JP4895634B2 - 基板処理装置 - Google Patents

基板処理装置 Download PDF

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Publication number
JP4895634B2
JP4895634B2 JP2006041424A JP2006041424A JP4895634B2 JP 4895634 B2 JP4895634 B2 JP 4895634B2 JP 2006041424 A JP2006041424 A JP 2006041424A JP 2006041424 A JP2006041424 A JP 2006041424A JP 4895634 B2 JP4895634 B2 JP 4895634B2
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Japan
Prior art keywords
gas
holding
wafer
cassette
boat
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Expired - Lifetime
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JP2006041424A
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English (en)
Japanese (ja)
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JP2007221000A5 (https=
JP2007221000A (ja
Inventor
信人 嶋
英樹 堀田
崇 中川
忠司 紺谷
謙和 水野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kokusai Denki Electric Inc
Original Assignee
Hitachi Kokusai Electric Inc
Kokusai Denki Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Hitachi Kokusai Electric Inc, Kokusai Denki Electric Inc filed Critical Hitachi Kokusai Electric Inc
Priority to JP2006041424A priority Critical patent/JP4895634B2/ja
Publication of JP2007221000A publication Critical patent/JP2007221000A/ja
Publication of JP2007221000A5 publication Critical patent/JP2007221000A5/ja
Application granted granted Critical
Publication of JP4895634B2 publication Critical patent/JP4895634B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Chemical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
JP2006041424A 2006-02-17 2006-02-17 基板処理装置 Expired - Lifetime JP4895634B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006041424A JP4895634B2 (ja) 2006-02-17 2006-02-17 基板処理装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006041424A JP4895634B2 (ja) 2006-02-17 2006-02-17 基板処理装置

Publications (3)

Publication Number Publication Date
JP2007221000A JP2007221000A (ja) 2007-08-30
JP2007221000A5 JP2007221000A5 (https=) 2009-03-19
JP4895634B2 true JP4895634B2 (ja) 2012-03-14

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Family Applications (1)

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JP2006041424A Expired - Lifetime JP4895634B2 (ja) 2006-02-17 2006-02-17 基板処理装置

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JP (1) JP4895634B2 (https=)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5545055B2 (ja) * 2010-06-15 2014-07-09 東京エレクトロン株式会社 支持体構造及び処理装置
JP6458547B2 (ja) * 2015-02-24 2019-01-30 株式会社デンソー シャワーヘッド、シャワーヘッドシステム、及び成膜装置
CN108695138A (zh) * 2017-03-29 2018-10-23 株式会社日立国际电气 衬底支承件、衬底处理装置及半导体器件的制造方法
TWI806261B (zh) * 2020-12-24 2023-06-21 日商國際電氣股份有限公司 基板處理方法、半導體裝置之製造方法、基板處理裝置及程式
KR20260037195A (ko) * 2024-09-10 2026-03-17 주식회사 유진테크 배치식 기판 처리 장치

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02102524A (ja) * 1988-10-11 1990-04-16 Nec Corp ウェハーボート
JP3023977B2 (ja) * 1990-11-01 2000-03-21 東京エレクトロン株式会社 縦型熱処理装置
JPH0737814A (ja) * 1993-07-23 1995-02-07 Sony Corp 薄膜形成装置

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Publication number Publication date
JP2007221000A (ja) 2007-08-30

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