JP2006297581A5 - - Google Patents
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- Publication number
- JP2006297581A5 JP2006297581A5 JP2005258274A JP2005258274A JP2006297581A5 JP 2006297581 A5 JP2006297581 A5 JP 2006297581A5 JP 2005258274 A JP2005258274 A JP 2005258274A JP 2005258274 A JP2005258274 A JP 2005258274A JP 2006297581 A5 JP2006297581 A5 JP 2006297581A5
- Authority
- JP
- Japan
- Prior art keywords
- structure according
- columnar member
- film
- manufacturing
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 238000004519 manufacturing process Methods 0.000 claims 8
- 238000000034 method Methods 0.000 claims 6
- 239000000758 substrate Substances 0.000 claims 6
- 238000005530 etching Methods 0.000 claims 2
- 239000000696 magnetic material Substances 0.000 claims 2
- 239000006249 magnetic particle Substances 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 229910052684 Cerium Inorganic materials 0.000 claims 1
- 229910052692 Dysprosium Inorganic materials 0.000 claims 1
- 229910052691 Erbium Inorganic materials 0.000 claims 1
- 229910052688 Gadolinium Inorganic materials 0.000 claims 1
- 229910052689 Holmium Inorganic materials 0.000 claims 1
- 229910052779 Neodymium Inorganic materials 0.000 claims 1
- 229910052777 Praseodymium Inorganic materials 0.000 claims 1
- 229910052772 Samarium Inorganic materials 0.000 claims 1
- 229910052771 Terbium Inorganic materials 0.000 claims 1
- 229910052775 Thulium Inorganic materials 0.000 claims 1
- 229910052769 Ytterbium Inorganic materials 0.000 claims 1
- 229910052788 barium Inorganic materials 0.000 claims 1
- 229910052792 caesium Inorganic materials 0.000 claims 1
- 229910052791 calcium Inorganic materials 0.000 claims 1
- 239000003054 catalyst Substances 0.000 claims 1
- 230000003197 catalytic effect Effects 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 150000001875 compounds Chemical class 0.000 claims 1
- 229910052802 copper Inorganic materials 0.000 claims 1
- 238000010586 diagram Methods 0.000 claims 1
- 239000006023 eutectic alloy Substances 0.000 claims 1
- 229910052735 hafnium Inorganic materials 0.000 claims 1
- 230000010365 information processing Effects 0.000 claims 1
- 229910052741 iridium Inorganic materials 0.000 claims 1
- 229910052742 iron Inorganic materials 0.000 claims 1
- 229910052746 lanthanum Inorganic materials 0.000 claims 1
- 229910052744 lithium Inorganic materials 0.000 claims 1
- 229910052749 magnesium Inorganic materials 0.000 claims 1
- 229910052748 manganese Inorganic materials 0.000 claims 1
- 239000012528 membrane Substances 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 229910052750 molybdenum Inorganic materials 0.000 claims 1
- 229910052759 nickel Inorganic materials 0.000 claims 1
- 229910052758 niobium Inorganic materials 0.000 claims 1
- 229910052762 osmium Inorganic materials 0.000 claims 1
- 229910052763 palladium Inorganic materials 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 229910052700 potassium Inorganic materials 0.000 claims 1
- 229910052702 rhenium Inorganic materials 0.000 claims 1
- 229910052703 rhodium Inorganic materials 0.000 claims 1
- 229910052701 rubidium Inorganic materials 0.000 claims 1
