JP4902369B2 - 硬化性組成物、カラーフィルタ及びその製造方法 - Google Patents

硬化性組成物、カラーフィルタ及びその製造方法 Download PDF

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Publication number
JP4902369B2
JP4902369B2 JP2007015443A JP2007015443A JP4902369B2 JP 4902369 B2 JP4902369 B2 JP 4902369B2 JP 2007015443 A JP2007015443 A JP 2007015443A JP 2007015443 A JP2007015443 A JP 2007015443A JP 4902369 B2 JP4902369 B2 JP 4902369B2
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JP
Japan
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curable composition
pigment
compound
acid
preferable
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JP2007015443A
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English (en)
Japanese (ja)
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JP2008181011A (ja
Inventor
久容 森
妙子 相澤
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Fujifilm Corp
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Fujifilm Corp
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Application filed by Fujifilm Corp filed Critical Fujifilm Corp
Priority to JP2007015443A priority Critical patent/JP4902369B2/ja
Priority to CN2008100021286A priority patent/CN101231467B/zh
Priority to KR20080005359A priority patent/KR101492877B1/ko
Publication of JP2008181011A publication Critical patent/JP2008181011A/ja
Application granted granted Critical
Publication of JP4902369B2 publication Critical patent/JP4902369B2/ja
Expired - Fee Related legal-status Critical Current
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00—Processes of polymerisation
    • C08F2/46—Polymerisation initiated by wave energy or particle radiation
    • C08F2/48—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50—Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Polymerisation Methods In General (AREA)
  • Graft Or Block Polymers (AREA)
  • Liquid Crystal (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2007015443A 2007-01-25 2007-01-25 硬化性組成物、カラーフィルタ及びその製造方法 Expired - Fee Related JP4902369B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2007015443A JP4902369B2 (ja) 2007-01-25 2007-01-25 硬化性組成物、カラーフィルタ及びその製造方法
CN2008100021286A CN101231467B (zh) 2007-01-25 2008-01-15 固化性组合物、滤色器及其制造方法
KR20080005359A KR101492877B1 (ko) 2007-01-25 2008-01-17 경화성 조성물, 컬러 필터 및 그 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007015443A JP4902369B2 (ja) 2007-01-25 2007-01-25 硬化性組成物、カラーフィルタ及びその製造方法

Publications (2)

Publication Number Publication Date
JP2008181011A JP2008181011A (ja) 2008-08-07
JP4902369B2 true JP4902369B2 (ja) 2012-03-21

Family

ID=39724948

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007015443A Expired - Fee Related JP4902369B2 (ja) 2007-01-25 2007-01-25 硬化性組成物、カラーフィルタ及びその製造方法

Country Status (3)

Country Link
JP (1) JP4902369B2 (zh)
KR (1) KR101492877B1 (zh)
CN (1) CN101231467B (zh)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010044981A (ja) * 2008-08-15 2010-02-25 Fujifilm Corp 表示装置
JP2010175878A (ja) * 2009-01-30 2010-08-12 Fujifilm Corp 着色感光性組成物、カラーフィルタ、および液晶表示装置
JP5928338B2 (ja) * 2010-11-15 2016-06-01 Jnc株式会社 液晶組成物および液晶表示素子
JP5962042B2 (ja) * 2011-02-28 2016-08-03 住友化学株式会社 着色硬化性樹脂組成物
JP5934664B2 (ja) * 2012-03-19 2016-06-15 富士フイルム株式会社 着色感放射線性組成物、着色硬化膜、カラーフィルタ、着色パターン形成方法、カラーフィルタの製造方法、固体撮像素子、及び画像表示装置
TWI652297B (zh) * 2013-11-15 2019-03-01 富士軟片股份有限公司 硬化性組成物、硬化膜的製造方法、硬化膜及顯示裝置
KR102383697B1 (ko) * 2018-03-26 2022-04-05 동우 화인켐 주식회사 네가티브형 감광성 수지 조성물
JP7249119B2 (ja) * 2018-09-27 2023-03-30 東京応化工業株式会社 感光性樹脂組成物、パターニングされた硬化膜の製造方法及び硬化膜

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH1055064A (ja) * 1996-08-08 1998-02-24 Mitsubishi Chem Corp カラーレジスト組成物及びカラーフィルター
JPH10319583A (ja) * 1997-05-16 1998-12-04 Mitsubishi Chem Corp カラーフィルター用光重合性組成物及びカラーフィルター
CN1318774A (zh) * 2000-04-18 2001-10-24 富士胶片株式会社 光敏影像记录材料
CN1229691C (zh) * 2002-11-28 2005-11-30 中国科学院理化技术研究所 高折射率环氧树脂和低折射率烯类单体组成的光致聚合物体全息存储材料及其制备方法
TWI352875B (en) * 2003-08-15 2011-11-21 Fujifilm Corp Photosensitive transcription sheet, photosensitive
JP2006259112A (ja) 2005-03-16 2006-09-28 Fuji Photo Film Co Ltd 感光性組成物、これを用いた感光性平版印刷版及び画像記録方法
JP4383376B2 (ja) * 2005-03-16 2009-12-16 富士フイルム株式会社 感光性組成物、これを用いた画像記録方法及び感光性平版印刷版

Also Published As

Publication number Publication date
CN101231467A (zh) 2008-07-30
CN101231467B (zh) 2012-05-23
KR20080070529A (ko) 2008-07-30
JP2008181011A (ja) 2008-08-07
KR101492877B1 (ko) 2015-02-12

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