JP4797140B2 - 荷電粒子線照射装置 - Google Patents

荷電粒子線照射装置 Download PDF

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Publication number
JP4797140B2
JP4797140B2 JP2007009524A JP2007009524A JP4797140B2 JP 4797140 B2 JP4797140 B2 JP 4797140B2 JP 2007009524 A JP2007009524 A JP 2007009524A JP 2007009524 A JP2007009524 A JP 2007009524A JP 4797140 B2 JP4797140 B2 JP 4797140B2
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JP
Japan
Prior art keywords
charged particle
particle beam
irradiation
proton beam
beam irradiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2007009524A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008173297A (ja
Inventor
禎治 西尾
尚 荻野
和弘 野村
敏樹 立川
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Heavy Industries Ltd
National Cancer Center Japan
Original Assignee
Sumitomo Heavy Industries Ltd
National Cancer Center Japan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Heavy Industries Ltd, National Cancer Center Japan filed Critical Sumitomo Heavy Industries Ltd
Priority to JP2007009524A priority Critical patent/JP4797140B2/ja
Priority to TW097101237A priority patent/TW200836792A/zh
Priority to CN2008100035414A priority patent/CN101224324B/zh
Priority to KR1020080005786A priority patent/KR100960823B1/ko
Publication of JP2008173297A publication Critical patent/JP2008173297A/ja
Application granted granted Critical
Publication of JP4797140B2 publication Critical patent/JP4797140B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/20—Masks or mask blanks for imaging by charged particle beam [CPB] radiation, e.g. by electron beam; Preparation thereof
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N5/00—Radiation therapy
    • A61N5/10—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy
    • A61N5/1042—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy with spatial modulation of the radiation beam within the treatment head
    • A61N5/1043—Scanning the radiation beam, e.g. spot scanning or raster scanning
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61N—ELECTROTHERAPY; MAGNETOTHERAPY; RADIATION THERAPY; ULTRASOUND THERAPY
    • A61N5/00—Radiation therapy
    • A61N5/10—X-ray therapy; Gamma-ray therapy; Particle-irradiation therapy
    • A61N5/1077—Beam delivery systems
    • A61N5/1079—Sharing a beam by multiple treatment stations
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F5/00—Screening processes; Screens therefor
    • G03F5/02—Screening processes; Screens therefor by projection methods
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70208—Multiple illumination paths, e.g. radiation distribution devices, microlens illumination systems, multiplexers or demultiplexers for single or multiple projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
    • H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams

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  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Biomedical Technology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Pathology (AREA)
  • Nuclear Medicine, Radiotherapy & Molecular Imaging (AREA)
  • Radiology & Medical Imaging (AREA)
  • Veterinary Medicine (AREA)
  • Animal Behavior & Ethology (AREA)
  • General Health & Medical Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Radiation-Therapy Devices (AREA)
  • Nuclear Medicine (AREA)
  • Apparatus For Radiation Diagnosis (AREA)
JP2007009524A 2007-01-18 2007-01-18 荷電粒子線照射装置 Expired - Fee Related JP4797140B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2007009524A JP4797140B2 (ja) 2007-01-18 2007-01-18 荷電粒子線照射装置
TW097101237A TW200836792A (en) 2007-01-18 2008-01-11 Irradiation apparatus of charged particle ray
CN2008100035414A CN101224324B (zh) 2007-01-18 2008-01-18 带电粒子线治疗装置
KR1020080005786A KR100960823B1 (ko) 2007-01-18 2008-01-18 하전입자선 조사장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2007009524A JP4797140B2 (ja) 2007-01-18 2007-01-18 荷電粒子線照射装置

Publications (2)

Publication Number Publication Date
JP2008173297A JP2008173297A (ja) 2008-07-31
JP4797140B2 true JP4797140B2 (ja) 2011-10-19

Family

ID=39700797

Family Applications (1)

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JP2007009524A Expired - Fee Related JP4797140B2 (ja) 2007-01-18 2007-01-18 荷電粒子線照射装置

Country Status (4)

