JP4874258B2 - プリントヘッド - Google Patents
プリントヘッド Download PDFInfo
- Publication number
- JP4874258B2 JP4874258B2 JP2007543157A JP2007543157A JP4874258B2 JP 4874258 B2 JP4874258 B2 JP 4874258B2 JP 2007543157 A JP2007543157 A JP 2007543157A JP 2007543157 A JP2007543157 A JP 2007543157A JP 4874258 B2 JP4874258 B2 JP 4874258B2
- Authority
- JP
- Japan
- Prior art keywords
- membrane
- droplet ejection
- fluid
- ejection device
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
- 239000012528 membrane Substances 0.000 claims abstract description 54
- 239000012530 fluid Substances 0.000 claims abstract description 24
- 238000005086 pumping Methods 0.000 claims abstract description 9
- 239000007788 liquid Substances 0.000 claims abstract description 8
- 150000004767 nitrides Chemical class 0.000 claims description 10
- 238000002834 transmittance Methods 0.000 claims description 10
- 229910052581 Si3N4 Inorganic materials 0.000 claims description 9
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims description 9
- 238000001020 plasma etching Methods 0.000 claims description 8
- 239000003795 chemical substances by application Substances 0.000 claims 1
- 238000007599 discharging Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 abstract description 14
- 229910010272 inorganic material Inorganic materials 0.000 abstract description 2
- 239000011147 inorganic material Substances 0.000 abstract description 2
- 230000035699 permeability Effects 0.000 description 13
- 238000007872 degassing Methods 0.000 description 12
- 238000000034 method Methods 0.000 description 8
- 229920002313 fluoropolymer Polymers 0.000 description 6
- 239000004811 fluoropolymer Substances 0.000 description 6
- 150000002500 ions Chemical class 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- 238000005530 etching Methods 0.000 description 4
- 239000001307 helium Substances 0.000 description 4
- 229910052734 helium Inorganic materials 0.000 description 4
- SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000004810 polytetrafluoroethylene Substances 0.000 description 2
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 2
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- 239000013060 biological fluid Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 230000006837 decompression Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005553 drilling Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 238000005459 micromachining Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- -1 tungsten nitride Chemical class 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/17—Ink jet characterised by ink handling
- B41J2/19—Ink jet characterised by ink handling for removing air bubbles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1628—Manufacturing processes etching dry etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/14—Structure thereof only for on-demand ink jet heads
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1626—Manufacturing processes etching
- B41J2/1629—Manufacturing processes etching wet etching
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1631—Manufacturing processes photolithography
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/005—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by bringing liquid or particles selectively into contact with a printing material
- B41J2/01—Ink jet
- B41J2/135—Nozzles
- B41J2/16—Production of nozzles
