JP5035784B2 - ブルーム耐性ベンゾトリアゾール紫外線吸収剤およびそれにより安定化された組成物 - Google Patents

ブルーム耐性ベンゾトリアゾール紫外線吸収剤およびそれにより安定化された組成物 Download PDF

Info

Publication number
JP5035784B2
JP5035784B2 JP2001556848A JP2001556848A JP5035784B2 JP 5035784 B2 JP5035784 B2 JP 5035784B2 JP 2001556848 A JP2001556848 A JP 2001556848A JP 2001556848 A JP2001556848 A JP 2001556848A JP 5035784 B2 JP5035784 B2 JP 5035784B2
Authority
JP
Japan
Prior art keywords
tert
group
butyl
carbon atoms
alkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2001556848A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003521538A5 (https=
JP2003521538A (ja
Inventor
ゲイル ウッド，マービン
ラヴィチャンドラン，ラマナザン
ウェイン ホーセイ，ダグラス
グプタ，アニュナイ
ジュド，デボラ
エィ．アール． ホール，ルーサー
アール． スミス，アンドレア
アンドリュース、スティーヴン，マーク
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Holding AG filed Critical Ciba Holding AG
Publication of JP2003521538A publication Critical patent/JP2003521538A/ja
Publication of JP2003521538A5 publication Critical patent/JP2003521538A5/ja
Application granted granted Critical
Publication of JP5035784B2 publication Critical patent/JP5035784B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K5/00—Use of organic ingredients
    • C08K5/16—Nitrogen-containing compounds
    • C08K5/34—Heterocyclic compounds having nitrogen in the ring
    • C08K5/3467—Heterocyclic compounds having nitrogen in the ring having more than two nitrogen atoms in the ring
    • C08K5/3472—Five-membered rings
    • C08K5/3475—Five-membered rings condensed with carbocyclic rings
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D249/00—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms
    • C07D249/16—Heterocyclic compounds containing five-membered rings having three nitrogen atoms as the only ring hetero atoms condensed with carbocyclic rings or ring systems
    • C07D249/18—Benzotriazoles
    • C07D249/20—Benzotriazoles with aryl radicals directly attached in position 2

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Manufacture Of Macromolecular Shaped Articles (AREA)
  • Detergent Compositions (AREA)
JP2001556848A 2000-02-01 2001-01-23 ブルーム耐性ベンゾトリアゾール紫外線吸収剤およびそれにより安定化された組成物 Expired - Fee Related JP5035784B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/496,084 US6380285B1 (en) 2000-02-01 2000-02-01 Bloom-resistant benzotriazole UV absorbers and compositions stabilized therewith
US09/496,084 2000-02-01
PCT/EP2001/000692 WO2001056998A1 (en) 2000-02-01 2001-01-23 Bloom-resistant benzotriazole uv absorbers and compositions stabilized therewith

Publications (3)

Publication Number Publication Date
JP2003521538A JP2003521538A (ja) 2003-07-15
JP2003521538A5 JP2003521538A5 (https=) 2008-03-21
JP5035784B2 true JP5035784B2 (ja) 2012-09-26

Family

ID=23971166

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001556848A Expired - Fee Related JP5035784B2 (ja) 2000-02-01 2001-01-23 ブルーム耐性ベンゾトリアゾール紫外線吸収剤およびそれにより安定化された組成物

Country Status (9)

Country Link
US (3) US6380285B1 (https=)
EP (1) EP1252147B1 (https=)
JP (1) JP5035784B2 (https=)
AT (1) ATE302760T1 (https=)
AU (1) AU777649B2 (https=)
CA (1) CA2396622A1 (https=)
DE (1) DE60112892T2 (https=)
ES (1) ES2247066T3 (https=)
WO (1) WO2001056998A1 (https=)