Country Link
JP (1) JP4797140B2 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
KR (1) KR100960823B1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
CN (1) CN101224324B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)
TW (1) TW200836792A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8461539B2 (en) 2008-08-01 2013-06-11 National Institute Of Radiological Sciences Combined radiation therapy/pet apparatus
JP5360914B2 (ja) * 2008-08-01 2013-12-04 独立行政法人放射線医学総合研究所 検出器シフト型放射線治療・ｐｅｔ複合装置
JP5286004B2 (ja) 2008-09-12 2013-09-11 株式会社日立ハイテクノロジーズ 基板の検査装置、および、基板の検査方法
JP5120459B2 (ja) * 2008-10-23 2013-01-16 株式会社島津製作所 粒子線治療装置
JP5339592B2 (ja) * 2009-01-28 2013-11-13 独立行政法人国立がん研究センター 陽子線治療におけるポジトロン放出核種のアクティビティ分布のシミュレーション方法
KR101127680B1 (ko) * 2009-09-08 2012-03-23 중앙대학교 산학협력단 도넛형 코일을 이용한 하전입자 빔 단층촬영 장치 및 방법
ES2605031T3 (es) 2009-10-23 2017-03-10 Ion Beam Applications Pórtico que comprende un analizador de haz para su uso en terapia de partículas
JP5638606B2 (ja) * 2010-12-27 2014-12-10 住友重機械工業株式会社 エネルギーデグレーダ、及びそれを備えた荷電粒子照射システム
JP5726541B2 (ja) * 2011-01-18 2015-06-03 住友重機械工業株式会社 エネルギーデグレーダ、及びそれを備えた荷電粒子照射システム
EP2703045B1 (en) * 2011-04-25 2015-11-25 Mitsubishi Electric Corporation Particle beam energy converter, particle beam treatment device provided with same, and particle beam energy converting method
JP5701671B2 (ja) * 2011-04-27 2015-04-15 住友重機械工業株式会社 荷電粒子線照射装置
JP5726644B2 (ja) * 2011-06-06 2015-06-03 住友重機械工業株式会社 エネルギーデグレーダ、及びそれを備えた荷電粒子線照射システム
JP2012254146A (ja) * 2011-06-08 2012-12-27 Hitachi Ltd 荷電粒子ビーム照射システム
JP6587826B2 (ja) * 2015-05-14 2019-10-09 株式会社日立製作所 粒子線照射システム
CN105251138B (zh) * 2015-11-13 2018-03-13 上海艾普强粒子设备有限公司 一种粒子照射装置以及包括该装置的粒子治疗系统
CN105797282B (zh) * 2016-03-07 2018-09-04 上海艾普强粒子设备有限公司 一种粒子照射装置以及包括该装置的粒子治疗系统
WO2017214902A1 (zh) * 2016-06-15 2017-12-21 深圳市奥沃医学新技术发展有限公司 肿瘤位置的追踪方法及放射治疗设备
JP6594835B2 (ja) * 2016-09-02 2019-10-23 住友重機械工業株式会社 荷電粒子線治療装置、及びリッジフィルタ

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL8900575A (nl) * 1989-03-09 1990-10-01 Philips Nv Roentgenonderzoek apparaat.
JP3142612B2 (ja) 1991-07-05 2001-03-07 栄胤 池上 固体の表面物性を探査する方法および走査クラスター顕微鏡
JP3519248B2 (ja) 1997-08-08 2004-04-12 住友重機械工業株式会社 放射線治療用回転照射室
JP2004524527A (ja) * 2001-02-06 2004-08-12 ジー エス アイ ゲゼルシャフト フュア シュベールイオーネンフォルシュンク エム ベー ハー 重イオン癌治療施設における高エネルギーイオンビームの輸送および送出のためガントリシステム
EP1347309A3 (en) * 2002-03-20 2012-04-18 Hitachi, Ltd. Radiological imaging apparatus and method
JP3673791B2 (ja) * 2002-05-22 2005-07-20 キヤノン株式会社 放射線撮影装置及び放射線撮影方法
JP4464612B2 (ja) * 2003-02-12 2010-05-19 株式会社島津製作所 放射線撮像装置
JP4352841B2 (ja) 2003-10-02 2009-10-28 株式会社島津製作所 放射線検出器、および、ｒｉイメージング装置
JP2005185718A (ja) * 2003-12-26 2005-07-14 Ge Medical Systems Global Technology Co Llc 放射線断層撮像装置および撮像方法
JP4071765B2 (ja) * 2004-12-10 2008-04-02 株式会社東芝 核医学診断装置
JP2006021046A (ja) * 2005-07-05 2006-01-26 Mitsubishi Heavy Ind Ltd 放射線治療装置

Also Published As

Publication number Publication date
CN101224324B (zh) 2012-10-10
KR20080068594A (ko) 2008-07-23
JP2008173297A (ja) 2008-07-31
KR100960823B1 (ko) 2010-06-07
TW200836792A (en) 2008-09-16
TWI352605B (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) 2011-11-21
CN101224324A (zh) 2008-07-23

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