JP4824929B2 - 統合利用のために改良された検査システム - Google Patents

統合利用のために改良された検査システム Download PDF

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Publication number
JP4824929B2
JP4824929B2 JP2004536521A JP2004536521A JP4824929B2 JP 4824929 B2 JP4824929 B2 JP 4824929B2 JP 2004536521 A JP2004536521 A JP 2004536521A JP 2004536521 A JP2004536521 A JP 2004536521A JP 4824929 B2 JP4824929 B2 JP 4824929B2
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radiation
scattered
optical fibers
optical fiber
line
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JP2005539225A5 (enExample
JP2005539225A (ja
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ヴァエス−イラバニ，メディ
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KLA Corp
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KLA Corp
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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/9501—Semiconductor wafers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G01N21/4738—Diffuse reflection, e.g. also for testing fluids, fibrous materials
    • G01N21/474—Details of optical heads therefor, e.g. using optical fibres
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N21/956—Inspecting patterns on the surface of objects

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  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2004536521A 2002-09-13 2003-09-10 統合利用のために改良された検査システム Expired - Fee Related JP4824929B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US41071702P 2002-09-13 2002-09-13
US60/410,717 2002-09-13
PCT/US2003/028593 WO2004025848A1 (en) 2002-09-13 2003-09-10 Improved inspection system for integrated applications

Related Child Applications (1)

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JP2011104180A Division JP5438064B2 (ja) 2002-09-13 2011-05-09 統合利用のために改良された検査システム

Publications (3)

Publication Number Publication Date
JP2005539225A JP2005539225A (ja) 2005-12-22
JP2005539225A5 JP2005539225A5 (enExample) 2006-10-26
JP4824929B2 true JP4824929B2 (ja) 2011-11-30

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JP2004536521A Expired - Fee Related JP4824929B2 (ja) 2002-09-13 2003-09-10 統合利用のために改良された検査システム
JP2011104180A Expired - Fee Related JP5438064B2 (ja) 2002-09-13 2011-05-09 統合利用のために改良された検査システム

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US (1) US7116413B2 (enExample)
JP (2) JP4824929B2 (enExample)
WO (1) WO2004025848A1 (enExample)

Families Citing this family (15)

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WO2004031741A2 (en) * 2002-09-30 2004-04-15 Applied Materials Israel, Ltd. Illumination system for optical inspection
US7319229B2 (en) * 2003-12-29 2008-01-15 Kla-Tencor Technologies Corporation Illumination apparatus and methods
US7417722B2 (en) * 2004-12-19 2008-08-26 Kla-Tencor Technologies Corporation System and method for controlling light scattered from a workpiece surface in a surface inspection system
US7345754B1 (en) 2005-09-16 2008-03-18 Kla-Tencor Technologies Corp. Fourier filters and wafer inspection systems
US7433033B2 (en) * 2006-05-05 2008-10-07 Asml Netherlands B.V. Inspection method and apparatus using same
US20080068593A1 (en) * 2006-09-13 2008-03-20 Hiroyuki Nakano Method and apparatus for detecting defects
JP4876019B2 (ja) * 2007-04-25 2012-02-15 株式会社日立ハイテクノロジーズ 欠陥検査装置およびその方法
US7746459B2 (en) * 2007-08-10 2010-06-29 Kla-Tencor Technologies Corp. Systems configured to inspect a wafer
US7623229B1 (en) 2008-10-07 2009-11-24 Kla-Tencor Corporation Systems and methods for inspecting wafers
US20110242312A1 (en) * 2010-03-30 2011-10-06 Lasertec Corporation Inspection system and inspection method
US8736831B2 (en) 2012-05-15 2014-05-27 Kla-Tencor Corp. Substrate inspection
DE102014103221A1 (de) * 2014-03-11 2015-09-17 Alpma Alpenland Maschinenbau Gmbh Anordnung von optischen Elementen zur Inspektion von Lebensmitteloberflächen
WO2020132961A1 (zh) * 2018-12-26 2020-07-02 合刃科技（深圳）有限公司 外观缺陷检测方法及装置
WO2022270864A1 (ko) * 2021-06-24 2022-12-29 (주)엠텔리 골프공 선별 장치
CN115389624B (zh) * 2022-10-27 2023-02-10 智能网联汽车(山东)协同创新研究院有限公司 一种加工用声波测试系统

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JP2000162141A (ja) * 1998-11-27 2000-06-16 Hitachi Ltd 欠陥検査装置および方法
JP2001255278A (ja) * 2000-03-08 2001-09-21 Hitachi Ltd 表面検査装置およびその方法
JP2002513461A (ja) * 1996-06-04 2002-05-08 ケーエルエー―テンカー コーポレイション 表面検査用光学走査システム
JP2003149159A (ja) * 2001-07-10 2003-05-21 Kla Tencor Technologies Corp 同時のまたは連続的な多重の斜視的な試料欠陥検査のためのシステムおよび方法

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JPS63143831A (ja) * 1986-12-08 1988-06-16 Hitachi Electronics Eng Co Ltd 面板欠陥検出光学装置
JPH0552764A (ja) * 1991-08-26 1993-03-02 Kobe Steel Ltd 表面欠陥検査装置
WO1996028721A1 (en) * 1995-03-10 1996-09-19 Hitachi, Ltd. Inspection method, inspection apparatus and method of production of semiconductor device using them
JP2002513461A (ja) * 1996-06-04 2002-05-08 ケーエルエー―テンカー コーポレイション 表面検査用光学走査システム
JPH1164234A (ja) * 1997-08-20 1999-03-05 Advantest Corp 異物検出方法、および異物検出装置
JP2000162141A (ja) * 1998-11-27 2000-06-16 Hitachi Ltd 欠陥検査装置および方法
JP2001255278A (ja) * 2000-03-08 2001-09-21 Hitachi Ltd 表面検査装置およびその方法
JP2003149159A (ja) * 2001-07-10 2003-05-21 Kla Tencor Technologies Corp 同時のまたは連続的な多重の斜視的な試料欠陥検査のためのシステムおよび方法

Also Published As

Publication number Publication date
WO2004025848A9 (en) 2004-11-11
JP2005539225A (ja) 2005-12-22
US20040125368A1 (en) 2004-07-01
JP5438064B2 (ja) 2014-03-12
WO2004025848A1 (en) 2004-03-25
US7116413B2 (en) 2006-10-03
JP2011215150A (ja) 2011-10-27

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