JP5039578B2 - 計測装置及び光強度分布計測方法、露光装置 - Google Patents

計測装置及び光強度分布計測方法、露光装置 Download PDF

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Publication number
JP5039578B2
JP5039578B2 JP2008007205A JP2008007205A JP5039578B2 JP 5039578 B2 JP5039578 B2 JP 5039578B2 JP 2008007205 A JP2008007205 A JP 2008007205A JP 2008007205 A JP2008007205 A JP 2008007205A JP 5039578 B2 JP5039578 B2 JP 5039578B2
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Japan
Prior art keywords
slit
light
optical system
light receiving
receiving units
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Expired - Fee Related
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JP2008007205A
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English (en)
Japanese (ja)
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JP2009170666A5 (enExample
JP2009170666A (ja
Inventor
彰律 大久保
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Canon Inc
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Canon Inc
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Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2008007205A priority Critical patent/JP5039578B2/ja
Priority to US12/353,541 priority patent/US8223313B2/en
Publication of JP2009170666A publication Critical patent/JP2009170666A/ja
Publication of JP2009170666A5 publication Critical patent/JP2009170666A5/ja
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/72—Controlling or varying light intensity, spectral composition, or exposure time in photographic printing apparatus
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70605—Workpiece metrology
    • G03F7/70653—Metrology techniques
    • G03F7/70666—Aerial image, i.e. measuring the image of the patterned exposure light at the image plane of the projection system

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2008007205A 2008-01-16 2008-01-16 計測装置及び光強度分布計測方法、露光装置 Expired - Fee Related JP5039578B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2008007205A JP5039578B2 (ja) 2008-01-16 2008-01-16 計測装置及び光強度分布計測方法、露光装置
US12/353,541 US8223313B2 (en) 2008-01-16 2009-01-14 Light intensity distribution measurement apparatus and measurement method, and exposure apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2008007205A JP5039578B2 (ja) 2008-01-16 2008-01-16 計測装置及び光強度分布計測方法、露光装置

Publications (3)

Publication Number Publication Date
JP2009170666A JP2009170666A (ja) 2009-07-30
JP2009170666A5 JP2009170666A5 (enExample) 2011-02-03
JP5039578B2 true JP5039578B2 (ja) 2012-10-03

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ID=40850355

Family Applications (1)

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JP2008007205A Expired - Fee Related JP5039578B2 (ja) 2008-01-16 2008-01-16 計測装置及び光強度分布計測方法、露光装置

Country Status (2)

Country Link
US (1) US8223313B2 (enExample)
JP (1) JP5039578B2 (enExample)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8199333B2 (en) 2005-05-27 2012-06-12 Carl Zeiss Smt Gmbh Optical scattering disk, use thereof, and wavefront measuring apparatus
JP5111225B2 (ja) * 2008-05-01 2013-01-09 キヤノン株式会社 計測装置、計測方法、露光装置及びデバイス製造方法
JP6321386B2 (ja) * 2014-01-29 2018-05-09 株式会社オーク製作所 露光装置および露光方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4136067B2 (ja) * 1997-05-02 2008-08-20 キヤノン株式会社 検出装置及びそれを用いた露光装置
JP2000097666A (ja) * 1998-09-22 2000-04-07 Nikon Corp 面形状計測用干渉計、波面収差測定機、前記干渉計及び前記波面収差測定機を用いた投影光学系の製造方法、及び前記干渉計の校正方法
JP2003197510A (ja) * 2001-12-27 2003-07-11 Nikon Corp 収差測定装置、収差測定方法、光学系、および、露光装置
JP2004241744A (ja) * 2003-02-10 2004-08-26 Nikon Corp 面位置検出装置、露光装置及び露光方法
JP2006080444A (ja) * 2004-09-13 2006-03-23 Canon Inc 測定装置、テストレチクル、露光装置及びデバイス製造方法
JP2006339448A (ja) * 2005-06-02 2006-12-14 Canon Inc 受光ユニットを有する露光装置
JP2007066926A (ja) * 2005-08-29 2007-03-15 Canon Inc 計測方法及び装置、露光装置、並びに、デバイス製造方法
JP4798353B2 (ja) * 2005-12-27 2011-10-19 株式会社ニコン 光学特性計測方法及びパターン誤差計測方法
JP2007329384A (ja) * 2006-06-09 2007-12-20 Nikon Corp 面位置検出装置、露光装置及びデバイスの製造方法
JP2008021830A (ja) * 2006-07-13 2008-01-31 Nikon Corp 計測方法及び装置、並びに露光方法及び装置
JP2008294019A (ja) * 2007-05-22 2008-12-04 Canon Inc 空中像計測方法および装置
JP4968335B2 (ja) * 2007-06-11 2012-07-04 株式会社ニコン 計測部材、センサ、計測方法、露光装置、露光方法、及びデバイス製造方法

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Publication number Publication date
US8223313B2 (en) 2012-07-17
US20090180094A1 (en) 2009-07-16
JP2009170666A (ja) 2009-07-30

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