Families Citing this family (85)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6846929B2 (en) * 2001-04-02 2005-01-25 Ciba Specialty Chemicals Corporation Benzotriazole/hals molecular combinations and compositions stabilized therewith
WO2002079313A1 (en) * 2001-04-02 2002-10-10 Ciba Specialty Chemicals Holding Inc. Stabilized candle wax
US7220288B2 (en) 2002-08-13 2007-05-22 Belmay, Inc. Protection of fragrance in a wax candle using an antioxidant
EP1471110A1 (en) * 2003-04-23 2004-10-27 Nan Ya Plastics Corporation Polyester composition reducing ultraviolet light penetration and a polyester bottle manufactured from said polyester composition
JP2007506829A (ja) * 2003-09-26 2007-03-22 チバ　スペシャルティ　ケミカルズ　ホールディング　インコーポレーテッド 重縮合物の色を改善する方法
BRPI0512134A (pt) * 2004-06-15 2008-02-06 Grace W R & Co moagem quimicamente assistida em sìlicas
US7642303B2 (en) * 2004-10-15 2010-01-05 Shakely Thomas L Thermoplastic articles for packaging UV sensitive materials, processes for the articles production and use and novel UV absorbers
ES2562403T3 (es) * 2004-11-02 2016-03-04 Basf Se Proceso para la síntesis de N-alcoxiaminas
US7468412B2 (en) * 2005-10-05 2008-12-23 Geo Specialty Chemicals, Inc. Method and composition for the suppression of bloom in peroxide crosslinked polymeric articles
DE102006004663B4 (de) * 2006-01-31 2008-10-02 Reifenhäuser GmbH & Co. KG Maschinenfabrik Verfahren zum Herstellen von Kerzen
JPWO2009047982A1 (ja) * 2007-10-10 2011-02-17 コニカミノルタオプト株式会社 光学用アクリル系樹脂フィルム、該光学用アクリル系樹脂フィルムを用いる偏光板及び液晶表示装置
US8163868B2 (en) * 2009-03-03 2012-04-24 E. I. Du Pont De Nemours And Company Reduction of whitening of polymer parts
US20110297228A1 (en) * 2009-12-07 2011-12-08 Rongfu Li Uv blocking fluoropolymer film
KR101882044B1 (ko) * 2011-04-01 2018-07-25 쓰리엠 이노베이티브 프로퍼티즈 캄파니 트라이아진계 자외선 흡수제를 포함하는 필름
MX2016016627A (es) 2014-06-23 2017-06-06 Carbon Inc Metodos de produccion de objetos tridimensionales a partir de materiales que tienen multiples mecanismos de endurecimiento.
CN113122269B (zh) * 2014-09-30 2024-05-28 光学转变公司 紫外光吸收剂
US20180243976A1 (en) 2015-09-30 2018-08-30 Carbon, Inc. Method and Apparatus for Producing Three- Dimensional Objects
WO2017112653A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Dual precursor resin systems for additive manufacturing with dual cure resins
WO2017112521A1 (en) 2015-12-22 2017-06-29 Carbon, Inc. Production of flexible products by additive manufacturing with dual cure resins
CN108475008B (zh) 2015-12-22 2020-11-06 卡本有限公司 一种形成三维物体的方法
WO2017112483A2 (en) 2015-12-22 2017-06-29 Carbon, Inc. Accelerants for additive manufacturing with dual cure resins
EP3430083B1 (en) 2016-03-17 2020-01-08 SABIC Global Technologies B.V. Flexible, uv resistant poly(phenylene ether) composition and insulated conductor and jacketed cable comprising it
WO2018094131A1 (en) 2016-11-21 2018-05-24 Carbon, Inc. Method of making three-dimensional object by delivering reactive component for subsequent cure
WO2018129023A1 (en) 2017-01-05 2018-07-12 Carbon, Inc. Dual cure stereolithography resins containing diels-alder adducts
WO2018148632A1 (en) 2017-02-13 2018-08-16 Carbon, Inc. Method of making composite objects by additive manufacturing
WO2018165090A1 (en) 2017-03-09 2018-09-13 Carbon, Inc. Tough, high temperature polymers produced by stereolithography