- B41J2/1621—Manufacturing processes
- B41J2/1632—Manufacturing processes machining
Landscapes
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Particle Formation And Scattering Control In Inkjet Printers (AREA)
- Ink Jet (AREA)
Description
Separation” SPIE Micromachining and Microfabrication Conference,カリフォルニア州、サンノゼ、1999年9月、およびニューメキシコ大学、1997年、W.P.Eatonの博士号論文 “Surface Micromachined Pressure Transducers” に記載されており、これら文献のすべての内容が引例として本明細書に組み入れられる。
20 プリントヘッド・ユニット
24 シート
30 マニフォルド・アセンブリ
40 インク流路
45 脱気部
50 半透性膜
60 減圧領域
70 ノズル
75 インク貯留領域
80 ポンピング室
100 窒化物層
110 ベース層
Claims (12)
- 貯留領域と吐出ノズルとの間に延び、流体の小滴を吐出するために該流体が内部で加圧されるポンピング室を備えた流路と、
前記流路内の流体と接触するように配置された、半透性窒化物を含む膜と、
を備えてなり、
前記膜が、Heに対し室温において1×10 −9 モル/(m 2 Pa・s)以上の透過率を有することを特徴とする小滴吐出装置。 - 前記膜が微小割れ目を備えていることを特徴とする請求項1記載の小滴吐出装置。
- 前記膜が多孔性であることを特徴とする請求項1または2記載の小滴吐出装置。
- 前記膜が、前記流路内の流体と接触する第1の表面と、減圧領域に接する第2の表面とを備えていることを特徴とする請求項1、2または3記載の小滴吐出装置。
- 前記膜が、液体に対しては不透性であるが気体に対して透過性であることを特徴とする請求項1から4いずれか1項記載の小滴吐出装置。
- 前記膜が、空気に対して透過性であることを特徴とする請求項5記載の小滴吐出装置。
- 前記膜が、前記小滴吐出装置内で用いられるインクに対して実質的に不透性であることを特徴とする請求項5記載の小滴吐出装置。
- 前記窒化物が窒化珪素を含むことを特徴とする請求項1から7いずれか1項記載の小滴吐出装置。
- 前記膜が、リアクティブ・イオンエッチング剤に曝されたものであることを特徴とする請求項1から8いずれか1項記載の小滴吐出装置。
- 前記膜が、Heに対し室温において少なくとも1.6×10−8モル/(m2Pa・s)の透過率を有することを特徴とする請求項1から9いずれか1項記載の小滴吐出装置。
- 複数の流路をさらに備えていることを特徴とする請求項1から10いずれか1項記載の小滴吐出装置。
- 前記膜が、100nm以下の断面寸法を有する微小割れ目を備えていることを特徴とする請求項1から11いずれか1項記載の小滴吐出装置。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US10/990,789 | 2004-11-17 | ||
US10/990,789 US7325907B2 (en) | 2004-11-17 | 2004-11-17 | Printhead |
PCT/US2005/041191 WO2006055490A2 (en) | 2004-11-17 | 2005-11-15 | Printhead |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2008520472A JP2008520472A (ja) | 2008-06-19 |
JP4874258B2 true JP4874258B2 (ja) | 2012-02-15 |
Family
ID=36385817
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2007543157A Active JP4874258B2 (ja) | 2004-11-17 | 2005-11-15 | プリントヘッド |
Country Status (7)
Country | Link |
---|---|
US (2) | US7325907B2 (ja) |
EP (1) | EP1827846B1 (ja) |
JP (1) | JP4874258B2 (ja) |
KR (1) | KR101241298B1 (ja) |
CN (1) | CN101080325B (ja) |
AT (1) | ATE519600T1 (ja) |
WO (1) | WO2006055490A2 (ja) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7273270B2 (en) * | 2005-09-16 | 2007-09-25 | Eastman Kodak Company | Ink jet printing device with improved drop selection control |
JP2008173961A (ja) * | 2006-12-19 | 2008-07-31 | Seiko Epson Corp | 液体噴射装置 |
JP5655264B2 (ja) * | 2008-09-02 | 2015-01-21 | セイコーエプソン株式会社 | 脱泡機構及びその製造方法 |
CN102126347A (zh) | 2008-08-19 | 2011-07-20 | 精工爱普生株式会社 | 液体喷射装置、脱泡机构及其制造方法 |
EP2452349A1 (en) * | 2009-07-06 | 2012-05-16 | Imec | Method for forming mems variable capacitors |
JP2013052636A (ja) * | 2011-09-06 | 2013-03-21 | Seiko Epson Corp | 液体噴射装置 |
EP3247563B1 (en) * | 2015-01-20 | 2021-06-23 | Hewlett-Packard Development Company, L.P. | Liquid-gas separator |
EP3247564B1 (en) * | 2015-01-22 | 2021-06-30 | Hewlett-Packard Development Company, L.P. | Vent |
EP3536508B1 (en) * | 2018-03-06 | 2021-03-31 | Ricoh Company, Ltd. | Printhead |
US10668725B2 (en) | 2018-03-06 | 2020-06-02 | Ricoh Company, Ltd. | Supply manifold in a printhead |
US10391781B1 (en) * | 2018-03-06 | 2019-08-27 | Ricoh Company, Ltd. | Printhead that evacuates air from a supply manifold |
CN112937122B (zh) * | 2021-01-28 | 2022-11-11 | 华中科技大学 | 一种均匀喷射的电喷印喷头及系统 |
Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0717050A (ja) * | 1993-07-02 | 1995-01-20 | Brother Ind Ltd | インクジェットプリンタにおけるフィルタ装置 |
