JP5032239B2 - インプリント用モールドおよびその製造方法 - Google Patents

インプリント用モールドおよびその製造方法 Download PDF

Info

Publication number
JP5032239B2
JP5032239B2 JP2007218240A JP2007218240A JP5032239B2 JP 5032239 B2 JP5032239 B2 JP 5032239B2 JP 2007218240 A JP2007218240 A JP 2007218240A JP 2007218240 A JP2007218240 A JP 2007218240A JP 5032239 B2 JP5032239 B2 JP 5032239B2
Authority
JP
Japan
Prior art keywords
mold
aluminum
aluminum material
imprint
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JP2007218240A
Other languages
English (en)
Japanese (ja)
Other versions
JP2009052066A (ja
JP2009052066A5 (enExample
Inventor
秀樹 益田
崇 柳下
奈緒子 熊谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kanagawa Academy of Science and Technology
Original Assignee
Kanagawa Academy of Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kanagawa Academy of Science and Technology filed Critical Kanagawa Academy of Science and Technology
Priority to JP2007218240A priority Critical patent/JP5032239B2/ja
Publication of JP2009052066A publication Critical patent/JP2009052066A/ja
Publication of JP2009052066A5 publication Critical patent/JP2009052066A5/ja
Application granted granted Critical
Publication of JP5032239B2 publication Critical patent/JP5032239B2/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Images

Landscapes

  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007218240A 2007-08-24 2007-08-24 インプリント用モールドおよびその製造方法 Active JP5032239B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007218240A JP5032239B2 (ja) 2007-08-24 2007-08-24 インプリント用モールドおよびその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007218240A JP5032239B2 (ja) 2007-08-24 2007-08-24 インプリント用モールドおよびその製造方法

Publications (3)

Publication Number Publication Date
JP2009052066A JP2009052066A (ja) 2009-03-12
JP2009052066A5 JP2009052066A5 (enExample) 2010-09-09
JP5032239B2 true JP5032239B2 (ja) 2012-09-26

Family

ID=40503398

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007218240A Active JP5032239B2 (ja) 2007-08-24 2007-08-24 インプリント用モールドおよびその製造方法

Country Status (1)

Country Link
JP (1) JP5032239B2 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107059090A (zh) * 2017-04-10 2017-08-18 福建农林大学 一种用于制备纳米阵列结构材料的装置

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2011167924A (ja) * 2010-02-18 2011-09-01 Kanagawa Acad Of Sci & Technol 低反射導電性表面を有する材料およびその製造方法
JP2011224850A (ja) * 2010-04-19 2011-11-10 Kanagawa Acad Of Sci & Technol 樹脂シート状物およびその製造方法
JP2012048030A (ja) * 2010-08-27 2012-03-08 Kanagawa Acad Of Sci & Technol 基板の製造方法
JP2012061832A (ja) * 2010-09-17 2012-03-29 Sony Corp 積層体の製造方法、原盤および転写装置
JP5828702B2 (ja) * 2011-07-26 2015-12-09 キヤノン株式会社 液体吐出ヘッドの製造方法
CN103668381B (zh) * 2012-09-04 2016-03-09 中国科学院宁波材料技术与工程研究所 一种绝缘基片上原位多孔氧化铝膜的制备方法
CN104087997A (zh) * 2014-06-16 2014-10-08 北京工业大学 异酸异压二次氧化制备规则小孔径阳极氧化铝模板的方法
JP2015146023A (ja) * 2015-03-02 2015-08-13 リコーイメージング株式会社 光学素子

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4595505B2 (ja) * 2004-11-24 2010-12-08 ソニー株式会社 モールド及びその製造方法、パターンの形成方法
JP2006195033A (ja) * 2005-01-12 2006-07-27 Seiko Epson Corp 液晶装置、電子機器、および液晶装置の製造方法
JP4330168B2 (ja) * 2005-09-06 2009-09-16 キヤノン株式会社 モールド、インプリント方法、及びチップの製造方法
JP4925651B2 (ja) * 2005-11-29 2012-05-09 京セラ株式会社 光インプリント用スタンパおよびそれを用いた発光装置の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN107059090A (zh) * 2017-04-10 2017-08-18 福建农林大学 一种用于制备纳米阵列结构材料的装置
CN107059090B (zh) * 2017-04-10 2018-09-28 福建农林大学 一种用于制备纳米阵列结构材料的装置

