JP4971612B2 - 構造体、その製造方法、及び該構造体を用いたデバイス - Google Patents

構造体、その製造方法、及び該構造体を用いたデバイス Download PDF

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Publication number
JP4971612B2
JP4971612B2 JP2005258267A JP2005258267A JP4971612B2 JP 4971612 B2 JP4971612 B2 JP 4971612B2 JP 2005258267 A JP2005258267 A JP 2005258267A JP 2005258267 A JP2005258267 A JP 2005258267A JP 4971612 B2 JP4971612 B2 JP 4971612B2
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Japan
Prior art keywords
substrate
present
film
members
magnetic recording
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Expired - Fee Related
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JP2005258267A
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English (en)
Japanese (ja)
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JP2006297580A5 (enExample
JP2006297580A (ja
Inventor
伸浩 安居
亮子 堀江
透 田
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Canon Inc
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Canon Inc
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Priority to JP2005258267A priority Critical patent/JP4971612B2/ja
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  • Cold Cathode And The Manufacture (AREA)
  • Magnetic Record Carriers (AREA)
JP2005258267A 2005-03-25 2005-09-06 構造体、その製造方法、及び該構造体を用いたデバイス Expired - Fee Related JP4971612B2 (ja)

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Application Number Priority Date Filing Date Title
JP2005258267A JP4971612B2 (ja) 2005-03-25 2005-09-06 構造体、その製造方法、及び該構造体を用いたデバイス

Applications Claiming Priority (3)

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JP2005088980 2005-03-25
JP2005088980 2005-03-25
JP2005258267A JP4971612B2 (ja) 2005-03-25 2005-09-06 構造体、その製造方法、及び該構造体を用いたデバイス

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JP2006297580A JP2006297580A (ja) 2006-11-02
JP2006297580A5 JP2006297580A5 (enExample) 2008-10-16
JP4971612B2 true JP4971612B2 (ja) 2012-07-11

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JP2005258267A Expired - Fee Related JP4971612B2 (ja) 2005-03-25 2005-09-06 構造体、その製造方法、及び該構造体を用いたデバイス

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JP (1) JP4971612B2 (enExample)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5016957B2 (ja) * 2006-03-17 2012-09-05 キヤノン株式会社 凹凸構造を有する型及び光学素子用型の製造方法並びに光学素子
JP5472446B2 (ja) * 2010-03-18 2014-04-16 株式会社豊田中央研究所 ナノヘテロ構造体およびその製造方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2684201B2 (ja) * 1987-11-26 1997-12-03 日立マクセル株式会社 磁気記録媒体
JP3135110B2 (ja) * 1995-11-29 2001-02-13 工業技術院長 多孔質セラミックス膜とその製造方法
JP4127682B2 (ja) * 1999-06-07 2008-07-30 株式会社東芝 パターン形成方法
JP2001261376A (ja) * 2000-03-17 2001-09-26 Asahi Glass Co Ltd 防曇膜および防曇膜付き基体
JP2001318201A (ja) * 2000-05-11 2001-11-16 Mitsubishi Chemicals Corp 相分離材料
JP4035459B2 (ja) * 2002-03-15 2008-01-23 キヤノン株式会社 酸化物多孔質体の製造方法
JP2003266400A (ja) * 2002-12-13 2003-09-24 Canon Inc シリコン酸化物ナノ構造体の製造方法
JP2005052909A (ja) * 2003-08-07 2005-03-03 Canon Inc ナノ構造体の製造方法
JP4865200B2 (ja) * 2003-08-07 2012-02-01 キヤノン株式会社 ナノ構造体及びその製造方法
JP2005064138A (ja) * 2003-08-08 2005-03-10 Canon Inc 半導体装置及びその製造方法
JP2005064137A (ja) * 2003-08-08 2005-03-10 Canon Inc メモリデバイス並びにそれを用いる情報記録再生装置及び情報処理装置
JP2005064246A (ja) * 2003-08-12 2005-03-10 Canon Inc 光電変換素子、その製造方法および太陽電池

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