- 229910052707 ruthenium Inorganic materials 0.000 claims 1
- 229910052706 scandium Inorganic materials 0.000 claims 1
- 229910052708 sodium Inorganic materials 0.000 claims 1
- 238000004544 sputter deposition Methods 0.000 claims 1
- 238000005477 sputtering target Methods 0.000 claims 1
- 229910052712 strontium Inorganic materials 0.000 claims 1
- 229910052715 tantalum Inorganic materials 0.000 claims 1
- 229910052719 titanium Inorganic materials 0.000 claims 1
- 229910052721 tungsten Inorganic materials 0.000 claims 1
- 229910052720 vanadium Inorganic materials 0.000 claims 1
- 239000011800 void material Substances 0.000 claims 1
- 229910052727 yttrium Inorganic materials 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
Priority Applications (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005258274A JP4965835B2 (ja) | 2005-03-25 | 2005-09-06 | 構造体、その製造方法、及び該構造体を用いたデバイス |
| US11/386,755 US7361420B2 (en) | 2005-03-25 | 2006-03-23 | Structure, magnetic recording medium, and method of producing the same |
| US12/040,223 US8329001B2 (en) | 2005-03-25 | 2008-02-29 | Structure, magnetic recording medium, and method of producing the same |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005088981 | 2005-03-25 | ||
| JP2005088981 | 2005-03-25 | ||
| JP2005258274A JP4965835B2 (ja) | 2005-03-25 | 2005-09-06 | 構造体、その製造方法、及び該構造体を用いたデバイス |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2006297581A JP2006297581A (ja) | 2006-11-02 |
| JP2006297581A5 true JP2006297581A5 (enExample) | 2008-10-16 |
| JP4965835B2 JP4965835B2 (ja) | 2012-07-04 |
Family
ID=37033915
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2005258274A Expired - Fee Related JP4965835B2 (ja) | 2005-03-25 | 2005-09-06 | 構造体、その製造方法、及び該構造体を用いたデバイス |
Country Status (2)
| Country | Link |
|---|---|
| US (2) | US7361420B2 (enExample) |
| JP (1) | JP4965835B2 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GR1006890B (el) * | 2005-09-16 | 2010-07-19 | Ευαγγελος Γογγολιδης | Μεθοδος για την κατασκευη επιφανειων μεγαλου επιφανειακου λογου και μεγαλου λογου ασυμμετριας σε υποστρωματα. |
| DE102005047081B4 (de) * | 2005-09-30 | 2019-01-31 | Robert Bosch Gmbh | Verfahren zum plasmalosen Ätzen von Silizium mit dem Ätzgas ClF3 oder XeF2 |
| CN101458606B (zh) * | 2007-12-12 | 2012-06-20 | 清华大学 | 触摸屏、触摸屏的制备方法及使用该触摸屏的显示装置 |
| KR100978491B1 (ko) * | 2008-12-11 | 2010-08-30 | 한국과학기술원 | Ｌ１0 규칙화 구조의 ＦｅＰｔ 나노 도트 어레이의 제조방법 |
| US20110198570A1 (en) * | 2010-02-12 | 2011-08-18 | Research Triangle Institute | Self assembled nano dots (sand) and non-self assembled nano-dots (nsand) device structures and fabrication methods thereof to create spacers for energy transfer |
| US8509039B1 (en) | 2012-06-28 | 2013-08-13 | HGST Netherlands B.V. | Thermally-assisted recording (TAR) disk with low thermal-conductivity underlayer |
| JP2014033051A (ja) | 2012-08-02 | 2014-02-20 | Toshiba Corp | パターン形成方法及び半導体装置の製造方法 |
| US9338536B2 (en) * | 2013-05-07 | 2016-05-10 | Bose Corporation | Modular headrest-based audio system |
| JP2015135713A (ja) * | 2014-01-17 | 2015-07-27 | 株式会社東芝 | 垂直磁気記録媒体、その製造方法、及び磁気記録再生装置 |
| CN114561621B (zh) * | 2021-12-10 | 2022-12-02 | 吉林大学 | 一种高熵金属玻璃薄膜及其制备方法和应用 |