US20210107211A1 (en) 2017-03-23 2021-04-15 Carbon, Inc. Lip supports useful for making objects by additive manufacturing
JP7094298B2 (ja) 2017-03-27 2022-07-01 カーボン，インコーポレイテッド 付加製造による３次元物体の作製方法
US10239255B2 (en) 2017-04-11 2019-03-26 Molecule Corp Fabrication of solid materials or films from a polymerizable liquid
US11226559B2 (en) 2017-06-08 2022-01-18 Carbon, Inc. Blocking groups for light polymerizable resins useful in additive manufacturing
US11135766B2 (en) 2017-06-29 2021-10-05 Carbon, Inc. Products containing nylon 6 produced by stereolithography and methods of making the same
US11135765B2 (en) 2017-08-11 2021-10-05 Carbon, Inc. Serially curable resins useful in additive manufacturing
WO2019053562A1 (en) 2017-09-12 2019-03-21 Sabic Global Technologies B.V. POLY (PHENYLENE ETHER) COMPOSITION, FLEXIBLE, UV RESISTANT, AND INSULATED CONDUCTOR AND CABLE COMPRISING THE COMPOSITION
EP3684826B1 (en) 2017-09-22 2022-04-20 Carbon, Inc. Production of light-transmissive objects by additive manufacturing
WO2019083876A1 (en) 2017-10-26 2019-05-02 Carbon, Inc. REDUCTION OF WITHDRAWAL OR LOWERING IN OBJECTS PRODUCED BY ADDITIVE MANUFACTURING
WO2019099347A1 (en) 2017-11-20 2019-05-23 Carbon, Inc. Light-curable siloxane resins for additive manufacturing
WO2019112707A1 (en) 2017-12-08 2019-06-13 Carbon, Inc. Shelf stable, low tin concentration, dual cure additive manufacturing resins
US10813637B2 (en) 2018-02-21 2020-10-27 Ethicon Llc Three dimensional adjuncts
USD882782S1 (en) 2018-02-21 2020-04-28 Ethicon Llc Three dimensional adjunct
US10952724B2 (en) 2018-02-21 2021-03-23 Ethicon Llc Three dimensional adjuncts
WO2019168807A1 (en) 2018-03-02 2019-09-06 Carbon, Inc. Sustainable additive manufacturing resins and methods of recycling
US11390705B2 (en) 2018-05-11 2022-07-19 Carbon, Inc. Reactive particulate materials useful for additive manufacturing
WO2019245892A1 (en) 2018-06-20 2019-12-26 Carbon, Inc. Method of treating additive manufacturing objects with a compound of interest
US12162975B2 (en) 2018-07-27 2024-12-10 Carbon, Inc. Branched reactive blocked prepolymers for additive manufacturing
EP3768494B1 (en) 2018-08-01 2023-04-19 Carbon, Inc. Production of low density products by additive manufacturing
WO2020055682A1 (en) 2018-09-10 2020-03-19 Carbon, Inc. Dual cure additive manufacturing resins for production of flame retardant objects
WO2020055609A1 (en) 2018-09-13 2020-03-19 Carbon, Inc. Reversible thermosets for additive manufacturing
US11241822B2 (en) 2018-09-25 2022-02-08 Carbon, Inc. Dual cure resins for additive manufacturing
WO2020131675A1 (en) 2018-12-21 2020-06-25 Carbon, Inc. Energy absorbing dual cure polyurethane elastomers for additive manufacturing
US11555095B2 (en) 2019-03-29 2023-01-17 Carbon, Inc. Dual cure resin for the production of moisture-resistant articles by additive manufacturing
WO2020263480A1 (en) 2019-06-28 2020-12-30 Carbon, Inc. Dual cure additive manufacturing resins for the production of objects with mixed tensile properties
EP3791804B1 (en) 2019-09-16 2023-11-29 Ethicon LLC Compressible non-fibrous adjuncts
EP3791810B1 (en) 2019-09-16 2023-12-20 Ethicon LLC Compressible non-fibrous adjuncts
EP3791800B1 (en) 2019-09-16 2024-09-25 Ethicon LLC Compressible non-fibrous adjuncts
