JP4820534B2 - 低温時の基板を試験するプローバ - Google Patents
低温時の基板を試験するプローバ Download PDFInfo
- Publication number
- JP4820534B2 JP4820534B2 JP2003343146A JP2003343146A JP4820534B2 JP 4820534 B2 JP4820534 B2 JP 4820534B2 JP 2003343146 A JP2003343146 A JP 2003343146A JP 2003343146 A JP2003343146 A JP 2003343146A JP 4820534 B2 JP4820534 B2 JP 4820534B2
- Authority
- JP
- Japan
- Prior art keywords
- chuck
- prober
- test substrate
- radiation shield
- cooled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000000758 substrate Substances 0.000 title claims description 71
- 238000012360 testing method Methods 0.000 title claims description 67
- 230000005855 radiation Effects 0.000 claims description 45
- 239000000523 sample Substances 0.000 claims description 35
- 238000007689 inspection Methods 0.000 claims description 32
- 239000000463 material Substances 0.000 claims description 12
- 238000001816 cooling Methods 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 6
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 238000010438 heat treatment Methods 0.000 claims description 4
- 238000001914 filtration Methods 0.000 claims 1
- 239000002826 coolant Substances 0.000 description 15
- 239000002131 composite material Substances 0.000 description 9
- 238000009833 condensation Methods 0.000 description 6
- 230000005494 condensation Effects 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000007789 gas Substances 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 230000002411 adverse Effects 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 238000009835 boiling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000004308 accommodation Effects 0.000 description 1
- 230000000712 assembly Effects 0.000 description 1
- 238000000429 assembly Methods 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 238000009795 derivation Methods 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229920005594 polymer fiber Polymers 0.000 description 1
- 230000000284 resting effect Effects 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/2872—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation
- G01R31/2874—Environmental, reliability or burn-in testing related to electrical or environmental aspects, e.g. temperature, humidity, vibration, nuclear radiation related to temperature
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/2851—Testing of integrated circuits [IC]
- G01R31/2855—Environmental, reliability or burn-in testing
- G01R31/286—External aspects, e.g. related to chambers, contacting devices or handlers
- G01R31/2865—Holding devices, e.g. chucks; Handlers or transport devices
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
- G01R31/00—Arrangements for testing electric properties; Arrangements for locating electric faults; Arrangements for electrical testing characterised by what is being tested not provided for elsewhere
- G01R31/28—Testing of electronic circuits, e.g. by signal tracer
- G01R31/282—Testing of electronic circuits specially adapted for particular applications not provided for elsewhere
- G01R31/2831—Testing of materials or semi-finished products, e.g. semiconductor wafers or substrates
Landscapes
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- General Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Toxicology (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
- Testing Of Individual Semiconductor Devices (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE2002146282 DE10246282B4 (de) | 2002-10-02 | 2002-10-02 | Prober zum Testen von Substraten bei tiefen Temperaturen |
