JP5008886B2 - 配線基板の製造方法 - Google Patents
配線基板の製造方法 Download PDFInfo
- Publication number
- JP5008886B2 JP5008886B2 JP2006086754A JP2006086754A JP5008886B2 JP 5008886 B2 JP5008886 B2 JP 5008886B2 JP 2006086754 A JP2006086754 A JP 2006086754A JP 2006086754 A JP2006086754 A JP 2006086754A JP 5008886 B2 JP5008886 B2 JP 5008886B2
- Authority
- JP
- Japan
- Prior art keywords
- base material
- wiring board
- laser
- via hole
- ceramic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 26
- 239000000463 material Substances 0.000 claims description 103
- 239000000919 ceramic Substances 0.000 claims description 79
- 229920005989 resin Polymers 0.000 claims description 75
- 239000011347 resin Substances 0.000 claims description 75
- 239000000758 substrate Substances 0.000 claims description 69
- 239000004020 conductor Substances 0.000 claims description 63
- 238000000034 method Methods 0.000 claims description 31
- 239000002131 composite material Substances 0.000 claims description 12
- 230000001678 irradiating effect Effects 0.000 claims description 7
- 239000010410 layer Substances 0.000 description 116
- 239000003985 ceramic capacitor Substances 0.000 description 43
- 238000012545 processing Methods 0.000 description 23
- 230000015572 biosynthetic process Effects 0.000 description 18
- 239000004065 semiconductor Substances 0.000 description 16
- 229910000679 solder Inorganic materials 0.000 description 16
- 230000004308 accommodation Effects 0.000 description 14
- 239000000945 filler Substances 0.000 description 9
- 238000013461 design Methods 0.000 description 8
- 238000007747 plating Methods 0.000 description 8
- 239000002861 polymer material Substances 0.000 description 8
- 239000003822 epoxy resin Substances 0.000 description 7
- 229920000647 polyepoxide Polymers 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 239000002390 adhesive tape Substances 0.000 description 6
- 230000006870 function Effects 0.000 description 6
- 238000009413 insulation Methods 0.000 description 5
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 4
- 229910052802 copper Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 238000003860 storage Methods 0.000 description 4
- 238000012938 design process Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 239000011229 interlayer Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 229920001187 thermosetting polymer Polymers 0.000 description 3
- 239000000654 additive Substances 0.000 description 2
- 239000000853 adhesive Substances 0.000 description 2
- 230000001070 adhesive effect Effects 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 2
- 229910002113 barium titanate Inorganic materials 0.000 description 2
- 239000005388 borosilicate glass Substances 0.000 description 2
- 238000004891 communication Methods 0.000 description 2
- 238000011161 development Methods 0.000 description 2
- 239000000835 fiber Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 230000007257 malfunction Effects 0.000 description 2
- 230000000873 masking effect Effects 0.000 description 2
- 229920001955 polyphenylene ether Polymers 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 230000008646 thermal stress Effects 0.000 description 2
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 1