US11490890B2 (en) 2019-09-16 2022-11-08 Cilag Gmbh International Compressible non-fibrous adjuncts
EP3791799B1 (en) 2019-09-16 2025-01-22 Ethicon LLC Compressible non-fibrous adjuncts
EP3791808B1 (en) 2019-09-16 2024-09-25 Ethicon LLC Compressible non-fibrous adjuncts
US11553915B2 (en) 2019-09-16 2023-01-17 Cilag Gmbh International Multi-cellular non-fibrous adjuncts
EP4052656B1 (en) 2019-09-16 2025-08-20 Ethicon LLC Compressible non-fibrous adjuncts
CN114641241A (zh) 2019-09-16 2022-06-17 卡本有限公司 用于增材制造的生物可吸收性树脂
EP3791807B1 (en) 2019-09-16 2023-10-04 Ethicon LLC Compressible non-fibrous adjuncts
EP3791806A1 (en) 2019-09-16 2021-03-17 Ethicon LLC Compressible non-fibrous adjuncts
EP3791809B1 (en) 2019-09-16 2024-07-17 Ethicon LLC Compressible non-fibrous adjuncts
WO2021080974A1 (en) 2019-10-25 2021-04-29 Carbon, Inc. Mechanically anisotropic 3d printed flexible polymeric sheath
EP3838592A1 (en) 2019-12-17 2021-06-23 Evonik Operations GmbH Composition comprising polyesters for additive manufacturing
US11713367B2 (en) 2019-12-23 2023-08-01 Carbon, Inc. Inhibition of crystallization in polyurethane resins
WO2021146237A1 (en) 2020-01-17 2021-07-22 Carbon, Inc. Chemical recycling of additively manufactured objects
US20230078824A1 (en) 2020-02-28 2023-03-16 Carbon, Inc. Methods of making a three-dimensional object
WO2021173785A1 (en) 2020-02-28 2021-09-02 Carbon, Inc. One part moisture curable resins for additive manufacturing
WO2021183741A1 (en) 2020-03-12 2021-09-16 Carbon, Inc. Partially reversible thermosets useful for recycling
WO2021202655A1 (en) 2020-04-03 2021-10-07 Carbon, Inc. Resins and methods for additive manufacturing of energy absorbing three-dimensional objects
US11655329B2 (en) 2020-04-24 2023-05-23 Carbon, Inc. Delayed action catalysts for dual cure additive manufacturing resins
US20230129561A1 (en) 2020-04-28 2023-04-27 Carbon, Inc. Methods of making a three-dimensional object
USD1029255S1 (en) 2020-09-01 2024-05-28 Cilag Gmbh International Stapling cartridge assembly with a compressible adjunct
WO2022066565A1 (en) 2020-09-25 2022-03-31 Carbon, Inc. Epoxy dual cure resin for the production of moisture-resistant articles by additive manufacturing
WO2022152775A1 (en) 2021-01-15 2022-07-21 Evonik Operations Gmbh Silicone urethane (meth)acrylates and their use in 3d printing resins and coating compositions
WO2022256635A1 (en) 2021-06-03 2022-12-08 Carbon, Inc. Methods for the rapid production of blocked prepolymers
US11952457B2 (en) 2021-06-30 2024-04-09 Carbon, Inc. Bioabsorbable resin for additive manufacturing with non-cytotoxic photoinitiator
US11884000B2 (en) 2021-08-27 2024-01-30 Carbon, Inc. One part, catalyst containing, moisture curable dual cure resins for additive manufacturing
US20250171407A1 (en) 2022-02-22 2025-05-29 Basf Se Ultraviolet absorber
CN119487095A (zh) 2022-06-29 2025-02-18 赢创运营有限公司 硅酮氨基甲酸酯(甲基)丙烯酸酯及其在涂层组合物中的用途
WO2025038337A1 (en) 2023-08-11 2025-02-20 Carbon, Inc. Dual cure resins having polyether and polyamide subunits and additive manufacturing methods using the same
TW202537991A (zh) 2023-10-12 2025-10-01 美商卡邦公司 用於混合模數材料的雙固化樹脂
WO2025137013A1 (en) 2023-12-19 2025-06-26 Carbon, Inc. Silicone resin compositions and methods of using same
WO2026064272A1 (en) 2024-09-18 2026-03-26 Carbon, Inc. Production of low-density products using moisture curable resins

