JP4935410B2 - カラーフィルタ基板の製造方法及び電気光学装置の製造方法。 - Google Patents
カラーフィルタ基板の製造方法及び電気光学装置の製造方法。 Download PDFInfo
- Publication number
- JP4935410B2 JP4935410B2 JP2007040424A JP2007040424A JP4935410B2 JP 4935410 B2 JP4935410 B2 JP 4935410B2 JP 2007040424 A JP2007040424 A JP 2007040424A JP 2007040424 A JP2007040424 A JP 2007040424A JP 4935410 B2 JP4935410 B2 JP 4935410B2
- Authority
- JP
- Japan
- Prior art keywords
- color filter
- substrate
- electro
- color
- optical device
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 174
- 238000000034 method Methods 0.000 title claims abstract description 33
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 20
- 238000005192 partition Methods 0.000 claims abstract description 76
- 239000000463 material Substances 0.000 claims abstract description 65
- 239000000126 substance Substances 0.000 claims abstract description 31
- 238000005498 polishing Methods 0.000 claims description 35
- 238000005530 etching Methods 0.000 claims description 3
- 230000001105 regulatory effect Effects 0.000 abstract 1
- 239000010410 layer Substances 0.000 description 64
- 239000004973 liquid crystal related substance Substances 0.000 description 44
- 230000015572 biosynthetic process Effects 0.000 description 24
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 14
- 229910052814 silicon oxide Inorganic materials 0.000 description 12
- 239000011229 interlayer Substances 0.000 description 10
- 239000004065 semiconductor Substances 0.000 description 10
- 239000003990 capacitor Substances 0.000 description 9
- 230000005669 field effect Effects 0.000 description 9
- 239000003086 colorant Substances 0.000 description 7
- 230000003287 optical effect Effects 0.000 description 6
- 239000011159 matrix material Substances 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 239000003566 sealing material Substances 0.000 description 5
- 239000011521 glass Substances 0.000 description 4
- 229910052581 Si3N4 Inorganic materials 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 230000001681 protective effect Effects 0.000 description 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 3
- 238000004528 spin coating Methods 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 2
- 229920000178 Acrylic resin Polymers 0.000 description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 description 2
- 230000001413 cellular effect Effects 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 238000007599 discharging Methods 0.000 description 2
- 238000005401 electroluminescence Methods 0.000 description 2
- 239000004744 fabric Substances 0.000 description 2
- 239000012535 impurity Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000005224 laser annealing Methods 0.000 description 2
- 238000004020 luminiscence type Methods 0.000 description 2
- 239000011368 organic material Substances 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 238000000059 patterning Methods 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 229910052698 phosphorus Inorganic materials 0.000 description 2
- 239000011574 phosphorus Substances 0.000 description 2
- -1 phosphorus ions Chemical class 0.000 description 2
- 238000000206 photolithography Methods 0.000 description 2
- 239000000049 pigment Substances 0.000 description 2
- 230000010287 polarization Effects 0.000 description 2
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 2
- 229920005591 polysilicon Polymers 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 239000004988 Nematic liquid crystal Substances 0.000 description 1
- 229920005830 Polyurethane Foam Polymers 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 239000011324 bead Substances 0.000 description 1
- 229910000420 cerium oxide Inorganic materials 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- APFVFJFRJDLVQX-UHFFFAOYSA-N indium atom Chemical compound [In] APFVFJFRJDLVQX-UHFFFAOYSA-N 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 238000005268 plasma chemical vapour deposition Methods 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000011496 polyurethane foam Substances 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000000638 solvent extraction Methods 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Landscapes
