JP4931843B2 - 流延装置、溶液製膜設備及び溶液製膜方法 - Google Patents
流延装置、溶液製膜設備及び溶液製膜方法 Download PDFInfo
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- Coating Apparatus (AREA)
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Description
(a) 2.5≦A+B≦3.0
(b) 0≦A≦3.0
(c) 0≦B≦2.9
図1に示すフィルム製造設備10を用いてフィルム20を製造した。温調設備35を用いて流延室12内の温度を常時35℃とした。また、流延室12内に窒素ガスを供給して、酸素濃度が常時10重量%未満となるように調整した。伝熱媒体供給装置37は、流延ドラム32の周面32cの温度を略−10℃に保持した。なお、流延ダイ30は、幅が1.8mのスリットからなる吐出口と内部温度を調整するためのジャケット(図示しない)とを有する形態を用いて、吐出するドープ21の温度を略36℃とした。ドープの流路となる配管等は温度調整機能を有する形態を用いて、その内部温度を全て略36℃に保持した。ドラム本体32aを回転し、周面32cを走行させた。図2に示すように、ドープ21を周面32cに吐出する前に、除電ブラシ73を用いて周面32cを除電し、その後電極棒70に直流高電圧を与えて放電し、流延ドラム32を帯電させた。流延ドラム32の周面32cの電位Vは1.0kVであった。
除電ブラシ73に代えて、イオン風吹き付け装置76を用いて周面32cを除電したこと以外は、実験1と同様にしてフィルム20を製造した。
除電ブラシ73や、イオン風吹き付け装置76を用いなかったこと以外は、実験1と同様にしてフィルムを製造した。
得られたフィルムについて厚みムラの評価を行ったところ、実験1、2における評価結果は「○」であり、実験3における評価結果は「×」であった。
相対標準偏差RSDが5%未満・・厚みの均一性に優れている。(○)
相対標準偏差RSDが5%以上10%未満・・若干の厚みムラが生じているものの、光学フィルムとしての使用には問題がない程度であった。(△)
相対標準偏差RSDが10%以上・・厚みムラが生じている。(×)
12 流延室
30 流延ダイ
32 流延ドラム
32a ドラム本体
32b 軸
32c 周面
32 剥ぎ取りローラ
33 流延膜
40 流延ビード
63 流延部
64 剥ぎ取り部
67 絶縁支持部
70 電極棒
73 除電ブラシ
73a ブラシ毛
76 イオン風吹き付け装置
80 電気絶縁膜
81 支持層
Claims (5)
- エンドレスに走行する支持体に流延ダイからドープを吐出し、前記支持体上に流延膜を形成し、前記流延膜が自己支持性を有した後に前記支持体から剥ぎ取る流延装置において、
前記支持体を電気的に非接地とする非接地手段と、
前記流延膜が剥ぎ取られた後であって、前記ドープが吐出される前の前記支持体を放電により帯電させる帯電装置と、
前記流延膜が剥ぎ取られた後であって、前記帯電装置によって帯電される前の前記支持体を除電する除電装置と、
を備えることを特徴とする流延装置。 - 前記除電装置が、電気的に接地となるように設けられる除電ブラシであることを特徴とする請求項1記載の流延装置。
- 前記除電装置が、前記支持体にイオンを含む空気を当てるイオン風吹き付け装置であることを特徴とする請求項1記載の流延装置。
- 請求項1ないし3のうちいずれか1項記載の流延装置と、
前記流延膜を前記支持体から剥ぎ取る剥ぎ取り装置と、
剥ぎ取られた前記流延膜を乾燥し、フィルムとする乾燥装置と、
を備えることを特徴とする溶液製膜設備。 - 請求項1ないし3のうちいずれか1項記載の流延装置を用いて前記流延膜を前記支持体に形成し、前記流延膜を剥ぎ取って乾燥し、フィルムとすることを特徴とする溶液製膜方法。
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