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL279768A (https=) 1961-06-16
EP0005922A1 (en) 1978-05-19 1979-12-12 SMITH & NEPHEW COSMETICS LIMITED Lip cosmetic
EP0057160B1 (de) 1981-01-23 1985-06-19 Ciba-Geigy Ag 2-(2-Hydroxyphenyl)-benztriazole, ihre Verwendung als UV-Absorber und ihre Herstellung
US4853471A (en) 1981-01-23 1989-08-01 Ciba-Geigy Corporation 2-(2-Hydroxyphenyl)-benztriazoles, their use as UV-absorbers and their preparation
US4574082A (en) 1983-07-29 1986-03-04 Revlon, Inc. One-phase silicone-based cosmetic products containing wax
US4713475A (en) 1986-06-12 1987-12-15 Ciba-Geigy Corporation Long chain (4-hydroxyphenyl) propanoate stabilizers
JPS63250647A (ja) * 1987-04-07 1988-10-18 Konica Corp ハロゲン化銀写真感光材料の処理方法
US4778728A (en) 1987-10-08 1988-10-18 American Cyanamid Company Curable compositions and corrosion resistant coatings prepared therefrom
JPH01118832A (ja) 1987-11-02 1989-05-11 Fuji Photo Film Co Ltd ハロゲン化銀写真感光材料
US4996239A (en) 1988-09-16 1991-02-26 Neutrogena Corporation Water resistant cream conditioner
JP2656827B2 (ja) * 1989-03-09 1997-09-24 王子製紙株式会社 減感インキ
JP2824310B2 (ja) * 1989-11-28 1998-11-11 王子製紙株式会社 顕色剤水分散液の製造方法及び感圧複写紙
US5736597A (en) * 1989-12-05 1998-04-07 Ciba-Geigy Corporation Stabilized organic material
US5280124A (en) * 1991-02-12 1994-01-18 Ciba-Geigy Corporation 5-sulfonyl-substituted benzotriazole UV-absorbers
WO1994013736A1 (en) 1992-12-16 1994-06-23 Shell Internationale Research Maatschappij B.V. Refined petroleum wax composition
AU2969395A (en) 1994-07-26 1996-02-22 Procter & Gamble Company, The Rinse added fabric softener compositions containing sunscreens for sun-fade protection for fabrics
CA2230312C (en) 1995-08-29 2006-10-17 Pennzoil Products Company Transparent gel candles
US5994431A (en) 1996-05-03 1999-11-30 3M Innovative Properties Company Amide functional ultraviolet light absorbers for polyolefins
US6291586B2 (en) * 1996-05-03 2001-09-18 3M Innovative Properties Company Amide functional ultraviolet light absorbers for polyurethanes and polyureas
US6166218A (en) * 1996-11-07 2000-12-26 Ciba Specialty Chemicals Corporation Benzotriazole UV absorbers having enhanced durability
US5977219A (en) 1997-10-30 1999-11-02 Ciba Specialty Chemicals Corporation Benzotriazole UV absorbers having enhanced durability
JP3714574B2 (ja) 1997-03-26 2005-11-09 ダイセル化学工業株式会社 紫外線吸収剤とその製造方法および合成樹脂組成物
JPH11174638A (ja) * 1997-12-08 1999-07-02 Konica Corp ハロゲン化銀カラー写真感光材料
JPH11279161A (ja) * 1998-03-26 1999-10-12 Kyodo Chem Co Ltd 難揮散性紫外線吸収剤
JPH11295855A (ja) * 1998-04-09 1999-10-29 Konica Corp ハロゲン化銀写真感光材料容器
US5964905A (en) 1998-05-21 1999-10-12 Sara Lee Corporation Scented candle gel
JP2000230077A (ja) * 1999-02-10 2000-08-22 Ipposha Oil Ind Co Ltd ベンゾトリアゾール系プラスチック用紫外線吸収剤
US6221115B1 (en) * 2000-02-01 2001-04-24 Ciba Specialty Chemicals Corporation Candle wax stabilized by a combination of UV absorber plus a selected hindered amine

