JP4962779B2 - ステージ装置およびその浮上制御方法と、ステージ装置を用いた露光装置 - Google Patents

ステージ装置およびその浮上制御方法と、ステージ装置を用いた露光装置 Download PDF

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Publication number
JP4962779B2
JP4962779B2 JP2007178862A JP2007178862A JP4962779B2 JP 4962779 B2 JP4962779 B2 JP 4962779B2 JP 2007178862 A JP2007178862 A JP 2007178862A JP 2007178862 A JP2007178862 A JP 2007178862A JP 4962779 B2 JP4962779 B2 JP 4962779B2
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linear motor
movable
axis
base
armature
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Expired - Fee Related
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JP2007178862A
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Japanese (ja)
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JP2009016678A5 (https=
JP2009016678A (ja
Inventor
智 村上
竜一郎 富永
智弘 松尾
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Yaskawa Electric Corp
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Yaskawa Electric Corp
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  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2007178862A 2007-07-06 2007-07-06 ステージ装置およびその浮上制御方法と、ステージ装置を用いた露光装置 Expired - Fee Related JP4962779B2 (ja)

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JP2007178862A JP4962779B2 (ja) 2007-07-06 2007-07-06 ステージ装置およびその浮上制御方法と、ステージ装置を用いた露光装置

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JP2007178862A JP4962779B2 (ja) 2007-07-06 2007-07-06 ステージ装置およびその浮上制御方法と、ステージ装置を用いた露光装置

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JP2009016678A JP2009016678A (ja) 2009-01-22
JP2009016678A5 JP2009016678A5 (https=) 2011-06-16
JP4962779B2 true JP4962779B2 (ja) 2012-06-27

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102782806A (zh) 2010-03-04 2012-11-14 株式会社安川电机 工作台装置
CN102307031A (zh) * 2011-09-08 2012-01-04 中南大学 一种永磁电磁相结合的磁悬浮直线运动平台
CN103199046B (zh) * 2012-01-05 2015-09-09 沈阳新松机器人自动化股份有限公司 晶圆缺口边缘中心预对准方法
CN103551860B (zh) * 2013-11-04 2015-09-23 南通大学 一种直线进给单元的磁悬浮支承结构
CN108389821A (zh) * 2018-05-04 2018-08-10 成都华聚科技有限公司 一种晶圆与mask单独取放和精准定位机构

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3011813B2 (ja) * 1992-02-24 2000-02-21 キヤノン株式会社 移動ステージ
JP4078485B2 (ja) * 2002-10-31 2008-04-23 株式会社ニコン 露光装置、ステージ装置、及びステージ装置の制御方法
JP2004228473A (ja) * 2003-01-27 2004-08-12 Canon Inc 移動ステージ装置
JP4487168B2 (ja) * 2003-05-09 2010-06-23 株式会社ニコン ステージ装置及びその駆動方法、並びに露光装置
JP2005011914A (ja) * 2003-06-18 2005-01-13 Canon Inc 反射型マスクおよび露光装置
JP4393150B2 (ja) * 2003-10-01 2010-01-06 キヤノン株式会社 露光装置
JP2005150527A (ja) * 2003-11-18 2005-06-09 Canon Inc 保持装置、それを用いた露光装置およびデバイス製造方法
JP2006253572A (ja) * 2005-03-14 2006-09-21 Nikon Corp ステージ装置、露光装置、及びデバイス製造方法
JP4699071B2 (ja) * 2005-04-01 2011-06-08 株式会社安川電機 ステージ装置およびその露光装置
JP2007053244A (ja) * 2005-08-18 2007-03-01 Yaskawa Electric Corp ステージ装置およびその露光装置
JP4594841B2 (ja) * 2005-10-12 2010-12-08 住友重機械工業株式会社 ステージ装置及びその制御方法
EP2068112A4 (en) * 2006-09-29 2017-11-15 Nikon Corporation Mobile unit system, pattern forming device, exposing device, exposing method, and device manufacturing method

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