Also Published As

Publication number Publication date
JP2009052066A (ja) 2009-03-12

Similar Documents

Publication Publication Date Title
JP5032239B2 (ja) インプリント用モールドおよびその製造方法
Liang et al. Self‐assembly of colloidal spheres toward fabrication of hierarchical and periodic nanostructures for technological applications
Seo et al. Nanopatterning by laser interference lithography: applications to optical devices
JP5642850B2 (ja) 多孔性高分子膜の製造方法
JP5079452B2 (ja) 表面に凹凸パターンを有するガラス材の製造方法
Santos et al. Low-cost fabrication technologies for nanostructures: state-of-the-art and potential
EP2487279B1 (en) Mold and production method for same, and anti-reflection film
Kustandi et al. Wafer-scale near-perfect ordered porous alumina on substrates by step and flash imprint lithography
US20120213971A1 (en) Method for producing die, and die
US9782917B2 (en) Cylindrical master mold and method of fabrication
CN101248219A (zh) 多孔性高分子膜及其制造方法以及该制造中所使用的压模的制造方法
Ma et al. Nanofabrication of nanostructure lattices: from high-quality large patterns to precise hybrid units
KR101064900B1 (ko) 패턴 형성방법
Lee et al. Vertically aligned nanopillar arrays with hard skins using anodic aluminum oxide for nano imprint lithography
CN1155740C (zh) 大尺寸纳米有序孔洞模板的制备方法
KR20140095102A (ko) 임프린트용 몰드 및 그 제조 방법
Fang et al. Optical nanoscale patterning through surface-textured polymer films
Asoh et al. Electrochemical etching of silicon through anodic porous alumina
JP2010047454A (ja) 表面に規則的な凹凸パターンを有する炭素材およびその製造方法
CN103091980B (zh) 一种多孔纳米压印模板及其制备方法
JP2012048030A (ja) 基板の製造方法
JP5739107B2 (ja) 多孔質構造材料の製造方法
JP5173505B2 (ja) 微細表面パターンを有する無機系材料の製造方法
CN117970745B (zh) 一种对遗留结构进行复形产生新的纳米结构的方法
Xu et al. Preparation of large-area controllable patterned silver nanocrystals for high sensitive and stable surface-enhanced Raman spectroscopy

Legal Events

Date Code Title Description
A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20100728

A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20100728

A977 Report on retrieval

Free format text: JAPANESE INTERMEDIATE CODE: A971007

Effective date: 20120412

A131 Notification of reasons for refusal

Free format text: JAPANESE INTERMEDIATE CODE: A131

Effective date: 20120417

A521 Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20120525

TRDD Decision of grant or rejection written
A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

Effective date: 20120615

A01 Written decision to grant a patent or to grant a registration (utility model)

Free format text: JAPANESE INTERMEDIATE CODE: A01

A61 First payment of annual fees (during grant procedure)

Free format text: JAPANESE INTERMEDIATE CODE: A61

Effective date: 20120628

R150 Certificate of patent or registration of utility model

Ref document number: 5032239

Country of ref document: JP

Free format text: JAPANESE INTERMEDIATE CODE: R150

Free format text: JAPANESE INTERMEDIATE CODE: R150

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150706

Year of fee payment: 3

FPAY Renewal fee payment (event date is renewal date of database)

Free format text: PAYMENT UNTIL: 20150706

Year of fee payment: 3

S533 Written request for registration of change of name

Free format text: JAPANESE INTERMEDIATE CODE: R313533

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

S531 Written request for registration of change of domicile

Free format text: JAPANESE INTERMEDIATE CODE: R314531

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313113

R360 Written notification for declining of transfer of rights

Free format text: JAPANESE INTERMEDIATE CODE: R360

R360 Written notification for declining of transfer of rights

Free format text: JAPANESE INTERMEDIATE CODE: R360

R371 Transfer withdrawn

Free format text: JAPANESE INTERMEDIATE CODE: R371

S111 Request for change of ownership or part of ownership

Free format text: JAPANESE INTERMEDIATE CODE: R313113

R350 Written notification of registration of transfer

Free format text: JAPANESE INTERMEDIATE CODE: R350

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250

R250 Receipt of annual fees

Free format text: JAPANESE INTERMEDIATE CODE: R250