DE10246282.8 | 2002-10-02 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2004128509A JP2004128509A (ja) | 2004-04-22 |
JP2004128509A5 JP2004128509A5 (enrdf_load_stackoverflow) | 2006-10-05 |
JP4820534B2 true JP4820534B2 (ja) | 2011-11-24 |
Family
ID=32010197
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2003343146A Expired - Fee Related JP4820534B2 (ja) | 2002-10-02 | 2003-10-01 | 低温時の基板を試験するプローバ |
Country Status (2)
Country | Link |
---|---|
JP (1) | JP4820534B2 (enrdf_load_stackoverflow) |
DE (1) | DE10246282B4 (enrdf_load_stackoverflow) |
Families Citing this family (17)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3945527B2 (ja) | 2004-11-30 | 2007-07-18 | 住友電気工業株式会社 | ウェハプローバ用ウェハ保持体およびそれを搭載したウェハプローバ |
JP2007201484A (ja) * | 2004-11-30 | 2007-08-09 | Sumitomo Electric Ind Ltd | ウェハプローバ用ウェハ保持体およびそれを搭載したウェハプローバ |
DE102005015334B4 (de) * | 2005-04-01 | 2017-02-09 | Cascade Microtech, Inc. | Prober zum Testen von Substraten bei Temperaturen im Bereich der Siedetemperatur von Helium |
JP4049172B2 (ja) | 2005-07-13 | 2008-02-20 | 住友電気工業株式会社 | ウェハプローバ用ウェハ保持体およびそれを搭載したウェハプローバ |
JP2007227250A (ja) * | 2006-02-24 | 2007-09-06 | Hitachi High-Technologies Corp | 検査装置及び検査装置の予備排気室を真空排気する方法 |
DE102006038457B4 (de) * | 2006-08-16 | 2014-05-22 | Cascade Microtech, Inc. | Verfahren und Vorrichtung zum Temperieren elektronischer Bauelemente |
DE102007058457B4 (de) | 2006-12-08 | 2018-06-07 | Cascade Microtech, Inc. | Anordnung und Verfahren zur Testung von Halbleitersubstraten unter definierter Atmosphäre |
JP2007235171A (ja) * | 2007-05-17 | 2007-09-13 | Sumitomo Electric Ind Ltd | ウェハプローバ用ウェハ保持体およびそれを搭載したウェハプローバ |
US8497693B2 (en) | 2007-10-10 | 2013-07-30 | Cascade Microtech, Inc. | Method for testing a test substrate under defined thermal conditions and thermally conditionable prober |
JP6161327B2 (ja) * | 2013-02-28 | 2017-07-12 | 株式会社 エイブイシー | 四端子抵抗測定装置および四端子測定用プローブ |
DE102013215781A1 (de) * | 2013-08-09 | 2015-02-12 | Ers Electronic Gmbh | Thermische Abschirmvorrichtung für eine Probecard und entsprechende Probecardanordnung |
CN107389455B (zh) * | 2017-09-05 | 2023-06-06 | 中国工程物理研究院流体物理研究所 | 用于磁驱动斜波压缩中样品初始温度的降温装置及方法 |
CN108918977B (zh) * | 2018-05-02 | 2024-02-06 | 沈阳工业大学 | 一种低温条件下电介质气固界面闪络特性测量装置及方法 |
EP3734301A1 (en) * | 2019-05-03 | 2020-11-04 | Afore Oy | Cryogenic wafer prober with movable thermal radiation shield |
EP3734303B1 (en) * | 2019-05-03 | 2024-04-03 | Afore Oy | Cryogenic probe station with loading assembly |
CN115165927A (zh) * | 2022-07-28 | 2022-10-11 | 河北博威集成电路有限公司 | 一种3d化合物半导体芯片的检测方法 |
CN116165472B (zh) * | 2023-04-22 | 2023-07-04 | 深圳市森美协尔科技有限公司 | 一种低温探针测试设备 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62190737A (ja) * | 1986-02-17 | 1987-08-20 | Fujitsu Ltd | 低温用オ−トプロ−バ− |
JPH01278739A (ja) * | 1988-04-30 | 1989-11-09 | Nippon Denshi Zairyo Kk | 半導体ウェハー低温試験装置 |
JPH0685020A (ja) * | 1990-05-16 | 1994-03-25 | Fujitsu Ltd | 低温領域の気体吸着防止機構 |
DE4109908C2 (de) * | 1991-03-26 | 1994-05-05 | Erich Reitinger | Anordnung zur Prüfung von Halbleiter-Wafern |
US5345999A (en) * | 1993-03-17 | 1994-09-13 | Applied Materials, Inc. | Method and apparatus for cooling semiconductor wafers |
JPH06323955A (ja) * | 1993-05-17 | 1994-11-25 | Canon Inc | 半導体試験装置 |
JPH0982785A (ja) * | 1995-09-18 | 1997-03-28 | Nec Corp | 半導体ウェハ温度制御装置 |
-
2002
- 2002-10-02 DE DE2002146282 patent/DE10246282B4/de not_active Expired - Fee Related
-
2003
- 2003-10-01 JP JP2003343146A patent/JP4820534B2/ja not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE10246282A1 (de) | 2004-04-15 |
DE10246282B4 (de) | 2005-12-29 |
JP2004128509A (ja) | 2004-04-22 |
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