Also Published As

Publication number Publication date
US20010023268A1 (en) 2001-09-20
CA2396622A1 (en) 2001-08-09
AU3733201A (en) 2001-08-14
JP2003521538A (ja) 2003-07-15
DE60112892D1 (de) 2005-09-29
EP1252147A1 (en) 2002-10-30
US6380285B1 (en) 2002-04-30
ATE302760T1 (de) 2005-09-15
AU777649B2 (en) 2004-10-28
WO2001056998A1 (en) 2001-08-09
US20020111404A1 (en) 2002-08-15
ES2247066T3 (es) 2006-03-01
US6508847B2 (en) 2003-01-21
US7157586B2 (en) 2007-01-02
DE60112892T2 (de) 2006-02-09
EP1252147B1 (en) 2005-08-24

Similar Documents

Publication Publication Date Title
JP5035784B2 (ja) ブルーム耐性ベンゾトリアゾール紫外線吸収剤およびそれにより安定化された組成物
US6846929B2 (en) Benzotriazole/hals molecular combinations and compositions stabilized therewith
JP4850694B2 (ja) 水融和性立体阻害されたヒドロキシ置換アルコキシアミン類
US6875870B2 (en) Long chain hindered amines and compositions stabilized therewith
RU2230758C2 (ru) Стабилизированная полимерная композиция, стабилизатор, входящий в ее состав, и способ его получения
JP2006522020A5 (https=)
JP2005504047A (ja) 紫外線吸収剤
DE19748658A1 (de) Benzotriazol-UV-Absorptionsmittel mit erhöhter Haltbarkeit
JP2004520284A (ja) Ｕｖ吸収剤としての置換５−アリール及び５−ヘテロアリール−２−（２−ヒドロキシフェニル）−２ｈ−ベンゾトリアゾール誘導体
US6579328B2 (en) Transition-metal-catalyzed process for the preparation of sterically hindered N-substituted aryloxyamines
US6387992B1 (en) Substituted 5-heteroaryl-2-(2-hydroxyphenyl)-2h-benzotriazole UV absorbers, a process for preparation thereof and compositions stabilized therewith
US6547841B2 (en) Transition-metal-catalyzed process for the preparation of sterically hindered N-substituted alkoxy amines

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20080123

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20080123

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20110518

A601 Written request for extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A601

Effective date: 20110812

A602 Written permission of extension of time

Free format text: JAPANESE INTERMEDIATE CODE: A602

Effective date: 20110819

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20110825

A02 Decision of refusal

Free format text: JAPANESE INTERMEDIATE CODE: A02

Effective date: 20120111

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120427

A911 Transfer to examiner for re-examination before appeal (zenchi)

Free format text: JAPANESE INTERMEDIATE CODE: A911

Effective date: 20120514

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120613

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120626

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150713

Year of fee payment: 3

R150 Certificate of patent or registration of utility model

Free format text: JAPANESE INTERMEDIATE CODE: R150

LAPS Cancellation because of no payment of annual fees