JPH11240173A (ja) * | 1997-12-18 | 1999-09-07 | Lexmark Internatl Inc | 流体から汚染物質を除去するためのフィルタ―及びその形成方法 |
US6660648B1 (en) * | 2000-10-02 | 2003-12-09 | Sandia Corporation | Process for manufacture of semipermeable silicon nitride membranes |
Family Cites Families (13)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SE362508B (ja) * | 1968-12-30 | 1973-12-10 | Commw Of Australia | |
US4593291A (en) * | 1984-04-16 | 1986-06-03 | Exxon Research And Engineering Co. | Method for operating an ink jet device to obtain high resolution printing |
JPS6124458A (ja) | 1984-07-13 | 1986-02-03 | Nec Corp | インク・ジエツト・プリント・ヘツド用脱泡装置 |
US4788556A (en) * | 1987-04-28 | 1988-11-29 | Spectra, Inc. | Deaeration of ink in an ink jet system |
US4995940A (en) * | 1988-11-18 | 1991-02-26 | Spectra, Inc. | Method for forming a gas removing device for an ink jet system |
US4940995A (en) * | 1988-11-18 | 1990-07-10 | Spectra, Inc. | Removal of dissolved gas from ink in an ink jet system |
US5659346A (en) * | 1994-03-21 | 1997-08-19 | Spectra, Inc. | Simplified ink jet head |
US5742313A (en) * | 1994-10-31 | 1998-04-21 | Spectra, Inc. | Efficient ink jet head arrangement |
JP3372833B2 (ja) | 1997-07-28 | 2003-02-04 | キヤノン株式会社 | インク吐出装置用の脱気装置、インク吐出装置、液体吐出装置、カラーフィルタ製造装置用の脱気装置、カラーフィルタ製造装置、インク吐出動作安定化方法、およびインクの脱気度安定化方法 |
JP2000323450A (ja) | 1999-05-14 | 2000-11-24 | Seiko Epson Corp | シリコン薄膜の形成方法及びインクジェットヘッドの製造方法 |
US6665787B2 (en) * | 2000-02-29 | 2003-12-16 | International Business Machines Corporation | Very high speed page operations in indirect accessed memory systems |
US7052117B2 (en) * | 2002-07-03 | 2006-05-30 | Dimatix, Inc. | Printhead having a thin pre-fired piezoelectric layer |
US6655787B1 (en) * | 2002-08-26 | 2003-12-02 | Eastman Kodak Company | Drop-on-demand liquid emission using symmetrical electrostatic device |
-
2004
- 2004-11-17 US US10/990,789 patent/US7325907B2/en active Active
-
2005
- 2005-11-15 EP EP05851616A patent/EP1827846B1/en active Active
- 2005-11-15 CN CN2005800431533A patent/CN101080325B/zh active Active
- 2005-11-15 AT AT05851616T patent/ATE519600T1/de not_active IP Right Cessation
- 2005-11-15 KR KR1020077013775A patent/KR101241298B1/ko active IP Right Grant
- 2005-11-15 JP JP2007543157A patent/JP4874258B2/ja active Active
- 2005-11-15 WO PCT/US2005/041191 patent/WO2006055490A2/en active Application Filing
-
2007
- 2007-12-21 US US11/962,776 patent/US7686424B2/en active Active
Patent Citations (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0717050A (ja) * | 1993-07-02 | 1995-01-20 | Brother Ind Ltd | インクジェットプリンタにおけるフィルタ装置 |
JPH11240173A (ja) * | 1997-12-18 | 1999-09-07 | Lexmark Internatl Inc | 流体から汚染物質を除去するためのフィルタ―及びその形成方法 |
US6660648B1 (en) * | 2000-10-02 | 2003-12-09 | Sandia Corporation | Process for manufacture of semipermeable silicon nitride membranes |
Also Published As
Publication number | Publication date |
---|---|
WO2006055490A3 (en) | 2006-12-28 |
CN101080325B (zh) | 2010-05-05 |
ATE519600T1 (de) | 2011-08-15 |
KR20070086377A (ko) | 2007-08-27 |
CN101080325A (zh) | 2007-11-28 |
JP2008520472A (ja) | 2008-06-19 |
EP1827846A2 (en) | 2007-09-05 |
US20060103699A1 (en) | 2006-05-18 |
US7325907B2 (en) | 2008-02-05 |
WO2006055490A2 (en) | 2006-05-26 |
US20080100670A1 (en) | 2008-05-01 |
KR101241298B1 (ko) | 2013-03-14 |
US7686424B2 (en) | 2010-03-30 |
EP1827846B1 (en) | 2011-08-10 |
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