Family Cites Families (24)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4444635A (en) * | 1981-07-22 | 1984-04-24 | Hitachi, Ltd. | Film forming method |
| US5211707A (en) * | 1991-07-11 | 1993-05-18 | Gte Laboratories Incorporated | Semiconductor metal composite field emission cathodes |
| US6002548A (en) * | 1992-11-27 | 1999-12-14 | Fujitsu Limited | Magnetic head supporting mechanism |
| JP3431386B2 (ja) * | 1995-03-16 | 2003-07-28 | 株式会社東芝 | 記録素子およびドリフト移動度変調素子 |
| US5602699A (en) * | 1995-06-29 | 1997-02-11 | Read-Rite Corporation | Gimbal assembly of a magnetic head suspension |
| JPH0922570A (ja) * | 1995-07-03 | 1997-01-21 | Fujitsu Ltd | ヘッドアセンブリ及び該ヘッドアセンブリを具備した磁気ディスク装置 |
| US6344271B1 (en) * | 1998-11-06 | 2002-02-05 | Nanoenergy Corporation | Materials and products using nanostructured non-stoichiometric substances |
| US6965501B1 (en) * | 2000-09-28 | 2005-11-15 | Hitachi Global Storage Technologies, The Netherlands B.V. | Integrated lead suspension for high density drive |
| WO2003069677A1 (en) * | 2002-02-12 | 2003-08-21 | Canon Kabushiki Kaisha | Structure, method of manufacturing the same, and device using the same |
| JP4035453B2 (ja) * | 2002-02-12 | 2008-01-23 | キヤノン株式会社 | 構造体、構造体の製造方法、及び該構造体を用いたデバイス |
| WO2003078687A1 (en) * | 2002-03-15 | 2003-09-25 | Canon Kabushiki Kaisha | Porous material and process for producing the same |
| JP4035457B2 (ja) * | 2002-03-15 | 2008-01-23 | キヤノン株式会社 | 機能デバイスの製造方法 |
| US6972146B2 (en) * | 2002-03-15 | 2005-12-06 | Canon Kabushiki Kaisha | Structure having holes and method for producing the same |
| WO2003078685A1 (en) * | 2002-03-15 | 2003-09-25 | Canon Kabushiki Kaisha | Functional device and method of manufacturing the device, vertical magnetic recording medium, magnetic recording and reproducing device, and information processing device |
| US6872645B2 (en) * | 2002-04-02 | 2005-03-29 | Nanosys, Inc. | Methods of positioning and/or orienting nanostructures |
| JP2004310851A (ja) * | 2003-04-04 | 2004-11-04 | Canon Inc | 磁気記録媒体、磁気記録再生装置及び情報処理装置 |
| JP2004311607A (ja) * | 2003-04-04 | 2004-11-04 | Canon Inc | 磁性体、磁気記録媒体、磁気記録再生装置、情報処理装置及びその製造方法 |
| JP4053457B2 (ja) * | 2003-04-23 | 2008-02-27 | ヒタチグローバルストレージテクノロジーズネザーランドビーブイ | サスペンション・アセンブリ及び回転円板形記憶装置 |
| JP4343616B2 (ja) * | 2003-08-08 | 2009-10-14 | キヤノン株式会社 | ナノ構造体の製造方法及びナノ構造体 |
| US7545010B2 (en) * | 2003-08-08 | 2009-06-09 | Canon Kabushiki Kaisha | Catalytic sensor structure |
| JP4434658B2 (ja) * | 2003-08-08 | 2010-03-17 | キヤノン株式会社 | 構造体及びその製造方法 |
| WO2006113207A2 (en) * | 2005-04-13 | 2006-10-26 | Nanosys, Inc. | Nanowire dispersion compositions and uses thereof |
| JP4630774B2 (ja) * | 2005-09-06 | 2011-02-09 | キヤノン株式会社 | 構造体の製造方法 |
| JP2007305270A (ja) * | 2006-05-15 | 2007-11-22 | Hitachi Global Storage Technologies Netherlands Bv | 磁気ヘッド・アセンブリ及び磁気ディスク装置 |
-
2005
- 2005-09-06 JP JP2005258274A patent/JP4965835B2/ja not_active Expired - Fee Related
-
2006
- 2006-03-23 US US11/386,755 patent/US7361420B2/en not_active Expired - Fee Related
-
2008
- 2008-02-29 US US12/040,223 patent/US8329001B2/en not_active Expired - Fee Related
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