- Liquid Crystal (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
- Optical Filters (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007040424A JP4935410B2 (ja) | 2007-02-21 | 2007-02-21 | カラーフィルタ基板の製造方法及び電気光学装置の製造方法。 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2007040424A JP4935410B2 (ja) | 2007-02-21 | 2007-02-21 | カラーフィルタ基板の製造方法及び電気光学装置の製造方法。 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2008203592A JP2008203592A (ja) | 2008-09-04 |
| JP2008203592A5 JP2008203592A5 (enExample) | 2009-12-24 |
| JP4935410B2 true JP4935410B2 (ja) | 2012-05-23 |
Family
ID=39781157
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007040424A Expired - Fee Related JP4935410B2 (ja) | 2007-02-21 | 2007-02-21 | カラーフィルタ基板の製造方法及び電気光学装置の製造方法。 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4935410B2 (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6486848B2 (ja) * | 2016-02-25 | 2019-03-20 | 株式会社ジャパンディスプレイ | 表示装置およびその製造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002277623A (ja) * | 2001-03-19 | 2002-09-25 | Canon Inc | 光学素子とその製造方法、該光学素子を用いた液晶素子 |
| JP2002365423A (ja) * | 2001-06-08 | 2002-12-18 | Canon Inc | カラーフィルタとその製造方法、該カラーフィルタを用いた液晶素子 |
-
2007
- 2007-02-21 JP JP2007040424A patent/JP4935410B2/ja not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JP2008203592A (ja) | 2008-09-04 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101515099B (zh) | 电光装置及电子设备 | |
| US10578932B2 (en) | Liquid crystal display device and electronic apparatus | |
| JPH11133463A (ja) | アクティブマトリクス型液晶表示装置及び電子機器 | |
| JP2008282896A (ja) | 半導体装置、電気光学装置および半導体装置の製造方法 | |
| CN1637539B (zh) | 液晶显示装置及其制造方法 | |
| JP2011059374A (ja) | 電気光学装置、その製造方法、および電子機器 | |
| JP2008281668A (ja) | カラーフィルタ付きマイクロレンズ基板、電気光学装置、電子機器、およびカラーフィルタ付きマイクロレンズ基板の製造方法 | |
| JP4935410B2 (ja) | カラーフィルタ基板の製造方法及び電気光学装置の製造方法。 | |
| JP2011186285A (ja) | 電気光学装置及びその製造方法、並びに電子機器 | |
| JP2003255853A (ja) | 電気光学装置、および電子機器 | |
| US8477269B2 (en) | Liquid crystal display device | |
| JP2021033110A (ja) | 電気光学装置の製造方法、電気光学装置および電子機器 | |
| JP2009080303A (ja) | 液晶装置および電子機器 | |
| JPH06258650A (ja) | 液晶表示装置 | |
| JP2008216858A (ja) | 電気光学装置、及び電子機器 | |
| JP2009223218A (ja) | 電気光学装置及びその製造方法、並びに電子機器 | |
| JP5070890B2 (ja) | 電気光学装置及び電子機器 | |
| JP2010066393A (ja) | 電気光学装置の製造方法、電気光学装置及び電子機器 | |
| JP2008139656A (ja) | 表示装置及びその製造方法 | |
| JP2010039209A (ja) | 電気光学装置及びその製造方法並びに電子機器 | |
| JP2006301476A (ja) | 電気光学装置及びその製造方法、電子機器 | |
| JP2005266814A (ja) | 電気光学装置及び電子機器 | |
| JP3857302B2 (ja) | 表示装置 | |
| KR101043670B1 (ko) | 액정표시장치 | |
| JP2007310283A (ja) | 液晶表示素子 |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20091110 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20091110 |
|
| A977 | Report on retrieval |
Free format text: JAPANESE INTERMEDIATE CODE: A971007 Effective date: 20111114 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20111213 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20111228 |
|
| TRDD | Decision of grant or rejection written | ||
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 Effective date: 20120124 |
|
| A01 | Written decision to grant a patent or to grant a registration (utility model) |
Free format text: JAPANESE INTERMEDIATE CODE: A01 |
|
| A61 | First payment of annual fees (during grant procedure) |
Free format text: JAPANESE INTERMEDIATE CODE: A61 Effective date: 20120206 |
|
| FPAY | Renewal fee payment (event date is renewal date of database) |
Free format text: PAYMENT UNTIL: 20150302 Year of fee payment: 3 |
|
| R150 | Certificate of patent or registration of utility model |
Ref document number: 4935410 Country of ref document: JP Free format text: JAPANESE INTERMEDIATE CODE: R150 Free format text: JAPANESE INTERMEDIATE CODE: R150 |
|
| S531 | Written request for registration of change of domicile |
Free format text: JAPANESE INTERMEDIATE CODE: R313531 |
|
| R350 | Written notification of registration of transfer |
Free format text: JAPANESE INTERMEDIATE CODE: R350 |
|
| LAPS | Cancellation because of no payment of annual fees |