- XQUPVDVFXZDTLT-UHFFFAOYSA-N 1-[4-[[4-(2,5-dioxopyrrol-1-yl)phenyl]methyl]phenyl]pyrrole-2,5-dione Chemical compound O=C1C=CC(=O)N1C(C=C1)=CC=C1CC1=CC=C(N2C(C=CC2=O)=O)C=C1 XQUPVDVFXZDTLT-UHFFFAOYSA-N 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 239000004952 Polyamide Substances 0.000 description 1
- 229910052581 Si3N4 Inorganic materials 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- NKZSPGSOXYXWQA-UHFFFAOYSA-N dioxido(oxo)titanium;lead(2+) Chemical compound [Pb+2].[O-][Ti]([O-])=O NKZSPGSOXYXWQA-UHFFFAOYSA-N 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000005489 elastic deformation Effects 0.000 description 1
- -1 for example Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 239000002241 glass-ceramic Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000010030 laminating Methods 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 229920003192 poly(bis maleimide) Polymers 0.000 description 1
- 229920002647 polyamide Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920013636 polyphenyl ether polymer Polymers 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 239000002759 woven fabric Substances 0.000 description 1
Images
Description
11…第1下地材としての基板コア
12,102…複合下地材の主面としての上面
33…樹脂絶縁層
51…第1ビア穴
53…第2ビア穴
91…収容穴部
101…第2下地材としてのセラミックキャパシタ
131,132…ビア導体
218…ビア穴形成用データ
220…レーザー照射装置としてのレーザーユニット
Claims (3)
- 第1下地材及び前記第1下地材とは異種の第2下地材を用いたものでありかつ前記第1下地材の主面の高さが前記第2下地材の主面の高さよりも低い位置にある複合下地材の主面上に樹脂絶縁層を設け、前記樹脂絶縁層に対してレーザーを照射することにより、前記樹脂絶縁層における前記第1下地材上の領域に第1ビア穴を形成し、前記樹脂絶縁層における前記第2下地材上の領域に第2ビア穴を形成するビア穴形成工程を含む配線基板の製造方法であって、
位置情報及び寸法情報を含む既存のビア穴形成用データに、前記位置情報に対応する位置の直下にある下地材が前記第1下地材であるか前記第2下地材であるかを識別するための下地材識別情報を付加する情報付加工程と、
前記情報付加工程にて付加された下地材識別情報に基づいて、レーザー照射装置のレーザー照射条件の設定を変更する照射条件設定変更工程と、
前記照射条件設定変更工程にて設定変更したレーザー照射条件に従って、所定位置にレーザーを照射する照射工程と
を含み、
前記照射条件設定変更工程において前記ビア穴形成用データに前記第1下地材であることを示す情報が付加されている場合には、レーザービーム径を大きくする設定変更、レーザーショット回数を多くする設定変更及びレーザー強度を強くする設定変更のうちの少なくとも1つを行う
ことを特徴とする配線基板の製造方法。 - 前記配線基板は、収容穴部を有する樹脂製のコア基板を前記第1下地材として備え、内部にビア導体が形成され前記収容穴部内に収容固定された埋め込み用セラミックチップを前記第2下地材として備えるセラミックチップ内蔵配線基板であることを特徴とする請求項1に記載の配線基板の製造方法。
- 前記配線基板は、複数の収容穴部を有する樹脂製のコア基板を前記第1下地材として備え、内部にビア導体が形成され前記複数の収容穴部内にそれぞれ収容固定された複数の埋め込み用セラミックチップを前記第2下地材として備える多数個取り用のセラミックチップ内蔵配線基板であることを特徴とする請求項1に記載の配線基板の製造方法。
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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JP2006086754A JP5008886B2 (ja) | 2006-03-27 | 2006-03-27 | 配線基板の製造方法 |
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---|---|---|---|
JP2006086754A JP5008886B2 (ja) | 2006-03-27 | 2006-03-27 | 配線基板の製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007266148A JP2007266148A (ja) | 2007-10-11 |
JP5008886B2 true JP5008886B2 (ja) | 2012-08-22 |
Family
ID=38638867
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JP2006086754A Expired - Fee Related JP5008886B2 (ja) | 2006-03-27 | 2006-03-27 | 配線基板の製造方法 |
Country Status (1)
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JP (1) | JP5008886B2 (ja) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20120102959A1 (en) * | 2010-10-29 | 2012-05-03 | John Howard Starkweather | Substrate with shaped cooling holes and methods of manufacture |
JP6582754B2 (ja) | 2015-08-31 | 2019-10-02 | 日亜化学工業株式会社 | 複合基板、発光装置、及び発光装置の製造方法 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005039243A (ja) * | 2003-06-24 | 2005-02-10 | Ngk Spark Plug Co Ltd | 中間基板 |
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2006
- 2006-03-27 JP JP2006086754A patent/JP5008886B2/ja not_active Expired - Fee Related
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