
| JP6734018B2 (ja) * | 2014-09-17 | 2020-08-05 | 株式会社フジミインコーポレーテッド | 研磨材、研磨用組成物、及び研磨方法 |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4021133B2 (ja) * | 1999-07-22 | 2007-12-12 | 花王株式会社 | 研磨液組成物 |
| TW528645B (en) * | 2000-04-17 | 2003-04-21 | Showa Denko Kk | Composition for polishing magnetic disk substrate |
| JP4231632B2 (ja) * | 2001-04-27 | 2009-03-04 | 花王株式会社 | 研磨液組成物 |
| JP4339034B2 (ja) * | 2003-07-01 | 2009-10-07 | 花王株式会社 | 研磨液組成物 |
-
2008
- 2008-10-31 JP JP2008281509A patent/JP5049249B2/ja not_active Expired - Lifetime